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| Number | Title | Issue Date |
| 8161986 | Dish-washing machine Dish-washing machine comprising a chamber (2) for washing articles (3), an air inlet line and an air outlet line both communicating with the chamber, air circulating means for forcing an inlet airflow sucked from the atmosphere into the chamber (2 | 04/24/2012 |
| 8109283 | Apparatus and process for the dry removal of the scale found on the surface of the metal products An apparatus and process for the dry removal of the scale from the surface of a metal product comprising at least one heating area that does not reduce the specific surface of the material to be treated and does not cause oxidation, at least one reducing area for pe... | 02/07/2012 |
| 8079375 | Processing apparatus and atmosphere exchange method A processing apparatus configured to process a substrate under a vacuum environment includes a holding unit configured to hold the substrate, a dust collection part having a surface opposite to the substrate held by the holding unit, a vacuum chamber configured to a... | 12/20/2011 |
| 7946300 | Rinse water heating device for dish washer A rinse water heating device for a dish washer includes a water tank for storing a rinse water used for washing dishes, a rinse water tank divided from the water tank by a separation plate positioned at a lower portion of the water tank, partitions installed in the ... | 05/24/2011 |
| 7909046 | Steam dish washing machine with effective positioning and orientation of items to be washed Dish washing machine that includes a steam generator, which supplies steam during a washing operation, to aid in the washing of dishes and other items in the dish washing machine. The dish washing machine further including one or more dish washing racks that effecti... | 03/22/2011 |
| 7905240 | Device and method for preventing the drying of fluid products in a dispensing machine for such products A device and a method for preventing the drying of fluid products in a delivery head of a machine for dispensing fluid products, wherein the delivery head is provided with a plurality of delivery nozzles. The device comprises first elements to generate a conditionin... | 03/15/2011 |
| 7823597 | Substrate processing apparatus and substrate processing method DIW is supplied toward a surface of a substrate to form a lower layer liquid film, which is then frozen to form a lower layer frozen film. Further, DIW cooled down to a temperature at which the lower layer frozen film will not melt is supplied toward a surface of th... | 11/02/2010 |
| 7617831 | Wash booth for containers A wash booth (1) for containers comprises a platform (3) for supporting a container (2), a wall (4) equipped with a watertight door (5) and means for washing the inside walls of the container comprising infrared radiant elements ( | 11/17/2009 |
| 7604014 | Dishwasher A dishwasher having a washing basket comprises a guidance system that is connected to the washing basket in an air-guiding manner and contains at least one Peltier element. The Peltier element is used for cooling and thereby drying, and also for heating air guided t... | 10/20/2009 |
| 7424892 | Method and apparatus for safely cleaning a live equipment The method and apparatus are for safely cleaning live equipment. The method comprises the steps of heating a water-based solution by means of an apparatus to produce superheated steam; grounding this apparatus; conducting the superheated steam through an insulated c... | 09/16/2008 |
| 7418970 | Substrate processing apparatus for drying substrate A substrate processing apparatus includes a container in which a heating plate, a discharge nozzle for discharging a vapor of organic solvent, and a discharge nozzle for supplying a process gas and a cooling gas are provided. A pump in communication with an exhaust ... | 09/02/2008 |
| 7412982 | Cleaning probe and megasonic cleaning apparatus having the same A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the cente... | 08/19/2008 |
| 7398786 | Cleaning device for the shaving head of a dry shaving apparatus A cleaning device for the shaving head of a dry shaving apparatus includes a receptacle formed in a housing of the cleaning device. The receptacle adapted to receive the shaving head for cleaning with a cleaning fluid. During the cleaning cycle, the dry shaving appa... | 07/15/2008 |
| 7386944 | Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in ... | 06/17/2008 |
| 7383841 | Method of cleaning substrate-processing device and substrate-processing device In a cleaning step of a substrate-processing device, vacuum drawing is made for the space between an inner chamber and an outer chamber that receives the inner chamber. Temperature of the inner chamber is set higher than the temperature of the inner chamber during s... | 06/10/2008 |
| 7361231 | System and method for mid-pressure dense phase gas and ultrasonic cleaning Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being maintained at less than about 1500 psi using a temperature control device. T... | 04/22/2008 |
| 7360546 | Cleaning apparatus for semiconductor wafer A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, th... | 04/22/2008 |
| 7361229 | Device for deposition with chamber cleaner and method for cleaning chamber A chamber cleaner includes a cleaner, which is sealed, a connector passing through a side of the cleaner, lamp assembly connected to the connector and uniformly arranged in an inside surface of the cleaner, a heat-source assembled in the lamp assembly and an exhaust... | 04/22/2008 |
