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| Number | Title | Issue Date |
| 7980255 | Single wafer dryer and drying methods In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line w... | 07/19/2011 |
| 7849864 | Liquid processing system A liquid processing system includes a liquid processing section including liquid processing units horizontally disposed therein and each configured to perform a liquid process while supplying a process liquid onto a substrate; a process liquid storing section that s... | 12/14/2010 |
| 7832416 | Imprint lithography apparatus and methods An imprint lithography apparatus including a service station. ... | 11/16/2010 |
| 7631652 | Flush rinse apparatus for electroplating operations An apparatus for rinsing an article includes a tank having an upper portion, the upper portion including a rim; a discharge pipe connected to the tank; a generally cylindrical spray assembly disposed in a middle portion of the tank; a second tank; a source of rinse ... | 12/15/2009 |
| 7621285 | Tunnel washer system with improved cleaning efficiency A tunnel washer that includes fluid exhaust paths that are optimized to minimize fluid transfer between chambers of the washer and minimize heat loss from each chamber of the washer. The fluid exhaust paths also facilitate uniform vapor evacuation from each chamber ... | 11/24/2009 |
| 7405164 | Apparatus and method for removing a photoresist structure from a substrate In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showerhead includes a first space ... | 07/29/2008 |
| 7392812 | Substrate processing apparatus and substrate transporting device mounted thereto The invention provides a substrate processing apparatus including a processing tank for processing substrates, a transporting path provided along the processing tank, a substrate transporting device moving along the transporting path for transporting the substrates,... | 07/01/2008 |
| 7384484 | Substrate processing method, substrate processing apparatus and substrate processing system After subjected to a developing process, a rinsing process and a replacing process in this order in a developing unit 10A, 10B, a substrate W wet with an anti-drying solution is wet-transported to a supercritical drying unit 20 by a primary tran... | 06/10/2008 |
| 7361632 | Water soluble glass as corrosion protector in dishwashing machines A zinc-containing, water-soluble glass composition comprising from 41 to 54 mole % of P2O5, 10 to 30 mole % of alkali oxides, up to 5 mole % of SO3 and up to 25 mole % of ZnO. ... | 04/22/2008 |
| 7346956 | Automatic cart wash apparatus An automatic cart wash apparatus. The automatic cart wash apparatus provides improved cleaning of stock carts on a regular basis over manual cleaning by store employees. The automatic cart wash apparatus includes three main stages: a debris removal (vacuum) stage, a... | 03/25/2008 |
| 7337792 | Liquid processing apparatus and liquid processing method A cleaning apparatus 1 includes a foup loading/unloading part 2 for mounting foups F each accommodating a plurality of wafers W at intervals of a constant pitch (normal pitch), a rotor 34 capable of holding the wafers W at half the normal pitch ... | 03/04/2008 |
| 7338757 | Process for decellularizing soft-tissue engineered medical implants, and decellularized soft-tissue medical implants produced The invention provides methodologies and apparatus for producing acellular soft-tissue implants, both in small quantities and in commercializable quantities. Such soft-tissue implants include vascular graft substitutes. An acellular graft is produced by subjecting t... | 03/04/2008 |
| 7332440 | Wet etching apparatus and method A wet etching apparatus and method to shorten processing time and to eliminate formation of unintended mask pattern are described. In the conventional art, after a mask pattern is formed, alien substances such as water mist or stain are left on the substrate. The al... | 02/19/2008 |
| 7318870 | Method of cleaning semiconductor substrate A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O3) into the cleaning chamber. This process operates to cleanse the semiconductor substrate without corrosion or... | 01/15/2008 |
| 7290551 | Washing device and its work conveying method The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion... | 11/06/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7284560 | Liquid processing apparatus A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating devic... | 10/23/2007 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7267128 | Substrate treating apparatus A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the treating tank and a transfer po... | 09/11/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7252098 | Apparatus for cleaning and drying substrates A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni dryi... | 08/07/2007 |
| 7252100 | Systems and methods for processing a set of circuit boards A circuit board processing system includes a wash tank configured to contain cleaning fluid, and a positioning subsystem configured to immerse a set of circuit boards into the wash tank. The system further includes a flow control subsystem having (i) a first set of ... | 08/07/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7237562 | Substrate processing apparatus and control method of inert gas concentration Provided is a substrate processing apparatus capable of supplying pure water that is stabilized with respect to the concentration of nitrogen gas. First and second nitrogen concentration meters to measure the nitrogen gas concentration of pure water are respectively... | 07/03/2007 |
