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Mountable Printable Placard With Headband
A resilient headband in a shape for being mounted on the head of the user. The headband is equipped with a longitudinal slotted member for holding a placard.
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| Number | Title | Issue Date |
| 7044731 | Heat treatment apparatus Exhaust pressure in an exhaust system 15 that evacuates a processing furnace 2 is determined as absolute pressure by using a differential manometer 23, which measures the exhaust pressure as differential pressure, and a barometer, which measures... | 05/16/2006 |
| 7045430 | Atomic layer-deposited LaAlO3 films for gate dielectrics A dielectric film containing LaAlO3 and method of fabricating a dielectric film contained LaAlO3 produce a reliable gate dielectric having a thinner equivalent oxide thickness than attainable using SiO2. The LaAlO3 gate di... | 05/16/2006 |
| 7045746 | Shadow-free shutter arrangement and method As part of a system for processing a workpiece by applying a controlled heat to the workpiece, a heating arrangement includes an array of spaced apart heating elements for use in a confronting relationship with the workpiece to subject the workpiece to a direct radi... | 05/16/2006 |
| 7043148 | Wafer heating using edge-on illumination A wafer, and a tungsten filament radiation heating source comprising at least one lamp arranged in a ring substantially surrounding the wafer edge. The radiation heating source irradiates the semiconductor wafer with radiation directed at the edge of the wafer, so t... | 05/09/2006 |
| 7041939 | Thermal processing apparatus and thermal processing method In a thermal processing apparatus (1), an upper opening (60) is closed by a transparent plate (61) and a light emitting part (5) emits light through the upper opening (60). Also provided are a susceptor (72) for supporting a... | 05/09/2006 |
| 7041931 | Stepped reflector plate In a system for thermal processing of a semiconductor substrate, a reflector plate has a stepped surface facing the substrate during heating and cooling of the substrate. The raised surface of the reflector plate has reduced reflectivity, providing advantages during... | 05/09/2006 |
| 7041335 | Titanium tantalum nitride silicide layer Methods and apparatus of forming titanium tantalum silicon nitride (TixTay(Si)Nz) layers are described. The titanium tantalum silicon nitride (TixTay(Si)Nz) layer may be formed using a cyclical deposi... | 05/09/2006 |
| 7039303 | Heating method, heating apparatus, and production method of image display apparatus On the occasion of producing an image display apparatus, in order to suppress the bend and breakage of a substrate by uniformly heating the substrate which constructs a chamber which contains the image display apparatus, a plurality of heaters are located in opposit... | 05/02/2006 |
| 7038174 | Heating device for heating semiconductor wafers in thermal processing chambers A novel apparatus for heat treating semiconductor wafers includes a heating device which comprises an assembly of light energy sources for emitting light energy onto a wafer. The light energy sources can be placed in various configurations. The tuning devices adjust... | 05/02/2006 |
| 7038173 | Thermal processing apparatus and thermal processing method A thermal processing apparatus, performing processing accompanied with heating on a substrate, having an upper lamp group directed toward a prescribed direction and a lower lamp group perpendicularly intersecting with the upper lamp group is provided with a lower re... | 05/02/2006 |
| 7037813 | Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage A method for implanting ions in a surface layer of a workpiece includes placing the workpiece on a workpiece support in a chamber with the surface layer being in facing relationship with a ceiling of the chamber, thereby defining a processing zone between the workpi... | 05/02/2006 |
| 7037797 | Localized heating and cooling of substrates The present invention is directed to an apparatus and process for locally heating and/or cooling of semiconductor wafers in thermal processing chambers. In particular, the apparatus of the present invention includes a device for heating or cooling localized regions ... | 05/02/2006 |
| 7037574 | Atomic layer deposition for fabricating thin films An atomic layer deposition (ALD) process deposits thin films for microelectronic structures, such as advanced gap and tunnel junction applications, by plasma annealing at varying film thicknesses to obtain desired intrinsic film stress and breakdown film strength. T... | 05/02/2006 |
| 7037372 | Method of growing a thin film onto a substrate The present invention relates to the production of thin films. In particular, the invention concerns a method of growing a thin film onto a substrate, in which method the substrate is placed in a reaction chamber and is subjected to surface reactions of a plurality ... | 05/02/2006 |
| 7037843 | Plasma etching method To provide a plasma etching method that can suppress discharge of active gases that do not contribute to plasma etching into the atmosphere, a plasma etching apparatus 10 is composed of a vacuum chamber 12, a plasma processing section 14, a heli... | 05/02/2006 |
| 7037846 | Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing A method for creating and transporting low-energy ions for use in plasma processing of a semiconductor wafer is disclosed. In an exemplary embodiment of the invention, the method includes generating plasma from a gas species to produce a plasma exhaust. The plasma e... | 05/02/2006 |
| 7032536 | Thin film formation apparatus including engagement members for support during thermal expansion A thin film formation apparatus for forming a thin film on a substrate is provided, which comprises: a reaction chamber; a gas introduction section for introducing a reactant gas into the reaction chamber; an evacuation section for exhausting the reactant gas from t... | 04/25/2006 |
| 7034255 | Light irradiation type thermal processing apparatus A lamp house stores twenty-seven flash lamps in such a state that a longitudinal direction of each of the twenty-seven flash lamps extends in a horizontal direction (Y-direction), and that the twenty-seven flash lamps are arranged in parallel to one another at equal... | 04/25/2006 |
| 7033443 | Gas-cooled clamp for RTP The present invention is directed to a semiconductor thermal processing apparatus and a method for thermally cooling a semiconductor substrate. According to one aspect of the present invention, a gas-cooled clamp and associated method is disclosed which provides coo... | 04/25/2006 |
