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| Number | Title | Issue Date |
| 8092601 | System and process for fabricating photovoltaic cell A substrate processing system includes a source unit configured to supply a deposition material to a substrate, a substrate holder configured to hold a substrate to receive the deposition material, a shadow mask comprising a frame that includes two opposing arms; an... | 01/10/2012 |
| 8048227 | Compensation plate used in a film coating device A compensation plate used in a film coating device includes a main body defining a plurality of guiding holes, a plurality of moveable blades connected to the main body, and a plurality of connectors. Each of the plurality of moveable blades defines two through hole... | 11/01/2011 |
| 8002896 | Shadow frame with cross beam for semiconductor equipment A shadow frame and framing system for semiconductor fabrication equipment comprising a rectangular frame having four edges, the edges forming an interior lip with a top surface and an bottom engagement surface; and a cross beam disposed between at least two edges of... | 08/23/2011 |
| 7988785 | Printing head for nano patterning The present invention provides a printing head for nano patterning including a manifold for accommodating a liquid printing material, a cartridge with an injection chamber communicating with the manifold, and a sample holder for patterning installed outside the inje... | 08/02/2011 |
| 7972442 | Photoplate for OLED deposition screen A photoplate for manufacturing a deposition mask that is used to form a matrix of pixel areas used in a display panel. The photoplate comprises a layer of material such as quartz, on which a matrix of pixel etching areas is defined. The pixel etching areas are confi... | 07/05/2011 |
| 7938907 | Device for fabricating a mask by plasma etching a semiconductor substrate A device for fabricating a mask by plasma etching a semiconductor substrate comprises a semiconductor substrate part of the area whereof is partially covered by a mask for protecting at least one area that must not be etched and for exposing at least one area includ... | 05/10/2011 |
| 7887635 | Printing head for nano patterning The present invention provides a printing head for nano patterning including a manifold for accommodating a liquid printing material, a cartridge with an injection chamber communicating with the manifold, and a sample holder for patterning installed outside the inje... | 02/15/2011 |
| 7806982 | Apparatus for fabricating electroluminescent display device The apparatus for fabricating an organic electroluminescent device which can distribute stress applied to the mask uniformly to form precise and reliable light emitting layers is disclosed. The apparatus for fabricating an electroluminescent device according to the ... | 10/05/2010 |
| 7803229 | Apparatus and method for compensating uniformity of film thickness An apparatus and a method for compensating uniformity of film thickness are provided. A shielding plate is provided between a vapor deposition object and a evaporation source. During the vapor deposition process, a shielding plate is continuously moved according to ... | 09/28/2010 |
| 7704326 | Deposition mask and manufacturing method thereof A deposition mask with which position precision of a passage hole is improved and deposition can be conducted precisely and a manufacturing method thereof are provided. A mask body made of a metal thin film is fixed and tightly mounted on a frame body having an open... | 04/27/2010 |
| 7686889 | Susceptor for semiconductor manufacturing apparatus There is provided a susceptor for semiconductor manufacturing apparatus that offers excellent thermal uniformity of a substrate being secured by vacuum chucking. A susceptor for semiconductor manufacturing apparatus includes an aluminum-nitride support member in whi... | 03/30/2010 |
| 7572338 | Mask for depositing thin film of flat panel display and method of fabricating the mask A mask for depositing a thin film of a flat panel display and a method of fabricating the mask are disclosed. Embodiments of the mask can improve position accuracy and prevent problems caused by thermal expansion of the mask by attaching a reinforcing member and mas... | 08/11/2009 |
| 7470329 | Method and system for nanoscale plasma processing of objects A plasma processing system includes a source of plasma, a substrate and a shutter positioned in close proximity to the substrate. The substrate/shutter relative disposition is changed for precise control of substrate/plasma interaction. This way, the substrate inter... | 12/30/2008 |
| 7442258 | Organic electroluminescent device for fabricating shadow mask A shadow mask for uniformly forming an organic luminescent layer of an organic electroluminescent device is disclosed. The shadow mask includes a plurality of striped slots aligned in one direction, the striped slots having a plurality of inclined surfaces formed on... | 10/28/2008 |
| 7435300 | Dynamic film thickness control system/method and its utilization A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and graduall... | 10/14/2008 |
| 7413610 | Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines A method for hard-material coating or heat treatment of the blade airfoils of blisks for gas turbines provides for partial heat-insulation and cooling of the other blisk parts during the respective process to prevent their properties from being changed by the high t... | 08/19/2008 |
| 7396411 | Apparatus for manufacturing single crystal A method for manufacturing a single crystal includes the steps of: flowing a raw material gas toward a seed crystal in a reactive chamber so that the single crystal grows from the seed crystal; controlling the raw material gas by a gas flow control member having a c... | 07/08/2008 |
| 7389580 | Method and apparatus for thin-film battery having ultra-thin electrolyte A method and system for fabricating solid-state energy-storage devices including fabrication films for devices without an anneal step. A film of an energy-storage device is fabricated by depositing a first material layer to a location on a substrate. Energy is suppl... | 06/24/2008 |
| 7371332 | Uniform etch system Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to the outer zone within the plasma processing chamber, wher... | 05/13/2008 |
| 7371286 | Wiring repair apparatus A wiring repair apparatus includes an XY stage on which a substrate is placed, a laser source unit disposed above the XY stage, first and second gas windows disposed between the laser source unit and the XY stage, and first and second CVD gas units. The laser source... | 05/13/2008 |
| 7338699 | Island projection-modified part, method for producing the same, and apparatus comprising the same In film-forming devices and plasma-processing devices, filmy matter adheres to the surfaces of the inner parts and it peels to cause dust and particles in the devices. In the devices, the dust and particles contaminate the objects for film formation thereon or the o... | 03/04/2008 |
