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| Number | Title | Issue Date |
| 6599371 | Hydrogen peroxide pickling scheme for silicon-containing electrical steel grades The pickling process of the present invention is designed for pickling electrical steel strip in a continuous fashion and comprises at least one pickling tank equipped with at least one set of sprayers designed to spray the top and bottom surfaces of a st... | 07/29/2003 |
| 6599370 | Stabilized alkaline compositions for cleaning microelectronic substrates The invention provides aqueous alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants. The compositions typically contain (a) ... | 07/29/2003 |
| 6596093 | Methods for cleaning microelectronic structures with cyclical phase modulation A method of cleaning and removing water, entrained solutes and particulate matter during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the step... | 07/22/2003 |
| 6596088 | Method for removing the circumferential edge of a dielectric layer A method for removing the circumferential edge of a dielectric layer on a semiconductor wafer is disclosed. First, a semiconductor wafer having a dielectric layer on its upper surface is provided. Second, the semiconductor wafer is placed and secured on a... | 07/22/2003 |
| 6594847 | Single wafer residue, thin film removal and clean A system is provided for use in semiconductor wafer cleaning operations. The cleaning system has a top cap and a bottom cap. The top cap seals on a top surface contact ring of a wafer, and the bottom cap seals on a bottom surface contact ring of the wafer... | 07/22/2003 |
| 6589386 | Device for processing wafer A device for processing a substrate comprises a processing vessel (1), an outer vessel (2) for surrounding the processing vessel (1) which outer vessel (2) can be sealed, a first supporting member (4) for bringing the substrate (3) into and out from the p... | 07/08/2003 |
| 6589353 | Treatment of air-bearing surface of a disc drive slider with light and oxidizing gas A method and apparatus for treating the air-bearing surface of a disc drive slider are disclosed. The surface is exposed to an oxidizing gas while being irradiated with light. In an illustrative embodiment, the oxidizing gas employed is ozone and the surf... | 07/08/2003 |
| 6589361 | Configurable single substrate wet-dry integrated cluster cleaner The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes an upper plate, a lower plate a... | 07/08/2003 |
| 6589359 | Cleaning method and cleaning apparatus for substrate A cleaning method is provided for cleaning a semiconductor wafer. In this method, after removing adhering substances from the wafer by using a chemical liquid of organic amine type, there is carried out a pure-water cleaning capable of prevention of elect... | 07/08/2003 |
| 6589355 | Cleaning processes using hydrofluorocarbon and/or hydrochlorofluorocarbon compounds Disclosed are methods of cleaning articles of manufacture using hydrofluorocarbon and hydrochlorofluorocarbon fluids. The methods comprise generally the steps of (a) providing a hydrofluorocarbon and/or hydrochlorofluorocarbon fluid in liquid or supercrit... | 07/08/2003 |
| 6589354 | Method and apparatus for in-situ lithography mask cleaning A method and system for in-situ cleaning of a reticle. Ionized gas is directed onto the reticle by a delivery device. The ionized gas neutralizes electro-static attraction between the reticle and particulate contaminants on the reticle and thereby dislodg... | 07/08/2003 |
| 6585827 | Apparatus and method of use for cleaning a hard floor surface utilizing an aerated cleaning liquid A method of cleaning a hard floor surface with a surface maintenance vehicle including the steps of generating a foam-like aerated cleaning liquid, selectively conveying the foam-like aerated cleaning liquid to the hard floor surface and a scrubbing mediu... | 07/01/2003 |
| 6585826 | Semiconductor wafer cleaning method to remove residual contamination including metal nitride particles A method of removing residual contamination including metal nitride particles from semiconductor wafer surfaces including the steps of: providing at least one semiconductor wafer with metal nitride particles adhering to the at least one semiconductor wafe... | 07/01/2003 |
| 6585825 | Stabilized alkaline compositions for cleaning microelectronic substrates The invention provides aqueous alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants. The compositions typically contain (a) ... | 07/01/2003 |
