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| Number | Title | Issue Date |
| 8171880 | Microwave plasma processing apparatus and method of supplying microwaves using the apparatus A microwave plasma processing apparatus performs plasma processing on a substrate by exciting a gas by electric field energy of microwaves emitted from a radial line slot antenna (RLSA). The microwave plasma processing apparatus includes: a processing container in w... | 05/08/2012 |
| 8136479 | Plasma treatment apparatus and plasma treatment method A plasma treatment apparatus generates a plasma in a treatment vessel by an electromagnetic wave radiated from an electromagnetic wave radiation portion into the treatment vessel to perform plasma treatment by the plasma. At least a part of a wall constituting the t... | 03/20/2012 |
| 8100082 | Method and system for introducing process fluid through a chamber component A method and system for introducing a process fluid through a chamber component in a processing system is described. The chamber component comprises a chamber element having a first surface on a supply side of the chamber element and a second surface on a process si... | 01/24/2012 |
| 8091506 | High velocity method for depositing diamond films from a gaseous phase in SHF discharge plasma and a plasma reactor for carrying out said method The invention relates to carbon deposition by decomposing gaseous compounds with the aid of the SHF discharge plasma. Said invention ensures a high speed deposition of the high quality diamond films (having a loss-tangent angle δ equal to or less than 3×10−... | 01/10/2012 |
| 8028654 | Planar controlled zone microwave plasma system An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism... | 10/04/2011 |
| 8020513 | Cooled device for plasma depositing a barrier layer onto a container A device for plasma depositing a thin film of a barrier material on an internal wall of a container includes: an electromagnetic wave generator; a cavity connected to the generator and made of a conductive material; a chamber positioned in the cavity and made of a m... | 09/20/2011 |
| 8006641 | Installation for depositing, by means of a microwave plasma, an internal barrier coating in thermoplastic containers Installation for depositing, by means of a microwave plasma, a barrier coating on thermoplastic containers (5), this installation comprising treatment stations (1) each comprising a treatment enclosure (2) and a cover (3) and including a ... | 08/30/2011 |
| 7975646 | Device for depositing a coating on an internal surface of a container Device for depositing a coating on an internal surface of a container, of the type in which the deposition is carried out by means of a low-pressure plasma created inside the container by excitation of a precursor gas by microwave-type electromagnetic waves. An inje... | 07/12/2011 |
| 7938081 | Radial line slot antenna having a conductive layer A radial line slot antenna (RLSA) is described for generating plasma during semiconductor device fabrication. The antenna comprises a resonator plate having a partially open, electrically conductive layer coupled to a surface of the resonator plate. For example, the... | 05/10/2011 |
| 7934468 | Plasma processing apparatus and plasma processing method Microwaves propagated through the waveguide 30, a plurality of slots 31 and the dielectric members 33 in this order are supplied into the processing chamber U where they are used to excite a gas to plasma to be used to process a substrate G. Alu... | 05/03/2011 |
| 7930992 | Plasma processing equipment Resonance can be surely provided under any plasma condition in such a manner that an antenna (3) is arranged in an opening of an upper part of a chamber (1) to produce an electromagnetic field generated by a microwave, a top plate (4) for sealin... | 04/26/2011 |
| 7926446 | Multi-place coating apparatus and process for plasma coating A coating apparatus is provided for simplifying the introduction and removal of workpieces into and from a reactor for plasma coating and to increase the throughput. The coating apparatus has a reactor with a moveable sleeve part and a base element, at least one sea... | 04/19/2011 |
| 7921804 | Plasma generating nozzle having impedance control mechanism The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to ... | 04/12/2011 |
| 7895971 | Microwave plasma processing apparatus A microwave plasma processing apparatus which easily ensures uniformity and stability of plasma in response to changes of process conditions and the like. The microwave plasma processing apparatus generates plasma of a process gas in a chamber by microwave and perfo... | 03/01/2011 |
| 7806077 | Plasma nozzle array for providing uniform scalable microwave plasma generation Microwave plasma nozzle array systems and methods for configuring the microwave plasma nozzle arrays are disclosed. The microwaves are transmitted to a microwave cavity in a specific manner and form an interference pattern that includes high-energy regions within th... | 10/05/2010 |
| 7779783 | Plasma processing device A plasma processing apparatus includes a chamber, a dielectric top plate member disposed on an upper portion of the chamber and an antenna having a plurality of slots. The antenna is disposed on the top plate member and is in close contact with the top plate member.... | 08/24/2010 |
| 7707965 | Processing apparatus and lid opening/closing mechanism A processing apparatus includes an openable/closable lid disposed on a process container, and an opening/closing mechanism configured to open/close the lid. The opening/closing mechanism includes a hinge structure swingably coupling the lid to one end of the process... | 05/04/2010 |
| 7694651 | High velocity method for deposing diamond films from a gaseous phase in SHF discharge plasma and device for carrying out said method The invention relates to carbon deposition by decomposing gaseous compounds with the aid of the SHF discharge plasma and can be used, for example, for producing polycrystalline diamond films (plates), which are used for producing output windows of power SHF sources,... | 04/13/2010 |
| 7650853 | Device for applying electromagnetic microwave radiation in a plasma cavity A device for applying, in use, electromagnetic microwave radiation in a plasma cavity. The device includes a plasma cavity present within a housing, being substantially cylindrically symmetric about a first axis, and which plasma cavity includes a cylindrical wall p... | 01/26/2010 |