| 7331780 | Heat treatment jig for semiconductor wafer A heat treatment jig by the invention comprising: the diameter of a disk-type structure being 60% or more of that of loaded semiconductor wafers; the thickness being 1.0 mm or more but 10 mm or less; the surface roughness Ra of 0.1 μm or more but 100 μm or less at... | 02/19/2008 |
| 7318869 | Variable gas conductance control for a process chamber A deposition system in accordance with one embodiment of the present invention includes a process chamber, a stationary pedestal for supporting a substrate in the process chamber, and a moveable shield forming at least a portion of an enclosure defining the process ... | 01/15/2008 |
| 7311939 | Vacuum coating unit and a method for the differentiated coating of spectacle lenses Substrates, such as spectacle lenses for example, may be provided with a coating which is not uniform by way of screens. The screens are aperture rings, arranged concentric to a symmetry axis of the vaporising crucible in a vacuum coating unit, by way of a screen ho... | 12/25/2007 |
| 7311782 | Apparatus for active temperature control of susceptors A method and an apparatus utilized for thermal processing of substrates during semiconductor manufacturing. The method includes heating the substrate to a predetermined temperature using a heating assembly, cooling the substrate to the predetermined temperature usin... | 12/25/2007 |
| 7306707 | Adaptable processing element for a processing system and a method of making the same The present invention presents an adaptable processing element for use in a processing system having multiple configurations. The processing element comprises a primary component and at least one detachable component, wherein the at least one detachable component ca... | 12/11/2007 |
| 7294245 | Cover ring and shield supporting a wafer ring in a plasma reactor A magnetic dipole ring assembly positioned inside a vacuum chamber and around a wafer being sputter deposited with a ferromagnetic material such as NiFe or other magnetic materials so that the material is deposited with a predetermined magnetization direction in the... | 11/13/2007 |
| 7270715 | Chemical vapor deposition apparatus A chemical vapor deposition apparatus includes a subatmospheric substrate transfer chamber. A subatmospheric deposition chamber is defined at least in part by a chamber sidewall. A passageway in the chamber sidewall extends from the transfer chamber to the depositio... | 09/18/2007 |
| 7270724 | Scanning plasma reactor A scanning plasma reactor for exciting reactant gases at a substrate surface including a beam forming module, a gas injection module, a reaction chamber with a window and a vacuum chuck, a gas exhaust module. Radiation from the beam forming module and the reactant g... | 09/18/2007 |
| 7271111 | Shadow mask deposition of materials using reconfigurable shadow masks A shadow mask deposition system includes a plurality of identical shadow masks arranged in a number of stacks to form a like number of compound shadow masks, each of which is disposed in a deposition vacuum vessel along with a material deposition source. Materials f... | 09/18/2007 |
| 7259026 | Method and apparatus for processing organosiloxane film There is provided a method and apparatus for processing an organosiloxane film, which allow an inter-level insulating film with a low dielectric constant to be formed at a low heat process temperature. A semiconductor (10) with a coating film formed thereon i... | 08/21/2007 |
| 7233499 | Extended memory card An extended memory card capable of coupling to a reduced size memory card and having an electrical connection to a card reader is disclosed. The extended memory card comprises a first flash memory and a first client controller, where the card reader accesses to the ... | 06/19/2007 |
| 7229502 | Method of forming a silicon nitride layer A method of forming a silicon nitride layer is provided. A deposition furnace having an outer tube, a wafer boat, a gas injector and a uniform gas injection apparatus is provided. The wafer boat is positioned within the outer tube for carrying a plurality of wafers.... | 06/12/2007 |
| 7228873 | Valve design and configuration for fast delivery system Embodiments of the invention relate to a substrate processing chamber. In one embodiment a substrate processing chamber includes a chamber body containing a substrate support, a lid assembly comprising an expanding channel extending from a central portion of the lid... | 06/12/2007 |
| 7229666 | Chemical vapor deposition method Methods of chemical vapor deposition include providing a deposition chamber defined at least in part by at least one of a chamber sidewall and a chamber base wall. At least one process chemical inlet to the deposition chamber is included. A substrate is positioned w... | 06/12/2007 |
| 7211145 | Substrate processing apparatus and substrate processing method A substrate processing apparatus include a spin chuck capable of holding a semiconductor wafer in a horizontal position, a drive motor for driving the spin chuck for rotation, and a processing vessel accommodating the spin chuck and the drive motor 50 therein... | 05/01/2007 |
| 7211769 | Heating chamber and method of heating a wafer A heating chamber which can be used during a reflow process to form a metal wiring having a multi-layered writing structure and a method of heating a wafer using the same, are provided. The heating chamber is movable upward and downward between the upper process pos... | 05/01/2007 |
| 7204912 | Method and apparatus for an improved bellows shield in a plasma processing system The present invention presents an improved bellows shield for a plasma processing system, wherein the design and fabrication of the bellows shield coupled to a substrate holder electrode advantageously provides protection of a bellows with substantially minimal eros... | 04/17/2007 |
| 7205237 | Apparatus and method for selected site backside unlayering of si, GaAs, GaAlAsof SOI technologies for scanning probe microscopy and atomic force probing characterization Apparatus for exposure and probing of features in a semiconductor workpiece includes a hollow concentrator for covering a portion of the workpiece connected by a gas conduit to a supply of etchant gas. A stage supports and positions the semiconductor workpiece. Cont... | 04/17/2007 |
| 7205033 | Method for forming polycrystalline silicon film of polycrystalline silicon TFT Disclosed is a method for forming a polycrystalline silicon film of a polycrystalline silicon thin film transistor. The method includes a step of crystallizing an amorphous silicon film deposited on a glass substrate by irradiating a laser beam onto the amorphous si... | 04/17/2007 |
