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| Number | Title | Issue Date |
| 6938638 | Gas circulating-processing apparatus A gas-circulating processing apparatus which comprises a processing chamber, a gas feeding piping, a gas supply piping, a first exhaust mechanism discharging a gas from the processing chamber, a second exhaust mechanism discharging a portion of a gas discharged from... | 09/06/2005 |
| 6935466 | Lift pin alignment and operation methods and apparatus A lifting mechanism includes a plurality of lift pins which may be driven separately and independently upward to engage an alignment surface of the chamber using ambient atmospheric pressure as the chamber is evacuated by a pump. In the illustrated embodiment, each ... | 08/30/2005 |
| 6935830 | Alignment of semiconductor wafers and other articles A wafer or some other article is aligned while being held by an end-effector. ... | 08/30/2005 |
| 6932872 | Heating apparatus using induction heating A heating apparatus which is installed in a low pressure CVD system or annealing equipment for use in semiconductor integrated circuit manufacturing processes for heat-treating wafers on which IC's are to be formed, wherein wafers are uniformly heated, the temperatu... | 08/23/2005 |
| 6932873 | Managing work-piece deflection A work-piece deflection management system including: (a) a first and a second vacuum chambers, each said vacuum chamber having an air-bearing seal circumscribing one of its sides, and (b) a work-piece plate; wherein the air-bearing seals are aligned to face one-anot... | 08/23/2005 |
| 6932871 | Multi-station deposition apparatus and method A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rota... | 08/23/2005 |
| 6933010 | Mixer, and device and method for manufacturing thin-film A thin film manufacturing system, wherein a stage for placing a substrate thereon is disposed within a vacuum reactor and a gas head for supplying a film forming gas to a central area on a top face of the vacuum reactor is arranged so that the gas head is opposed to... | 08/23/2005 |
| 6933508 | Method of surface texturizing A method and system for providing a texture to a surface of a workpiece is provided. The method comprises providing a workpiece to a texturizing chamber and scanning a beam of electromagnetic energy across the surface of the workpiece to form a plurality of features... | 08/23/2005 |
| 6934606 | Automatic calibration of a wafer-handling robot In one embodiment, a wafer-handling robot in a wafer processing system is automatically calibrated by determining an orientation of the robot relative to a chassis of the wafer processing system, determining hand-off coordinates of a load port in the wafer processin... | 08/23/2005 |
| 6929712 | Plasma processing apparatus capable of evaluating process performance A high-frequency current detector of a plasma processing apparatus detects a high-frequency current produced when high-frequency power in the range that does not cause generation of plasma in a chamber is supplied from a high-frequency power supply source to the cha... | 08/16/2005 |
| 6926802 | Exhaust ring of dry etching device An exhaust ring made of a material other than quartz, thereby reducing the creation of polymer particles on the exhaust ring is provided in the present invention. The exhaust ring of the present invention is formed of two parts wherein only one part is exposed to an... | 08/09/2005 |
| 6926926 | Silicon carbide deposited by high density plasma chemical-vapor deposition with bias A SiC-based layer is deposited on a substrate having an electrical resistivity between about 1 and 100 Ω cm. The substrate is disposed in a process chamber. A gaseous mixture having a silicon-containing gas and a hydrocarbon-containing gas is flowed to the process ... | 08/09/2005 |
| 6924462 | Pedestal for flat panel display applications An apparatus for supporting a substrate in a processing system comprising a body and an upper top portion having a surface thereon adapted to minimize friction and/or chemical reactions between the substrate support and a substrate supported thereon. ... | 08/02/2005 |
| 6921437 | Gas distribution system The present invention provides a gas distribution apparatus useful in semiconductor manufacturing. The gas distribution apparatus comprises a unitary member and a gas distribution network formed within the unitary member for uniformly delivering a gas into a process... | 07/26/2005 |
| 6921724 | Variable temperature processes for tunable electrostatic chuck An etch processor for etching a wafer includes a chuck for holding the wafer and a temperature sensor reporting a temperature of the wafer. The chuck includes a heater controlled by a temperature control system. The temperature sensor is operatively coupled to the t... | 07/26/2005 |
| 6921457 | Semiconductor manufacturing apparatus, and positioning jig used for same The placement of a wafer can be performed with good positional precision, and the positioning of wafer clamps during maintenance is facilitated. A tapered recess is formed in that portion of the wafer support on which a wafer is placed. When a wafer is placed in the... | 07/26/2005 |
| 6919538 | Method for thermally treating substrates To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-v... | 07/19/2005 |
| 6919541 | Apparatus for preventing rapid temperature variation during wafer processing An apparatus for fabricating a semiconductor device, whereby a semiconductor wafer is thermally treated with a wafer treatment device. The semiconductor wafer is delivered with a conveyer to the wafer treatment device. The temperature of the conveyer is controlled t... | 07/19/2005 |
| 6919569 | Radiation detector and method of manufacture thereof A solid-state imaging element 2 having a light-receiving portion where a plurality of photoelectric conversion elements 21 are arranged, and electrode pads 22 electrically connected to the photoelectric conversion elements 21 is mounted o... | 07/19/2005 |
| 6915592 | Method and apparatus for generating gas to a processing chamber A method and apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes an unitary, isolatable, transportable canister having a plurality of first spacing elements, a pluralit... | 07/12/2005 |
| 6916374 | Atomic layer deposition methods and atomic layer deposition tools An atomic layer deposition method includes positioning a plurality of semiconductor wafers into an atomic layer deposition chamber. Deposition precursor is emitted from individual gas inlets associated with individual of the wafers received within the chamber effect... | 07/12/2005 |
