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| Number | Title | Issue Date |
| 8161985 | Method and apparatus for cleaning articles used in the production of semiconductors An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid a... | 04/24/2012 |
| 7434588 | Spin cleaning and drying apparatus and method of spin cleaning and drying The present invention provides a spin cleaning and drying apparatus of single-wafer processing type which cleans a substrate with a cleaning liquid from a rinse nozzle while rotating the substrate and dries the substrate after cleaning while rotating the substrate, ... | 10/14/2008 |
| 7422641 | Substrate cleaning apparatus and substrate cleaning method A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea... | 09/09/2008 |
| 7386944 | Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer A method an apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer are provided. In the apparatus for cleaning and drying a wafer, the wafer is dipped into a cleaning solution in a cleaning tank. The wafer is then dried using a drying gas in ... | 06/17/2008 |
| 7383844 | Meniscus, vacuum, IPA vapor, drying manifold A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit region is defined for delivery of a first fluid to wafer of the surface an... | 06/10/2008 |
| 7364625 | Rinsing processes and equipment Described are methods of rinsing and processing devices such as semiconductor wafers wherein the device is rinsed with using a surface tension reducing agent; the method may include a subsequent drying step which preferably incorporates the use of a surface tension ... | 04/29/2008 |
| 7343922 | Wafer drying apparatus A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning ... | 03/18/2008 |
| 7335268 | Inorganic compound for removing polymers in semiconductor processes An inorganic compound for removing polymers after a semiconductor etching process and related methods and apparatus are disclosed. An example compound includes DIW, H2SO4, H2O2 and HF. An example method for removing polyme... | 02/26/2008 |
| 7326305 | System and method for decapsulating an encapsulated object A system and method for the selective etching or removal of encapsulating material from an encapsulated object, such as a semiconductor, includes depositing an encapsulant-removal agent, such as a solvent or acid, onto the surface of the object. A flow of heated gas... | 02/05/2008 |
| 7320328 | Pulsed pressure cleaning apparatus and process An apparatus and process are described delivering alternating pulses of fluid and air within either a fully sealed or partially sealed tooling enclave in the direct presence of a constant or variable vacuum source for the purpose of removing loose as well as attache... | 01/22/2008 |
| 7318870 | Method of cleaning semiconductor substrate A cleaning method for a semiconductor substrate including placing the semiconductor substrate into a cleaning chamber and injecting ozone gas (O3) into the cleaning chamber. This process operates to cleanse the semiconductor substrate without corrosion or... | 01/15/2008 |
| 7314054 | Liquid processing apparatus with nozzle having planar ejecting orifices A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in ... | 01/01/2008 |
| 7293571 | Substrate proximity processing housing and insert for generating a fluid meniscus An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process ... | 11/13/2007 |
| 7282882 | Robot controller A robot control system for simultaneously controlling multi-axial robots each of which has actuators, a standard movement part being set in each of the robots, includes: a single main controller for calculating respective movement positions of the standard moving pa... | 10/16/2007 |
| 7267130 | Substrate processing apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm... | 09/11/2007 |
| 7229521 | Etching system using a deionized water adding device An etching system (3) includes an etching chamber (31), an etchant solution tank (32) connected with the etching chamber, a heater (34) set in the tank, and a deionized water (DIW) adding device. The DIW adding device includes a DIW feedi... | 06/12/2007 |
| 7198055 | Meniscus, vacuum, IPA vapor, drying manifold A head is provided which includes a first surface of the head capable of being in close proximity to the wafer surface, and includes a first conduit region on the head where the first conduit region is defined for delivery of a first fluid to wafer of the surface an... | 04/03/2007 |
| 7165562 | Washing device for a baby bottle The present invention relates to a washing device for a baby bottle. According to the present invention, it is possible to automatically wash a bottle body, a nipple and a nipple cap of the baby bottle, and to dry and sterilize the baby bottle after washing thereof.... | 01/23/2007 |
| 7107701 | Substrate drying method and apparatus There are provided a substrate drying method and apparatus by which an attachment amount of particles to surfaces of substrates can be reduced when the substrates are exposed from pure water, and occurrence of non-uniform drying can be prevented by improving drying ... | 09/19/2006 |
| 7103992 | Industrial dishwasher An industrial dishwashing machine with at least one essentially closed water circuit in which washing water is circulated, and with at least one water inflow which makes rinsing water available which is received into the water circuit after a rinsing operation follo... | 09/12/2006 |
| 7056447 | Semiconductor processing methods Embodiments in accordance with the present invention provide for removing organic materials from substrates, for example substrates employed in the fabrication of integrated circuits, liquid crystal displays and the like. Such embodiments also provide for forming se... | 06/06/2006 |
