Did You Know...
...that one person who claimed to be the inventor of the television is Russian emigre Vladimir Zworykin? In 1929 David Sarnoff, founder of RCA, asked Zworykin what it would take to develop TV for commercial use. He said: a year and a half and $100,000. In reality, it took 20 years and $50 million! Before his death in 1982 at the age of 92, Zworykin said of his invention: "The technique is wonderful. It is beyond my expectations. But the programs! I would never let my children even come close to this thing."
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| Number | Title | Issue Date |
| 6742279 | Apparatus and method for rinsing substrates Embodiments of the invention provide a spin rinse dry (SRD) chamber for a semiconductor processing system. The SRD chamber includes a selectively rotatable substrate support member having an upper substrate receiving surface formed thereon, and a selectively rotatab... | 06/01/2004 |
| 6737221 | Mass production method of semiconductor integrated circuit device and manufacturing method of electronic device In order to prevent the contamination of wafers made of a transition metal in a semiconductor mass production process, the mass production method of a semiconductor integrated circuit device of the invention comprises the steps of depositing an Ru film on individual... | 05/18/2004 |
| 6736148 | Automated semiconductor processing system An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are locate... | 05/18/2004 |
| 6736146 | Method of rapidly reworking color filters A method of removing non-polar colorants of a color filter array rapidly from a bottom layer starts by performing a cracking process to decompose cross-linked polymeric molecules of non-polar R/G/B colorants to smaller fragments. A plasma cleaning process is perform... | 05/18/2004 |
| 6736149 | Method and apparatus for supercritical processing of multiple workpieces An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled ... | 05/18/2004 |
| 6736150 | Fluid heating system for processing semiconductor materials A system for heating solvents in processing semiconductor wafers has a coiled solvent tube, a coiled cooling water tube, and electric heater elements, cast in place within an aluminum casting. The solvent flows through the solvent tube and is heated by conduction of... | 05/18/2004 |
| 6734121 | Methods of treating surfaces of substrates In one aspect, the invention includes a method of treating a surface of a substrate. A mixture which comprises at least a frozen first material and liquid second material is provided on the surface and moved relative to the substrate. In another aspect, the inventio... | 05/11/2004 |
| 6733597 | Method of cleaning a dual damascene structure A method is provided for cleaning a dual damascene structure. A first metal layer, a cap layer, and a dielectric layer are formed on a substrate in sequence. Then a dual damascene opening is formed in the dielectric layer and the cap layer exposing the first metal l... | 05/11/2004 |
| 6732750 | Semiconductor wafer cleaning apparatus and method of using the same A semiconductor wafer cleaning apparatus and method uses only one inner bath for chemical solution and de-ionized water cleaning, and includes a marangoni dryer for cleaning and drying semiconductor wafers. The apparatus includes a loading unit loaded with a cassett... | 05/11/2004 |
| 6733594 | Method and apparatus for reducing He backside faults during wafer processing A method and system for processing a wafer is disclosed. The method includes receiving a wafer having a process side and a backside. The method further includes removing un-wanted particles from the backside of the wafer to prevent gaps from forming between the back... | 05/11/2004 |
| 6732749 | Particle barrier drain A system and method for reducing the amount of contaminants that come into contact with wafer substrates during the production of integrated circuit devices. The system allows for uniform overflow of processing liquid from a process tank while preventing contaminant... | 05/11/2004 |
| 6730176 | Single wafer megasonic cleaner method, system, and apparatus The present invention is directed to a method, system, and apparatus for applying megasonic energy to the surface of a workpiece for the removal of contaminants. A nozzle dispenses a stream of deionized water or other cleaning fluid at a radial position on the surfa... | 05/04/2004 |
| 6729339 | Method and apparatus for cooling a resonator of a megasonic transducer A method for cleaning a semiconductor substrate is provided. The method initiates with introducing a liquid onto the top surface of the semiconductor substrate. Then, a bottom surface of a resonator is coupled to a top surface of a semiconductor substrate through th... | 05/04/2004 |
| 6726777 | Cleaning method and apparatus using fluid spraying Cleaning fluid is sprayed upwards from under a substantially horizontally-held object to be cleaned for cleaning the underside of the object. At this time, an accelerating fluid accelerates the cleaning fluid to change its spraying direction toward a surface of the ... | 04/27/2004 |
| 6725564 | Processing platform with integrated particle removal system Embodiments of the invention generally provide a multistage semiconductor processing tool, wherein the processing tool includes a first transfer chamber having a first substrate transfer robot positioned therein and at least one load lock chamber in communication wi... | 04/27/2004 |
| 6725868 | Liquid processing apparatus A cleaning processing apparatus, which is one embodiment of a liquid processing apparatus for performing a liquid processing by supplying a predetermined process liquid to a target object to be processed such as a semiconductor wafer while rotating the target object... | 04/27/2004 |
| 6725869 | Protective barrier for cleaning chamber A method and apparatus is provided that may protect a fragile component (such as a quartz plate) positioned within a megasonic tank from impact by falling objects. The megasonic tank may include a barrier (such as one or more extended rollers, quartz bars, or a net)... | 04/27/2004 |
| 6725119 | Cleaning-apparatus line configuration and designing process therefor An objective of this invention is to provide a process for selecting rationally and quickly a wet process treatment in which an etchant can be shared based on a minimum preliminary investigation while eliminating cross contamination derived from a newly employed mat... | 04/20/2004 |
| 6723172 | Method and system for processing semiconductor wafers A method for processing semiconductor wafers includes processing a semiconductor wafer in a processing chamber having upper and lower chambers, decoupling the upper chamber from the lower chamber, cleaning the upper chamber, determining, while decoupled, that a leak... | 04/20/2004 |