| 6916739 | Structural element and process for its production including bonding through an amorphous hard layer A method for manufacturing structural elements provides a first part with a surface that is substantially copper and a second part with a surface of a metal. The surface of the first part is coated with a hard layer which is stable at a temperature of at least 80° ... | 07/12/2005 |
| 6917755 | Substrate support An apparatus for supporting a substrate is described that has a ball adapted to minimize damage between the substrate support and the substrate supported thereon. In one embodiment, an apparatus for supporting a substrate includes ball disposed on an inclined ball s... | 07/12/2005 |
| 6913670 | Substrate support having barrier capable of detecting fluid leakage A substrate support has a receiving surface capable of receiving a substrate during processing in a substrate processing chamber. The substrate support has a pedestal having a conduit to circulate a heat transfer fluid therein. A barrier about the conduit includes a... | 07/05/2005 |
| 6911093 | Lid liner for chemical vapor deposition chamber A lid liner for a chemical vapor deposition chamber includes an annular portion having an inner surface for surrounding a reaction volume within the chemical deposition chamber; a mounting tab formed on an outer surface of the annular portion; and a hole formed in t... | 06/28/2005 |
| 6910441 | Pressure regulating system of plasma processing equipment Plasma processing equipment includes a process, a cover covering the top of the process chamber, a wafer chuck disposed in the process chamber, a pressure regulating system including a pressure regulating plate situated at the bottom surface of the cover, and an ele... | 06/28/2005 |
| 6911391 | Integration of titanium and titanium nitride layers Embodiments of the present invention generally relate to an apparatus and method of integration of titanium and titanium nitride layers. One embodiment includes providing one or more cycles of a first set of compounds, providing one or more cycles of a second set of... | 06/28/2005 |
| 6911234 | Chemical vapor deposition apparatus and method Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of... | 06/28/2005 |
| 6908865 | Method and apparatus for cleaning substrates Generally, a method for pre-cleaning native oxides and other contaminants from apertures on a substrate is provided. In one embodiment, a method for pre-cleaning apertures on a substrate includes disposing the substrate on a support member in a process chamber, cool... | 06/21/2005 |
| 6907841 | Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method Disclosed are an apparatus and a method to synthesize powders typed diamond with the size between several tens nm to several μm in diameter using conventional CVD processes for deposition of diamond films. Gas phase nucleation has been induced on the boundary of pl... | 06/21/2005 |
| 6907924 | Thermally conductive chuck for vacuum processor A chuck body mounts a substrate within a vacuum chamber. Contiguous portions of the substrate and the chuck body form a heat-transfer interface. An intermediate sealing structure seals the chuck body to the substrate independently of any contact between the chuck bo... | 06/21/2005 |
| 6905737 | Method of delivering activated species for rapid cyclical deposition A method for providing activated species for a cyclical deposition process is provided. In one aspect, the method includes delivering a gas to be activated into a plasma generator, activating the gas to create a volume of reactive species, delivering a fraction of t... | 06/14/2005 |
| 6902682 | Method and apparatus for electrostatically maintaining substrate flatness An apparatus and method for holding a substrate on a support layer in a processing chamber. The method includes the steps of positioning the substrate a predetermined distance from the support layer, introducing a plasma in the processing chamber, lowering the subst... | 06/07/2005 |
| 6902624 | Massively parallel atomic layer deposition/chemical vapor deposition system A method and apparatus for the use of individual vertically stacked ALD or CVD reactors. Individual reactors are independently operable and maintainable. The gas inlet and output are vertically configured with respect to the reactor chamber for generally axi-symmetr... | 06/07/2005 |
| 6902622 | Systems and methods for epitaxially depositing films on a semiconductor substrate Systems and methods for epitaxial deposition. The reactor includes a hot wall process cavity enclosed by a heater system, a thermal insulation system, and chamber walls. The walls of the process cavity may comprises a material having a substantially similar coeffici... | 06/07/2005 |
| 6899788 | Article holders that use gas vortices to hold an article in a desired position An article (e.g. a semiconductor wafer) is held in an article holder by means of a number of gas flows emitted from gas vortex chambers. Some of the gas flows act to cool an adjacent article portion more than the other gas flows. For example, some of the vortex cham... | 05/31/2005 |
| 6899765 | Chamber elements defining a movable internal chamber A process chamber for processing or inspecting a substrate such as a semiconductor wafer and the like includes a internal chamber employing dynamic seals at the interface of relatively moving elements. In one embodiment, the internal chamber has a first element, suc... | 05/31/2005 |
| 6899789 | Method of holding substrate and substrate holding system A method and system of holding a substrate to decrease foreign substances on the back surface thereof. The substrate holding system includes a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the subst... | 05/31/2005 |
| 6896929 | Susceptor shaft vacuum pumping Provided herein is a method of improving the planarity of a support plate of a susceptor for use during deposition of a film of material onto a substrate comprising the steps of reducing pressure in a hollow core of a shaft to a level below atmospheric pressure; and... | 05/24/2005 |
| 6896738 | Induction heating devices and methods for controllably heating an article A heating device for controllably heating an article defines a processing chamber to hold the article and includes a housing and an EMF generator. The housing includes a susceptor portion surrounding at least a portion of the processing chamber, and a conductor port... | 05/24/2005 |
