Celebrity Inventors
Comic actor Danny Kaye received patent D166,807 for the co-design of "Blowout Toy or the Like". It's similar to one of those toys that unravels when you blow into at a birthday party except Kaye's has three blowouts going in different directions, not just one.
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| Number | Title | Issue Date |
| 7717061 | Gas switching mechanism for plasma processing apparatus A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device (12) excites a reducing gas supplied thereinto, and ... | 05/18/2010 |
| 7430984 | Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements A plasma reactor for processing a workpiece, the plasma reactor comprising an enclosure, a workpiece support within the enclosure facing an overlying portion of the enclosure, the workpiece support and the overlying portion of the enclosure defining a process region... | 10/07/2008 |
| 7374941 | Active reactant vapor pulse monitoring in a chemical reactor A method and apparatus for determining changes in a supply system, designed to supply repeated pulses of a vapor phase reactant to a reaction chamber is disclosed. One embodiment involves providing the reactant source, and a gas conduit to connect the reactant sourc... | 05/20/2008 |
| 7371332 | Uniform etch system Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to the outer zone within the plasma processing chamber, wher... | 05/13/2008 |
| 7371427 | Reduction of hillocks prior to dielectric barrier deposition in Cu damascene Unwanted hillocks arising in copper layers due to formation of overlying barrier layers may be significantly reduced by optimizing various process parameters, alone or in combination. A first set of process parameters may be controlled to pre-condition the processin... | 05/13/2008 |
| 7363876 | Multi-core transformer plasma source A transformer-coupled plasma source using toroidal cores forms a plasma with a high-density of ions along the center axis of the torus. In one embodiment, cores of a plasma generator are stacked in a vertical alignment to enhance the directionality of the plasma and... | 04/29/2008 |
| 7361890 | Analytical instruments, assemblies, and methods Instrument assemblies including a support coupled to an active substrate are provided with the support being configured to be coupled to an interior portion of an ionization chamber. Instruments are also provided that can include a chamber being configured to contac... | 04/22/2008 |
| 7323701 | Gas discharge lamp A gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation has at least two electrodes for providing a radiaton-emitting plasma in the intervening discharge space. One of the electrodes has a continuous opening to an a... | 01/29/2008 |
| 7302982 | Label applicator and system A label applicator including a support surface having a central area and curving downwardly from the central area. A post assembly extends up from the central area such that a label having a label through-hole can be positioned in a support position generally on the... | 12/04/2007 |
| 7302910 | Plasma apparatus and production method thereof A plasma apparatus includes a container (11) having an opening, a dielectric member (13) supported by an end surface of an outer periphery of the opening of the container (11), an electromagnetic field supplying means for supplying an electromag... | 12/04/2007 |
| 7301277 | Electro-optical apparatus, manufacturing method thereof, and electronic instrument The invention achieves a reduction in a thickness while suppressing a thermal effect. An apparatus includes a light-emitting element and a sealing layer to hermetically seal the light-emitting element. The sealing layer includes a heat radiation layer having thermal... | 11/27/2007 |
| 7300617 | Method of making fusion cast articles Fusion cast indium zinc oxide articles and methods of manufacturing fusion cast indium zinc articles are disclosed. The fusion cast indium zinc articles can be used as sputtering targets for forming transparent conductive films. ... | 11/27/2007 |
| 7296532 | Bypass gas feed system and method to improve reactant gas flow and film deposition A method and reactant gas bypass system for carrying out a plasma enhanced chemical vapor deposition (PECVD) process with improved gas flow stability to avoid unionized reactant precursors and thickness non-uniformities the method including providing a semiconductor... | 11/20/2007 |
| 7285196 | Methods and apparatus for making integrated-circuit wiring from copper, silver, gold, and other metals In recent years, copper wiring has emerged as a promising substitute for the aluminum wiring in integrated circuits, because copper offers lower electrical resistance and better reliability at smaller dimensions than aluminum. However, use of copper typically requir... | 10/23/2007 |
| 7282454 | Switched uniformity control A component delivery mechanism for distributing a component inside a process chamber is disclosed. The component is used to process a work piece within the process chamber. The component delivery mechanism includes a plurality of component outputs for outputting the... | 10/16/2007 |
| 7276122 | Multi-workpiece processing chamber A multi-workpiece chamber includes at least two processing stations, for exposing workpieces to a treatment process. A partition cooperates with the chamber such that the partition is disengagably removable from the chamber and re-engagable with the chamber for sele... | 10/02/2007 |
| 7270713 | Tunable gas distribution plate assembly A gas distribution plate assembly and a method for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate assembly includes a tuning plate coupled to a diffuser plate. The tuning plate has a plurality of orifice holes form... | 09/18/2007 |
| 7269526 | Aggregated run-to-run process control for wafer yield optimization A method for processing wafers in a batch processing tool that optimizes yield by minimizing within batch wafer variation in a wafer process. In a tool having a plurality of available wafer positions for a batch process, the method is useful when less than a full ba... | 09/11/2007 |
| 7242012 | Lithography device for semiconductor circuit pattern generator General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor ... | 07/10/2007 |
