Did You Know...
...that in 1800 ether was first used by partyers as a fun diversion? Sniffing the gas led to hilarious and raucous laughter as people watched each other become more and more intoxicated and silly. Several doctors independently realized the value ether would have to anesthetize surgery patients. Of those who claimed rights to the "discovery," none had a happy ending. One had a seizure and died defending his rights. Another spent his life in an asylum because he had been denied acclaim. A third became addicted to chloroform and, in a New York City jail, he soaked a cloth in the drug, severed an artery and bled to death.
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| Number | Title | Issue Date |
| 5835677 | Liquid vaporizer system and method A liquid vaporizer apparatus and method for chemical vapor deposition of liquid solutions into a controlled atmosphere of a CVD reaction chamber. The apparatus comprises an atomizer, gas curtain, heated porous media disks and a carrier gas mixer. The inve... | 11/10/1998 |
| 5827371 | Unibody crucible and effusion source employing such a crucible A unibody, monolithic, one-piece negative draft crucible for an MBE effusion source. The crucible maximizes capacity, uniformity and long term flux stability, and minimizes oval defects, depletion effects, and short term shutter-related flux transients. T... | 10/27/1998 |
| 5820681 | Unibody crucible and effusion cell employing such a crucible A unibody, monolithic, one-piece negative draft crucible for a MBE effusion cell. The crucible maximizes capacity, uniformity and long term flux stability, and minimizes oval defects, depletion effects, and short term shutter-related flux transients. The ... | 10/13/1998 |
| 5820680 | Vacuum evaporator A vacuum evaporator is characterized in that hot-cathode filaments (7) are provided as the electron source around a tip of a rod evaporation material (4); the peripheries of the rod evaporation material (4) and the hot-cathode filaments (7) are disposed i... | 10/13/1998 |
| 5820678 | Solid source MOCVD system A system for MOCVD fabrication of superconducting and non-superconducting oxide films provides a delivery system for the feeding of metalorganic precursors for multi-component chemical vapor deposition. The delivery system can include multiple cartridges ... | 10/13/1998 |
| 5820682 | Laser deposition apparatus for depositing a large area oxide thin film on a substrate A laser deposition apparatus for a large area oxide thin film which can enable thin films of a large area to be deposited by varying a target affixing method when performing a pulse laser deposition which most effectively deposits various oxide thin films... | 10/13/1998 |
| 5815330 | Radiation limiter and optical system incorporating the same An optical system is provided comprising an entry window, an exit window, a radiation transmissive membrane, and first and second lenses. The entry window and the exit window define a radiation path extending from the entry window to the exit window. The ... | 09/29/1998 |
| 5803938 | Liquid vaporizing apparatus A liquid vaporizing apparatus includes a container for holding a liquid at a constant temperature with a temperature adjustment unit and a gas that does not react with the liquid is bubbled through the liquid in the container to vaporize the liquid. The c... | 09/08/1998 |
| 5803976 | Vacuum web coating In an apparatus for vacuum web coating, an evaporation means has a plurality of separately spaced outlet nozzles through which vapour is conveyed to a deposition zone at the surface of a chilled rotatable drum in a vacuum chamber over which drum the subst... | 09/08/1998 |
| 5800175 | Method and apparatus for re-implanting teeth A method and apparatus for extraction and re-implantation of a natural tooth, such tooth being cleaned and repaired while extracted. The crown of the repaired tooth is mechanically masked and the tooth is then mounted in a partitioned vacuum cavity wherei... | 09/01/1998 |
| 5795628 | Device for coating a substrate surface Device containing a vacuum chamber 30 and situated therein a substrate 10 and a vaporization crucible 22 filled with inorganic materials 24. Situated in the region of the vacuum chamber 30 is an electron beam or laser gun 26, the electron or laser beam 27... | 08/18/1998 |
| 5788769 | Evaporator boat for an apparatus for coating substrates A flat, elongate, trough-shaped part (8) made of an electrically conductive ceramic can be heated by the direct passage of current between clamping points at opposite ends. The trough-shaped part (8) being provided with openings (12) for reducing cross se... | 08/04/1998 |
