Did You Know...
...that two musicians were responsible for the invention of color print film? Fascinated by photography, Leopold Godowsky and Leopold Mannes worked together to produce an easy-to-use, practical color film. They worked full time as music teachers and gave concerts while experimenting during their off hours in Mannes' kitchen. Their success earned them full-time, well-paying jobs at Kodak and their efforts resulted in Kodachrome film, which was introduced in 1935.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8182609 | Apparatus and method for direct surface cleaning The present invention provides a method for cleaning a surface of a substrate that includes directing a laser towards at least one radiation-produced particle disposed on a substrate, generating a thermal increase in the particle and removing the particle from the s... | 05/22/2012 |
| 8172951 | Method of cleaning with an aqueous composition containing a semiconductor The use of an aqueous composition comprising a semiconductor as cleaning agent for surfaces in the outdoors field and indoors field is proposed. ... | 05/08/2012 |
| 8163093 | Cleaning operations with dwell time Methods of cleaning one or more workpieces are described. A method includes oscillating workpieces while performing a cleaning operation (e.g., sonication, rinse, etc.) and dwelling the workpieces at one or more oscillation positions (e.g., an upper oscillation posi... | 04/24/2012 |
| 8152928 | Substrate cleaning method, substrate cleaning system and program storage medium A substrate cleaning method can uniformly removing particles from substrates at a high removing efficiency. The substrate cleaning method includes the steps of immersing substrates W in a cleaning liquid in a cleaning tank 12, and generating ultrasonic waves ... | 04/10/2012 |
| 8088227 | Method and apparatus for the treatment of objects, in particular for the cleaning of semiconductor elements The invention relates to the continuous cleaning of objects, in particular of semiconductor elements, using ultrasound, wherein the objects to be cleaned are arranged within a liquid. Furthermore, the present invention relates to an apparatus for carrying out the me... | 01/03/2012 |
| 8083856 | Ultrasonic cleaning apparatus and ultrasonic cleaning method An ultrasonic cleaning apparatus having at least a cleaning tank; an ultrasonic wave transmitting tank; a vibrating plate placed at a bottom portion of the ultrasonic wave transmitting tank, the vibrating plate superposing the ultrasonic waves on the transmitting wa... | 12/27/2011 |
| 8070881 | Systems and strippable coatings for decontaminating structures that include porous material Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material fr... | 12/06/2011 |
| 8052797 | Method for removing foreign matter from substrate surface A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which includes applying a light beam in a wavelength range which makes the light a... | 11/08/2011 |
| 8048232 | Cleaning method and system utilizing microcapsules A cleaning method uses a cleaning agent in which microcapsules are dispersed therein. Each of the microcapsules encapsulates a gas precursor, which is capable of undergoing a phase transition to a gas phase by application of ultrasonic wave energy. In the cleaning m... | 11/01/2011 |
| 8048231 | Handheld sterilization device Embodiments of the disclosed technology comprise a handheld cleaning device that sanitizes an item to be cleaned by, in a single action, dispensing ozone and ultrasonic wave cavitations in an aqueous medium that contains the object to be cleaned. The handheld device... | 11/01/2011 |
| 8007593 | Remover compositions A remover composition containing 1,3-propanediamine (a), 1-hydroxyethylidene-1, 1-diphosphonic acid (b) and water, wherein the remover composition contains the component (a) in an amount of from 0.2 to 30% by weight, the component (b) in an amount of from 0.05 to 10... | 08/30/2011 |
| 8002897 | At-home integrated cleaning and disinfection system and method for dental hardware An at-home integrated cleaning and disinfection system for dental hardware, for consumer use includes a compact and portable base unit sized for at-home use by a consumer, the base unit including a holding frame and an ultraviolet lamp. The system also includes a cl... | 08/23/2011 |
| 7993464 | Apparatus and method for indirect surface cleaning A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direc... | 08/09/2011 |