| 7040328 | Fluid/air burst washing system A combination fluid and air washing apparatus for washing a vehicle's viewing surface. The apparatus includes a housing, a nozzle assembly with at least one fluid nozzle and at least one air nozzle corresponding to each of fluid nozzles. A shaft is pivotally attache... | 05/09/2006 |
| 7021323 | Dust-incompatible article transfer container cleaner To clean the inside and outside of a container capable of containing dust-free objects for carrying, a cleaning apparatus is used within a clean room or a housing in which the cleaning apparatus is installed. The clean room or housing is kept highly cleaned. By the ... | 04/04/2006 |
| 7018528 | Portable purifying system A portable purifying system for improved filtering and/or separating of cleaning solutions such as solvents, particularly those used in parts washers. The purifying system utilizes a removable reservoir to provide a smaller reservoir within a larger reservoir such a... | 03/28/2006 |
| 6955180 | Pipette washer A pipette washer comprising a plurality of cells for receiving pipettes is disclosed. Each of the cells comprises a top opening for receiving pipettes to be washed and a bottom opening. A support member supports the cells with the top opening accessible to receive p... | 10/18/2005 |
| 6901938 | Substrate cleaning apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a gas-liquid mixture by mixing a liquid and a pressurized gas, to discharge the gas-liquid mixture to a substrate at high speeds. The mixture process is conducted in an ope... | 06/07/2005 |
| 6895981 | Cross flow processor A centrifugal processor includes an elongated inlet and outlet in fluid communication with a rotor housing having an eccentric bowl. A rotor having fan blades and adapted to hold flat media is rotatably disposed within the rotor housing. An intake gate is pivotably ... | 05/24/2005 |
| 6837252 | Apparatus for treating a workpiece with steam and ozone In a method for processing a workpiece to remove material from a first surface of the workpiece, steam is introduced onto the first surface under conditions so that at least some of the steam condenses and forms a liquid boundary layer on the first surface. The cond... | 01/04/2005 |
| 6817370 | Method for processing the surface of a workpiece An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus comprises a liquid supply line that is used to provide fluid communica... | 11/16/2004 |
| 6818178 | Method for high vacuum sterilization of closures A heat sterilization process for small, washed, and bagged articles such as vial stoppers includes a conditioning or air removal phase prior to sterilization. During the air removal phase, a substantial majority of the liquid moisture is removed from the bagged arti... | 11/16/2004 |
| 6792693 | Wafer dryer system for PRS wet bench A wafer dryer system which is suitable for drying rinse water from substrates in the event of a system malfunction or failure during or after rinsing of the substrates. The wafer dryer system typically includes a pair of drying chambers, each of which is fitted with... | 09/21/2004 |
| 6790291 | Method of and apparatus for processing substrate In a substrate processing apparatus for use in performing a reduced-pressure pull up drying method, a liquid drainage pipe (46) for draining a drainage liquid containing an organic solvent from a processing chamber (26) including therein a processing b... | 09/14/2004 |
| 6746543 | Apparatus for and method of cleaning objects to be processed A cleaning apparatus and a cleaning method for cleaning a object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 ... | 06/08/2004 |
| 6725868 | Liquid processing apparatus A cleaning processing apparatus, which is one embodiment of a liquid processing apparatus for performing a liquid processing by supplying a predetermined process liquid to a target object to be processed such as a semiconductor wafer while rotating the target object... | 04/27/2004 |
| 6706243 | Apparatus and method for cleaning particulate matter and chemical contaminants from a hand An apparatus has a hand-cleaning volume sized to receive a gloved or ungloved human hand. The apparatus includes a mechanical-cleaning device and a chemical-cleaning device, operated sequentially to remove particles and chemical contaminants such as organics. The me... | 03/16/2004 |
| 6705331 | Substrate cleaning apparatus The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a gas-liquid mixture by mixing a liquid and a pressurized gas, to discharge the gas-liquid mixture to a substrate at high speeds. The mixture process is conducted in an ope... | 03/16/2004 |
| 6601594 | Apparatus and method for delivering a treatment liquid and ozone to treat the surface of a workpiece An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus comprises a liquid supply line that is used to provide flui... | 08/05/2003 |
| 6591845 | Apparatus and method for processing the surface of a workpiece with ozone An apparatus for supplying a mixture of a treatment liquid and ozone for treatment of a surface of a workpiece, and a corresponding method are set forth. The preferred embodiment of the apparatus comprises a liquid supply line that is used to provide flui... | 07/15/2003 |
| 6575178 | Cleaning and drying method and apparatus An enclosure 23A that defines a drying chamber 23 is configured of a pair of enclosing elements 23c and 23d and a base element 23b. When wafers enter or leave the drying chamber 23, the enclosing elements 23c and 23d are lifted upward by vertical air cyli... | 06/10/2003 |
| 6491045 | Apparatus for and method of cleaning object to be processed A method for cleaning an object to be processed in which the atmosphere in a drying chamber is replaced by an inert gas prior to placing an object to be cleaned from an external environment into the chamber. The object is then transported by an elongated ... | 12/10/2002 |
