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| Number | Title | Issue Date |
| 8128753 | Method and apparatus for depositing LED organic film In one embodiment the disclosure relates to an apparatus for depositing an organic material on a substrate, including a source heater for heating organic particles to form suspended organic particles; a transport stream for delivering the suspended organic particles... | 03/06/2012 |
| 7439116 | Apparatus and method for forming polycrystalline silicon thin film Apparatus and method for forming a polycrystalline silicon thin film by converting an amorphous silicon thin film into the polycrystalline silicon thin film using a metal are provided. The method includes: a metal nucleus adsorbing step of introducing a vapor phase ... | 10/21/2008 |
| 7416633 | Plasma processing apparatus Described is a vacuum processing apparatus that includes a vacuum container which has a processing chamber inside thereof, wherein a plasma used for processing a sample is formed inside the processing chamber. The processing chamber has an upper side wall which surr... | 08/26/2008 |
| 7393416 | Vapor deposition process and apparatus therefor An apparatus for depositing a ceramic coating on a component. The apparatus includes an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having a vapor pressure that is higher than the remaining oxide compounds, t... | 07/01/2008 |
| 7390366 | Apparatus for chemical vapor deposition An apparatus for CVD is disclosed. Processing gas is injected to an upper center portion of a wafer supporting member by a gas focus ring installed at an inner side surface of a reaction chamber. The processing gas is prevented from coming down to a lower space of t... | 06/24/2008 |
| 7384666 | Method and apparatus for fabricating quantum dot functional structure, quantum dot functional structure, and optically functioning device Fabrication of a quantum dot functional structure having ultra-fine particles homogeneously distributed in a transparent medium includes depositing such particles having a single particle diameter and uniform structure onto a substrate with the transparent medium. A... | 06/10/2008 |
| 7374620 | Substrate processing apparatus A substrate processing apparatus (10A) using a microwave plasma is disclosed wherein an inner partition wall (15) is provided within a process chamber (11) so that the inside of the process chamber (11) is divided into a space (11A... | 05/20/2008 |
| 7371286 | Wiring repair apparatus A wiring repair apparatus includes an XY stage on which a substrate is placed, a laser source unit disposed above the XY stage, first and second gas windows disposed between the laser source unit and the XY stage, and first and second CVD gas units. The laser source... | 05/13/2008 |
| 7361228 | Showerheads for providing a gas to a substrate and apparatus Showerheads including a plate having a plurality of gas outlet holes extending therethrough and a head cover coupled to the plate to form a space between the plate and the head cover. A gas supply inlet member is configured to provide gas to the space directed towar... | 04/22/2008 |
| 7341763 | Thermal spraying device and thermal spraying method A thermal spraying device with a first blowing mechanism for lengthening a droplet formed near the tips of thermal spraying materials by arc, and a second blowing mechanism for a blowing a tip portion of the lengthened droplet to atomize it into droplets and to scat... | 03/11/2008 |
| 7326305 | System and method for decapsulating an encapsulated object A system and method for the selective etching or removal of encapsulating material from an encapsulated object, such as a semiconductor, includes depositing an encapsulant-removal agent, such as a solvent or acid, onto the surface of the object. A flow of heated gas... | 02/05/2008 |
| 7323699 | Apparatus and method for modifying an object A method and apparatus includes positioning a reactant on a surface in specific location and then directing an energy source from a device at the reactant such that it modifies the surface to either remove material or add material. ... | 01/29/2008 |
| 7316893 | Modular containment cell arrangements Modular containment cell arrangements, including modular containment cells to contain an item and at least one processing material associated with processing of the item. ... | 01/08/2008 |
| 7285792 | Scratch repairing processing method and scanning probe microscope (SPM) used therefor A sample to be processed is disposed within a processing cell which contains a liquid. Scratch processing using a scanning probe microscope is performed within the liquid so that chips or shavings removed from the sample scatter within the liquid rather than collect... | 10/23/2007 |
| 7282111 | System and method for monitoring particles contamination in semiconductor manufacturing facilities Provided is a particle monitoring system capable of detecting a level of polymer particle contamination on inner walls of a process chamber. Also disclosed is a method of monitoring the level of polymer particle contamination on inner walls of a process chamber.... | 10/16/2007 |
| 7270724 | Scanning plasma reactor A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas exhaust module. Radiation from the beam forming module and the reactant g... | 09/18/2007 |
| 7271075 | Method and a device for bonding two plate-shaped objects A method for bonding two plate-shaped objects (5) with an adhesive which is cured by ultraviolet light irradiation and by heating. The two plate-shaped objects (5) with the adhesive in between are transported into a cure chamber (11) comprising ... | 09/18/2007 |
| 7262116 | Low temperature epitaxial growth of silicon-containing films using close proximity UV radiation A method of preparing a clean substrate surface for blanket or selective epitaxial deposition of silicon-containing and/or germanium-containing films. In addition, a method of growing the silicon-containing and/or germanium-containing films, where both the substrate... | 08/28/2007 |
| 7253901 | Laser-based cleaning device for film analysis tool A system for analyzing a thin film uses an energy beam, such as a laser beam, to remove a portion of a contaminant layer formed on the thin film surface. This cleaning operation removes only enough of the contaminant layer to allow analysis of the underlying thin fi... | 08/07/2007 |
| 7247584 | System and method for selectively increasing surface temperature of an object A system and method for selectively increasing the thermal effect of a radiant energy source to the surface of an object relative to the substrate is described in the context of rapid thermal processing of semiconductor wafers, and apparatus produced therefrom. A ra... | 07/24/2007 |
