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| Number | Title | Issue Date |
| 7976641 | Extending storage time of removed plasma chamber components prior to cleaning thereof A method of extending storage time prior to cleaning a component of a plasma chamber is provided. The method comprises removing the component from the chamber, covering a thermal spray coating on the component while the surface is exposed to atmospheric air, storing... | 07/12/2011 |
| 7850786 | Method of improving corrosion resistance of stainless steel surfaces by a process of passivation Described is a space-conserving integrated fluid delivery system particularly useful for gas distribution in semiconductor processing equipment. The system includes integrated fluid flow network architecture, and may include, in addition to a layered substrate conta... | 12/14/2010 |
| 7666264 | Aircraft cleaner formula A cleaning composition based on an aqueous or non-petroleum solvent, and useful for cleaning exterior surfaces such as aircraft exterior surfaces and other metal, glass, rubber and polymer surfaces possesses solvent-like properties with respect to greasy soils; inhi... | 02/23/2010 |
| 7419552 | C-alkanol alkoxylates and the use thereof Alkoxylates of the formula (I) C5H11CH(C3H7)CH2O(A)n(CH2CH2O)mH (I) where A is propyleneoxy, buteneoxy or p... | 09/02/2008 |
| 7416611 | Process and apparatus for treating a workpiece with gases In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk transport achieved by entraining the gas in a liquid stream, spray or ... | 08/26/2008 |
| 7410544 | Method for cleaning electroless process tank A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid (103), after which the tank is exposed to a second acid in the presence of a first oxidizing agent (107). ... | 08/12/2008 |
| 7396417 | Method for removing laser scales A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales with an aqueous solution containing at least one type of highly water-... | 07/08/2008 |
| 7387130 | Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating a... | 06/17/2008 |
| 7384901 | Process for cleaning aluminum and aluminum alloy surfaces with nitric acid and chromic acid-free compositions A process for cleaning (e.g., desmutting) an aluminum surface, using compositions free of nitric acid and chromic acid and comprising, in one embodiment, an oxidant and at least one mineral acid salt. In another embodiment, the process uses a composition free of nit... | 06/10/2008 |
| 7381279 | Article for deionization of water An article of manufacture, a system, and a method for at least partially deionizing water, including but not limited to converting tap water into essentially deionized water that can be used for numerous purposes including, but not limited to cleaning and/or treatin... | 06/03/2008 |
| 7377984 | Method for cleaning a photomask Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidat... | 05/27/2008 |
| 7368019 | Method for preventing elution of lead and/or nickel from copper alloy piping material such as valve or pipe joint and copper alloy piping material, and fluid for use in cleaning piping material A technique is provided to precludes elution of the nickel by infallibly removing the nickel adhering to the inner surface of plumbing hardware, realize a treatment for efficient (treating temperature, treating duration, etc.) preclusion of both or either of lead an... | 05/06/2008 |
| 7364625 | Rinsing processes and equipment Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ... | 04/29/2008 |
| 7351295 | Cleaning and polishing rusted iron-containing surfaces A method for cleaning and polishing a rusted iron-containing metal surface is disclosed. The metal surface is contacted with a composition containing fluorometallate anions of a Group IVB metal. ... | 04/01/2008 |
| 7337788 | Compositions useful for cleaning solvent-based paint from paint delivery installations Uncured solvent-based paint may be flushed from a paint delivery installation using a substantially non-aqueous composition containing one or more organic solvents and a polymer having acid and/or amine functional groups. ... | 03/04/2008 |
| 7270764 | Method for removing aluminide coating from metal substrate and turbine engine part so treated A method for selectively removing an aluminide coating from at least one surface of a metal-based substrate by: (a) contacting the surface of the substrate with at least one stripping composition comprising nitric acid at a temperature less than about 20° C. to deg... | 09/18/2007 |
| 7261780 | Ceramic susceptor and a method of cleaning the same An object of the present invention is to provide a ceramic susceptor for considerably reducing the count number of metal atoms on the surface of a semiconductor after the semiconductor is treated, specifically to 1×1010 atoms/cm2 or lower. It ... | 08/28/2007 |
| 7251959 | Washwater neutralization system for glass forming line A neutralization system for controlling the pH of the washwater used to clean and maintain polyacrylic bound glass forming equipment. The neutralization system introduces a base solution to a washwater solution when the pH of the washwater solution contained in a cl... | 08/07/2007 |
| 7252718 | Forming a passivating aluminum fluoride layer and removing same for use in semiconductor manufacture A composition for the cleaning of residues from substrates can contain from about 0.01 percent by weight to about 5 percent by weight of one or more fluoride compounds, from about 20 percent by weight to about 50 percent by weight water, from about 20 percent by wei... | 08/07/2007 |
| 7252096 | Methods of simultaneously cleaning and disinfecting industrial water systems On-Line and Off-Line methods of simultaneously cleaning and disinfecting an industrial water system are described and claimed. The methods involve the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali... | 08/07/2007 |
