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| Number | Title | Issue Date |
| 7398786 | Cleaning device for the shaving head of a dry shaving apparatus A cleaning device for the shaving head of a dry shaving apparatus includes a receptacle formed in a housing of the cleaning device. The receptacle adapted to receive the shaving head for cleaning with a cleaning fluid. During the cleaning cycle, the dry shaving appa... | 07/15/2008 |
| 7377982 | Method for the removal of airborne molecular contaminants using water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 05/27/2008 |
| 7368057 | Method and system for removing residual water from excess washcoat by ultrafiltration A washcoat coating composition is disclosed that includes at least one water insoluble organic solvent and at least one polymer, such as an epoxy acrylic copolymer. A method of removing residual water from a mixture of residual water and washcoat using ultrafiltrati... | 05/06/2008 |
| 7338563 | Process for cleaning hydrocarbons from soils A combination of parallel processes is disclosed to provide optimal re-mediation operations for contaminated soil. Soils with high levels of heavy petroleum hydrocarbons are directed to a thermal process for destruction in a combustion process. Carbon dioxide genera... | 03/04/2008 |
| 7326673 | Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical fluid-based cleaning composition, which ... | 02/05/2008 |
| 7297212 | Method for the removal of airborne molecular contaminants using water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 11/20/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7282099 | Dense phase processing fluids for microelectronic component manufacture Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is prepared by introducing a subcritical fluid into a pressurization vesse... | 10/16/2007 |
| 7276138 | Vapor generating and recovery apparatus A vapor generating and recovery apparatus including a housing having an open top, a closed bottom and a plurality of sidewalls therebetween defining a boiling sump with a treating solution therein. The housing is further provided with at least one heating coil and a... | 10/02/2007 |
| 7273060 | Methods for chemically treating a substrate using foam technology The present invention relates to methods and compositions for treating a surface of a substrate by foam technology that includes at least one treatment chemical. The invention more particularly relates to the removal of undesired matter from the surface of substrate... | 09/25/2007 |
| 7267727 | Processing of semiconductor components with dense processing fluids and ultrasonic energy Method for processing an article with a dense processing fluid in a processing chamber while applying ultrasonic energy during processing. The dense fluid may be generated in a separate pressurization vessel and transferred to the processing chamber, or alternativel... | 09/11/2007 |
| 7264009 | Cleaning system and method of use A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably suppo... | 09/04/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7201851 | Vacuum processing apparatus and substrate transfer method An etching processing apparatus 1 has a transfer chamber 2, a plurality of processing chambers 3 and 4, and a plurality of cassette chambers 7 and 8. Inside the transfer chamber 2, a transfer mechanism 14 is pr... | 04/10/2007 |
| 7201804 | Cleaning of hydrocarbon-containing materials with critical and supercritical solents A method for cleaning materials containing solids and/or liquids is disclosed which involves contacting the materials with an extracting fluid including Xe, NH3, lower aromatics, nitrous oxide, water, CO, CO2, H2O, lower alcohols, lo... | 04/10/2007 |
| 7199711 | Mobile floor cleaner data communication In a method of communicating data from a mobile floor cleaner to a remote receiver a data communication is initiated from a communicator of the mobile floor cleaner to the remote receiver and data is communicated to the remote receiver with the communicator. ... | 04/03/2007 |
| 7189290 | Method and device for cleaning raw material gas introduction tube used in CVD film forming apparatus A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas introduction pipe to easily remove the contaminant in a short period of time. W... | 03/13/2007 |
| 7189291 | Method for the removal of airborne molecular contaminants using oxygen gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 03/13/2007 |
| 7175716 | Critical and supercritical cleaning of hydrocarbon-containing materials A method for cleaning materials containing solids and/or liquids is disclosed which involves contacting the materials with an extracting fluid including Xe, NH3, lower aromatics, nitrous oxide, water, CO, CO2, H2O, lower alcohols, lo... | 02/13/2007 |
| 7172658 | Cleaning liquid dispensing in a mobile hard surface cleaner A hard surface cleaner includes a motorized scrub head, a fluid recovery device, a primary cleaning liquid component container, a cleaning agent container, a flow control device and a fluid flow path. The flow control device is configured to supply a flow of cleanin... | 02/06/2007 |
| 7159598 | Cleaning system and method of use A method, system and apparatus for cleaning a tank through the use of a pair of spray heads arranged in operable communication with a pump via a pair of hose lines. One of the spray heads is operable to disperse a heated mist of cleaning solution, while the other sp... | 01/09/2007 |
