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| Number | Title | Issue Date |
| 8048235 | Gate valve cleaning method and substrate processing system A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing ab... | 11/01/2011 |
| 8038804 | Method for drying a surface Method for drying a surface of a disc-shaped article includes covering the surface with a rinsing liquid, whereby a closed liquid layer is formed, and removing the rinsing liquid, wherein the rinsing liquid containing at least 50 wt. % water and at least 5 wt. % of ... | 10/18/2011 |
| 7967917 | Method of cleaning storage case The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: f... | 06/28/2011 |
| 7931755 | Method for removing deposit from substrate and method for drying substrate, as well as apparatus for removing deposit from substrate and apparatus for drying substrate using these methods In a method for removing deposit that has attached to a main surface of a substrate from the main surface of the substrate using air knife units where a slit portion is formed so that a fluid can be discharged in band form, a fluid introduction path having an approx... | 04/26/2011 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7410543 | Substrate processing method Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atm... | 08/12/2008 |
| 7407554 | Development or removal of block copolymer or PMMA-b-S-based resist using polar supercritical solvent Methods of developing or removing a select region of block copolymer films using a polar supercritical solvent to dissolve a select portion are disclosed. In one embodiment, the polar supercritical solvent includes chlorodifluoromethane, which may be exposed to the ... | 08/05/2008 |
| 7396418 | Process for removing particles from reticle A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particle removing tool includes at l... | 07/08/2008 |
| 7377982 | Method for the removal of airborne molecular contaminants using water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 05/27/2008 |
| 7371289 | Cleaning and doping of tubulars Apparatus for cleaning and doping a pin 2 of a tubular 3 during the making or breaking of a string on a well platform. The apparatus comprises a housing 4 having first and second conosed ends 6,7 and arranged in used to be secured at its ... | 05/13/2008 |
| 7364625 | Rinsing processes and equipment Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ... | 04/29/2008 |
| 7361233 | Methods of hydrogen cleaning of metallic surfaces The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to about 1400° F., a partial pressure hydrogen gas and a vacuum are rep... | 04/22/2008 |
| 7331354 | Cleaning of tray columns which have been used for rectificatively treating liquids comprising (meth)acrylic acid and/or esters thereof In process for cleaning tray columns which are used for the purposes of rectifiying liquids comprising (meth)acrylic compounds, a basic liquid is conveyed downward through the tray column and a gas is passed through the column in countercurrent to the basic liquid a... | 02/19/2008 |
| 7329322 | Exhaust apparatus, semiconductor device manufacturing system and method for manufacturing semiconductor device In an exhaust pipe, a rotating shaft takeoff connection is provided so as to support a rotating shaft for rotating a switching valve fixed thereon. The rotating shaft extends to the outside of the exhaust pipe and is provided with an introduction hole and branch hol... | 02/12/2008 |
| 7314068 | Apparatus for replacing gas in storage container and method for replacing gas therewith While gas in a general storage container with no gas inlet and in the storage container with the gas inlet is replaced in a short time, the semiconductor wafer surface is cleaned. In an apparatus for replacing gas in a semiconductor wafer storage container which inc... | 01/01/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7300524 | Substrate cleaning method A substrate cleaning apparatus includes an indexer, a front surface cleaning unit for cleaning the front surface of a substrate, a back surface cleaning unit for cleaning the back surface of the substrate, a particle inspecting unit for detecting a distribution of p... | 11/27/2007 |
| 7297212 | Method for the removal of airborne molecular contaminants using water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 11/20/2007 |
| 7287534 | Cleaning of apparatus in which meth(acrylic) acid-containing organic solvents have been treated and/or generated A process for cleaning apparatus in which (meth)acrylic acid-containing organic solvents have been treated and/or generated and contain fouling and/or polymer and residues of organic solvent, in which the apparatus contents are subjected to a steam distillation in t... | 10/30/2007 |
| 7288156 | Methods for cleaning a substrate The invention provides a water supplying apparatus and method thereof which has a high capacity of peeling and removing a disused material such as a resist film and the like, and can efficiently use water vapor. A water supplying apparatus for executing a washing pr... | 10/30/2007 |
| 7282100 | Method of cleaning automobile painted surfaces and automobile glass surfaces A system for cleaning acid rain and mineral deposits from glass and/or painted surfaces includes powdered kaolin clay. The glass is preferably cleaned with this system, then a system for more effectively delivering Fibershield 218 and like protectants to glass is us... | 10/16/2007 |
