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Class 134/21 - Including use of vacuum, suction, or inert atmosphere


Subclass of Class 134 - Cleaning and liquid contact with solids
Definition: Processes in which the work is subjected to a vacuum or
No. of patents: 970
Last issue date: 05/22/2012


1                      
NumberTitleIssue Date
8182611Vacuum cleaning apparatus and cleaning method thereof
The invention relates to a cleaning method, and in particular, to a vacuum cleaning apparatus and a vacuum cleaning method thereof. A vacuum cleaning method comprising (a) positioning a dust receiver joined to one end of a vacuum suction device in the vicinity of th...
05/22/2012
8137473Method for cleaning elements in vacuum chamber and apparatus for processing substrates
To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically cha...
03/20/2012
8118944Self-cleaning pill counting device, and cleaning method
A pills counting device is provided. It comprises a tray comprising a base member and a trough member. The device also comprises a lid member mounted on the base member and being movable between two extreme positions. The device also comprises at least one port prov...
02/21/2012
7998277Removing hair from a surface
A method of removing hair from a surface laden with hair comprising moving a hair collection element along the surface in a first direction to collect hair, depositing the collected hair at a first location, gliding the hair collection element along the surface in a...
08/16/2011
7964040Multi-port pumping system for substrate processing chambers
An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrat...
06/21/2011
7875123Method and apparatus for cleaning percolation basins
A method and apparatus for cleaning accumulated silt from the floor of a percolation basin are provided. An underwater terrain vehicle (UTV) moves along the basin floor and carries a series of blades that cut and lift the accumulated silt. An eductor driven vacuum h...
01/25/2011
7857909Cleaning device including a flood chamber
In order to produce a cleaning device comprising a flood chamber for accommodating a workpiece requiring cleaning and a flooding device for flooding the flood chamber with a liquid cleaning agent which is of simple construction and the flood chamber of which can be ...
12/28/2010
7846262Aqueous cleaning of liquid residue by etching
The present invention is a method of cleaning an object in an open aqueous cleaning system. The method is directed to an open cleaning vessel into which water used for cleaning a material or object can be introduced. A means is provided for introducing a reactant ch...
12/07/2010
7837803Device and method for wet treating disc-shaped articles
In a spin-chuck with plural collector levels, a separate exhaust controller is provided for each level. This permits selectively varying gas flow conditions among the collector levels, so that the ambient pressure at one level does not adversely affect device perfor...
11/23/2010
7789969Methods and apparatus for cleaning chamber components
In a first aspect, a method for cleaning a semiconductor fabrication chamber component having an orifice is provided. The method includes (A) placing the component into a bath having a cleaning solution; (B) flowing a fluid into the orifice thereby maintaining at le...
09/07/2010
7767026Substrate processing apparatus and substrate processing method
An on-off valve 81 is opened during rinsing, whereby a part of DIW supplied to a processing liquid supply section 43 is guided into inside a suction pipe 82. After rinsing, a puddle is formed between a lower cleaning nozzle 29 and the bot...
08/03/2010
7758702Extraction cleaning with surface heating
Extraction surface cleaning wherein a cleaning liquid is applied to a surface to be cleaned and extracted to remove the soiled cleaning fluid from the surface, and the surface is heated prior to or concurrent with the application of the cleaning fluid to the surface...
07/20/2010
7731802Methods for transitioning a fluid meniscus to and from surfaces of a substrate
Methods for processing a substrate with a fluid meniscus are provided. One method includes positioning a transition surface substantially coplanar to a substrate surface. The transition surface is defined to be adjacent to an edge of the substrate. And, moving a flu...
06/08/2010
RE41367Sprayless surface cleaner
A cleaning head for carpets, walls or upholstery, including a rigid, exterior, open-bottomed main body which defines the surface subjected to the cleaning process. Mounted within or adjacent to the main body portion coplanar with the bottom thereof is the fluid-appl...
06/08/2010
7722724Methods for substrate processing in cluster tool configurations having meniscus application systems
Method for processing a substrate are provided. The processing occurs when the substrate is moved between cluster tools. One method includes providing the substrate to a cluster tool, and the cluster tool is configured to move the substrate into a meniscus processin...
05/25/2010
7682462Cluster tool process chamber having integrated high pressure and vacuum chambers
A cluster tool includes a transfer chamber connected to a plurality of vacuum chambers. An additional process chamber connected to the transfer chamber includes a high pressure chamber assembly seated on a housing. The high pressure chamber assembly, which is adjust...
03/23/2010
7597767Paint gun cleaning apparatus
A paint gun cleaning apparatus is provided that prevents the collection of overspray on the discharge end of the paint gun. The cleaning apparatus includes a drum that defines an aperture for insertion of at least the discharge end of a paint gun. The apparatus also...