| 7942973 | Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses A method for cleaning an electrode assembly comprising a backing plate bonded to an electrode plate for a plasma processing assembly, the method including the steps of contacting the backing plate and electrode plate with a solvent; spraying the backing plate and el... | 05/17/2011 |
| 7935191 | Controlling accumulation of select adsorbers on a piezoelectric cantilever sensor The techniques described herein are directed to removing material that has attached to or preventing material from attaching to the surface of a piezoelectric cantilever. The material can be a target material, other, non-target, material that may be weakly bound or ... | 05/03/2011 |
| 7922822 | Method for cleaning and sterilizing endoscopic camera A cleaning and sterilizing method for removing organic matter adhered to the surface of an endoscopic camera instrument, and effectively exhibiting bacteria-killing and virus-killing effects of acidic water uses, as a cleaning bath, an alkaline-water-producing elect... | 04/12/2011 |
| 7896969 | Methods and systems for enhancing the effectiveness of cleaning compositions The present invention provides inexpensive, safe and reliable methods and systems for enhancing the effectiveness of aqueous or non-aqueous, concentrated or non-concentrated, cleaning compositions, such as concentrated cleaning liquids, by “energizing” all, or a... | 03/01/2011 |
| 7887636 | Substrate dryer and a drying method A substrate dryer includes, among other things, means for generating isopropyl alcohol bubbles, and a vibrator to atomize stored isopropyl alcohol. A heater may be provided to heat pumped isopropyl alcohol, as wells as a spray nozzle to spray the heated IPA to the v... | 02/15/2011 |
| 7875120 | Method of cleaning an industrial tank using electrical energy and critical fluid A method of cleaning an industrial tank using electrical energy and critical fluid comprises the steps of transmitting electrical energy into an industrial tank to a first predetermined temperature, providing a critical fluid with a reactant or catalyst into the tan... | 01/25/2011 |
| 7867336 | Cleaning wastewater holding tanks Vibrators, each comprising an electric motor having an eccentric weight on its rotating shaft, are adhesively secured to the bottoms of the wastewater holding tanks of a recreational vehicle, to aid in flushing the tanks by dislodging solid debris from the inside wa... | 01/11/2011 |
| 7846257 | Method for cleaning substrate processing apparatus, substrate processing apparatus, program and recording medium having program recorded therein The substrate processing apparatus includes a plurality of processing chambers. A given processing chamber is cleaned by first executing first processing during which voltage application control is executed to control a voltage applied to an electrostatic chuck base... | 12/07/2010 |
| 7833357 | Methods for removing contaminant matter from a porous material Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material fr... | 11/16/2010 |
| 7828901 | Method and apparatus to detect nanometer particles in ultra pure liquids using acoustic microcavitation An apparatus to produce acoustic cavitation by controlling cavitation events in a liquid insonification medium utilizing a waveform to excite a transducer with a series of bipolar inharmonic tone bursts having medium recovery intervals between respective bursts so t... | 11/09/2010 |
| 7819978 | Diesel particulate filter cleaning apparatus and method A diesel particulate filter of a motor vehicle is cleaned of diesel particulate material like ash and possibly soot, typically using equipment already available in a service shop following the method and diesel particulate filter cleaning apparatus of the invention.... | 10/26/2010 |
| 7799136 | Method of cleaning at least one surface of an optical device disposed in a vacuum chamber A method of cleaning at least one surface of an optical device disposed in a vacuum chamber, which is at least partially contaminated by atoms and/or ions of metalloid and/or metal introduced by a radiation source generating, such as extreme ultraviolet radiation an... | 09/21/2010 |
| 7799137 | Resonant frequency bottle sanitation A system and method of cleaning an enclosure of a container defined by inner walls, including providing a container, orienting the container so that the opening is lowermost and opens downwardly and generating resonant vibration in the container at a predetermined f... | 09/21/2010 |
| 7789964 | Method for cleaning a surface of a photomask A method of cleaning a surface of a photomask by removing contaminants from its surface that includes placing the photomask in a vessel, which is held under an elevated pressure and feeding a supercritical fluid, in particular, CO2 in a supercritical stat... | 09/07/2010 |