| 7223621 | Method of fabricating an array substrate An array substrate for use in an X-ray sensing device and in an LCD device is fabricated using plasma gas treatment. Especially, an indium-tin-oxide (ITO) transparent conductive metallic layer is plasma-treated by N2 plasma, He plasma or Ar plasma, before... | 05/29/2007 |
| 7224921 | Image forming apparatus capable of effectively removing heated air undesirable to image reproduction An image forming apparatus includes an image forming mechanism, a transfer mechanism, a fixing mechanism, and a heat radiation mechanism. The image forming mechanism forms a toner image which is transferred by the transfer mechanism transfers onto a recording sheet ... | 05/29/2007 |
| 7223696 | Methods for maskless lithography General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor ... | 05/29/2007 |
| 7220943 | RF stand offs This invention relates to RV stand offs or breaks and in particular, but not exclusively not to stand offs which are suitable for use in plasma generating apparatus. A stand off 14 includes a resistive or insulating cylinder 15, through which gas feeds... | 05/22/2007 |
| 7205034 | Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus A plasma generation device for generating plasma uniformly over a large surface area by very high frequency (VHF), which is installed in a plasma chemical vapor deposition apparatus. A first and a second power supply section are installed on both ends of the dischar... | 04/17/2007 |
| 7201823 | High throughput plasma treatment system A method for the plasma treatment of parts. The method includes sending loading signals from an electronic control to a transfer mechanism and loading the parts from a position outside of the treatment chamber to a plurality of treatment positions within the treatme... | 04/10/2007 |
| 7202187 | Method of forming sidewall spacer using dual-frequency plasma enhanced CVD A silicon nitride spacer material for use in forming a PFET device and a method for making the spacer includes the use of a dual-frequency plasma enhanced CVD process wherein the temperature is in the range depositing a silicon nitride layer by means of a low-temper... | 04/10/2007 |
| 7192851 | Semiconductor laser manufacturing method A method for manufacturing a semiconductor laser. As a preparative step for coating an end face of a resonator with a dielectric film, a cleavage plane of a semiconductor laminated structure that is to be the end face is subjected to a plasma cleaning to prevent a c... | 03/20/2007 |
| 7193239 | Three dimensional structure integrated circuit A Three-Dimensional Structure (3DS) Memory allows for physical separation of the memory circuits and the control logic circuit onto different layers such that each layer may be separately optimized. One control logic circuit suffices for several memory circuits, red... | 03/20/2007 |
| 7186314 | Plasma processor and plasma processing method A plasma processor includes a table on which a target object is to be placed, a vessel which accommodates the table and in which a plasma is to be generated by a high-frequency electromagnetic field, a high-frequency oscillator (30) which generates a high-fre... | 03/06/2007 |
| 7183715 | Method for operating a semiconductor processing apparatus A method for operating a semiconductor processing apparatus that plasma-processes a semiconductor wafer mounted on a stage placed in a container using a plasma generated therein. The method includes setting a temperature of the semiconductor wafer, and controlling a... | 02/27/2007 |
| 7183220 | Plasma etching methods A plasma etching method includes forming a polymer comprising carbon and a halogen over at least some internal surfaces of a plasma etch chamber. After forming the polymer, plasma etching is conducted using a gas which is effective to etch polymer from chamber inter... | 02/27/2007 |
| 7182842 | Device for amplifying the current of an abnormal electrical discharge and system for using an abnormal electrical discharge comprising one such device A device (1) for amplifying the current of an abnormal electrical discharge, characterized in that it comprises an electrode which is positively polarized (2) and associated with a magnetic circuit (3) producing a magnetic field (4) which... | 02/27/2007 |
| 7176545 | Apparatus and methods for maskless pattern generation General purpose methods for the fabrication of integrated circuits from flexible membranes formed of very thin low stress dielectric materials, such as silicon dioxide or silicon nitride, and semiconductor layers. Semiconductor devices are formed in a semiconductor ... | 02/13/2007 |
| 7169231 | Gas distribution system with tuning gas An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas sup... | 01/30/2007 |
| 7166816 | Inductively-coupled torodial plasma source Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surround... | 01/23/2007 |
| 7166167 | Laser CVD device and laser CVD method A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided. The device comprises a plasma pretreating unit for turning pretreating ... | 01/23/2007 |
| 7161112 | Toroidal low-field reactive gas source An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switc... | 01/09/2007 |
| 7157659 | Plasma processing method and apparatus In a state that a plate-shaped insulator is disposed adjacent to a plate-shaped electrode, a discharge gas containing an inert gas is supplied to a vicinity of a processing object from one gas exhaust port located nearer from the plate-shaped electrode, out of at le... | 01/02/2007 |
| 7156046 | Plasma CVD apparatus A plasma CVD apparatus in which microwave power is supplied into a reaction chamber provided inside an annular waveguide through an antenna provided on the inner peripheral part of the waveguide to produce a plasma inside the reaction chamber and to form a film by a... | 01/02/2007 |
| 7138295 | Method of information processing using three dimensional integrated circuits A Three-Dimensional Structure (3DS) Memory allows for physical separation of the memory circuits and the control logic circuit onto different layers such that each layer may be separately optimized. One control logic circuit suffices for several memory circuits, red... | 11/21/2006 |
