Bizarre Patents
Mouse device with a built-in printer
A mouse device for use as an input device of a computer is provided that includes a housing in which recording paper is loadable, and a printer unit provided within the housing for printing on the recording paper print information received from the computer.
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| Number | Title | Issue Date |
| 7049164 | Microelectronic mechanical system and methods The current invention provides for encapsulated release structures, intermediates thereof and methods for their fabrication. The multi-layer structure has a capping layer, that preferably comprises silicon oxide and/or silicon nitride, and which is formed over an et... | 05/23/2006 |
| 7047984 | Device and method for cleaning articles used in the production of semiconductor components A cleaning device for use in the production of semiconductor components comprises two feed devices with which a fluid medium is guided across a respective surface of an object to be cleaned so that different faces of the object are simultaneously cleaned. At least t... | 05/23/2006 |
| 7049275 | Photoresist stripping composition and cleaning composition The photoresist stripping composition of the present invention contains at least one oxymethylamine compound represented by the following formula 1: wherein R1 to R3 are as defined in the sp... | 05/23/2006 |
| 7045019 | Method for performing site-specific backside particle and contamination removal An invention is disclosed for backside particle removal during a semiconductor manufacturing process. Cleaning sites are defined on the backside of a wafer. The cleaning sites are regions of the backside of the wafer that physically contact a chuck during a semicond... | 05/16/2006 |
| 7044143 | Detergent injection systems and methods for carbon dioxide microelectronic substrate processing systems Microelectronic substrate processing systems include a microelectronic substrate processing chamber that is configured to contain therein at least one microelectronic substrate. A carbon dioxide supply system is configured to supply densified carbon dioxide to the m... | 05/16/2006 |
| 7044662 | Developing photoresist with supercritical fluid and developer An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced ... | 05/16/2006 |
| 7045017 | Method for post chemical-mechanical planarization cleaning of semiconductor wafers The inventive method cleans residual titanium accumulations and other undesirable materials from a planarized surface of a wafer to produce a planarized surface with less than about fifty defects per wafer. After a metallic layer of material has been planarized usin... | 05/16/2006 |
| 7045018 | Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same A method for cleaning and drying a front and a back surface of a substrate is provided. The method includes brush scrubbing the back surface of the substrate using a brush scrubbing fluid chemistry. The method further includes applying a front meniscus onto the fron... | 05/16/2006 |
| 7042611 | Pre-deflected bias ribbons A modulator for and a method of modulating an incident beam of light including means for supporting a plurality of active elements and a plurality of bias elements, each active and bias element including a light reflective planar surface with the light reflective pl... | 05/09/2006 |
| 7041580 | Laser annealing method and laser annealing device A laser-annealing method includes the steps of a first step of cleaning a non-monocrystal silicon film formed on a substrate, and a second step of laser-annealing the non-monocrystal silicon film in an atmosphere containing oxygen therein, wherein the first and seco... | 05/09/2006 |
| 7040330 | Method and apparatus for megasonic cleaning of patterned substrates A system for cleaning a semiconductor substrate is provided. The system includes transducers for generating acoustic energy oriented in a substantially perpendicular direction to a surface of a semiconductor substrate and an acoustic energy oriented in a substantial... | 05/09/2006 |
| 7040332 | Method and apparatus for megasonic cleaning with reflected acoustic waves A system for cleaning a substrate includes a tank defining an inner cavity between a base and sidewalls extending therefrom. A source of acoustic energy affixed to an outer surface of one of the sidewalls. The tank is configured to decouple a direction associated wi... | 05/09/2006 |
| 7041562 | Method for forming multiple gate oxide thickness utilizing ashing and cleaning Embodiments of the present invention relate to semiconductor structures having multiple gate dielectric structures. One embodiment forms semiconductor devices in multiple regions having different dielectric thicknesses where the interface between the gate dielectric... | 05/09/2006 |
| 7037852 | Composition for stripping photoresist and method of preparing the same A composition for stripping photoresist, methods of preparing and forming the same, a method of manufacturing a semiconductor device using the composition, and a method of removing a photoresist pattern from an underlying layer using the composition, where the compo... | 05/02/2006 |
| 7033068 | Substrate processing apparatus for processing substrates using dense phase gas and sonic waves Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a ... | 04/25/2006 |
| 7032269 | Brush scrubbing-high frequency resonating substrate processing system A substrate processing system is provided. The substrate processing system comprises a brush assembly that includes a core, a transducer, and a brush. The core is configured to include a plurality of orifices extending from a center of the brush core to an outer sur... | 04/25/2006 |
| 7033946 | Plasmaless dry contact cleaning method using interhalogen compounds A method of removing an oxide layer from an article. The article may be located in a reaction chamber into which an interhalogen compound reactive with the oxide layer is introduced. A temperature of the reaction chamber may be modified so as to remove the oxide lay... | 04/25/2006 |
| 7033978 | Post-planarization clean-up Cleaning solutions for removing residuals from the surface of an integrated circuit device. Such cleaning solutions find particular application in the fabrication of a dual damascene structure following removal of excess portions of a silver-containing metal layer f... | 04/25/2006 |
| 7029374 | Method for cleaning semiconductor wafers A method for cleaning a surface of semiconductor wafer after chemical mechanical polishing in accordance with the present invention comprises the steps of: (1) providing a semiconductor wafer having a surface to be treated; (2) applying a photocatalyst containing so... | 04/18/2006 |
