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...Daniel Webster invented a "bull plow" to pull out tree stumps. It didn't catch on because it was huge and required four oxen to pull it!
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| Number | Title | Issue Date |
| 8163095 | Composition for stripping and stripping method The present invention provides a stripping composition and a stripping method capable of easily stripping a color resist or an organic insulating film formed on a substrate to reuse the substrate when defects are found during a process of forming the color filter or... | 04/24/2012 |
| 8147615 | Method of fabricating semiconductor cleaners A method of manufacturing cleaning solvents is provided. The method includes selecting a small plurality of test solvents from a large plurality of perspective solvents. The equilibrium composition of a multi-component solution is preferably described by the Hansen ... | 04/03/2012 |
| 8137472 | Semiconductor process A semiconductor process is provided. First, a metal layer, a dielectric layer and a patterned hard mask layer are sequentially formed on a substrate. Thereafter, a portion of the dielectric layer is removed to form an opening exposing the metal layer. Afterwards, a ... | 03/20/2012 |
| 8097089 | Methods for cleaning process kits and chambers, and for ruthenium recovery A method is provided for recovering a metal from electronic device deposition equipment including: providing deposition equipment wherein the deposition equipment is at least partially coated with a deposited metal; blasting the deposition equipment with a grit to r... | 01/17/2012 |
| 8092760 | Scanning arm for semiconductor wafer pollutant measurement apparatus and scanning device using the same Provided is a scanning arm which moves to collect pollutants on the surface of a semiconductor wafer, for use in a semiconductor wafer pollutant measurement apparatus, and a scanning device using the same. The scanning arm includes: an X-axis portion; a Z-axis porti... | 01/10/2012 |
| 8083857 | Substrate cleaning method and substrate cleaning apparatus The present invention provides a substrate cleaning method capable of reducing non-uniformity of a removal efficiency of particles between lots with a simple procedure. The substrate cleaning method comprises: a step of supplying a gas into a cleaning tank, while an... | 12/27/2011 |
| 8075695 | Apparatus, circuitry, signals, probes and methods for cleaning and/or processing with sound The invention utilizes single and multiple frequency ultrasound generators driving single and multiple frequency resonant and harmonic transducer arrays at frequencies into the megasonic range. Generator signals that increase cavitation efficiency improve the perfor... | 12/13/2011 |
| 8062429 | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or m... | 11/22/2011 |
| 8043435 | Cleaning liquid and cleaning method for electronic material A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method ena... | 10/25/2011 |
| 7981221 | Rheological fluids for particle removal Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided. ... | 07/19/2011 |
| 7976637 | Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method A substrate processing system which enables a minute pieces of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out pre... | 07/12/2011 |
| 7976638 | High negative zeta potential polyhedral silsesquioxane composition and method for damage free semiconductor wet clean A composition for removing particulate matter from integrated circuit substrates, including (a) one or more metal ion-free base; (b) a water-soluble metal ion-free onium salt of a polyhedral silsesquioxane; (c) an oxidizing agent; and (d) metal ion-free water, and a... | 07/12/2011 |
| 7959738 | Method of removing photoresist and method of manufacturing a semiconductor device A method of removing a photoresist may include permeating supercritical carbon dioxide into the photoresist on a substrate having a conductive structure including a metal. The photoresist permeating the supercritical carbon dioxide may be easily removable. The photo... | 06/14/2011 |
| RE42420 | Liquid feed nozzle, wet treatment apparatus and wet treatment method The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other end... | 06/07/2011 |
| 7922823 | Compositions for processing of semiconductor substrates Compositions useful in microelectronic device manufacturing for surface preparation and/or cleaning of wafer substrates such as microelectronic device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be fu... | 04/12/2011 |
| 7922824 | Oxidizing aqueous cleaner for the removal of post-etch residues An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least... | 04/12/2011 |
| 7918941 | Cleaning composition The present invention relates to a cleaning agent composition for use in cleaning a substrate for recording media, a substrate for photomask, or a substrate for flat panel display, a surface of which at least contains a metallic or glassy substrate moiety, the clean... | 04/05/2011 |
| 7914624 | Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substr... | 03/29/2011 |
| 7909934 | Megasonic cleaning efficiency using auto-tuning of a RF generator at constant maximum efficiency A system and method of cleaning a substrate includes a megasonic chamber that includes a transducer and a substrate. The transducer is being oriented toward the substrate. A variable distance d separates the transducer and the substrate. The system also includes a d... | 03/22/2011 |