| 5788776 | Molecular beam epitaxy isolation tube system A molecular beam epitaxy (MBE) growth chamber which provides separate longitudinally oriented isolation chambers for each effusion cell thereof. Wall structures bounding each isolation chamber are hollow to receive cryogenic material and are in fluid comm... | 08/04/1998 |
| 5778682 | Reactive PVD with NEG pump An apparatus for carrying out reactive physical vapor deposition on a substrate to form a nitride layer, comprises a vacuum chamber, a substrate support in the vacuum chamber, a target over the substrate support made of a refractory or noble metal, for ex... | 07/14/1998 |
| 5779804 | Gas feeding device for controlled vaporization of an organanometallic compound used in deposition film formation A gas-feeding device for feeding a starting gas for deposition-film-formation by the chemical vapor deposition method, comprising a container having a space for discharging the starting gas containing an organometallic compound by introduction of a carrie... | 07/14/1998 |
| 5776255 | Chemical vapor deposition apparatus A chemical vapor deposition apparatus comprises a starting material container holding a starting material in a liquid state, a starting gas generating container into which the liquid starting material is fed from the starting material container, a means f... | 07/07/1998 |
| 5776254 | Apparatus for forming thin film by chemical vapor deposition A chemical vapor deposition (CVD) apparatus for depositing a thin film on a substrate by CVD has a material container for containing a liquid CVD source material, a material feeder for feeding the liquid CVD source material to a vaporizer for vaporizing t... | 07/07/1998 |
| 5773147 | Ceramic-coated support for powder metal sintering This invention relates to an apparatus comprising: a) a article having a composition selected from the group consisting of graphite, carbon/carbon, carbon/graphite, and mixtures thereof, and b) a ceramic coating thereon, wherein the ceramic coating comprises a ... | 06/30/1998 |
| 5764849 | Solid precursor injector apparatus and method An apparatus and method are provided for effectively and controllably vaporizing solid material, in general, and specifically, solid precursor material for chemical phase deposition processes. The apparatus includes a hollow container member, capable of r... | 06/09/1998 |
| 5755885 | Gas feeding device for controlled vaporization of an organometallic compound used in deposition film formation A gas-feeding device for feeding a starting gas for forming a deposited film by the chemical vapor deposition method, comprising a storage area for an organometallic compound having a high viscosity, wherein the storage area has a space for discharging a ... | 05/26/1998 |
| 5747818 | Thermoelectric cooling in gas-assisted FIB system Apparatus for supplying a jet of chemical vapor at a substantially constant rate comprises a crucible for containing a quantity of chemical, a hollow needle, a flow path from the crucible to the hollow needle, a Peltier element in thermal communication wi... | 05/05/1998 |
| 5738729 | Coating chamber, accompanying substrate carrier, vacuum evaporation and coating method In order to maintain a required minimal variation of angle of incidence (a) of a coating material on a flat substrate (3), it is recommended that the substrate (3) be exposed to the evaporation source (1) clamped in a curved position.... | 04/14/1998 |
| 5733375 | Apparatus for supplying a treatment material An apparatus for supplying a treating material to a treating device has a tank containing a liquid treating material and a heat exchanger formed by a spiral pipe and provided in the tank. A nitrogen gas (N2 gas) is introduced into the tank and ... | 03/31/1998 |
| 5730804 | Process gas supply apparatus A process gas supply apparatus according to the invention comprises a supply pipe line connecting a supply source containing an organic aluminum metallic compound in a liquid state, to a process device for forming a film on an object using the organic alu... | 03/24/1998 |
| 5725674 | Device and method for epitaxially growing gallium nitride layers An epitaxial growth system comprises a housing around an epitaxial growth chamber. A substrate support is located within the growth chamber. A gallium source introduces gallium into the growth chamber and directs the gallium towards the substrate. An acti... | 03/10/1998 |
| 5725672 | Apparatus for the high speed, low pressure gas jet deposition of conducting and dielectric thin sold films Described is a method for depositing from the vapor phase a chemical species into the form of a thin solid film material which overlays a substrate material. The deposition process consists of three steps: (1) synthesis of depositing species, (2) transpor... | 03/10/1998 |