| 7235153 | System for removal of a spacer The present disclosure provides a system for removing a spacer, such as associated with a processing operation using a lightly doped drain (LDD) region. In one example, the system includes means for creating a spacer, means for implanting a first relatively heavily ... | 06/26/2007 |
| 7220462 | Method and electrode assembly for non-equilibrium plasma treatment A method and electrode assembly for treating a substrate with a non-equilibrium plasma in which the electrode assembly has two or more spaced barrier electrodes and a ground electrode spaced apart from the two spaced barrier electrodes for passage of a substrate to ... | 05/22/2007 |
| 7211454 | Manufacturing method of a light emitting device including moving the source of the vapor deposition parallel to the substrate The present invention provides an active matrix substrate which can be fabricated at a lower cost and a light emitting device having a large display area fabricated by a vapor deposition system which makes a film with uniform thickness for a large substrate. Accordi... | 05/01/2007 |
| 7181863 | Wafer dryer and method for drying a wafer A wafer dryer and method featuring a nebulizer which emits a pressurized drying liquid stream that converges with an opposed pressurized non-reactive carrier gas stream to produce a drying liquid fog. The pressurized non-reactive gas spray device is disposed partial... | 02/27/2007 |
| 7179726 | Laser processing apparatus and laser processing process A laser processing process which comprises laser annealing a silicon film 2 μm or less in thickness by irradiating a laser beam 400 nm or less in wavelength and being operated in pulsed mode with a pulse width of 50 nsec or more, and preferably, 100 nsec or more. | 02/20/2007 |
| 7166167 | Laser CVD device and laser CVD method A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided. The device comprises a plasma pretreating unit for turning pretreating ... | 01/23/2007 |
| 7156923 | Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method A thermal processing system (1) includes a reaction vessel (2) capable of forming a silicon nitride film on semiconductor wafers (10) through interaction between hexachlorodisilane and ammonia, and an exhaust pipe (16) connected to the re... | 01/02/2007 |
| 7153542 | Assembly line processing method An apparatus for sequential processing of a workpiece comprises an assembly line processing system. The apparatus comprises multiple workpieces moving in an assembly line fashion under multiple process stations. The multiple process stations provide different proces... | 12/26/2006 |
| 7151589 | Lithographic apparatus and patterning device transport According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterni... | 12/19/2006 |
| 7135417 | Method of forming a semiconductor device In the formation of semiconductor devices, a processing method is provided, including steps for forming an oxide layer. The embodied methods involve a series of oxidation steps, with optional interposed cleanings, as well as an optional conditioning step after oxida... | 11/14/2006 |
| 7118781 | Methods for controlling formation of deposits in a deposition system and deposition methods including the same A method for controlling parasitic deposits in a deposition system for depositing a film on a substrate, the deposition system defining a reaction chamber for receiving the substrate and including a process gas in the reaction chamber and an interior surface contigu... | 10/10/2006 |
| 7119016 | Deposition of carbon and nitrogen doped poly silicon films, and retarded boron diffusion and improved poly depletion A compound that includes at least Si, N and C in any combination, such as compounds of formula (R—NH)4-nSiXn wherein R is an alkyl group (which may be the same or different), n is 1, 2 or 3, and X is H or halogen (such as, e.g., bis-tertiary ... | 10/10/2006 |
| 7101588 | Apparatus and method for applying liquid material to form a resin layer A liquid material is applied by spin coating it onto a first main surface of a flat plate to form a coating of the liquid material thereon. The flat plate includes a second main surface which is opposite to the first main surface and a hole which passes through the ... | 09/05/2006 |
| 7097712 | Apparatus for processing a semiconductor A multi-chamber system for providing a process of a high degree of cleanliness in fabricating semiconductor devices such as semiconductor integrated circuits. The system comprises a plurality of vacuum apparatus (e.g., a film formation apparatus, an etching apparatu... | 08/29/2006 |
| 7090727 | Heated gas line body feedthrough for vapor and gas delivery systems and methods for employing same A feedthrough device for use in deposition chambers such as chemical vapor deposition chambers and atomic layer deposition chambers and methods using the same in association with such chambers as well as chambers so equipped. The feedthrough device includes an assoc... | 08/15/2006 |
| 7087119 | Atomic layer deposition with point of use generated reactive gas species An apparatus for atomic layer deposition preventing mixing of a precursor gas and an input gas. From the apparatus a flow of the input gas is provided over a surface of the workpiece wherein a beam of the electromagnetic radiation is directed into the input gas in c... | 08/08/2006 |
| 7070659 | System for filling openings in semiconductor products Explosive forces are used to fill interconnect material into trenches, via holes and other openings in semiconductor products. The interconnect material may be formed of metal. The metal may be heated prior to the force filling step. The explosive forces may be gene... | 07/04/2006 |
| 7071118 | Method and apparatus for fabricating a conformal thin film on a substrate A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser p... | 07/04/2006 |
| 7067439 | ALD metal oxide deposition process using direct oxidation Methods of forming metal compounds such as metal oxides or metal nitrides by sequentially introducing and then reacting metal organic compounds with ozone or with oxygen radicals or nitrogen radicals formed in a remote plasma chamber. The metal compounds have surpri... | 06/27/2006 |
| 7063748 | Methods for coating particles and particles produced thereby Methods of coating core materials by providing target materials and core materials; ablating the target materials to form ablated particulate target materials; and coating the core materials with said ablated particulate target materials; wherein the method is perfo... | 06/20/2006 |