| 6582524 | Method for washing wafer and apparatus used therefor A method including the consecutive steps of: dipping a wafer in a washing solution in a washing chamber; replacing the washing solution by a first chemical solution in the washing chamber receiving therein the wafer, the first chemical solution including ... | 06/24/2003 |
| 6579377 | Hydrofluoric acid generating composition and method of treating surfaces The present invention relates to compositions, kits and processes for the brightening of metal surfaces by the application of the chemical compositions. These compositions act to release hydrofluoric acid as a brightening agent. The solutions are preferab... | 06/17/2003 |
| 6578586 | Single chamber dishwashing machine An improved dishwashing machine is proposed which has a dish-cleaning compartment, a dish-rack rotating mechanism, a re-circulating fluid spraying system, a non re-circulating fluid spraying system, a drainage mechanism, a waste filter tank and a controll... | 06/17/2003 |
| 6576066 | Supercritical drying method and supercritical drying apparatus According to a supercritical drying method of this invention, a substrate having a pattern is dipped in water and rinsed with water. Then, the substrate is placed in the reaction chamber of a predetermined sealable vessel, and surfactant-added liquid carb... | 06/10/2003 |
| 6569210 | Gas jet removal of particulated soil from fabric Fabrics are cleaned by treating at least a portion of the piece of fabric with a particulating chemical, and agitated by a gas jet of a particle-dislodging gas to dislodge the particulated soil. The particulating chemical loosens embedded non-particulate ... | 05/27/2003 |
| 6565920 | Edge bead removal for spin-on materials containing low volatility solvents fusing carbon dioxide cleaning Methods are provided for removing edge beads from spin-on films. A spin-on film is removed from a region of a surface of a spin-coated substrate adjacent to an edge of the surface by spinning the spin-coated substrate, expanding a fluid through a nozzle t... | 05/20/2003 |
| 6565663 | Use of organic carbonates as solvents for the washing of metal surfaces The invention relates to the use of organic carbonates having formula (I) ##STR1## wherein: n=1-4 R and R' are two linear or branched alkyl radicals which contain a number of carbon atoms whose sum is equal to at least 5 and which can be the same or diffe... | 05/20/2003 |
| 6562146 | Processes for cleaning and drying microelectronic structures using liquid or supercritical carbon dioxide A method of cleaning and removing water and entrained solutes during a manufacturing process from a microelectronic device such as a resist-coated semiconductor substrate, a MEM's device, or an optoelectronic device comprising the steps of: (a) providing ... | 05/13/2003 |
| 6562142 | System and method for cleaning and/or treating vehicles and the surfaces of other objects The present invention relates to a system and method for cleaning and/or treating a surface, preferably surfaces such as ceramic, steel, plastic, glass and/or painted surfaces such as the exterior surface of a vehicle. The system and method utilize a clea... | 05/13/2003 |
| 6558473 | Dry ice cleaning method, dry ice cleaning apparatus, and part or unit cleaned by dry ice A method of cleaning a component or a unit of an image forming apparatus which has been contaminated by a toner used for image forming includes the steps of blasting a target surface of the component or unit which has been contaminated by the toner with d... | 05/06/2003 |
| 6557569 | Method of manufacturing an electrophotographic photosensitive member including multiple liquid cleaning steps and machining step A method of manufacturing an electrophotographic photosensitive member includes the steps of: cleaning a substrate of the electrophotographic photosensitive member by cleaning step using a vessel and machining the substrate. The cleaning step includes a f... | 05/06/2003 |
| 6554911 | En masse process for cleaning thin polarizing glass devices A method for en masse cleaning of thin polarizing glass devices involving the steps of using a cleaning vessel possessing a vertical side wall, and a porous shelf attached to the vertical side wall to form an annular cavity for receiving a plurality of th... | 04/29/2003 |
| 6554909 | Process for cleaning components using cleaning media A method for cleaning a semiconductor processing component is provided. The process calls for directing a stream of cleaning media at a surface of the component, the cleaning media including zirconia. After cleaning with the cleaning media, frozen CO... | 04/29/2003 |