| 5714008 | Molecular beam epitaxy source cell Apparati and methods for varying the flux of a molecular beam emanating from an effusion cell are disclosed. The apparatus includes a means for controllably adjusting the angular distribution of a molecular field effusing from a source material within the... | 02/03/1998 |
| 5711816 | Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same A process and apparatus for delivering an involatile reagent in gaseous form, wherein an involatile reagent source liquid is flash vaporized on a vaporization matrix structure at elevated temperature. A carrier gas may be flowed past the flash vaporizatio... | 01/27/1998 |
| 5711810 | Apparatus for variable optical focusing for processing chambers In a pulsed laser deposition system, the two optical actions of focusing rastering, and the optical chamber window are combined into a single optics system. The single optics system is mounted on the processing chamber. Combining the three separate opti... | 01/27/1998 |
| 5711813 | Epitaxial crystal growth apparatus An epitaxial growth apparatus includes a substrate heating member, a growth chamber, a molecular beam source, a nozzle for ejecting a gaseous source material, an exhaust pipe, and a vacuum chamber. When a gate valve is opened between the vacuum chamber an... | 01/27/1998 |
| 5709753 | Parylene deposition apparatus including a heated and cooled dimer crucible Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes a heated and cooled dimer receptacle for fast and efficient vaporiz... | 01/20/1998 |
| 5707415 | Method of vaporizing reactants in a packed-bed, column, film evaporator A vaporizer (film evaporator) (13) for halide-free, silicon-containing liquid reactants used in producing preforms is provided. The vaporizer includes a plurality of packed-bed columns (22) surrounding a central tube (24). A mixture of liquid reactant, e.... | 01/13/1998 |
| 5702532 | MOCVD reactor system for indium antimonide epitaxial material Multiple solid precursor bubblers are used to alleviate channeling effects caused by high carrying gas flow rates to provide for deposition of indium-based epitaxial materials in high-capacity MOCVD reactor systems. Precracking of precursor materials that... | 12/30/1997 |
| 5698037 | Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing An integrated module with a heated reservoir to vaporize liquid for semiconductor processes with liquid sources is presented. Shut-off valves and a proportioning pressure valve for controlling the flow of the vapor from the reservoir are mounted on the mo... | 12/16/1997 |
| 5693146 | Device for forming a compound oxide superconducting thin film There is disclosed a device for forming a thin film on a substrate by irradiating a target of a compound oxide superconducting material with a laser beam and evaporating on the substrate a thin film corresponding to a composition of the target in an oxyge... | 12/02/1997 |
| 5690743 | Liquid material supply apparatus and method An apparatus for supplying a low vapor pressure liquid material for deposition to a deposition chamber in which the low vapor pressure liquid material is pushed out of a pressurization passage by a pressure gas to a pressure liquid supply passage; a flow ... | 11/25/1997 |
| 5679166 | Magnetic recording media, magnetic recording media fabrication method, and fabrication equipment A magnetic recording medium fabrication device includes a cooling drum around which a substrate runs while being cooled thereby, an ion gun arranged upstream to a vapor deposition station for kicking out particles absorbed on the plane of the substrate, a... | 10/21/1997 |
| 5674574 | Vapor delivery system for solid precursors and method regarding same A vapor delivery system for vaporization and delivery of a solid precursor includes a housing having an inlet for receiving a carrier gas. A rotatable substrate surface is contained in the housing having a solid precursor material applied thereon. A focus... | 10/07/1997 |
| 5672211 | Apparatus for depositing a thin layer on a substrate by laser pulse vapor deposition A method for depositing a thin layer on a substrate by laser pulse vapor deposition provides a substantially cylindrical target having a cylinder axis and a curved target surface. A pulsed laser beam is generated having an initial path section and an init... | 09/30/1997 |
| 5672210 | Method and apparatus for manufacturing superconducting components via laser ablation followed by laser material processing The method for manufacturing superconducting elements according to the present invention include the following steps of: (a) placing a substrate near a target in a chamber so that the substrate is positioned to face a surface of the target, wherein the ta... | 09/30/1997 |