| 7640887 | Surface wave excitation plasma generator and surface wave excitation plasma processing apparatus The present invention provides a surface wave excitation plasma generator in which surface wave excitation plasma is efficiently generated. A surface wave excitation plasma generator including an annular waveguide and a dielectric tube is provided. The annular waveg... | 01/05/2010 |
| 7603963 | Controlled zone microwave plasma system An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism... | 10/20/2009 |
| 7584714 | Method and system for improving coupling between a surface wave plasma source and a plasma space A surface wave plasma (SWP) source having an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system... | 09/08/2009 |
| 7581511 | Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes A reactor comprising an energy source, a plasma unit positioned relative to the energy source, and a processing vessel connected to the plasma unit. The energy source has a generator that produces a plasma energy and a transmitter to transmit the plasma energy. The ... | 09/01/2009 |
| 7574974 | Device for production of a plasma sheet The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device w... | 08/18/2009 |
| 7565879 | Plasma processing apparatus A plasma processing apparatus having a plasma generating unit, a process chamber including an outer cylinder for withstanding a reduced pressure, and an inner cylinder made of non-magnetic material and being replaceable, arranged inside the outer cylinder, a process... | 07/28/2009 |
| 7562638 | Methods and arrangement for implementing highly efficient plasma traps An arrangement configured to contain plasma within plasma tube assembly of downstream microwave plasma system. Downstream microwave plasma system is configured to generate plasma within plasma-sustaining region of plasma tube assembly and channeling at least portion... | 07/21/2009 |
| 7533628 | Volume-optimized reactor for simultaneously coating eyeglasses on both sides A reactor for simultaneous coating of eyeglasses on both sides thereof. Two partial devices are provided, each with a microwave energy waveguide, a gas supply and an apparatus for evacuating the coating chamber where the first and second devices can be moved relativ... | 05/19/2009 |
| 7520245 | Plasma processing apparatus In a microwave plasma processing apparatus, a metal made lattice-like shower plate 111 is provided between a dielectric material shower plate 103, and a plasma excitation gas mainly an inert gas and a process gas are discharged form different locations... | 04/21/2009 |
| 7506609 | System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber In an arrangement for generating a local electron-cyclotron-microwave-low pressure plasma at a certain location within a gas-filled process chamber, a microwave supply means providing a microwave beam and a plasma localization unit generating a magnetic field are pr... | 03/24/2009 |
| 7478609 | Plasma process apparatus and its processor A plasma processing apparatus and a processing apparatus having a widened process condition range allowing plasma generation are obtained by increasing microwave propagation efficiency. The plasma processing apparatus includes a processing chamber where plasma proce... | 01/20/2009 |
| 7469654 | Plasma processing device A plasma processing apparatus includes a chamber for carrying out plasma processing inside, a top plate made of a dielectric material for sealing the upper side of this chamber, and an antenna section that serves as a high frequency supply for supplying high frequen... | 12/30/2008 |
| 7442271 | Miniature microwave plasma torch application and method of use thereof A miniature microwave plasma torch apparatus (10) is described. The microwave plasma torch apparatus (10) is used for a variety of applications where rapid heating of a small amount of material is needed. The miniature microwave plasma torch apparatus ... | 10/28/2008 |
| 7434537 | Device for the coating of objects An apparatus for coating objects having a single microwave source, two or more coating chambers, and an impedance structure or a waveguide structure. The coating chambers are connected to the single microwave source. The impedance structure or waveguide structure di... | 10/14/2008 |
| 7430985 | Plasma processing equipment Plasma processing equipment capable of increasing the heat resistance of a wave guide by using a high dielectric material, comprising a processing container 44 formed to allow vacuuming, a loading table 46 installed in the processing container for plac... | 10/07/2008 |
| 7418921 | Plasma CVD apparatus for forming uniform film A plasma CVD film formation apparatus includes: a reaction chamber; a shower plate installed inside the reaction chamber; and a susceptor for placing a wafer thereon installed substantially parallel to and facing the shower plate. The shower plate has a surface faci... | 09/02/2008 |
| 7410552 | Electron cyclotron resonance equipment with variable flare angle of horn antenna An electron cyclotron resonance equipment generates plasma by application of a processing gas and microwave energy into a vacuum chamber having a wafer therein in an environment of reduced pressure. The equipment includes a horn antenna assembly mounted onto an uppe... | 08/12/2008 |
| 7411352 | Dual plasma beam sources and method A pair of plasma beam sources are connected across an AC power supply to alternatively produce an ion beam for depositing material on a substrate transported past the ion beams. Each plasma beam source includes a discharge cavity having a first width and a nozzle ex... | 08/12/2008 |
| 7404991 | Device and control method for micro wave plasma processing A microwave is introduced into a process chamber through a waveguide (26) of the plasma process apparatus, thereby generating plasma. A reflection monitor (40) and an electric power monitor (42) monitor the electric power of a reflected wave ref... | 07/29/2008 |
| 7402526 | Plasma processing, deposition, and ALD methods A plasma processing method includes providing a substrate in a processing chamber, the substrate having a surface, and generating a plasma in the processing chamber. The plasma provides at least two regions that exhibit different plasma densities. The method include... | 07/22/2008 |
| 7395779 | Plasma processing apparatus A first conductive plate (31A) constituting the radiation surface of a slot antenna (30A) inclines with respect to a first dielectric member (13) opposed to the radiation surface of the slot antenna (30A). Consequently, a plasma generated... | 07/08/2008 |