| 7235141 | Lift-off method and chemical liquid tank A lift-off procedure is provided which enables prevention of damage to a wiring pattern caused by contact of a metal being peeled off from a wafer with a wiring pattern at a time of lift-off procedure. A wafer having a surface on which a pattern is formed which cont... | 06/26/2007 |
| 7234898 | Pneumatic transmission system A pneumatic transmission system includes a first terminal, a second terminal, and a transmission conduit connecting the first and second terminals in fluid communication with each other. The pneumatic transmission system may include a first blower directly connected... | 06/26/2007 |
| 7228645 | Multi-zone shower head for drying single semiconductor substrate A shower head processes a wafer with a plate having a plurality of nozzles positioned thereon, each of the nozzles assigned to one of a plurality of processing zones for the wafer; and a manifold assembly coupled to each of the nozzles to control one or more of the ... | 06/12/2007 |
| 7229521 | Etching system using a deionized water adding device An etching system (3) includes an etching chamber (31), an etchant solution tank (32) connected with the etching chamber, a heater (34) set in the tank, and a deionized water (DIW) adding device. The DIW adding device includes a DIW feedi... | 06/12/2007 |
| 7229522 | Substrate processing apparatus and substrate processing method A substrate processing apparatus removes resist films formed on wafers by holding the wafers in a processing vessel and exposing the wafers to a mixed gaseous fluid of steam and an ozone-containing gas into the processing vessel. The inner surfaces, to be exposed to... | 06/12/2007 |
| 7226512 | Load lock system for supercritical fluid cleaning A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised to a high pressure above vacuum. A second door coupling the load lock... | 06/05/2007 |
| 7202175 | Method and apparatus for treating a substrate surface by bubbling The present invention discloses a technique of removing a substance from a substrate surface, such as stripping photoresist from a wafer, or forming a substance on a substrate surface. Substrates to be treated are parallel arranged at an equal interval and are immer... | 04/10/2007 |
| 7192488 | Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscus A system and method for processing an edge of a substrate includes an edge roller and a first proximity head. The first proximity head being mounted on the edge roller. The first proximity head capable of forming a meniscus and including a concave portion and multip... | 03/20/2007 |
| 7182820 | Methods and apparatus for cleaning a hearing aid device Methods and apparatus for cleaning hearing aid devices are disclosed. Drying is facilitated in hearing instruments through a novel combination of heater and desiccant in an essentially closed system. Greater efficiency is obtained by minimizing the volume of gas, e.... | 02/27/2007 |
| 7172383 | Wafer transfer equipment and semiconductor device manufacturing apparatus using wafer transfer equipment A semiconductor wafer transfer equipment transfers a plurality of semiconductor wafers, held in grooves of carriers in an erected state, to a boat using first and second wafer elevators equipped with a comb-teeth portion and a wafer grip and transfer unit. The first... | 02/06/2007 |
| 7153782 | Effective solution and process to wet-etch metal-alloy films in semiconductor processing A solution and method is described for etching TaN, TiN, Cu, FSG, TEOS, and SiN on a silicon substrate in silicon device processing. The solution is formed by combining HF at 49% concentration with H2O2 at 29%–30% concentration in deionized w... | 12/26/2006 |
| 7147689 | Apparatus and method for removing volatile organics from vented gases An apparatus and a method for removing volatile organic compounds from air that is vented from tanks and vessels containing hydrocarbon material. This invention also relates to a self-propelled vehicle on which the apparatus is mounted. ... | 12/12/2006 |
| 7146994 | Active rinse shield for electrofill chemical bath and method of use An active rinse shield designed to protect electrofill chemical baths from excessive dilution during rinse sprays on the semiconductor wafer. The shield uses overlapping blades to cover the bath, making a physical barrier between the bath chemistry and the wafer rin... | 12/12/2006 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7114508 | Cleaning apparatus having multiple wash tanks for carbon dioxide dry cleaning and methods of using same Cleaning apparatus having multiple wash tanks for washing articles in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution are provided. Cleaning apparatus having multiple wash tanks of the present invention may provide improved t... | 10/03/2006 |
| 7107999 | Substrate processing apparatus for removing organic matter by removal liquid An indexer part, removal processing part, interface, and dry processing part are disposed adjacent to each other in a row. That is, the removal processing part that performs removal processing of an organic matter by using a removal liquid is disposed adjacent to th... | 09/19/2006 |