10/06/2009
7582169Device and method for cleaning a powder coating booth
The device according to the invention for cleaning a powder coating booth has a mobile frame, which can be moved along the insides of the booth. The frame includes suction nozzles for sucking off powder residues from the insides of the booth. ...
09/01/2009
7578886Substrate processing apparatus, substrate processing method, and substrate holding apparatus
A substrate processing apparatus and a substrate processing method is provided for performing a chemical liquid process, a cleaning process, a drying process, or the like while rotating a substrate such as a semiconductor wafer or a liquid crystal substrate. A subst...
08/25/2009
7575641Method and system for cleaning heat exchanger tube bundles
A method and system utilizing a mobile cleaning unit for providing cleaning of heat exchanger tube bundles. The mobile cleaning unit utilizes a pressurized seal positioned about top door of the cleaning enclosure to provide a fluid and vapor lock of the cleaning enc...
08/18/2009
7566370Wafer clamping apparatus and method for operating the same
A wafer clamping apparatus is provided to secure a wafer within a chamber during wafer processing. The wafer clamping apparatus creates a pressure differential between a top surface and a bottom surface of the wafer. The pressure differential serves to pull the wafe...
07/28/2009
7556697System and method for carrying out liquid and subsequent drying treatments on one or more wafers
Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from rinsing to drying). At least a portion of residual liquid remaining in fl...
07/07/2009
7544254System and method for cleaning an ion implanter
This disclosure provides an approach for cleaning an ion implanter. In this disclosure, there is a vacuum device having an in-take port adapted to receive a contaminant removing hose. The vacuum device and hose are configured to provide constant suction to the ion i...
06/09/2009
7534307Methods for processing wafer surfaces using thin, high velocity fluid layer
Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the...
05/19/2009
7531046Process for de-oiling steelmaking sludges and wastewater streams
The present invention is directed to a process for treating an oily mixture consisting of hydrocarbons, solid particles, and water. The steps of the process include placing the oily mixture into a reactor chamber, purging the reactor chamber with an inert gas, and c...
05/12/2009
7520938Method for high-pressure processing
An object is subjected to high-pressure processing by bringing at least a high-pressure fluid into contact with the object under pressure in a high-pressure processing chamber, and then the high-pressure processing chamber is depressurized while the temperature in t...
04/21/2009
7507298Cleaning equipment and use thereof
By constructing tank cleaning equipment according to the invention such that it comprises a cleaning jetting part (7, 9) as well as a suction part (4), the equipment can work with the same cleaning medium which is recirculated. This saves supply of fre...
03/24/2009
7465359Game ticket scratching device and method
A game ticket scratching device and method includes an elongated tubular member that has an open first end and a closed second end. An axle is mounted within the tubular member adjacent to the first end. A plurality of bristles is attached to and radially extends ou...
12/16/2008
7419765Method for producing flexographic printing plates by means of laser engraving
Process for the production of flexographic printing plates by means of direct laser engraving, in which the particulate and gaseous degradation products formed in the course of the engraving are taken up by means of a suction apparatus, and the waste gas stream lade...
09/02/2008
7410543Substrate processing method
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atm...
08/12/2008
7401744Jetting device and a method of jetting device
A jetting device and a method of jetting droplets of viscous medium onto a substrate. The jetting device includes a jetting outlet through which the droplets are jetted. The jetting device further includes a wall located at the jetting outlet, downstream of the jett...
07/22/2008
7387689Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
Methods for processing substrate through a head that is configured to be placed in close non-contact proximity to a surface of a substrate are provided. One method includes applying a first fluid onto the surface of the substrate from conduits in the head when the h...
06/17/2008
7377982Method for the removal of airborne molecular contaminants using water gas mixtures
The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf...
05/27/2008
7377053Method and device for drying substrate
A device for drying substrate comprising a processing vessel housing a specified number of substrates such as semiconductor wafers installed erectedly in parallel to one another, a first substrate supporting member supporting substrates within the processing vessel,...
05/27/2008
7372049Lithographic apparatus including a cleaning device and method for cleaning an optical element
An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to p...
05/13/2008
7373055System and method for providing a buffer tube including a jet
A system and method for providing a buffer tube. The system includes a crosshead that coats at least one optical fiber with a buffer tube coating; a vat that includes a fluid, the fluid within the vat cooling the buffer tube coating to form a buffer tube, and the va...
05/13/2008
7370659Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a workpiece support, a cleaning ...
05/13/2008
7364625Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ...
04/29/2008
7361233Methods of hydrogen cleaning of metallic surfaces
The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to about 1400° F., a partial pressure hydrogen gas and a vacuum are rep...
04/22/2008
7360276Electric vacuum cleaner
An electric vacuum cleaner including a suction tool main body, a vacuum cleaner main body which communicates to the suction tool main body, and a dust colleector provided at the vacuum cleaner main body. The dust collector includes a dust collection container, a tub...
04/22/2008
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