| 6723226 | Method and apparatus for forming electrolytic water and apparatus for washing semiconductor substrate using electrolytic water-forming apparatus In forming an electrolytic water, pure water or ultra-pure water is added to at least one solid supporting electrolyte selected from the group consisting of oxalic acid, ammonium oxalate, ammonium formate, ammonium bicarbonate, and ammonium tartrate to prepare a sol... | 04/20/2004 |
| 6722379 | One-piece cleaning tank with indium bonded megasonic transducer A megasonic cleaning system comprised of a one-piece cleaning tank, one or more piezoelectric crystals and an indium layer for attaching the piezoelectric crystals to the cleaning tank. The tank comprises a material selected from the group consisting of quartz, sapp... | 04/20/2004 |
| 6715944 | Apparatus for removing photoresist film An apparatus for removing a photoresist film includes a substrate cassette for fixing a substrate having a surface covered with a photoresist film, an ozone feed tube for supplying ozone, a liquid feed tube for supplying a liquid photoresist film removing solution, ... | 04/06/2004 |
| 6715498 | Method and apparatus for radiation enhanced supercritical fluid processing A supercritical process vessel with an interior for holding a supercritical fluid is provided. A wafer support for supporting a wafer within the interior of a supercritical process vessel to expose the wafer to the supercritical fluid is provided. A lamp, which is a... | 04/06/2004 |
| 6715507 | Vaporizer A vaporizer comprises disks each including an aperture at a central portion thereof. A hollow pipe having apertures for permitting radial outflow of a liquid extends through the aperture of each of the discs so as to form a stack of the discs. A resilient member app... | 04/06/2004 |
| 6712078 | Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying ... | 03/30/2004 |
| 6712081 | Pressure processing device A pressure processing device including a vessel having a body and an opening/closing member. A seal member is provided on a joining surface between the body and the opening/closing member, and a non-sliding joining surface is provided which is not slidably moved whe... | 03/30/2004 |
| 6708700 | Cleaning of semiconductor processing chambers A method of removing deposits from selected areas of a substrate-processing chamber comprising applying RF energy to a coil located around selected areas of the chamber is provided. Also provided is a substrate-processing chamber with improved cleaning properties ha... | 03/23/2004 |
| 6708701 | Capillary ring The present invention provides an apparatus for removing an edge bead from a substrate. The apparatus includes a substrate support member, a plurality of mounting posts positioned along a perimeter of the substrate support member, and a rigid annular capillary ring ... | 03/23/2004 |
| 6708702 | Liquid processing apparatus with storage tank having an internal and external tank There is provided a liquid processing apparatus for carrying out a process, such as cleaning, with a chemical serving as a processing liquid, with respect to a semiconductor wafer (W) which serves as an object to be processed and which is housed in a processing cham... | 03/23/2004 |
| 6705331 | Substrate cleaning apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a gas-liquid mixture by mixing a liquid and a pressurized gas, to discharge the gas-liquid mixture to a substrate at high speeds. The mixture process is conducted in an ope... | 03/16/2004 |
| 6706121 | Device and method for the treatment of semiconductor wafers In a method of treating substrates a treatment fluid is fed into a collection vessel after treatment, at least a portion of the treatment fluid is withdrawn from the collection vessel and returned to respective reservoir and the collection vessel is rinsed before re... | 03/16/2004 |
| 6701941 | Method for treating the surface of a workpiece An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus comprises a liquid supply line that is used to provide flui... | 03/09/2004 |
| 6701942 | Method of and apparatus for removing contaminants from surface of a substrate A cleaning apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants from the surface b... | 03/09/2004 |
| 6702197 | Anti-electrostatic discharge spray gun apparatus and method An anti-electrostatic discharge spray gun apparatus and method for preventing crystallization of particles formed as a result of electrostatic discharge from forming on a spray gun nozzle and an associated pair of oppositely charged electrodes disposed on... | 03/09/2004 |
| 6702202 | Method and apparatus for fluid delivery to a backside of a substrate A fluid delivery device for delivering fluid to the backside of a substrate while minimizing waste. The device includes an inner cylindrical tube having a top opening and a bottom opening. An upper cap overlying a top portion of the inner cylindrical tube... | 03/09/2004 |
| 6698439 | Processing apparatus with sealing mechanism A processing apparatus includes an inner cylinder 25 (a processing chamber 23) accommodated in a carrying unit for carrying an object to be processed and further seals up the object with the inner cylinder 25 or a first stationary wall 34 to process the o... | 03/02/2004 |
| 6699330 | Method of removing contamination adhered to surfaces and apparatus used therefor A method of removing surface-deposited contaminants, comprising bringing an ozone-containing treating solution into contact with the surface of a treating target on which contaminants have deposited. The ozone-containing treating solution comprises an org... | 03/02/2004 |
| 6691430 | High-pressure drying apparatus, high-pressure drying method and substrate processing apparatus Liquid for prevention of substrate drying is supplied into a processing chamber so that a pool of the liquid is created as an anti-drying atmosphere in advance inside a processing chamber, and substrates, as they are dipped in the pool, are kept on stand-... | 02/17/2004 |
| 6692580 | Method of cleaning a dual damascene structure A method of cleaning a dual damascene structure. A first metal layer, a cap layer, and a dielectric layer are formed on a substrate in sequence. Then a dual damascene opening is formed in the dielectric layer and the cap layer, exposing the first metal la... | 02/17/2004 |
| 6691578 | Measurement systems for ultrasound in a vessel The invention produces a change to the acoustic input power applied to a liquid in a vessel. The magnitude and shape of the resulting change in the ultrasonic field in the vessel is measured and this data is used to determine the ultrasonic activity in th... | 02/17/2004 |
