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Patent No. 5307162

Cloaking System Using Optoelectronically Controlled Camouflage

A Cloaking System designed to operate in the visible light spectrum, utilizes optoelectronics and/or photonic components to conceal an object within it.

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Class 134/19 - Including work heating or contact with combustion products


Subclass of Class 134 - Cleaning and liquid contact with solids
Definition: Processes in which the work is either (1) contacted by hot
No. of patents: 490
Last issue date: 03/27/2012


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NumberTitleIssue Date
8142571Process for treatment of semiconductor wafer using water vapor containing environment
A process is provided for treating a semiconductor wafer at a target wafer temperature. This process includes the following steps: a) determining the target wafer temperature of the semiconductor wafer during a given wafer treatment process step; ...
03/27/2012
8097091Hot source cleaning system
There is an apparatus for cleaning a substrate (5) mounted on a moveable platen. In an example embodiment, the apparatus comprises a first chamber (20), the first chamber has solvent-dispensing nozzles (25); the solvent-dispensing nozzles wet th...
01/17/2012
8092612Cooling method and cooling device
A cooling device (70) for cooling a work piece (9) that has reached a high temperature due to the implementation of a closing operation in which a bottom portion (9c) is formed by closing an end portion of the tubular work piece (9...
01/10/2012
7879153Method for cleaning metal nanoparticles
It relates to a method for removing a surfactant, organic materials and chlorine ions remained on the surface of metal nanoparticles, prepared on an organic solvent phase including a surfactant. The method for cleaning metal nanoparticles herein is efficient to remo...
02/01/2011
7846261Methods of using halogen-containing organic compounds to remove deposits from internal surfaces of turbine engine components
Methods for cleaning surface deposits, such as sulfidation deposits or dust particles, from a surface bounding an internal passage in a turbine engine component. The surface deposits are cleaned by placing a halogen-containing organic compound, such as a fluorine-co...
12/07/2010
7763117Method for the manufacture of extended steel products
A method for the manufacture of extended steel products. The steel product is initially contaminated by oils and by at least one of organic and inorganic particles that are suspended or dissolved in the oils. Following the shaping of the steel product by working but...
07/27/2010
7648585Incubator and method for cleaning the incubator
The invention relates to a method for cleaning an incubator and to an incubator designed for carrying out the method. The method involves disinfecting the incubator, or at any rate the climatic chamber and/or removable parts present in it during the incubation proce...
01/19/2010
7601227High purification method of jig for semiconductor heat treatment
A method for achieving high purity in a jig for semiconductor heat treatment includes subjecting a semiconductor heat treatment jig made of a substrate having a surface covered with a silicon carbide film grown by chemical vapor deposition or a semiconductor heat tr...
10/13/2009
7534306Steam humidifier and method
The steam humidifier fed with a premix of natural gas and forced air under low pressure (less than 1 psi) includes a main frame, a movable lower frame, a two part evaporation canister, releasably sealed, for water, an immersible combustion chamber retaining a radian...
05/19/2009
7531045Method for removing haze in a photo mask
An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the chamber, and a discharge device to discharge impurities in the chamber to t...
05/12/2009
7429337Method for removing at least one area of a layer of a component consisting of metal or a metal compound
The invention relates to a method for removing an area of a layer of a component consisting of metal or a metal compound. According to prior art, corrosion products of a component are removed in a first step by applying a molten mass or by heating in a voluminous po...
09/30/2008
7416611Process and apparatus for treating a workpiece with gases
In a method and apparatus for cleaning or processing a workpiece, a process gas is brought into contact with the workpiece by diffusion through a heated liquid layer on the workpiece, and by bulk transport achieved by entraining the gas in a liquid stream, spray or ...
08/26/2008
7413613Method for activating electron source surface of field emission display
A method for activating surface of electron emission source of a field emission display. After a cathode structure is fabricated and sintered with high temperature, the surface of electron emission source is activated by employing a spray coating technology. The spr...
08/19/2008
7410543Substrate processing method
Resists can be removed while metal contamination of wafers, etc. and generation of particles, and growth of oxide films are suppressed. A substrate processing method comprises feeding a processing gas, such as ozone gas, into a processing vessel to pressurize an atm...
08/12/2008
7410611In-line method and apparatus to prevent fouling of heat exchangers
The present invention relates to a method and apparatus for the prevention of fouling of process streams by the application of electric charge on process components. The electric charge may be attractive or repulsive to the foulants, they may be constant or variable...
08/12/2008
7383841Method of cleaning substrate-processing device and substrate-processing device
In a cleaning step of a substrate-processing device, vacuum drawing is made for the space between an inner chamber and an outer chamber that receives the inner chamber. Temperature of the inner chamber is set higher than the temperature of the inner chamber during s...
06/10/2008
7377984Method for cleaning a photomask
Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidat...
05/27/2008
7368020Reduced particle contamination manufacturing and packaging for reticles
A method of transporting a reticle is disclosed. The reticle is placed in a reticle carrier that has an ionizer. Moreover, the reticle may be attached with a pellicle. The pellicle consists of a pellicle frame and a pellicle film stretched over the pellicle frame. T...
05/06/2008
7364625Rinsing processes and equipment
Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ...
04/29/2008
7361233Methods of hydrogen cleaning of metallic surfaces
The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to about 1400° F., a partial pressure hydrogen gas and a vacuum are rep...
04/22/2008
7361905Substrate processing apparatus and maintenance method therefor
A substrate processing apparatus comprises a chamber. The chamber includes a container and an upper lid for closing an upper opening of the container. On the upper side of the chamber, an elevator for vertically moving the upper lid is disposed integrally with the c...
04/22/2008
7350821Method and system for purging a dispensed fluid within a fluid dispensing system including a filter-free connector apparatus
A connector apparatus is provided which is configured to replace a separation module in a system for dispensing a fluid. When it is desired to purge the system of a dispensed fluid, the connector apparatus, having the same configuration of an inlet and an outlet as ...
04/01/2008
7349165Clamping apparatus for clamping optical element
A clamping apparatus for clamping optical elements (100) includes a first fixture (10), a second fixture (20) and two mounting members (30). The first fixture defines a plurality of holding holes (11). The second fixture defines a ...
03/25/2008
7338563Process for cleaning hydrocarbons from soils
A combination of parallel processes is disclosed to provide optimal re-mediation operations for contaminated soil. Soils with high levels of heavy petroleum hydrocarbons are directed to a thermal process for destruction in a combustion process. Carbon dioxide genera...
03/04/2008
7332041Residential dishwasher
A dishwasher that fits within the conventional U.S. residential dishwasher counter space and uses the conventional U.S. residential power supply to achieve within a convenient cycle time the same standard of sanitation as set forth for commercial and residential hot...
02/19/2008
7332042Process for treatment and extraction of organic cork compounds by a dense fluid under pressure
Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into contact with a dense fluid under pressure at a temperature of from 10 t...
02/19/2008
7326305System and method for decapsulating an encapsulated object
A system and method for the selective etching or removal of encapsulating material from an encapsulated object, such as a semiconductor, includes depositing an encapsulant-removal agent, such as a solvent or acid, onto the surface of the object. A flow of heated gas...
02/05/2008
7326673Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates
Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical fluid-based cleaning composition, which ...
02/05/2008
7318013Method for slurry and operation design in cuttings re-injection
A method for simulating cuttings re-injection in a wellbore, that includes defining a mass balance equation for a solids bed, defining a mass balance equation for a suspension solids, segmenting the wellbore into a plurality of elements, wherein each element include...
01/08/2008
7306680Method of cleaning by removing particles from surfaces, a cleaning apparatus and a lithographic projection apparatus
A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface. ...
12/11/2007
7306681Method of cleaning a semiconductor substrate
A cleaning method and cleaning recipes are disclosed. The present invention relates to a method for cleaning a semiconductor substrate and cleaning recipes. The present invention utilizes a first cleaning solution including diluted hydrofluoric acid and a second cle...
12/11/2007
7293569Alkylsilanes as solvents for low vapor pressure precursors
Compositions and methods for cleaning deposition systems utilizing alkylsilanes are described herein. In an embodiment, a method of cleaning a semiconductor fabrication system comprises flushing the system with a solvent comprising at least one alkylsilane. In anoth...
11/13/2007
7291565Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl...
11/06/2007
7287534Cleaning of apparatus in which meth(acrylic) acid-containing organic solvents have been treated and/or generated
A process for cleaning apparatus in which (meth)acrylic acid-containing organic solvents have been treated and/or generated and contain fouling and/or polymer and residues of organic solvent, in which the apparatus contents are subjected to a steam distillation in t...
10/30/2007
7288155Method for the rapid thermal control of a work piece in liquid or supercritical fluid
A method for cleaning a semiconductor structure including providing a chamber for holding the semiconductor structure and a dense phase fluid, providing a thermal transfer device having a thermal transfer surface, connecting the thermal transfer device to the chambe...
10/30/2007
7289878Apparatus and method for modifying operation of an electric gun driver
A method and apparatus for providing adjustment of current-related dispensing parameters in an electric dispensing gun. A control circuit receives user-selected inputs corresponding to dispensing parameters of the gun and converts those inputs into digital signals. ...
10/30/2007
7284558Enhanced megasonic based clean using an alternative cleaning chemistry
The present invention relates to the use of a C1 to C5 alcohol during the cleaning step. With the use of said alcohol, the surface tension of the solution is reduced which allows the application of reduced megasonic power with increased cleanin...
10/23/2007
7282099Dense phase processing fluids for microelectronic component manufacture
Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is prepared by introducing a subcritical fluid into a pressurization vesse...
10/16/2007
7272912Method and apparatus for converting spent water-based drilling muds into fertile indigenous top soil
A method and apparatus for converting spent water-based drilling mud into fertile indigenous top soil at a well site or location. The fertile indigenous top soil is produced by the steps of: admixing, at a well site, effective amou...
09/25/2007
7270137Apparatus and method of securing a workpiece during high-pressure processing
An apparatus is disclosed for performing high-pressure processing of a workpiece having a top face and a bottom face. The apparatus comprises a processing chamber and a holder for securing the workpiece within the processing chamber so that a substantial portion of ...
09/18/2007
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