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| Number | Title | Issue Date |
| 6695927 | Method and cleaning solution for cleaning a container A method and a solution are provided for cleaning a container, in particular a boiler of a conventional power station. The container is degreased and pickled in one method step using an alkaline cleaning solution. A suitable cleaning solution includes, fo... | 02/24/2004 |
| 6692612 | Adhesive removal compositions and methods of using same Novel compositions and methods of using the same which are highly effective at removing adhesive materials. The compositions are useful for removing adhesives, such as those used to secure floor coverings, to thereby aid in the removal of the floor coveri... | 02/17/2004 |
| 6693065 | Non-foaming detergent compositions for concentrated alkaline media Detergent compositions which are non-foaming and stable in highly alkaline medium, comprising 25 to 45% by weight of non-foaming detergent agent, in particular a capped nonionic surfactant, for example an -alkyl-ω-halopoly(oxy-1,2-ethanediyl), or ... | 02/17/2004 |
| 6689736 | Cleaning wipe The present invention relates to a cleaning wipe which is a water insoluble substrate impregnated with a cleaning composition containing a cellulosic polymer.... | 02/10/2004 |
| 6689223 | Water-containing multiphase cleaning composition based on nonionic surfactant A method of cleaning hard surfaces by contact with an aqueous, liquid, multiphase, surfactant-containing cleaning composition having at least two continuous phases, one lower aqueous phase I and an upper aqueous phase II immiscible with the lower phase I,... | 02/10/2004 |
| 6682607 | Reconditioning of semiconductor substrates to remove photoresist during semiconductor device fabrication A method for reconditioning the surface of a semiconductor substrate to remove an unwanted (i.e. defective) layer of photoresist is disclosed. The method adapts a conventional automated spinner which is used to rotate the substrate at high speed while a s... | 01/27/2004 |
| 6682605 | Apparatus and method for removing coating layers from alignment marks An apparatus and a method for removing coating layers from the top of alignment marks on a wafer are described. The apparatus includes a cleaning chamber that is a cavity and a lid member suspended in the cavity, a wafer chuck that is rotatably mounted in... | 01/27/2004 |
| 6681781 | Methods for cleaning microelectronic substrates using ultradilute cleaning liquids A method of cleaning a surface of an article using cleaning liquids in combination with acoustic energy. Preferably, an ultradilute concentration of a cleaning enhancement substance, such as ammonia gas, is dissolved in a liquid solvent, such as filtered ... | 01/27/2004 |
| 6682604 | Restoration of contaminated polymer articles A method of restoring a contaminated polymer article including contacting a contaminated polymer article with an oil which is not a plasticizer under conditions effective to remove substantially all contaminants present on the polymer article to produce a... | 01/27/2004 |
| 6679950 | Cleaning method and cleaner A substrate cleaning method of the present invention enables effective cleaning of a wafer having a recess therein without causing any increase in cleaning costs. Ozone gas and ammonia water are supplied to an area right above a wafer 7 having a recess th... | 01/20/2004 |
| 6679274 | Clean-in-place method for cleaning solution delivery systemes/lines A method is taught for cleaning photographic chemistry product fouling, including a proteinaceous portion and a non-proteinaceous portion from a liquid delivery system. The method comprises the steps of displacing resident product solution in the piping w... | 01/20/2004 |
| 6676710 | Process for treating textile substrates A process for treating a textile substrate, the process including the steps of providing a textile substrate; providing a treatment bath; entraining a transport material in the treatment bath wherein the transport material further comprises a treatment ma... | 01/13/2004 |
| 6676767 | Apparatus and method for removing condensate from pipes The present invention provides an improved apparatus and method for removing condensates, such as chlorides, from a dry etch, vacuum effluent stream. Dry etching of metallizations under vacuum conditions, using RF plasma and other techniques, is used in t... | 01/13/2004 |
| 6676768 | Methods, compositions and apparatus for cleaning surfaces The present invention comprises methods, compositions and apparatus for cleaning the surfaces within vessels that have restricted points of entry, and in particular, the surfaces within oxygen converters and oxygen cylinders. These oxygen converters and o... | 01/13/2004 |
| 6676762 | Method for cleaning a finished and polished surface of a metal automotive wheel A method using irradiation of substrates (12) with ultra violet light to remove a surface contaminant is described. The light can be pulsed or continuous. The treated surfaces are more paintable and bondable.... | 01/13/2004 |
| 6676763 | Method and apparatus for cleaning an optical fiber There is provided a method and apparatus for automatically cleaning a portion of an optical fiber. One embodiment of the apparatus comprises a fluid tank assembly that holds cleaning fluid and comprises an aperture sized and arranged to receive the portio... | 01/13/2004 |
| 6673158 | Entangled fibrous web of eccentric bicomponent fibers and method of using The present invention provides a web of entangled synthetic fibers, wherein said fibers are eccentric bicomponent fibers. The present invention further provides a method of absorbing oil from foods by contacting a web of entangled, eccentric bicomponent f... | 01/06/2004 |
| 6673157 | Methods for stripping paint with DMSO containing compositions The invention relates to a method for stripping paint from surfaces, comprising: a) contacting a painted surface with a paint stripping composition, and b) separating at least some of the paint contacted with the paint stripping composition from the pa... | 01/06/2004 |
| 6669785 | Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide A method of cleaning a microelectronic substrate is carried out by providing a cleaning fluid, the cleaning fluid comprising an adduct of hydrogen fluoride with a Lewis base in a carbon dioxide solvent; and then cleaning the substrate by contacting the su... | 12/30/2003 |
