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| Number | Title | Issue Date |
| 7435301 | Cleaning solution of silicon germanium layer and cleaning method using the same Disclosed are a cleaning solution for preventing damage of a silicon germanium layer when cleaning a semiconductor device including the silicon germanium layer and a cleaning method using the same. The cleaning solution of a silicon germanium layer includes from abo... | 10/14/2008 |
| 7410544 | Method for cleaning electroless process tank A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid (103), after which the tank is exposed to a second acid in the presence of a first oxidizing agent (107). ... | 08/12/2008 |
| 7375065 | Method and composition for cleaning a fluid delivery system A composition for cleaning a fluid delivery system includes an agent which controls the rheology of the fluid so that its apparent viscosity decreases as the fluid is subjected to a shear force. In particular applications, the viscosity of the composition is greater... | 05/20/2008 |
| 7367350 | Processing device and method of maintaining the device A film processing device using vaporized liquid source capable of confirming the flow control accuracy of flow control equipment such as a mass flow controller (15) controlling the flow of the liquid source without separating the flow control equipment from p... | 05/06/2008 |
| 7361230 | Substrate processing apparatus In the substrate processing apparatus, a ceramic module for mounting a substrate has a flat plate portion having an electric circuitry and a ceramic base body, and as at least a part of a surface of the flat plate portion other than the surface mounting the substrat... | 04/22/2008 |
| 7354485 | Cleaning solution A method of cleaning a surface which comprises the step of applying an aqueous cleaning solution to the surface wherein the active cleaning ingredient of the aqueous solution consists essentially of a lignosulfonate. It has been found that lignosulfonate can functio... | 04/08/2008 |
| 7337788 | Compositions useful for cleaning solvent-based paint from paint delivery installations Uncured solvent-based paint may be flushed from a paint delivery installation using a substantially non-aqueous composition containing one or more organic solvents and a polymer having acid and/or amine functional groups. ... | 03/04/2008 |
| 7338564 | Powdered evaporator coil cleaner A prepackaged, peroxide-based, cleaning composition is described which is suitable for on-site dilution, and for cleaning substrates such as air conditioner coils. ... | 03/04/2008 |
| 7338664 | Color changing matrix as wear indicator A sustained-release matrix for dental application includes either an anti-microbial agent or a colorant that is released from the matrix when the matrix contacts water. The preferred matrices include a water-soluble polymer and a water-insoluble support resin. ... | 03/04/2008 |
| 7300525 | Device for cleaning pipette probes or stirrers The invention concerns a device for cleaning pipette needles or stirrers, the device comprising a trough which holds cleaning fluid and whose lower region has a fluid duct for filling and/or emptying purposes and whose upper region has at least one feed pipe which l... | 11/27/2007 |
| 7300683 | Method of forming resistance film The invention provides a method of forming a resistance film with even thickness and at high speed even in a substrate having micro depressions and projections in its surface. A fine particle dispersion solution is prepared by adding a solution which decreases the a... | 11/27/2007 |
| 7293569 | Alkylsilanes as solvents for low vapor pressure precursors Compositions and methods for cleaning deposition systems utilizing alkylsilanes are described herein. In an embodiment, a method of cleaning a semiconductor fabrication system comprises flushing the system with a solvent comprising at least one alkylsilane. In anoth... | 11/13/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7264007 | Method and apparatus for cleaning a substrate using megasonic power A method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes moving the fluid meniscus over the surface the substrate to process t... | 09/04/2007 |
| 7259650 | Magnetic element A magnetic element including coils; a first core and a second core each of which has a planar plate portion, outer leg portions and a middle leg portion which is inserted into aforesaid coil; and an intermediate core to form a closed magnetic circuit which is dispos... | 08/21/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7252096 | Methods of simultaneously cleaning and disinfecting industrial water systems On-Line and Off-Line methods of simultaneously cleaning and disinfecting an industrial water system are described and claimed. The methods involve the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali... | 08/07/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7240679 | System for substrate processing with meniscus, vacuum, IPA vapor, drying manifold One of many embodiments of a substrate preparation system is provided which includes a drying system, the drying system including at least one proximity head for drying a substrate. The system also includes a cleaning system for cleaning the substrate. ... | 07/10/2007 |
| 7234477 | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces One of many embodiments of a substrate preparation system is provided which includes a head having a head surface where the head surface is proximate to a surface of the substrate. The system also includes a first conduit for delivering a first fluid to the surface ... | 06/26/2007 |
