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| Number | Title | Issue Date |
| 8137467 | Temperature controlled showerhead A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from... | 03/20/2012 |
| 8137468 | Heated valve manifold for ampoule Embodiments of the invention provide an apparatus and a method for generating a gaseous chemical precursor that may be used in a vapor deposition processing system. In one embodiment, the apparatus contains a valve manifold assembly, which includes a valve assembly ... | 03/20/2012 |
| 8133323 | Film forming apparatus and method, gas supply device and storage medium A film forming apparatus is provided with a chamber which defines a processing space for performing a film forming process to a substrate a stage arranged in the chamber for mounting the substrate thereon; a substrate heating unit arranged on the stage for heating t... | 03/13/2012 |
| 8097085 | Thermal diffusion chamber A frame supporting a containment chamber, the containment chamber is preferably configured to enclose and confine a process chamber. A heat source module is disposed between the containment chamber and the process chamber, while a thermal regulation cavity is mainta... | 01/17/2012 |
| 8092602 | Thermally zoned substrate holder assembly A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature... | 01/10/2012 |
| 8083855 | Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body A temperature control module for a semiconductor processing chamber comprises a thermally conductive component body, one or more channels in the component body and one or more tubes concentric therewith, such that gas filled spaces surround the tubes. By flowing a h... | 12/27/2011 |
| 8038796 | Apparatus for spatial and temporal control of temperature on a substrate An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal ... | 10/18/2011 |
| 8034180 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor A method of controlling the temperature of a workpiece on a workpiece support in a plasma reactor includes placing coolant in a flow channel thermally coupled to the workpiece support, supporting a thermally conductive gas between the workpiece and the workpiece sup... | 10/11/2011 |
| 8034181 | Plasma processing apparatus A plasma processing apparatus includes a processing chamber encased in a vacuum vessel equipped with an evacuator; a sample stage located in the processing chamber and having an upper surface on which a sample as an object to be processed rests; a gas feeding unit f... | 10/11/2011 |
| 7976634 | Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at... | 07/12/2011 |
| 7976635 | Dual substrate loadlock process equipment One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. T... | 07/12/2011 |
| 7935188 | Vertical thermal processing apparatus and method of using the same The invention is a vertical thermal processing apparatus including: a processing container that contains an object to be processed; a main heater provided so as to surround the processing container, the main heater being capable of heating the processing container a... | 05/03/2011 |
| 7850782 | Thermally zoned substrate holder assembly A thermally zoned substrate holder including a substantially cylindrical base having top and bottom surfaces configured to support a substrate. A plurality of temperature control elements are disposed within the base. An insulator thermally separates the temperature... | 12/14/2010 |
| 7815740 | Substrate mounting table, substrate processing apparatus and substrate processing method A substrate mounting table includes a plurality of passageways independently provided therein, a temperature control medium flowing through the passageways, and a gap formed between at least two of the passageways. In a substrate processing method for processing a s... | 10/19/2010 |
| 7806983 | Substrate temperature control in an ALD reactor A deposition system includes a process chamber for conducting an ALD process to deposit layers on a substrate. An electrostatic chuck (ESC) retains the substrate. A backside gas increases thermal coupling between the substrate and the ESC. The ESC is cooled via a co... | 10/05/2010 |
| 7780791 | Apparatus for an optimized plasma chamber top piece A plasma processing system for processing a substrate is described. The plasma processing system includes a bottom piece including a chuck configured for holding the substrate. The plasma processing system also includes an induction coil configured to generate an el... | 08/24/2010 |
| 7704327 | High temperature anneal with improved substrate support A method including removing an impurity from a gas stream to a processing chamber at a point of use. An apparatus with a point of use purifier on a gas stream. An apparatus including a shelf having dimensions suitable for placement within a thermal processing includ... | 04/27/2010 |
| 7678197 | Susceptor device A susceptor device comprises a base body, an electrostatic absorbing inner electrode which is disposed on a bottom surface of the base body, a power supplying terminal, an insulating sprayed layer which coats the electrostatic absorbing inner electrode and a connect... | 03/16/2010 |
| 7662233 | ALD apparatus and method Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improve... | 02/16/2010 |
| 7651569 | Pedestal for furnace A pedestal is provided for supporting wafer boats in a process chamber during semiconductor fabrication. The pedestal contains hollow spaces, such as within porous insulating plugs, and gases inside the pedestal may expand during semiconductor processing. The pedest... | 01/26/2010 |
| 7544251 | Method and apparatus for controlling temperature of a substrate A pedestal assembly and method for controlling temperature of a substrate during processing is provided. In one embodiment, the pedestal assembly includes a support member that is coupled to a base by a material layer. The material layer has at least two regions hav... | 06/09/2009 |