| 7250085 | Method of wet cleaning a surface, especially of a material of the silicon-germanium type Method of wet cleaning a surface of at least one material chosen from silicon, silicon-germanium alloys, A(III)/B(V)-type semiconductors and epitaxially grown crystalline materials, such as germanium, in which method the following successive steps are carried out: | 07/31/2007 |
| 7247208 | Microelectronic cleaning compositions containing ammonia-free fluoride salts Ammonia-free, HF-free cleaning compositions for cleaning photoresist and plasma ash residues from microelectronic substrates, and particularly to such cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized b... | 07/24/2007 |
| 7232528 | Surface treatment agent for copper and copper alloy The surface treatment agent for copper and copper alloys contains hydrogen peroxide, a mineral acid, an azole compound, silver ion and a halide ion. The surface treatment agent for copper and copper alloys is useful in the production of printed wiring boards in elec... | 06/19/2007 |
| 7228865 | FRAM capacitor stack clean An embodiment of the invention is a method of cleaning a material stack 2 that has a hard mask top layer 8. The method involves cleaning the material stack 2 with a fluorine-based plasma etch. The method further involves rinsing the material sta... | 06/12/2007 |
| 7229506 | Process for pickling martensitic or ferritic stainless steel A process for pickling martensitic or ferritic stainless steel, preferably in the form of wires, tubes or rods, wherein the stainless steel is placed in contact with a pickling solution which has a temperature in the range 15 to 29° C. and contains 50 to 120 g/l of... | 06/12/2007 |
| 7226898 | Use of low foam percarboxylic acid based products containing surfactants for cip-disinfection The use of an agent containing surfactant components chosen from sulfonic acids or sulfonates, alkylamine oxides, ethercarboxylic acids, and alkylether sulfates, in total amounts of 0.01 to 1 wt. %, preferably 0.05 to 0.5 wt. %, with respect to the entire agent, and... | 06/05/2007 |
| 7226897 | Water soluble barrier film conformal coating composition A composition having a first nonionic nonylphenol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic nonylphenol surfactant having an HLB value ranging from about 16 to 20, an aqueous solvent, and optionally, a bio-film permeation ag... | 06/05/2007 |
| 7219421 | Method of a coating heat spreader A coated heat spreader for a die includes a body and a coating on a surface of the body, wherein the outermost coating is an organic surface protectant. An IC package includes a die thermally coupled to a heat spreader coated with an organic surface protectant. A PC... | 05/22/2007 |
| 7214276 | Ether carboxylic acids based on alkoxylated styrylphenols The invention relates to compounds of the formula (1) in which A is C2- to C4-alkylene, B is C1- to C4-alkylene, x is a number fr... | 05/08/2007 |
| 7208049 | Process solutions containing surfactants used as post-chemical mechanical planarization treatment Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse sol... | 04/24/2007 |
| 7198680 | Process for cleaning surfaces of medical equipment A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste material. A rinse solution is applied to the surfaces of the equipment... | 04/03/2007 |
| 7186301 | Device and method for cleaning photomask Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curi... | 03/06/2007 |
| 7172657 | Cleaning method of treatment equipment and treatment equipment In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and ... | 02/06/2007 |
| 7169235 | Cleaning method and polishing apparatus employing such cleaning method A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method includes polishing a substrate using an abrasive liquid containing abrasi... | 01/30/2007 |
| 7166758 | Foam and gel methods for the decontamination of metallic surfaces Decontamination of nuclear facilities is necessary to reduce the radiation field during normal operations and decommissioning of complex equipment. In this invention, we discuss gel and foam based diphosphonic acid (HEDPA) chemical solutions that are unique in that ... | 01/23/2007 |
| 7153371 | Extraction with chemical exothermic reaction heating An extraction cleaning machine comprising dispensing and recovery systems, the dispensing system including a system for generating heat with an exothermic reaction upon activation for heating the cleaning solution prior to dispensing of the cleaning solution onto a ... | 12/26/2006 |
| 7144461 | Method of removing acid component in deteriorated acetate film There is provided a method of removing acids from the surface and interior of an acetate film produced by deterioration during storage. Such methods are characterized by extracting and removing the acids from the surface and interior of the acetate film, and the ext... | 12/05/2006 |
| 7135413 | Cleaning solution for removing damaged portion of ferroelectric layer and cleaning method using the same A cleaning solution for use in removing a damaged portion of a ferroelectric layer, and a cleaning method using the solution. The cleaning solution includes a fluoride, an organic acid with carboxyl group, an alkaline pH adjusting agent and water. ... | 11/14/2006 |
| 7115171 | Method for removing engine deposits from turbine components and composition for use in same A method and cleaning composition for removing engine deposits from turbine components, in particular turbine disks and turbine shafts. This method comprises the following steps: (a) providing a turbine component having a surface with engine deposits thereon, wherei... | 10/03/2006 |
| 7097713 | Method for removing a composite coating containing tantalum deposition and arc sprayed aluminum from ceramic substrates A method for removing a metallic layer from the surface of a ceramic substrate, the method including the steps of immersing the metallic coated ceramic substrate in a solution of up to 31% hydrochloric acid for a sufficient time to at least substantially dissolve or... | 08/29/2006 |