| 7029536 | Processing system and method for treating a substrate A processing system and method for chemical oxide removal (COR), wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and second treatment chambers are coupled to one another. The first treatment chamber... | 04/18/2006 |
| 7029539 | Angular spin, rinse, and dry module and methods for making and implementing the same A method for processing a wafer in a spin, rinse, and dry (SRD) module is provided. The method includes engaging a wafer in a process plane, spinning the wafer in the process plane, and cleaning a top surface and a bottom surface of the wafer while spinning the wafe... | 04/18/2006 |
| 7029798 | Ultrasonic agitation-assisted development of resist layer of master stamper/imprinter A method of forming a topographical pattern in a surface of a resist layer, comprising sequential steps of: (a) providing a substrate having a surface; (b) forming a desired thickness resist material layer on the s... | 04/18/2006 |
| 7030008 | Techniques for patterning features in semiconductor devices Techniques for semiconductor processing are provided. In one aspect, a method for patterning one or more features in a semiconductor device comprises the following step. At least one critical dimension of the one or more features is reduced during etching of the ant... | 04/18/2006 |
| 7025831 | Apparatus for surface conditioning Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes reactive gas. The apparatus includes a support for supporting the substrate in the cham... | 04/11/2006 |
| 7027202 | Silicon substrate as a light modulator sacrificial layer An optical MEM device is fabricated with a patterned device layer formed on a silicon wafer. Preferably, the patterned device layer is patterned with plurality of ribbons and/or access trenches. The central portion of the ribbon is released from the silicon wafer us... | 04/11/2006 |
| 7022610 | Wet cleaning method to eliminate copper corrosion A method for cleaning semiconductor substrates includes a DI water clean operation that uses a spin speed no greater than 350 rpm. The cleaning method may include additional cleaning operations such as an organic clean, an aqueous chemical clean or a DI water/ozone ... | 04/04/2006 |
| 7022193 | Apparatus and method for treating surfaces of semiconductor wafers using ozone An apparatus and method for treating surfaces of semiconductor wafers with a reactive gas, such as ozone, utilizes streams of gaseous material ejected from a gas nozzle structure to create depressions on or holes through a boundary layer of processing fluid formed o... | 04/04/2006 |
| 7022608 | Method and composition for the removal of residual materials during substrate planarization A method, composition, and computer readable medium for planarizing a substrate. In one aspect, the composition includes one or more chelating agents and ions of at least one transition metal, one or more surfactants, one or more oxidizers, one or more corrosion inh... | 04/04/2006 |
| 7021319 | Assisted rinsing in a single wafer cleaning process The present invention is a method of assisting the rinsing of a wafer in a single wafer cleaning apparatus. According to the present invention, after exposing a wafer to a cleaning and/or etching solution, the cleaning or etching solution is removed from the wafer b... | 04/04/2006 |
| 7021320 | Method of removing a via fence A method of fabricating a dual damascene structure includes etching a via through a first dielectric layer above a substrate, a barrier layer on the first dielectric layer, and a second dielectric layer on the barrier layer. The via is at least partially filled with... | 04/04/2006 |
| 7019440 | Ultrasonic cleaning tank An ultrasonic cleaning tank for use in cleaning electronic parts having a top portion and a bottom portion operably divided by a perforated dispersion plate. The cleaning tank is assembled to avoid internal projections or obstructions within the top portion to creat... | 03/28/2006 |
| 7020876 | Campaign management for batch processes A campaign management technique for batch processes enables a process control system user to flexibly create, edit and execute batch process campaigns. The campaign management technique uses a campaign management function that sends messages requesting batch informa... | 03/28/2006 |
| 7017597 | Megasonic cleaning apparatus for fabricating semiconductor device A megasonic cleaning apparatus is provided for removing contamination particles on a wafer. The megasonic cleaning apparatus includes a piezoelectric transducer and an energy transfer rod. The piezoelectric transducer is for generating megasonic energy. The energy t... | 03/28/2006 |
| 7018552 | Method of manufacturing electronic device A method of manufacturing an electronic device comprises forming a wiring material layer made of aluminum or an aluminum alloy on the surface of an insulating film on a substrate, patterning the wiring material layer by a reactive ion etching treatment with a resist... | 03/28/2006 |
| 7018554 | Method to reduce stacking fault nucleation sites and reduce forward voltage drift in bipolar devices A method is disclosed for preparing a substrate and epilayer for reducing stacking fault nucleation and reducing forward voltage (Vf) drift in silicon carbide-based bipolar devices. The method includes the steps of etching the surface of a silicon carbide... | 03/28/2006 |
| 7014537 | Method of processing a semiconductor substrate A post-CMP cleaning process includes brush cleaning a CMPed surface, followed by at least partially drying the CMPed surface, followed by spray cleaning the CMPed surface. A method of cleaning residue from registration alignment markings formed on a semiconductor su... | 03/21/2006 |
| 7015119 | Fabrication method of semiconductor integrated circuit device A method of fabrication of a semiconductor integrated circuit device, calls for disposing, in an ultrapure water preparing system, UF equipment having therein a UF module which has been manufactured by disposing, in a body thereof, a plurality of capillary hollow fi... | 03/21/2006 |
| 7012051 | Inhibition of titanium corrosion A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: ... | 03/14/2006 |
| 7009141 | Rotary scanning laser head with coaxial refractive optics A rotary refractive laser scanner head uses two sets of lenses and prisms aligned along a common optical axis. Each prism is paired with one of the lenses. The lens-prism pairs are separately mounted rotatable on a common axis coaxial with the optical axis. A motor ... | 03/07/2006 |
| 7004016 | Probe system for ultrasonic processing tank The invention provides systems, methods and apparatus for processing delicate parts within a process tank such as an ultrasonic tank. Typically, one or more transducers connect to the tank and respond to drive signals from a generator to produce ultrasound within pr... | 02/28/2006 |