| 7234476 | Method of cleaning CVD equipment processing chamber A method of remote plasma cleaning a processing chamber of CVD equipment, which has high cleaning rates, low cleaning operational cost and high efficiency, is provided. The method comprises supplying cleaning gas to the remote plasma-discharge device; activating the... | 06/26/2007 |
| 7219675 | Cleaning composition and method A novel cleaning composition comprises a dilutant, a wetting agent, a chelating agent, an alkaline builder, and a chlorine provider. The dilutant is preferably water. The wetting agent is alkoxylated alcohol. The chelating agent is an acrylic/maleic acid copolymer. ... | 05/22/2007 |
| 7211550 | Compositions for controlling scaling and completion fluids An aqueous-based composition containing cesium formate and at least one chelating agent is described. Methods of removing scaling deposits, which may include alkaline earth metal sulfates, present on surfaces, including porous media, such as alkaline earth metal sul... | 05/01/2007 |
| 7204890 | Process for removing fine particulate soil from hard surfaces Many prior art processes for cleaning predominantly organic hard surfaces have been found to be considerably less effective in removing very fine particles on such surfaces than are the best cleaners for metallic surfaces. However, it has been found, and forms the b... | 04/17/2007 |
| 7205265 | Cleaning compositions and methods of use thereof A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable f... | 04/17/2007 |
| 7201807 | Method for cleaning a deposition chamber and deposition apparatus for performing cleaning Disclosed are a method for cleaning a deposition chamber by removing attached metal oxides, and a deposition apparatus for performing in situ cleaning. A first gas and a second gas are provided into the deposition chamber. The first gas is reacted with metal include... | 04/10/2007 |
| 7198055 | Meniscus, vacuum, IPA vapor, drying manifold A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit region is defined for delivery of a first fluid to wafer of the surface an... | 04/03/2007 |
| 7166758 | Foam and gel methods for the decontamination of metallic surfaces Decontamination of nuclear facilities is necessary to reduce the radiation field during normal operations and decommissioning of complex equipment. In this invention, we discuss gel and foam based diphosphonic acid (HEDPA) chemical solutions that are unique in that ... | 01/23/2007 |
| 7165561 | Biofilm reduction in crossflow filtration systems Systems and methods for reducing biofilms are described. The systems and methods are particularly suitable for use with conventional aqueous crossflow filtration systems, such as reverse osmosis systems. The addition of the enzyme/surfactant compound has been found ... | 01/23/2007 |
| 7147386 | MEMS based handheld fiber optic connector cleaner A Micro-Electro-Mechanical System (MEMS) and double-layer nozzle based high efficiency, lightweight, low cost, compact, portable fiber-optic connector cleaning apparatus useful for various fiber optic communications applications such as fiber optic cable plant maint... | 12/12/2006 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7140374 | System, method and apparatus for self-cleaning dry etch A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species d... | 11/28/2006 |
| 7137569 | Chemical injector A chemical injector for injecting fluid chemical into a pipeline having an axis wherein the pipeline has fluid flow moving from an upstream to a downstream direction. The chemical injector includes an injector tube having an axis substantially perpendicular to the a... | 11/21/2006 |
| 7122510 | One-bath particle-free chemical cleaning The invention relates to a method for one-bath chemical cleaning and preservation of interior surfaces of hollow steel bodies, without any organic solvents, comprising controlled change of the liquid bath in that in a circuit of hoses running from a mobile tank equi... | 10/17/2006 |
| 7073519 | Facility parts cleaning solution for processing of (meth)acrylic acid and/or (meth)acrylic esters and cleaning method using said cleaning solution The present invention relates to a facility parts cleaning solution for the processing of (meth)acrylic acid and/or (meth)acrylic esters and a cleaning method using the cleaning solution. An aqueous cleaning composition comprising 5 to 50 wt % of at least one alkali... | 07/11/2006 |
| 7067571 | Antistatic agent and resin composition and formed product An antistatic agent containing a borate ester of polyoxyalklene. An antistatic resin composition comprising a thermoplastic resin and a borate ester of polyoxyalkylene. An antistatic plastic resin formed product made from a plastic resin composition comprising a the... | 06/27/2006 |
| 7060422 | Method of supercritical processing of a workpiece An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical ... | 06/13/2006 |
| 7048803 | Method of dissolving scale A method of dissolving scale comprises contacting the scale with a solution of an alkali metal bisulfate. Another method of dissolving scale comprises contacting the scale with a solution of an alkali metal bisulfate and a strong mineral acid. A further method of di... | 05/23/2006 |
| 7044662 | Developing photoresist with supercritical fluid and developer An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced ... | 05/16/2006 |
| 7041176 | Pipe renovating system and method A pipe renovating method and system in which a pipe is first cleaned and then coated with a suitable coating material. In the cleaning step, pressurized air and particles of abrasive material are pumped into a first end of a pipe while suction is applied to the seco... | 05/09/2006 |