| 7276449 | Gas assisted method for applying resist stripper and gas-resist stripper combinations A method for moving resist stripper across the surface of a semiconductor substrate includes applying a wet chemical resist stripper, such as an organic or oxidizing wet chemical resist stripper, to at least a portion of a photomask positioned over the semiconductor... | 10/02/2007 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7264679 | Cleaning of chamber components In a method of cleaning a surface of a substrate processing chamber component to remove process deposits, the component surface is cooled to a temperature below about −40° C. to fracture the process deposits on the surface. The surface can be cooled by immersing ... | 09/04/2007 |
| 7252717 | Method and apparatus for cleaning machines A method of cleaning a lubrication system of a machine includes removing existing lubricant and circulating a cleaning fluid through the lubrication system. After the cleaning fluid has been removed, a neutralising fluid is circulated through the lubrication system,... | 08/07/2007 |
| 7247210 | Methods for treating CIP equipment and equipment for treating CIP equipment A method for treating CIP equipment is provided according to the present invention. The CIP equipment includes process equipment. The method includes steps of treating the CIP equipment with a multiple phase treating composition comprising a treating liquid phase an... | 07/24/2007 |
| 7235479 | Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials A method of fabricating a semiconductor device. The method comprises creating a via in a dielectric layer that is formed on a substrate, filling the via, and optionally, the surface of the dielectric layer with a sacrificial material, patterning a first photoresist ... | 06/26/2007 |
| 7231927 | Method for recycling used-up plastic products and washing process of crushed plastic and apparatus therefor An object of the invention is to provide a method and an apparatus for recycling plastics which is improved with respect to operation efficiency, operation environment, lowering degradation of plastics, recycling cost and environment load including saving energy. Th... | 06/19/2007 |
| 7222388 | Imaging-device cleaning apparatus An imaging-device cleaning apparatus is attached to a camera by engaging with a lens mount of the camera typically used for attaching a camera lens. The imaging-device cleaning apparatus includes a nozzle for removing dust and dirt in the vicinity of an imaging sect... | 05/29/2007 |
| 7209625 | Method and device for cleaning an optical waveguide removed from its jacket The present invention is directed to a method for cleaning a section of an optical waveguide removed from its jacket, in which the optical waveguide section is inserted into a treatment cell, sprayed with a cleaning fluid, blasted with compressed air and removed fro... | 04/24/2007 |
| 7205265 | Cleaning compositions and methods of use thereof A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable f... | 04/17/2007 |
| 7189290 | Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas introduction pipe to easily remove the contaminant in a short period of time. W... | 03/13/2007 |
| 7189291 | Method for the removal of airborne molecular contaminants using oxygen gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 03/13/2007 |
| 7186299 | Method of rinsing and drying semiconductor substrates A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain process is employed to improve p... | 03/06/2007 |
| 7172657 | Cleaning method of treatment equipment and treatment equipment In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and ... | 02/06/2007 |
| 7168436 | Gas for removing deposit and removal method using same The invention relates to a gas for removing deposits by a gas-solid reaction. This gas includes a hypofluorite that is defined as being a compound having at least one OF group in the molecule. Various deposits can be removed by the gas, and the gas can easily be mad... | 01/30/2007 |
| 7153372 | Method for removing particles from elements installed in a vacuum chamber Gas is introduced prior to a flooding process of a vacuum chamber of a vacuum installation, into coverings of elements, which coverings can be ventilated such that solid bodies are blown out of said coverings thereby preventing a penetration of said solid bodies int... | 12/26/2006 |
| 7153370 | Method of cleaning semiconductor wafer The present application discloses a method of cleaning a semiconductor wafer by mounting a wafer to a chuck, positioning a gas guard, defining therein a chamber having an open bottom, immediately above the layer of water, spraying de-ionized water onto the wafer whi... | 12/26/2006 |
| 7141123 | Method of and apparatus for removing contaminants from surface of a substrate A cleanling apparatus for removing contaminants from the surface of a substrate includes two parts: one which produces an aerosol including frozen particles and directs the aerosol onto the surface of the substrate to remove contaminants from the surface by physical... | 11/28/2006 |
| 7131163 | Retort cleaning apparatus A retort cleaning apparatus 10 (RCA 10) comprising a blow-off nozzle (12) having an air inlet port (14) and an orifice (16). An air passage extension tube (22) has an inward coupler (24), and a heat-resistant outward ... | 11/07/2006 |