| 7896970 | Semiconductor substrate cleaning liquid and semiconductor substrate cleaning process A semiconductor substrate cleaning liquid composition is provided that includes one or more types selected from the group consisting of a compound having at least two sulfonic acid groups per molecule, phytic acid, and a condensed phosphoric acid compound; an inorga... | 03/01/2011 |
| 7837800 | CMP polishing slurry and polishing method The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,... | 11/23/2010 |
| 7799139 | Chemistry for removal of photo resist, organic sacrificial fill material and etch polymer Methods and associated structures of forming a microelectronic device are described. Those methods may include utilizing a cleaning mixture comprising a solvent such as ethylene glycol monopropyl ether, an inorganic base, an organic base, a copper corrosion inhibito... | 09/21/2010 |
| 7731801 | Semiconductor wafer treatment method and apparatus therefor In the ozone water treatment process, the silicon wafer is treated with the first ultra-pure water that includes ozone. The first ultra-pure water is refined by the ultraviolet ray sterilization method. The first ultra-pure water includes total organic carbon conten... | 06/08/2010 |
| 7731799 | Substrate processing method, substrate processing apparatus and computer-readable memory medium A substrate processing method which removes an ArF resist film from a wafer having the ArF resist film. As an ultraviolet irradiation process is performed on the ArF resist film, and then an ozone gas and water vapor are fed to the ArF resist film, the ArF resist fi... | 06/08/2010 |
| 7731800 | Systems and methods for single integrated substrate cleaning and rinsing Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to ... | 06/08/2010 |
| 7691207 | Method for cleaning disk-shape glass substrate and magnetic disk A method for cleaning a disk-shape glass substrate, which comprises rotating the disk-shape glass substrate on its center with its main surface vertical, and making a cleaning fluid irradiated with ultrasonic waves run down on the outer peripheral edge surface of th... | 04/06/2010 |
| 7658803 | Manufacturing and cleansing of thin film transistor panels A manufacturing a thin film transistor array panel includes depositing a first thin film including aluminum on a substrate, patterning the first thin film by photolithography and etching, cleansing the substrate including the first thin film, and depositing a second... | 02/09/2010 |
| 7655094 | Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substr... | 02/02/2010 |
| 7637270 | Method of washing a polished object An abrasive includes abrasive grains, a solvent, and an additive. MnO2, Mn2O3, Mn3O4, MnO or a mixture thereof as the abrasive grains, H2O2 as the solvent, and HNO3, an organic a... | 12/29/2009 |
| 7624742 | Method for removing aluminum fluoride contamination from aluminum-containing surfaces of semiconductor process equipment Described are methods of removing aluminum fluoride contaminants from aluminum, anodized aluminum, and sprayed ceramic surfaces. Hydrofluoric acid, long known to be effective at removing certain contaminants, has not been used to dissolve aluminum fluoride on alumin... | 12/01/2009 |
| 7621281 | Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same A cleaning solution for cleaning a substrate for semiconductor devices and a cleaning method using the said cleaning solution, which comprises at least the following components (A), (B) and (C): (A) an ethyleneoxide-type surfactant... | 11/24/2009 |
| 7614406 | Method of cleaning substrates utilizing megasonic energy A method of cleaning a substrate without causing damage to the substrate is provided. The method comprises the steps of providing a transmitter made of a material that is a good conductor of megasonic energy, positioning the transmitter so that a lower edge is posit... | 11/10/2009 |
| 7604011 | Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic energy is applied to the supercritical fluid to impart energy to partic... | 10/20/2009 |
| 7591270 | Process solutions containing surfactants Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of semiconductor devices. ... | 09/22/2009 |
| 7578302 | Megasonic cleaning using supersaturated solution A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liqui... | 08/25/2009 |
| 7543592 | Compositions and processes for photoresist stripping and residue removal in wafer level packaging Improved compositions and processes for removing photoresists, polymers, post etch residues, and post oxygen ashing residues from interconnect, wafer level packaging, and printed circuit board substrates are disclosed. One process comprises contacting such substrate... | 06/09/2009 |
| 7543593 | Substrate processing apparatus A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 a... | 06/09/2009 |
| 7467632 | Method for forming a photoresist pattern A photoresist cleaning solution and method for forming photoresist patterns using the same. More specifically, disclosed are a photoresist cleaning solution comprising H2O and an ionic surfactant represented by Formula 1, and a method for forming a photor... | 12/23/2008 |
| 7448396 | Apparatus and method of removing particles An impurities elimination apparatus including a base plate, a first nozzle for removing impurities on the base plate using air suction, a glass substrate disposed on the base plate, and a second nozzle for coating the glass substrate with an organic material. ... | 11/11/2008 |
| 7448395 | Process method to facilitate silicidation The present invention substantially removes dry etch residue from a dry plasma etch process 110 prior to depositing a cobalt layer 124 on silicon substrate and/or polysilicon material. Subsequently, one or more annealing processes 128 are perfor... | 11/11/2008 |
