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Actor Marlon Brando has four patents, all named "Drumhead tensioning device and method."
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| Number | Title | Issue Date |
| 8020568 | Dishwasher The present invention relates to a dishwasher. A dishwasher includes a washing tub in which dishes are placed, a steam generator that generates steam and a nozzle part in which a flow direction of the steam is diverted at least one time to allow the steam exhausted ... | 09/20/2011 |
| 7810512 | Dishwasher The present invention relates to a dishwasher. A dishwasher includes a washing tub in which dishes are placed, a steam generator that generates steam and a nozzle part in which a flow direction of the steam is diverted at least one time to allow the steam exhausted ... | 10/12/2010 |
| 7775220 | Parts washer A parts washer having a cleaning chamber and a receptacle into which parts to be cleaned are placed. The receptacle is rotatably mounted within the cleaning chamber and is rotated by a drive device. One or more spray manifolds are provided, each having a plurality o... | 08/17/2010 |
| 7418971 | Vending machine hose controller A vending machine and a hose controller system for vending machines wherein the dispenser hose is axially and torsionally controlled to facilitate slight twisting, thereby minimizing applicator tool resistance, and making it easier for users to operate the remote ve... | 09/02/2008 |
| 7346956 | Automatic cart wash apparatus An automatic cart wash apparatus. The automatic cart wash apparatus provides improved cleaning of stock carts on a regular basis over manual cleaning by store employees. The automatic cart wash apparatus includes three main stages: a debris removal (vacuum) stage, a... | 03/25/2008 |
| 7323066 | Paint accessory cleaning device and method A device and method for cleaning paint accessories and particularly roller covers and/or other paint accessories simultaneously or individually. A spray head has a fluid inlet engageable to a source of fluid and a fluid collection chamber in communication with the f... | 01/29/2008 |
| 7314529 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 01/01/2008 |
| 7267130 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 09/11/2007 |
| 7264009 | Cleaning system and method of use A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably suppo... | 09/04/2007 |
| 7255114 | Ion sampling system for wafer An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the f... | 08/14/2007 |
| 7255115 | Apparatus for cleaning semiconductor wafers An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry th... | 08/14/2007 |
| 7252099 | Wafer cleaning apparatus with multiple wash-heads A wafer cleaning apparatus with multiple wash-heads is applied in chemical and mechanical polishing process after wafer cleaning. The wafer cleaning apparatus device includes a supporting base, which supporting base comprises a driving device and at least one fluid ... | 08/07/2007 |
| 7252100 | Systems and methods for processing a set of circuit boards A circuit board processing system includes a wash tank configured to contain cleaning fluid, and a positioning subsystem configured to immerse a set of circuit boards into the wash tank. The system further includes a flow control subsystem having (i) a first set of ... | 08/07/2007 |
| 7188632 | Cleaning and sanitizing system A high pressure water stream (14) is discharged onto a surface to be cleaned. An ozone/water stream (16) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams (14, 16) are discharged simult... | 03/13/2007 |
| 7188636 | Containment cart A portable enclosure apparatus is provided with a frame assembly having a bottom wall, an upper frame member and a single pair of vertical support members. The support members are easily length adjusted by a single user to vary the height of the system while in use.... | 03/13/2007 |
| 7185664 | Fill control system for an in sink dishwasher A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, a... | 03/06/2007 |
| 7086407 | Cleaning and sanitizing system A high pressure water stream(14) is discharged onto a surface to be cleaned. An ozone/water stream(16) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams(14,16) are discharged simultaneo... | 08/08/2006 |
| 7069937 | Vertical proximity processor A method for processing a substrate is provided which includes generating a fluid meniscus on the surface of the vertically oriented substrate, and moving the fluid meniscus over the surface of the vertically oriented substrate to process the surface of the substrat... | 07/04/2006 |
| 7047984 | Device and method for cleaning articles used in the production of semiconductor components A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least t... | 05/23/2006 |
| 7028697 | In-sink dishwasher A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, a... | 04/18/2006 |
| 6983755 | Cleaning method and cleaning apparatus for performing the same A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle supplying the cleaning liquid onto the edge section, and second and thi... | 01/10/2006 |
| 6966937 | Patient isolation unit A patient isolation unit including a foldable frame body, a flexible envelope made of a flammable resin sheet which can be attached to the assembled frame body, and an exhauster to discharge or exhaust the air from the envelope. The exhauster includes a UV lamp, an ... | 11/22/2005 |
| 6960282 | Apparatus for cleaning residual material from an article An apparatus in which opposed nozzle assemblies are utilized to clean residual material, such as a metallic paste, from an article, such as a screening mask. Each of the nozzle assemblies has a first set of nozzles for spraying a cleaning agent onto the article in a... | 11/01/2005 |