| 7337790 | Dishwasher Disclosed is a dishwasher, in which upper and lower pipes are opened/closed using a water pressure to simplify a configuration of the dishwasher and to reduce product costs. The present invention includes a washing chamber, top and bottom nozzles injecting water in ... | 03/04/2008 |
| 7337860 | Apparatus and process for removing liquids from drill cuttings Drill cuttings associated with drilling fluid are thermally cleaned. The wet cuttings are fed into a vessel chamber having mechanical mixers, such as ribbon blenders, extending lengthwise of the chamber. Direct heating is applied to the chamber contents by introduci... | 03/04/2008 |
| 7335721 | Polytetrafluoroethylene treatment One or more PTFE films are heated to greater than 150 degrees centigrade (C) and for a time greater than 20 hours, then the PTFE films are cooled. The PTFE films may be heated to temperatures greater than 200° C. and less than 250° C. and most preferably heated to... | 02/26/2008 |
| 7332041 | Residential dishwasher A dishwasher that fits within the conventional U.S. residential dishwasher counter space and uses the conventional U.S. residential power supply to achieve within a convenient cycle time the same standard of sanitation as set forth for commercial and residential hot... | 02/19/2008 |
| 7329616 | Substrate processing apparatus and substrate processing method A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate. A subs... | 02/12/2008 |
| 7299810 | Substrate treating apparatus with circulating and heating mechanism for removal liquid A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a circulating pump for circulating a removal liquid and transmitting the r... | 11/27/2007 |
| 7299662 | Ultrasonic cleaning system for cleaning a plurality of parallel extending, strand like products, such as example wire, profiles and pipes The invention concerns an arrangement for ultrasound cleaning of several strandlike articles (4) traveling next to each other, such as, e.g., wires, profiles and pipes, by means of a liquid excited by ultrasound in a borehole (3), which is only slightl... | 11/27/2007 |
| 7297895 | Apparatus for removal of minute particles from a surface using thermophoresis to prevent particle redeposition A method and apparatus for removing minute particles from a surface of a sample are provided that prevent redeposition of the particles onto the surface. By combining thermophoresis with laser assisted particle removal (LAPR), the methods and apparatus remove minute... | 11/20/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7282099 | Dense phase processing fluids for microelectronic component manufacture Method for processing an article by contacting the article with a dense fluid. The article is introduced into a sealable processing chamber and the processing chamber is sealed. A dense fluid is prepared by introducing a subcritical fluid into a pressurization vesse... | 10/16/2007 |
| 7270137 | Apparatus and method of securing a workpiece during high-pressure processing An apparatus is disclosed for performing high-pressure processing of a workpiece having a top face and a bottom face. The apparatus comprises a processing chamber and a holder for securing the workpiece within the processing chamber so that a substantial portion of ... | 09/18/2007 |
| 7270941 | Method of passivating of low dielectric materials in wafer processing A method of passivating silicon-oxide based low-k materials using a supercritical carbon dioxide passivating solution comprising a silylating agent is disclosed. The silylating agent is preferably an organosilicon compound comprising organo-groups with five carbon a... | 09/18/2007 |
| 7270136 | Apparatus for cleaning the edges of wafers The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus... | 09/18/2007 |
| 7264009 | Cleaning system and method of use A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably suppo... | 09/04/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7255114 | Ion sampling system for wafer An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the f... | 08/14/2007 |
| 7252714 | Apparatus and method for thermally controlled processing of microelectronic workpieces Apparatus and method for thermally controlled processing of microelectronic workpieces with liquids. An apparatus in accordance with and embodiment of the invention includes a process vessel configured to carry a processing liquid, such as an electroless processing ... | 08/07/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7237561 | Apparatus for cleaning semiconductor wafer including heating using a light source and method for cleaning wafer using the same An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying ... | 07/03/2007 |
| 7235347 | Low pH development solutions for chemically amplified photoresists A method for carrying out positive tone lithography with a carbon dioxide development system is carried out by: (a) providing a substrate, the substrate having a polymer resist layer formed thereon, (b) exposing at least one portion of the polymer resist layer to ra... | 06/26/2007 |
| 7234478 | High frequency heating apparatus Cleaning according to an evaporating dish cleaning mode or heating chamber cleaning mode is implemented based on a signal inputted by the control part. In the heating chamber cleaning mode, condensation is generated on the inner surface of the heating chamber 11 | 06/26/2007 |
| 7225817 | Cleaning device for the shaving head of a dry shaving apparatus A cleaning device for the shaving head of a dry shaving apparatus includes a receptacle having a reservoir adapted to receive the a shaving head and a pump to transfer a cleaning fluid from the reservoir and into the receptacle. A controllable drain disposed between... | 06/05/2007 |
