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| Number | Title | Issue Date |
| 8147618 | Device and method for liquid treating disc-like articles Herein disclosed is a device and a method for liquid treatment of a disc-like article comprising rotating a disc-like article, dispensing liquid onto the disc-like article when rotated, collecting liquid, which is flung off the disc-like article when rotated, provid... | 04/03/2012 |
| 8147617 | Substrate cleaning method and computer readable storage medium A wafer W is processed by supplying a two-fluid, high pressure jet water, or mega-sonic water onto the wafer W, while rotating the wafer W in an essentially horizontal state. After supply of the cleaning fluid is stopped, the wafer W is dried by rotating the wafer W... | 04/03/2012 |
| 8128755 | Cleaning solvent and cleaning method for metallic compound Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry or the semiconductor industry. The cleaning solvents and the cleaning... | 03/06/2012 |
| 8118946 | Cleaning process residues from substrate processing chamber components A component from a substrate processing chamber which has plasma process residues on both its internal and external surfaces, is removed from the processing chamber, and transferred to a cleaning chamber. The component is exposed to an energized cleaning gas in the ... | 02/21/2012 |
| 8097092 | Method of cleaning and after treatment of optical surfaces in an irradiation unit The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting EUV-radiation and/or soft X-rays, a first volume (40) following s... | 01/17/2012 |
| 8083862 | Method and system for monitoring contamination on a substrate A method and system for measuring contamination, such as metal contamination, on a substrate. A dry cleaning system is utilized for non-destructive, occasional removal of contamination, such as metal containing contamination, on a substrate, whereby a monitoring sys... | 12/27/2011 |
| 8080114 | Cleaning process Provided is a cleaning process which is simplified and in which a time required for the cleaning process is reduced and which has an excellent cleaning effect. The cleaning process comprises loading a wafer in a high pressure cleaner, injecting high-purity gaseous c... | 12/20/2011 |
| 8075704 | Method for the removal of airborne molecular contaminants using oxygen and/or water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 12/13/2011 |
| 8066819 | Method of removing organic materials from substrates Water-free, gaseous sulfur trioxide is used as an agent to remove various organic coatings, films, layers and residues from the surface of a substrate when used in conjunction with certain other physical and chemical treatments applied at the appropriate time during... | 11/29/2011 |
| 8066820 | Process for cleaning articles A method of cleaning at least one article having a surface to be cleaned, the method comprising the steps of inserting the article into a cleaning chamber (3), subjecting the surface of the article to treatment with water vapor under conditions such that at l... | 11/29/2011 |
| 7914626 | Liquid processing method and liquid processing apparatus A liquid processing method includes: placing a plate adjacently to at least one of surfaces of a target substrate, and supplying a process liquid into a gap between the plate and the target substrate, thereby forming a liquid film of the process liquid; subjecting t... | 03/29/2011 |
| 7909936 | Dishwasher final steam rinse method An overall dishwasher operation cycle includes a washing cycle and a final rinse cycle including steam generation. During the final rinse cycle, a dishwasher tub is filled with fluid, heated and utilized to rinse dishware within the dishwasher. After partially drain... | 03/22/2011 |
| 7896973 | Substrate processing apparatus and substrate processing method This substrate processing apparatus supplies wafers W accommodated in a closed processing container 10 with ozone gas and steam for processing the wafers W. The apparatus includes an ozone-gas generator 40 for supplying the ozone gas into the processin... | 03/01/2011 |
| 7846266 | Environment friendly methods and systems for template cleaning and reclaiming in imprint lithography technology Cleaning and reclaiming nano-imprint templates using environment friendly methods and systems is disclosed. A template may be cleaned by a combination of exposure to activated gaseous species followed by rinsing with oxygenated or hydrogenated DI water and exposure ... | 12/07/2010 |
| 7819984 | Process for treatment of substrates with water vapor or steam A method of treating a substrate comprises, in one aspect, placing a substrate having material on a surface thereof in a treatment chamber; directing a stream of a liquid treatment composition to impinge the substrate surface; and directing a stream of water vapor t... | 10/26/2010 |
| 7806989 | Substrate processing method and substrate processing apparatus A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Ne... | 10/05/2010 |
| 7691210 | Resist film removing method A resist film removing method for removing a resist film disposed on a substrate and having a cured layer at a surface includes covering the surface of the resist film with a protection film; causing popping in the resist film covered with the protection film; denat... | 04/06/2010 |
| 7517413 | Remediation of microfloral and biofilm development from laundering devices Methods, improved compositions and kits are employed that provide dosing and cleaning solutions containing a halogen-based oxidant effectively delivered to remediate microfloral and biofilm development on the laundering surfaces of enclosed horizontal axis washers. ... | 04/14/2009 |
| 7481893 | Cleaning textiles Cleaning media based on liquid CO2 and including from 0.01 to 5% by weight of the formulation of a cleaning additive which is at least one C6 to C24 hydrocarbyl ester of a multi-carboxylic acid can be used in dry cleaning of textiles... | 01/27/2009 |
