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Class 134/102.1 - Having steam, air or gas applying conduit


Subclass of Class 134 - Cleaning and liquid contact with solids
Definition: Apparatus wherein one of the fluids being applied to the
No. of patents: 313
Last issue date: 03/13/2012


1                
NumberTitleIssue Date
8132580Substrate processing system and substrate cleaning apparatus including a jetting apparatus
A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined processing on the substrate. A substrate cleaning apparatus cleans the...
03/13/2012
7946299Spray jet cleaning apparatus and method
A spray cleaning device having an atomizing unit with at least one gas passage and at least one cleaning fluid passage converging into a atomizing area. The gas flowing though the gas passage and the cleaning fluid flowing through the cleaning fluid passages combine...
05/24/2011
7614411Controls of ambient environment during wafer drying using proximity head
A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substr...
11/10/2009
7467634No contact spray apparatus cleaning device
The invention is an automatic no contact machine for cleaning and drying tips, air caps, retainers and cups on spray apparatus when changing liquid or when the apparatus will be idle, or to remove build up of paint on applicators that cause spits and drips on surfac...
12/23/2008
7422641Substrate cleaning apparatus and substrate cleaning method
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea...
09/09/2008
7392814Substrate processing apparatus and method
Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Furth...
07/01/2008
7367346Method for cleaning hollow tubing and fibers
Hollow porous fibers containing adhered contaminants are cleaned to remove the contaminants by backflushing a liquid to fill the pores, and adding a flow of gas so as to form a two-phase mixture of gas and bubbles of liquid that can scrub the fibers, loosening the c...
05/06/2008
7364626Substrate processing apparatus and substrate processing method
Substrate cleaning apparatus and method capable of preventing adhesion of particles to a substrate irrespective of being hydrophilic or hydrophobic are provided. Although a cleaning liquid ejected from a two-fluid nozzle 36 rebounds from a cup CP and scatters...
04/29/2008
7360546Cleaning apparatus for semiconductor wafer
A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, th...
04/22/2008
7350528Warewash machine with moveable table and multi-position rack support track
A warewash machine includes a housing at least in part defining a washing chamber having an access opening and a door mounted for movement between a closed position for washing and an open position for inlet/outlet of wares through the access opening. At least one n...
04/01/2008
7343922Wafer drying apparatus
A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning ...
03/18/2008
7341641Bonding device for manufacturing liquid crystal display device
A bonding device for manufacturing a liquid crystal display device includes a bonding chamber for bonding first and second substrates and an ionizing device for introducing ionized gas or air into the bonding chamber. ...
03/11/2008
7337663Sonic energy process chamber
A system for processing a workpiece includes a base having a bowl or recess for holding a processing fluid. A sonic energy source, such as a megasonic transducer, provides sonic energy into a processing fluid in the bowl. A process head holds a workpiece. A process ...
03/04/2008
7332054Etch apparatus
In a process using a hot phosphoric acid etchant (12) to etch silicon nitride on a semiconductor wafer (15) submerged in a tank (11) of the etchant (12), a recirculating path is established for the etchant (12). A porous filter (
02/19/2008
7326305System and method for decapsulating an encapsulated object
A system and method for the selective etching or removal of encapsulating material from an encapsulated object, such as a semiconductor, includes depositing an encapsulant-removal agent, such as a solvent or acid, onto the surface of the object. A flow of heated gas...
02/05/2008
7320328Pulsed pressure cleaning apparatus and process
An apparatus and process are described delivering alternating pulses of fluid and air within either a fully sealed or partially sealed tooling enclave in the direct presence of a constant or variable vacuum source for the purpose of removing loose as well as attache...
01/22/2008
7314054Liquid processing apparatus with nozzle having planar ejecting orifices
A liquid processing apparatus includes containers 26, 27, 26a, 26b surrounding processing chambers 51, 52 for accommodating a plurality of wafers W and nozzles 54, 56 for supplying a processing liquid to the substrates W in ...
01/01/2008
7314529Substrate cleaning apparatus and substrate cleaning method
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During clea...
01/01/2008
7284560Liquid processing apparatus
A liquid processing apparatus has a substrate rotating device including a holder for holding a substrate and a motor, a chamber for applying the liquid processing to the substrate, a posture changing mechanism for changing the posture of the substrate rotating devic...
10/23/2007
7278433Washing a cored lettuce head
A produce washer includes a holder to position a single piece of produce and a nozzle disposed at a horizontal distance adjacent to the holder. When the produce is a cored lettuce head, the cored lettuce head is positioned in the holder with the cored portion facing...
10/09/2007
7278434Cleaning device with toggle for increasing ozone dissolution in water for cleaning vegetables and fruits
A cleaning device with a toggle serves for increasing ozone dissolution in water for cleaning vegetables and fruits. The cleaning device is placed in a washing barrel. The cleaning device comprises a toggle being a circular body which is installed with at least one ...