| 7156927 | Transition flow treatment process and apparatus A method is provided for treating an object. In this method, a treating chemical is introduced to a bath under conditions effective to at least partially envelop the object to be treated in eddy currents of the bath liquid, followed by introducing non-treating liqui... | 01/02/2007 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7111517 | Apparatus and method for in-situ measuring of vibrational energy in a process bath of a vibrational cleaning system Apparatus and method are provided for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system. The apparatus may be made up of a test wafer comprising an array of pressure sensing elements disposed thereon for ... | 09/26/2006 |
| 7084099 | Method for processing a contaminant-containing lipophilic fluid The present invention relates to a system for processing a lipophilic fluid, more particularly to a system for processing a lipophilic fluid utilized in a fabric treating process, even more particularly to a system for processing a lipophilic fluid such that contami... | 08/01/2006 |
| 7060422 | Method of supercritical processing of a workpiece An apparatus for supercritical processing and non-supercritical processing of a workpiece comprises a transfer module, a supercritical processing module, a non-supercritical processing module, and a robot. The transfer module includes an entrance. The supercritical ... | 06/13/2006 |
| 7051399 | Cleaner cartridge A cleaner cartridge includes a container having an interior cavity, in which cleaning agent can be stored. A first end of conduit is fluidically coupled to the interior cavity. A second end of the conduit is connectable to a chemical dispenser. ... | 05/30/2006 |
| 7051741 | Reduction/oxidation material removal method A method of resist stripping for use during fabrication of semiconductor devices. A semiconductor substrate with a resist material formed thereon, such as a silicon wafer, is positioned in a sealed chamber in communication with a plasma-generating source. A gaseous ... | 05/30/2006 |
| 7044662 | Developing photoresist with supercritical fluid and developer An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced ... | 05/16/2006 |
| 7045017 | Method for post chemical-mechanical planarization cleaning of semiconductor wafers The inventive method cleans residual titanium accumulations and other undesirable materials from a planarized surface of a wafer to produce a planarized surface with less than about fifty defects per wafer. After a metallic layer of material has been planarized usin... | 05/16/2006 |
| 7044144 | Relocatable pressure washer adapter Methods and apparatus for attaching a pressure washing device to a storage tank that allows adjustment of the location of the pressure washing device. One embodiment includes a mounting plate adapted to be connected to a tank opening, a second plate hingably attache... | 05/16/2006 |
| 7033249 | Dry ice blasting cleaning apparatus The invention is an apparatus used for cleaning equipment including extremely high voltage energized electrical equipment using a dry ice blasting stream as the cleaning agent. The apparatus comprises a cleaning wand and a heating mechanism for impeding the formatio... | 04/25/2006 |
| 7011713 | Cascade extracting and solvent refreshing method for recycling jelly cables The method of continuously collecting jelly compounds from jelly filled cable is performed by recycling operation of a solvent by repeatedly heating, cleaning and condensing the recycling solvent used to deprive the jelly compounds of the jelly filled cable. The sol... | 03/14/2006 |
| 6997196 | Dishwasher for receiving articles disposed in a washing receptacle for cleaning A dishwasher includes a washing receptacle for items to be cleaned, a pump for liquid, a flow heater for liquid, a device for spraying items to be cleaned, a control device for wash cycles of the spraying device, and a device for providing steam having a separate st... | 02/14/2006 |
| 6982007 | Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same A method of utilizing a divided pressure vessel in a processing system employing a carbon dioxide based solvent includes transferring a first carbon dioxide based treating solution from a first liquid chamber in a divided pressure vessel having a plurality of liquid... | 01/03/2006 |
| 6938439 | System for use of land fills and recyclable materials Gases are vented from a waste site such as a landfill, and the gases are separated into at least three streams comprising a hydrocarbon stream, a carbon dioxide stream, and residue stream. At least a portion of the carbon dioxide stream and hydrocarbon stream are li... | 09/06/2005 |
| 6930079 | Process for treating a lipophilic fluid The present invention relates to a process for treating a lipophilic fluid contained in an emulsion of water and lipophilic fluid. The process includes the steps of pretreating the emulsion, removing lipophilic fluid from the emulsion, and purifying the lipophilic f... | 08/16/2005 |
| 6926012 | Method for supercritical processing of multiple workpieces An apparatus for supercritical processing of multiple workpieces comprises a transfer module, first and second supercritical processing modules, and a robot. The transfer module includes an entrance. The first and second supercritical processing modules are coupled ... | 08/09/2005 |
| 6913654 | Method for the removal of airborne molecular contaminants using water gas mixtures The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surf... | 07/05/2005 |