| 7442319 | Poly etch without separate oxide decap The use of an ammonium hydroxide spike to a hot tetra methyl ammonium hydroxide (TMAH) solution to form an insitu poly oxide decapping step in a polysilicon (poly) etch process, results in a single step rapid poly etch process having uniform etch initiation and a hi... | 10/28/2008 |
| 7422639 | Method of reducing water spotting and oxide growth on a semiconductor structure The present invention relates to a method of cleaning and drying a semiconductor structure in a modified conventional gas etch/rinse or dryer vessel. ... | 09/09/2008 |
| 7419614 | Method of etching and cleaning objects A method of etching and cleaning objects contained in a vessel, includes etching the objects by providing etching solution into the vessel, forcing out the etching solution from the vessel by providing pressurized gas into the vessel; cleaning the objects by providi... | 09/02/2008 |
| 7416612 | Process for removal of paint from plastic substrates A process for removing paint from a plastic substrate that typically includes immersing and optionally agitating the painted plastic substrate in a first chemical fluid, removing the substrate from the first chemical fluid, typically immersing and optionally agitati... | 08/26/2008 |
| 7416611 | Process and apparatus for treating a workpiece with gases In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk transport achieved by entraining the gas in a liquid stream, spray or ... | 08/26/2008 |
| 7412979 | Selective removal or application of a coating on a portion of a container The present invention relates to an apparatus and method for removing a coating material from a predetermined first portion of a container, while retaining the coating on a second portion of the container, or alternatively applying a coating to a predetermined porti... | 08/19/2008 |
| 7413613 | Method for activating electron source surface of field emission display A method for activating surface of electron emission source of a field emission display. After a cathode structure is fabricated and sintered with high temperature, the surface of electron emission source is activated by employing a spray coating technology. The spr... | 08/19/2008 |
| 7410543 | Substrate processing method Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atm... | 08/12/2008 |
| 7410545 | Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate A substrate immersed in pure water held inside a processing bath disposed to a cleaning unit 1 and accordingly washed, as it bears an aqueous film on its surface, is transported by a substrate transportation mechanism 3 to a spin-processing unit 2 | 08/12/2008 |
| 7405164 | Apparatus and method for removing a photoresist structure from a substrate In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showerhead includes a first space ... | 07/29/2008 |
| 7404863 | Methods of thinning a silicon wafer using HF and ozone A method of thinning a silicon wafer in a controllable cost-effective manner with minimal chemical consumption. The wafer is placed into a process chamber, after which ozone gas and HF vapor are delivered into the process chamber to react with a silicon surface of t... | 07/29/2008 |
| 7402213 | Stripping and removal of organic-containing materials from electronic device substrate surfaces Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m2). The substrate may comprise an electronic device. The exposed surface is treated with a stripping solution comprising o... | 07/22/2008 |
| 7387689 | Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces Methods for processing substrate through a head that is configured to be placed in close non-contact proximity to a surface of a substrate are provided. One method includes applying a first fluid onto the surface of the substrate from conduits in the head when the h... | 06/17/2008 |
| 7377982 | Method for the removal of airborne molecular contaminants using water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 05/27/2008 |
| 7377984 | Method for cleaning a photomask Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidat... | 05/27/2008 |
| 7371502 | Methods of fabricating organic light emitting display and donor substrate Methods of fabricating an OLED and a donor substrate are provided. The method includes: preparing a base substrate of a donor substrate; forming a light to heat conversion layer and a transfer layer on the base substrate; preparing a donor substrate including perfor... | 05/13/2008 |
| 7368020 | Reduced particle contamination manufacturing and packaging for reticles A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. T... | 05/06/2008 |
| 7368682 | Processing apparatus A processing apparatus contains a holding member for holding a workpiece, and a laser beam shining member for shining a laser beam at the workpiece held on the holding member. The holding member has a holding plate and the workpiece is placed on the holding plate. T... | 05/06/2008 |
| 7364625 | Rinsing processes and equipment Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ... | 04/29/2008 |
| 7341067 | Method of managing the cleaning of heat transfer elements of a boiler within a furnace A method of cleaning a heat transfer element within a boiler furnace is provided. The method includes the steps of allowing a furnace to operate and deposit ash on a heat transfer element, determining an efficiency rate for at least one cleaning element, and managin... | 03/11/2008 |
| 7341065 | Single wafer cleaning method to reduce particle defects on a wafer surface Methods of preventing air-liquid interfaces on the surface of a wafer in order to prevent the formation of particle defects on a wafer are presented. The air-liquid interfaces may be prevented by covering the entire surface of the wafer with liquid at all times duri... | 03/11/2008 |