| 7033444 | Plasma processing apparatus, and electrode structure and table structure of processing apparatus An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber (26) in which a vacuum can be formed. An electrode unit (38) has a heater unit (... | 04/25/2006 |
| 7033445 | Gridded susceptor Susceptor designs are provided for controlling damage to wafers, particularly during cold wafer drops-off on a hot susceptor. The designs include axisymmetric grid designs, such that thermal gradients are symmetrical in the circumferential (θ) direction and the sam... | 04/25/2006 |
| 7033650 | Method of producing a nanotube layer on a substrate In a method of producing a nanotube layer on a substrate by using a CVD process, the substrate is placed in a reaction chamber, which is flushed with a carbon-containing gas. Subsequently, the substrate is heated by an induction process to a temperature at which car... | 04/25/2006 |
| 7029989 | Semiconductor device and method of manufacturing the same The present invention relates to a semiconductor device and a method of manufacturing the same. The minimum marginal width of an impurity diffusion layer is defined to reduce by a given width. The reduced width of the impurity diffusion layer is compensated for thro... | 04/18/2006 |
| 7030039 | Method of uniformly coating a substrate A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing throu... | 04/18/2006 |
| 7030401 | Modular substrate measurement system A substrate measurement system including a measurement chamber and a substrate handling chamber possessing a substrate transfer and a substrate container interface arranged to receive a substrate to container. The handling chamber contains a first interface to conne... | 04/18/2006 |
| 7029632 | Radiation-heated fluidized-bed reactor A radiation-heated fluidized-bed reactor and a process for producing high-purity polycrystalline silicon by using this reactor are provided. In this reactor, a heater device (14) is a radiation source for thermal radiation which is arranged outside the inner ... | 04/18/2006 |
| 7029505 | Sheet type heat treating apparatus and method for processing semiconductors The single substrate thermal processing apparatus (2) includes a process chamber (5) arranged to accommodate a target substrate (W) and provided with a showerhead (10) disposed on its ceiling. A support member (28) is disposed to support ... | 04/18/2006 |
| 7026581 | Apparatus for positioning an elevator tube A wafer support position control mechanism selectively positions a semiconductor wafer along an axis of excursion within a process chamber. An elevator tube protrudes through an orifice in the chamber surface and is connected at a first distal end to the wafer suppo... | 04/11/2006 |
| 7026580 | Adjustable exhaust flow for thermal uniformity A method and apparatus for adjusting exhaust flow, and the apparatus has a programmable exhaust control regulator generating a first input signal to a motor control circuit, an exhaust flow meter generating a second input signal to the motor control circuit and a mo... | 04/11/2006 |
| 7026011 | Aluminide coating of gas turbine engine blade A method for applying an aluminide coating on a gas turbine engine blade having an external surface and an internal cooling cavity having an internal surface that is connected to the external surface by cooling holes. The method is conducted in a vapor coating conta... | 04/11/2006 |
| 7025858 | Apparatus for supporting wafer in semiconductor process The present invention provides an apparatus for supporting a wafer in a semiconductor process. The apparatus includes an electrostatic chuck, a focus ring and a conductive material. The electrostatic chuck has a first fillister in its periphery. When a DC power is a... | 04/11/2006 |
| 7025280 | Adaptive real time control of a reticle/mask system An adaptive real time thermal processing system is presented that includes a multivariable controller. Generally, the method includes creating a dynamic model of the thermal processing system; incorporating reticle/mask curvature in the dynamic model; coupling a dif... | 04/11/2006 |
| 7025690 | Golf club with transparent grip A transparent grip of a golf club, wherein prints for public information like photos or pictures are incorporated in the grip and the content of the incorporated prints is observable from the outside. The grip is composed of a sheet layer of an elastomeric material ... | 04/11/2006 |
| 7025831 | Apparatus for surface conditioning Apparatus and process for conditioning a generally planar substrate, contained in a chamber isolatable from the ambient environment and fed with a conditioning gas which includes reactive gas. The apparatus includes a support for supporting the substrate in the cham... | 04/11/2006 |
| 7027561 | Dual-energy scanning-based detection of ionizing radiation A dual-energy scanning-based radiation detecting apparatus comprises a line detector; a device for scanning said line detector across an object while said line detector is exposed to an ionizing radiation beam, which has impinged on said object, to thereby record a ... | 04/11/2006 |
| 7027722 | Electric heater for a semiconductor processing apparatus An electric heater has multiple zones, wherein the multiple zones include at least one zone which is subject to high loading (e.g. bottom zone) and, at least one zone is a non-metal heating element, and the rest of the zones (e.g. middle zone and top zone) are metal... | 04/11/2006 |
| 7024105 | Substrate heater assembly A substrate heater assembly for supporting a substrate of a predetermined standardized diameter during processing is provided. In one embodiment, the substrate heater assembly includes a body having an upper surface, a lower surface and an embedded heating element. ... | 04/04/2006 |
| 7024266 | Substrate processing apparatus, method of controlling substrate, and exposure apparatus A substrate processing apparatus includes a first chamber, a second chamber which has a first valve, a second valve and a chuck, wherein a substrate is transferred to the second chamber through the first valve, held by the chuck in the second chamber, and then trans... | 04/04/2006 |
| 7022948 | Chamber for uniform substrate heating Embodiments of the invention generally provide an apparatus and a method for providing a uniform thermal profile to a plurality of substrates during heat processing. In one embodiment, a cassette containing one or more heated substrate supports is moveably disposed ... | 04/04/2006 |
| 7022570 | Methods of forming hemispherical grained silicon on a template on a semiconductor work object The present invention provides a method of preparing a surface of a silicon wafer for formation of HSG structures. The method contemplates providing a wafer having at least one HSG template comprising polysilicon formed in BPSG, the HSG template being covered by sil... | 04/04/2006 |