10/09/2007
7278452Filler for filling drink liquid
The drink liquid, such as beer, soft drink, etc., stayed in stay portion 5 of filler during the filling operation is recovered without dropping of the quality. The filler is composed of cylinder rod 4 connected to the cap 3 of container 2...
10/09/2007
7275553Liquid processing apparatus and liquid processing method
A cleaning processing apparatus comprises a spin chuck for holding a wafer W, an under plate being positioned to face the back surface of the wafer W with a prescribed gap provided therebetween, a support member for supporting the under plate, and a nozzle hole form...
10/02/2007
7270136Apparatus for cleaning the edges of wafers
The invention concerns an apparatus for cleaning the edge of a wafer that may be relatively simply constructed with low cost, and prevent the wafer from being re-contaminated by the edge cleaning, thus resulting in increase of the yield rate of wafers. The apparatus...
09/18/2007
7267130Substrate processing apparatus
The substrate processing apparatus is provided with a gas-liquid mixing nozzle for generating a process liquid mist by mixing a liquid and a pressurized gas, to discharge the process liquid mist to a substrate at high speeds. The liquid may be remover liquid, interm...
09/11/2007
7264009Cleaning system and method of use
A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably suppo...
09/04/2007
7262140Method of smoothing waveguide structures
A semiconductor based structure containing substantially smoothed waveguides having a rounded surface is disclosed, as well as methods of fabricating such a structure. The substantially smoothed waveguides may be formed of waveguide materials such as amorphous silic...
08/28/2007
7258749Wash fluid containment system
A wash fluid containment system includes an elevated, fluid impervious surface upon which items to be washed are placed for washing. The surface is configured to cause wash fluid to flow to an edge of the surface and off of the surface to prevent buildup of wash flu...
08/21/2007
7257319Jewelry cleaning device
A jewelry cleaning device which emits a jet of steam under manually operable control means for the cleansing of various types of small items including jewelry, coins, trinkets, or the like. The jewelry cleaning device of the present invention is lightweight and rela...
08/14/2007
7246626Sanitation system for refrigerated fixture having an air curtain
A sanitation system for a refrigerated fixture having an air curtain. This sanitation includes a spray manifold positioned in a case tank of the refrigerated fixture. A reservoir is provided which is adapted to contain disinfectant. A pump is provided to pump disinf...
07/24/2007
7240681Trailer mounted mobile apparatus for dewatering and recovering formation sand
An apparatus for removing formation sand from an oil storage tank. The apparatus is mounted to a truck towable trailer so that it may be transported to remote sites. Mounted to the truck towable trailer is a container adapted to accept and dewater a sand-water slurr...
07/10/2007
7237562Substrate processing apparatus and control method of inert gas concentration
Provided is a substrate processing apparatus capable of supplying pure water that is stabilized with respect to the concentration of nitrogen gas. First and second nitrogen concentration meters to measure the nitrogen gas concentration of pure water are respectively...
07/03/2007
7235066Fluid containment device
A wound irrigation/fluid containment system having a flexible bag body defining a containment space, the bag body including walls and at least one opening with a seal, means for accessing through the bag body walls to the containment space and means for inflating po...
06/26/2007
7219676Substrate detecting apparatus
A substrate cleaning apparatus includes a bath in the form of a vessel filled with a cleaning liquid, a substrate guide disposed on the bottom of the vessel and configured to support at least one substrate vertically, a first sensing unit for sensing the substrate(s...
05/22/2007
7216654Dishwasher
A dishwasher having a dishwasher is provided in which an intake port cover for closing a steam intake port is mechanically operated. The dishwasher has a cavity enclosed in part by a door, and a fan motor which drives a fan installed at an upper portion of the door....
05/15/2007
7199711Mobile floor cleaner data communication
In a method of communicating data from a mobile floor cleaner to a remote receiver a data communication is initiated from a communicator of the mobile floor cleaner to the remote receiver and data is communicated to the remote receiver with the communicator. ...
04/03/2007
7198003Milking arrangement
The present invention refers to an arrangement and a method for milking of animals. The arrangement includes a number of milking stations (1), a central milk-receiving unit (30–32), and a transport conduit (15). Each milking station (1)...
04/03/2007
7191785Substrate processing apparatus for resist film removal
Semiconductor wafers are cleaned by placing the semiconductor wafers in a processing vessel, forming a pure water film on the surfaces of the wafers, forming an ozonic water film by dissolving ozone gas in the pure water film, and removing resist films formed on the...
03/20/2007
7179390Method of filtering a fluid and remote filtering station
Filtering of an operating fluid of a mechanical device is performed utilizing a pumping device of the mechanical device which routinely circulated the operating fluid within the mechanical device. A remote filtering station of the present invention has a first condu...
02/20/2007
7172657Cleaning method of treatment equipment and treatment equipment
In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroaceticacid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and ...
02/06/2007
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