| 7442900 | Chamber for uniform heating of large area substrates Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an apparatus for thermal processing large area substrates includes a cha... | 10/28/2008 |
| 7442275 | Lateral temperature equalizing system for large area surfaces during processing In many processes used in fabricating semiconductors the wafer is seated on the top surface of a pedestal and heated in a high energy process step, such as plasma etching. The pedestal, chuck or platen may be cooling but the wafer gradually heats until the process c... | 10/28/2008 |
| 7442413 | Methods and apparatus for treating a work piece with a vaporous element Methods and apparatus for controlling and delivering a vaporous element or compound, for example, selenium or sulfur, from a solid source to a work piece are provided. The methods and apparatus may be used in photovoltaic cell manufacturing. The apparatus may compri... | 10/28/2008 |
| 7438872 | Steam oxidation apparatus A steam oxidation apparatus is provided which is capable of ensuring a desirable controllability and reproducibility of the steam oxidation of an object-to-be-oxidized housed in the reactor, by suppressing condensation of the steam in the steam-accompanied inert gas... | 10/21/2008 |
| 7432475 | Vertical heat treatment device and method controlling the same A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating fu... | 10/07/2008 |
| 7429717 | Multizone heater for furnace The present invention relates to an apparatus and method for heating a semiconductor processing chamber. One embodiment of the present invention provides a furnace for heating a semiconductor processing chamber. The furnace comprises a heater surrounding side walls ... | 09/30/2008 |
| 7427329 | Temperature control for single substrate semiconductor processing reactor A reactor for heat treatment of a substrate having a process chamber within a substrate enclosing structure, and a support structure configured to position a substrate at a predetermined spacing between the upper part and the bottom part within the process chamber d... | 09/23/2008 |
| 7422635 | Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces The present disclosure suggests several systems and methods for batch processing of microfeature workpieces, e.g., semiconductor wafers or the like. One exemplary implementation provides a method of depositing a reaction product on each of a batch of workpieces posi... | 09/09/2008 |
| 7422655 | Apparatus for performing semiconductor processing on target substrate An apparatus for performing a semiconductor process on a target substrate (W) includes a lifting mechanism (48) disposed in a worktable (38) to assist transfer of the target substrate. The lifting mechanism includes a lifter pin (51) configured ... | 09/09/2008 |
| 7419566 | Plasma reactor The plasma reactor comprises at least one cooling device (15, 16) consisting of two cooling elements (15a, 15b; 16a, 16b) adapted to be separately switched on and off. The heat produced during the plasma... | 09/02/2008 |
| 7419550 | Oxidizing method and oxidizing unit of object for object to be processed An oxidizing method for includes: an arranging step of arranging a plurality of objects to be processed in a processing container whose inside can be vacuumed, a supplying unit of an oxidative gas being provided at one end of the processing container, a plurality of... | 09/02/2008 |
| 7416633 | Plasma processing apparatus Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the processing chamber. The processing chamber has an upper side wall which surr... | 08/26/2008 |
| 7413610 | Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines A method for hard-material coating or heat treatment of the blade airfoils of blisks for gas turbines provides for partial heat-insulation and cooling of the other blisk parts during the respective process to prevent their properties from being changed by the high t... | 08/19/2008 |
| 7411161 | Susceptor for deposition process equipment and method of fabricating a heater therein A susceptor for deposition process equipment is provided. The susceptor includes a heater that heats the susceptor. The heater includes a sheath. The sheath surrounds a heating wire and is filled with an insulating ceramic material. An isolation layer is formed oppo... | 08/12/2008 |
| 7408131 | Wafer holder and semiconductor manufacturing apparatus A wafer holder is provided in which local heat radiation in supporting and heating wafers is kept under control and temperature uniformity of the wafer retaining surface is enhanced, and by making use of the wafer holder a semiconductor manufacturing apparatus suita... | 08/05/2008 |
| 7402778 | Oven for controlled heating of compounds at varying temperatures An oven is provided for curing or reflowing compounds on objects, such as lead frames or other substrates. The oven comprises a heating chamber, a heating assembly mounted in thermal communication with the heating chamber to provide heat thereto, and a support assem... | 07/22/2008 |
| 7396411 | Apparatus for manufacturing single crystal A method for manufacturing a single crystal includes the steps of: flowing a raw material gas toward a seed crystal in a reactive chamber so that the single crystal grows from the seed crystal; controlling the raw material gas by a gas flow control member having a c... | 07/08/2008 |
| 7396432 | Composite shadow ring assembled with dowel pins and method of using A composite shadow ring that is constructed of an upper ring and a lower ring assembled together by a plurality of dowel pins and a method for using the ring. The upper ring and the lower ring each has a predetermined outside diameter that is substantially the same,... | 07/08/2008 |
| 7393418 | Susceptor A susceptor at least a surface thereof being coated with SiC, includes a recess where an wafer is mounted, the recess having an round portion disposed on a lower portion of an outer circumferential portion of the recess, a ring-shaped SiC crystal growth surface port... | 07/01/2008 |