| 6554908 | Process for pickling stainless steel in the absence of nitric acid and in the presence of chloride ions Process for pickling stainless steel carried out at a temperature of between 20° and 70° C., with the use of a pickling solution containing the following basic ingredients: H2 SO4 (free acid): 50 to 200 g/l HF (free acid): 0 to 60 g/l F... | 04/29/2003 |
| 6551415 | Touch-free loading system for an in-bay, automatic vehicle wash system A vehicle loading system for the wash bay of an automatic vehicle wash system that eliminates the use of a floor-mounted target to capture the front tire of the vehicle to be washed. The vehicle wash system includes a pair of side position sensors that de... | 04/22/2003 |
| 6550484 | Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing The present invention pertains to apparatus and methods for maintaining wafer back side, bevel, and front side edge exclusion during supercritical fluid processing. Apparatus of the invention include a pedestal and an exclusion ring. When the exclusion ri... | 04/22/2003 |
| 6547918 | Raw bar stripping off and cleaning jig and raw bar stripping off and cleaning method A raw bar stripping off and cleaning jig has a stripping-off member on which transfer tools are placed, a base for supporting raw bars stripped off from the transfer tools, a stripping-off suction member for attracting the raw bars to separate the same fr... | 04/15/2003 |
| 6544347 | Methods for using a ring-vortex A vortex ring is used to produce a flow of fluid through a flexible tube, to remove surface deposits from a surface, and to transfer heat from a platen to a ring vortex. In pumping a fluid through a flexible conduit or tube, a vortex ring is launched alon... | 04/08/2003 |
| 6544346 | Method for repairing a thermal barrier coating A method of repairing a thermal barrier coating on a component designed for use in a hostile thermal environment, such as turbine, combustor and augmentor components of a gas turbine engine. The method is particularly suited for completely removing a ther... | 04/08/2003 |
| 6539952 | Megasonic treatment apparatus The invention provides an apparatus and method for cleaning or etching wafers. The invention further provides a megasonic transducer designed to apply mechanical vibrations to a layer of fluid in contact with a wafer. The electromechanical transducer is h... | 04/01/2003 |
| 6537380 | Fluorinated solvent compositions containing ozone A homogeneous non-aqueous composition containing a fluorinated solvent, ozone, and optionally a co-solvent and the use of these compositions for cleaning and oxidizing substrates is described.... | 03/25/2003 |
| 6530386 | Method of cleaning returnable bottles A method for cleaning returnable bottles and similar containers used in the food industry. The method uses an enzymatic solution during the cleaning process. The cleaning results are at least as good as conventional methods, without requiring an increase ... | 03/11/2003 |
| 6530382 | Gel purge formulations and methods of cleaning extruders by using the same Methods for cleaning screw extruder, especially powder-coating extruders, include filling the extruder barrel with a gel purge formulation comprised of a high-boiling pyrrolidone or piperidone (lactam) solvent (most preferably N-methyl pyrrolidone (NMP)),... | 03/11/2003 |
| 6530381 | Process for the wet-chemical surface treatment of a semiconductor wafer A process for the wet-chemical surface treatment of a semiconductor wafer following a mechanical surface treatment, in particular following a mechanical surface treatment in a lapping machine, includes a sequence of treatment steps. The process essentiall... | 03/11/2003 |
| 6527870 | Wafer cleaning module and method for cleaning the surface of a substrate In a method for cleaning a surface of a substrate an amount of a solution is applied on a surface of the substrate. After the solution is applied on the surface, crystallization of the solution is initiated to form a liquid-crystal mixture. Once the liqui... | 03/04/2003 |
| 6525010 | Composition and associated method for inhibiting stain formation on a ferrous metal surface A composition for adding to an aqueous rinse which is applied to a ferrous metal surface after treatment of the ferrous metal surface with an aqueous acid solution is disclosed. The composition includes a base. The base is present in the composition in an... | 02/25/2003 |
