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| Number | Title | Issue Date |
| 8152934 | Aeroengine washing system and method An adjustable nozzle dispenser and a multi-nozzle dispenser are disclosed for washing an aerofoil of a gas turbine engine. The dispensers are characterized by their nozzle arrangements being capable of washing at least two different parts of the aerofoil. A system a... | 04/10/2012 |
| 8123868 | Method and apparatus for in-line processing and immediately sequential or simultaneous processing of flat and flexible substrates through viscous shear in thin cross section gaps for the manufacture of micro-electronic circuits or displays A method and apparatus for cleaning, drying, coating, baking etching and deposition of surfaces on glass substrate as it transitions thru and between small gaps between hydro-static porous media bearings. Due to the non-contact nature of the device extremely high pr... | 02/28/2012 |
| 8075705 | Reaction vessel for an ozone cleaning system A reaction vessel for entraining ozone gas in an aqueous ozone solution for an industrial cleaning system is described. The reaction vessel includes a conical-shaped surface having two or more edges. The conical-shaped surface defines a generally hollow interior, an... | 12/13/2011 |
| 8016949 | Process and a device to clean substrates In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air ... | 09/13/2011 |
| 7749334 | Methods and agents for cleaning and disinfecting fragile medical appliances The invention relates to the use of agents, which contain at least one disinfection system based on selected organic peracids and combinations of peracids, in automatically functioning systems, in which fragile medical appliances, in particular, endoscopes, are clea... | 07/06/2010 |
| 7615122 | Method and apparatus for dispensing a use solution A method and apparatus provides for dispensing a liquid concentrate. The source pressure of a liquid diluent is changed by a boost pump (52) to bring the pressure of the diluent to an elevated pressure. The diluent then enters an aspirator assembly (10... | 11/10/2009 |
| 7556698 | Methods and agents for cleaning and disinfecting fragile medical appliances The invention relates to the use of agents, which contain at least one disinfection system based on selected organic peracids and combinations of peracids, in automatically functioning systems, in which fragile medical appliances, in particular, endoscopes, are clea... | 07/07/2009 |
| 7435301 | Cleaning solution of silicon germanium layer and cleaning method using the same Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germanium layer includes from abo... | 10/14/2008 |
| 7435303 | Methods and agents for cleaning and disinfecting fragile medical appliances The invention relates to the use of agents, which contain at least one disinfection system based on selected organic peracids and combinations of peracids, in automatically functioning systems, in which fragile medical appliances, in particular, endoscopes, are clea... | 10/14/2008 |
| 7416612 | Process for removal of paint from plastic substrates A process for removing paint from a plastic substrate that typically includes immersing and optionally agitating the painted plastic substrate in a first chemical fluid, removing the substrate from the first chemical fluid, typically immersing and optionally agitati... | 08/26/2008 |
| 7412979 | Selective removal or application of a coating on a portion of a container The present invention relates to an apparatus and method for removing a coating material from a predetermined first portion of a container, while retaining the coating on a second portion of the container, or alternatively applying a coating to a predetermined porti... | 08/19/2008 |
| 7410545 | Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate transportation mechanism 3 to a spin-processing unit 2 | 08/12/2008 |
| 7410544 | Method for cleaning electroless process tank A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid (103), after which the tank is exposed to a second acid in the presence of a first oxidizing agent (107). ... | 08/12/2008 |
| 7410543 | Substrate processing method Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atm... | 08/12/2008 |
| 7404863 | Methods of thinning a silicon wafer using HF and ozone A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are delivered into the process chamber to react with a silicon surface of t... | 07/29/2008 |
| 7405164 | Apparatus and method for removing a photoresist structure from a substrate In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showerhead includes a first space ... | 07/29/2008 |
| 7402213 | Stripping and removal of organic-containing materials from electronic device substrate surfaces Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m2). The substrate may comprise an electronic device. The exposed surface is treated with a stripping solution comprising o... | 07/22/2008 |
| 7399367 | Rust-preventive water-oil separating cleaner composition and a cleaning method using the same A rust-preventive water-oil separating cleaner composition contacts a part to be cleaned to which an oil attaches. The composition separates the oil from the part, while providing the part with a rust-preventive property, thus forming an oil layer containing the oil... | 07/15/2008 |
| 7399366 | Product and processes for preventing the occurrence of rust stains resulting from irrigation systems using water containing iron ions and for cleaning off rust stains resulting from using said irrigation systems Several products and processes for preventing the occurrence of rust stains resulting from irrigation systems using water having iron ions, such as well water, and for cleaning off rust stains resulting from the use of said irrigation systems are disclosed. In one e... | 07/15/2008 |