| 6951221 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 10/04/2005 |
| 6945259 | Substrate cleaning method and substrate cleaning apparatus A substrate cleaning apparatus is provided that includes a cleaning cup for receiving a to-be-cleaned substrate, a table in the cleaning cup, a first, second, and third nozzles, a pure water heating mechanism configured to supply hot pure water, a branch line, a con... | 09/20/2005 |
| 6938626 | Method and apparatus for wet-cleaning substrate An apparatus for wet cleaning a substrate includes a clean air supplier for supplying the clean air into a cleaning draft, a humidifier for supplying steam or mist like water drops into the cleaning draft, a hygrometer, connected to the humidifier and positioned at ... | 09/06/2005 |
| 6854473 | Method and apparatus for executing plural processes on a microelectronic workpiece at a single processing station An apparatus for processing a microelectronic workpiece is set forth. The apparatus comprises a workpiece support adapted to hold the microelectronic workpiece and a processing container adapted to receive the microelectronic workpiece held by the workpiece support.... | 02/15/2005 |
| 6851434 | Composition, apparatus, and method of conditioning scale on a metal surface A composition and apparatus and method for aqueous spray conditioning of scale on metal surfaces. An aqueous solution having a base composition of an alkali metal hydroxide is used. The aqueous solution may contain additives to improve the performance of the salt. I... | 02/08/2005 |
| 6817475 | Multi-stage filter cleaning system with water recycling A system for liquid cleaning a plurality of dirty open-ended cylindrical internal combustion engine paper air filters by subjecting each filter to a cleaning cycle including successive first, intermediate and final cleaning steps. For each step liquid is pumped from... | 11/16/2004 |
| 6807972 | Gutter and splash-guard for protecting a wafer during transfer from a single wafer cleaning chamber A single wafer cleaning chamber that includes a rotatable bracket that can place a wafer beneath an upper end of a catch cup during a wafer cleaning process, a gutter positioned above a wafer transfer slit; where the catch cup can mate with the gutter to create a ga... | 10/26/2004 |
| 6805754 | Device and method for processing substrates A device and method for processing substrates, whereby medium consumption and processing time are reduced. According to the inventive method, liquid is conducted to a surface of the substrate that is to be treated via at least one nozzle that is arranged in a substa... | 10/19/2004 |
| 6732751 | Automatic cleaning apparatus for paint sprayer gun Disclosed herein is an automatic cleaning apparatus for paint sprayer gun comprising a solvent cleaning tank, cleaning tank, and a check valve. The solvent cleaning tank has a pressurized air inlet, the cleaning tank has a plurality of vertically erected first tubes... | 05/11/2004 |
| 6571805 | Multi-container pressure washer and related product selecting valve A pressure washer includes a chassis as well as a liquid pump, a pump-driving prime mover, plural chemical product containers and a product selecting valve, all supported by the chassis. Each of the containers is attached to a separate valve conduit exten... | 06/03/2003 |
| 6516816 | Spin-rinse-dryer An inventive vertical spin-dryer is provided. The inventive spin-dryer may have a shield system positioned to receive fluid displaced from a substrate vertically positioned within the spin-dryer. The shield system may have one or more shields positioned t... | 02/11/2003 |
| 6481447 | Fluid delivery ring and methods for making and implementing the same A fluid delivery module for use in preparing a substrate is provided. The fluid delivery module includes a process bowl designed to contain a substrate to be prepared. The process bowl has a bottom wall and a sidewall. The fluid delivery module further in... | 11/19/2002 |
| 6367490 | Processing apparatus and processing method A processing apparatus is provided for cleaning a wafer W. In the apparatus, a carbonated solution in the form of mist is ejected onto the wafer W through a nozzle 41, so that the film of carbonated solution, i.e., a conductive liquid film is formed on th... | 04/09/2002 |
| 6235125 | Industrial cleaning sponge An industrial sponge device and a method of manufacturing the same. The sponge is made from a polyvinyl acetal material with a process in which the pores are formed by gas to provide an open pore structure having no fibrils. Additionally, the sponge is pu... | 05/22/2001 |
| 6210481 | Apparatus and method of cleaning nozzle and apparatus of processing substrate An apparatus of cleaning a nozzle comprising a mounting table for mounting a substrate to be processed, a process liquid nozzle having a liquid output portion for outputting a process liquid toward the substrate mounted on the table, a nozzle cleaning mec... | 04/03/2001 |
| 6103018 | Method for extracting residue from a sponge material and method of cleaning material with the sponge An industrial sponge device and a method of manufacturing the same. The sponge is made from a polyvinyl acetal material with a process in which the pores are formed by gas to provide an open pore structure having no fibrils. Additionally, the sponge is pu... | 08/15/2000 |
| 6003530 | Automatic and manual washing apparatus, working at variable conditions, for spray guns and their components A washing apparatus for spray guns and their components wherein a washing operation is provided which is realized by feeding clean liquid and air.... | 12/21/1999 |