| 7789965 | Method of cleaning UV irradiation chamber A method of cleaning a UV irradiation chamber includes steps of: (i) after completion of irradiating a substrate with UV light transmitted through an optical transmitted window provided in the UV irradiation chamber, generating radical species of a cleaning gas outs... | 09/07/2010 |
| 7771540 | System for cleaning dental and/or medical appliances and implements utilizing a sonic wave bath A cleaning apparatus and method for cleaning dental and/or medical implements, and in particular to a system for quickly and thoroughly cleaning dental and/or orthodontic retainers, dental/orthodontic aligners, dental appliances, dentures, bridges, and the like. The... | 08/10/2010 |
| 7691206 | Wafer cleaning process The invention is directed to a wafer cleaning process for being applied on a wafer after an etching process is performed on the wafer, wherein the wafer has a wafer center, a wafer radius and a wafer circumference. The wafer cleaning process comprises a step of disp... | 04/06/2010 |
| 7682457 | Frontside structure damage protected megasonics clean An apparatus and method for removing contaminants from a workpiece is described. Embodiments of the invention describe placing a workpiece on a holding bracket within a process chamber to hold and rotate the workpiece to be cleaned. A first cleaning fluid is provide... | 03/23/2010 |
| 7682456 | Substrate treatment method and substrate treatment apparatus A substrate treatment method is disclosed, which can effectively reduce the amount of charges accumulated on a substrate due to treatment of the substrate with a water-containing liquid. The method comprises the steps of: supplying a water-containing liquid to a sub... | 03/23/2010 |
| 7662236 | Method for forming insulation film In a process involving the formation of an insulating film on a substrate for an electronic device, the insulating film is formed on the substrate surface by carrying out two or more steps for regulating the characteristic of the insulating film involved in the proc... | 02/16/2010 |
| 7662235 | Method of cleaning etching apparatus To provide a cleaning method for an etching apparatus for a metal film that efficiently removes an etching residue deposited in an etching process chamber, assures the reproducibility of the etching performance, and keeps the etching process chamber in a low-dust-em... | 02/16/2010 |
| 7648582 | Cleaning of electrostatic chucks using ultrasonic agitation and applied electric fields A method of cleaning an ESC comprises immersing a ceramic surface of the ESC in dielectric fluid; spacing the ceramic surface of the ESC apart from a conductive surface such that the dielectric fluid fills a gap between the ceramic surface of the ESC and the conduct... | 01/19/2010 |
| 7648580 | Substrate processing method and substrate processing device A processing tank 10 is divided into a washing section 15 and a drying section 30, a clearance is formed in the joint between the sections, and the clearance is communicated with by sink 29. In drying a substrate, the substrate is moved f... | 01/19/2010 |
| 7648581 | Substrate cleaning method, substrate cleaning apparatus, substrate processing system, substrate cleaning program and storage medium In a substrate cleaning method for cleaning a backside of a substrate on a surface of which a predetermined processing is performed, a two phase substance contacts the backside of the substrate, and a flow of the substance is generated near the backside of the subst... | 01/19/2010 |
| 7645343 | Uniform cavitation for particle removal Systems and methods for promoting a substantially uniform cavitation field. With system (100) including a diaphragm (109) dividing a container (103), a second energy pulse corresponding to a first energy pulse arising from collapse of a cavity C... | 01/12/2010 |
| 7632357 | Silicon wafer cleaning method A silicon wafer cleaning method, comprising a first cleaning process, in which, after completion of mirror polishing of the surface, the silicon wafer is immersed in a non-ionic surfactant aqueous solution; a second cleaning process, in which the wafer, after comple... | 12/15/2009 |
| 7628864 | Substrate cleaning apparatus and method A substrate cleaning apparatus includes a chamber for accommodating a substrate; a mounting table, disposed in the chamber, for mounting thereon the substrate; an electrode disposed in the mounting table, the substrate being attracted and held on the mounting table ... | 12/08/2009 |