| 7396417 | Method for removing laser scales A degreasing method for descaling or removing laser scales from iron-containing metal part surface by treating the iron-containing metal part surfaces that is optionally tainted with laser scales with an aqueous solution containing at least one type of highly water-... | 07/08/2008 |
| 7396418 | Process for removing particles from reticle A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particle removing tool includes at l... | 07/08/2008 |
| 7392811 | Delivery head for multiple phase treatment composition, vessel including a delivery head, and method for treating a vessel interior surface A delivery head is provided that includes a delivery arm and a spray diverter constructed to divert a multiple phase treatment composition flowing through the delivery arm and diverted by the spray diverter to provide a target spray pattern. The delivery head includ... | 07/01/2008 |
| 7390368 | Aqueous fiber optic cleaner Fiber optic connector end faces are cleaned effectively by exposing the fiber optic connector end face to the disclosed predominantly aqueous solution and wiping the fiber optic end face dry. The predominantly water-based cleaning solution contains water, water solu... | 06/24/2008 |
| 7387689 | Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces Methods for processing substrate through a head that is configured to be placed in close non-contact proximity to a surface of a substrate are provided. One method includes applying a first fluid onto the surface of the substrate from conduits in the head when the h... | 06/17/2008 |
| 7387688 | Method of operating a dishwasher with a central control unit by measuring the turbidity The invention relates to a method of operating a dishwasher with a central control unit by measuring the turbidity of the rinsing liquid and establishing the course of the program as a function of the turbidity of the rinsing liquid, the program beginning with a pre... | 06/17/2008 |
| 7380557 | Method of flushing a coil pipes(s) of a heat exchanger A heat exchanger coil pipe is internally cleaned off dirt deposits by forcing ice and water to pass the pipe. A system for carrying out the cleaning comprises a suction pump, a wastewater collecting tank, a suction hose for connection between the waste and wash wate... | 06/03/2008 |
| 7381279 | Article for deionization of water An article of manufacture, a system, and a method for at least partially deionizing water, including but not limited to converting tap water into essentially deionized water that can be used for numerous purposes including, but not limited to cleaning and/or treatin... | 06/03/2008 |
| 7377983 | Prevention of deposits on ceramics A method to prevent deposits on a ceramic surface comprising: (1) pretreating the surface by applying an aqueous solution containing from about 200 ppm to about 1000 ppm by weight of an amphoteric fluorosurfactant, and (2) periodically applying an aqueous maintenanc... | 05/27/2008 |
| 7377984 | Method for cleaning a photomask Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidat... | 05/27/2008 |
| 7377982 | Method for the removal of airborne molecular contaminants using water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 05/27/2008 |
| 7374621 | System and method for cleaning chemistry and processing during thin film magnetic head wafer fabrication A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-mechanical polishing (CMP), wi... | 05/20/2008 |
| 7371289 | Cleaning and doping of tubulars Apparatus for cleaning and doping a pin 2 of a tubular 3 during the making or breaking of a string on a well platform. The apparatus comprises a housing 4 having first and second conosed ends 6,7 and arranged in used to be secured at its ... | 05/13/2008 |
| 7367345 | Apparatus and method for providing a confined liquid for immersion lithography A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate. ... | 05/06/2008 |
| 7364625 | Rinsing processes and equipment Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ... | 04/29/2008 |
| 7364626 | Substrate processing apparatus and substrate processing method Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters... | 04/29/2008 |
| 7361231 | System and method for mid-pressure dense phase gas and ultrasonic cleaning Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being maintained at less than about 1500 psi using a temperature control device. T... | 04/22/2008 |
| 7354484 | Liquid processing apparatus and liquid processing method A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under plate, and a nozzle hole form... | 04/08/2008 |
| 7353560 | Proximity brush unit apparatus and method An apparatus is provided for producing a wet region and corresponding dry region on a wafer. A proximity brush unit delivers fluids with a rotatable brush to produce the wet region on the wafer. As the proximity brush unit moves in a selected scan method across the ... | 04/08/2008 |
| 7350316 | Meniscus proximity system for cleaning semiconductor substrate surfaces A system and apparatus for cleaning a substrate is provided. The system includes a first head configured as a bar shape that extends approximately a diameter of the substrate. The first head is configured for placement on a first side of the substrate. A second head... | 04/01/2008 |
| 7351295 | Cleaning and polishing rusted iron-containing surfaces A method for cleaning and polishing a rusted iron-containing metal surface is disclosed. The metal surface is contacted with a composition containing fluorometallate anions of a Group IVB metal. ... | 04/01/2008 |