| 6668587 | Method for the production of glass substrates for magnetic recording mediums A method for the production of a glass substrate for magnetic recording mediums is herein provided and this method is characterized in that the final cleaning step is performed in two stages, in which scrubbing and dip-cleaning steps are carried out after... | 12/30/2003 |
| 6667286 | Adhesive sanitary agent The invention relates to a sanitary agent for cleaning and/or disinfecting and/or releasing an odorant, said agent comprising an adhesion promoter, water anionic and/or non-ionic and/or amphoteric surface active agents and, optionally, further common cons... | 12/23/2003 |
| 6666217 | Gemini surfactants in cleaning compositions A cleaning composition containing a gemini surfactant corresponding to formula I: wherein R is a linear or branched alkyl and/or alkenyl radical having from about 4 to 22 carbon atoms, and x is a number from about 5 to 90.... | 12/23/2003 |
| 6666927 | Vacuum debris removal system for an integrated circuit manufacturing device A vacuum debris removal system and method for an integrated circuit manufacturing device is disclosed. The vacuum debris removal system comprises at least one vacuum tube. An opening is formed in the at least one vacuum tube at a selected location to caus... | 12/23/2003 |
| 6663722 | Method of cleaning fluorine-containing rubber molded article for semiconductor production apparatuses and cleaned molded article To provide a novel and effective cleaning method which can give a cleaned fluorine-containing rubber molded article for semiconductor production apparatuses. The method of cleaning the fluorine-containing rubber molded article for semiconductor production... | 12/16/2003 |
| 6660103 | Cleaning process for ink jet printheads A method of cleaning ink jet printheads without rendering the printheads inoperative by soaking the printheads in a cleaning solution of acetone and n-methyl-2-pyrolidine, and then flushing the printhead with a gas, such as air. The solution is made of ab... | 12/09/2003 |
| 6656895 | Remover composition A remover composition comprising (a) 100 parts by weight of a composition obtained by adding a cyclic urea compound to water, water-soluble organic solvent, or a mixture of water and water-soluble organic solvent so that the concentration of the cyclic ... | 12/02/2003 |
| 6652661 | Radioactive decontamination and translocation method A method for removing a wide variety of radioactive contaminants from a contaminated surface sufficient for the surface to be classified as a low-level waste or as free release. Contaminated surfaces may be classified as Class C, Class B, Class A, or high... | 11/25/2003 |
| 6652663 | Composition for eliminating thermosetting resin A composition suitable for eliminating a thermosetting resin (and a method of so using the composition) is disclosed. In the composition, tetra methyl ammonium hydroxide (TMAH) is included so as to eliminate the thermosetting resin. Accordingly, the compo... | 11/25/2003 |
| 6652658 | Method for machining/cleaning by hydroxide ion in ultrapure water A method for clean processing wherein an object and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion exchange material or catalyst material that increases the amou... | 11/25/2003 |
| 6652659 | Low species buffered rinsing fluids and method A method of rinsing an electronic substrate recognizes that adding a buffer to a rinsing fluid eliminates fluctuations in the amount of residues on an electronic substrate, and a buffered rinsing fluid is prepared by (a) providing water from a water sourc... | 11/25/2003 |
| 6652665 | Method of removing silicone polymer deposits from electronic components A method of removing cured silicone polymer deposits from electronic components. The components are immersed in a preheated solution of a quaternary ammonium fluoride in a hydrophobic non-hydroxylic aprotic solvent with agitation. The components are then ... | 11/25/2003 |
| 6653273 | Wetting agents for concrete cleaning and adhesives The present invention relates to a cleaning composition comprising: (a) at least one additive selected from the group consisting of detergents, corrosion inhibitors, organic and aqueous carriers, and combinations thereof, (b) a wetting/cleaning agent sele... | 11/25/2003 |
| 6652667 | Method for removing engine deposits in a gasoline internal combustion engine Disclosed are methods for removing engine deposits in a gasoline internal combustion engine by introducing a cleaning composition into an air-intake manifold of a warmed-up and idling gasoline internal combustion engine and running the engine while the cl... | 11/25/2003 |
| 6649584 | Cleaning wipe A dishwashing cleaning wipe comprising a fabric wherein the fabric is impregnated with a cleaning composition.... | 11/18/2003 |
| 6648983 | Process of cleaning enamel surfaces A process of cleaning an enamel surface with a liquid acidic composition comprising an enamel safe buffering system, wherein said buffering system comprises a salt having an anion selected from the group consisting of hydroxide and carbonate; and a cation... | 11/18/2003 |
| 6649586 | Detergent composition and method for removing soil The invention relates to a highly alkaline or mildly alkaline detergent composition having enhanced cleaning properties. The detergent combines a source of alkalinity and a blend of nonionic surfactants that enhances cleaning starchy soils. The blend of n... | 11/18/2003 |
| 6645930 | Clean room wipes for neutralizing caustic chemicals Clean room wipe products, methods of preparing them, and methods of using them are described. The clean room wipes are intended for use in cleaning up alkaline contaminants in clean room environments. The wipes contain impregnated acidic solutions, e.g., ... | 11/11/2003 |
| 6645306 | Hydrogen peroxide pickling scheme for stainless steel grades The present invention relates to a process for pickling hot rolled, hot rolled & annealed, and cold rolled & annealed stainless steel strip in a continuous fashion. The process comprises a series of pre-pickling tanks and pickling tanks, and optionally in... | 11/11/2003 |
| 6645308 | Polish cleaning apparatus and method in manufacture of HGA A method and apparatus for cleaning the slider air bearing surface of a head gimbal assembly is disclosed. A plurality of carriers may position and hold a plurality of head gimbal assemblies to be polished. A cloth strip may be rubbed against the slider a... | 11/11/2003 |
| 6641678 | Methods for cleaning microelectronic structures with aqueous carbon dioxide systems A method of cleaning and removing water and entrained solutes during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing ... | 11/04/2003 |
