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| Number | Title | Issue Date |
| 8182608 | Deposition system for thin film formation An apparatus for maintaining the alignment or positional relationship between at least two coating modules in an ALD system, the apparatus comprising a plurality of coating modules in a coating section, at least a first bar and a second bar for supporting the coatin... | 05/22/2012 |
| 8172949 | Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valv... | 05/08/2012 |
| 8137465 | Single-chamber sequential curing of semiconductor wafers The present invention relates to curing of semiconductor wafers. More particularly, the invention relates to cure chambers containing multiple cure stations, each featuring one or more UV light sources. The wafers are cured by sequential exposure to the light source... | 03/20/2012 |
| 8137466 | Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same A thin film deposition apparatus and an organic light-emitting display device by using the same. The thin film deposition apparatus includes an electrostatic chuck, an a plurality of chambers; at least one thin film deposition assembly; a carrier; a first power sour... | 03/20/2012 |
| 8123861 | Apparatus for making interconnect seed layers and products An apparatus for depositing seed layers over a substrate, which substrate includes a patterned insulating layer with at least one opening surrounded by a field, and which opening has sidewalls, bottom surfaces and top corners, includes: a CVD chamber adapted to depo... | 02/28/2012 |
| 8097084 | Vacuum chamber system for semiconductor processing A vacuum chamber system for semiconductor processing includes at least two evacuable vacuum chambers for receiving semiconductor elements to be processed, each including a vacuum chamber opening and a vacuum chamber sealing surface, and transfer aspects by which one... | 01/17/2012 |
| 8088224 | Roll-to-roll evaporation system and method to manufacture group IBIIAVIA photovoltaics The present inventions provide method and apparatus that employ constituents vaporized from one or more constituent supply source or sources to form one or more films of a precursor layer formed on a surface of a continuous flexible workpiece. Of particular signific... | 01/03/2012 |
| 8070880 | Substrate processing apparatus Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube, a substrate holder, a gas nozzle, a heating unit, a temperature detector, and an exhaust unit. The reaction tube accommodates and processes substrates. The sub... | 12/06/2011 |
| 8066815 | Multi-workpiece processing chamber A multi-workpiece chamber includes at least two processing stations, for exposing workpieces to a treatment process. A partition cooperates with the chamber such that the partition is disengagably removable from the chamber and re-engagable with the chamber for sele... | 11/29/2011 |
| 8043432 | Atomic layer deposition systems and methods Systems and methods for depositing thin films using Atomic Layer Deposition (ALD). The deposition system includes a process chamber with a peripheral sidewall, partitions that divide a processing space inside the process chamber into at least first and second compar... | 10/25/2011 |
| 8034178 | Apparatus and method for manufacturing an organic electroluminescence display An apparatus for manufacturing an organic electroluminescence display having an alignment chamber for aligning a mask having openings corresponding to a predetermined pattern with a substrate on which a first electrode layer is formed and detachably attaching the ma... | 10/11/2011 |
| 8034179 | Method for insulating film formation, storage medium from which information is readable with computer, and processing system In order to form an insulating film, which constitutes a flat interface with silicon, by CVD, a surface of silicon is oxidized to form a silicon oxide film using a plasma treatment apparatus in which microwaves are introduced into a chamber through a flat antenna ha... | 10/11/2011 |
| 8021485 | Positioning apparatus In the present positioning apparatus, a positioning apparatus, comprising: a box body including a process chamber exposed to a decompression environment in the interior of the box body and an opening allowing said process chamber to communicate with an outside; a mo... | 09/20/2011 |
| 8021486 | Protective self-aligned buffer layers for damascene interconnects Capping protective self aligned buffer (PSAB) layers are layers of material that are selectively formed at the surface of metal layers in a partially fabricated semiconductor device. Encapsulating PSAB layers are formed not only at the surface of the metal layers, b... | 09/20/2011 |
| 7993456 | Device for carrying out a surface treatment of substrates under vacuum The present invention relates to a device for carrying out a surface treatment of substrates under vacuum, which comprises a housing (1) comprising chambers (2-5) communicate with a vacuum source, at least one of which chambers serves as vacuum ... | 08/09/2011 |
| 7993457 | Deposition sub-chamber with variable flow An apparatus and method for depositing film on a substrate includes a plurality of conduits that allow by-product and reactant gases to flow past the edge of a substrate. The apparatus and process of the present invention has several advantages for enhanced chamber ... | 08/09/2011 |
| 7993458 | Vacuum processing apparatus and method A gas exhaust unit evacuates the inside of a vacuum transfer chamber at a constant exhaust rate. An gas exhaust valve is kept normally open, and a purge gas (N2 gas) is supplied from a purge gas supply source into the vacuum transfer chamber via a mass fl... | 08/09/2011 |
| 7981217 | Vertical heat treatment apparatus and method of transferring substrates to be processed Disclosed herein is a vertical heat treatment apparatus which includes a thermal reactor having a reactor opening, a cover that hermetically closes the reactor opening, a holder that holds a large number of to-be-processed substrates via a ring-shaped support plate ... | 07/19/2011 |
| 7976632 | Vacuum processing apparatus A vacuum processing apparatus includes a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas, and a mass flow contr... | 07/12/2011 |
| 7955436 | Systems and methods for sealing in site-isolated reactors Substrate processing systems and methods are described for site-isolated processing of substrates. The processing systems include numerous site-isolated reactors (SIRs). The processing systems include a reactor block having a cell array that includes numerous SIRs. ... | 06/07/2011 |
| 7938906 | Method and apparatus for dynamic thin-layer chemical processing of semiconductor wafers A semiconductor wafer processing and analysis apparatus (20) includes a processing micro chamber (22) for closely receiving a semiconductor wafer (27) therein. The chamber may be opened for loading and removing the semiconductor wafers and then ... | 05/10/2011 |
| 7935187 | Film forming apparatus The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by th... | 05/03/2011 |
| 7935186 | Plasma processing apparatus A plasma processing apparatus is described and which includes a chamber having at least two processing stations which are separated by a wall. At least one channel is formed in the wall, and wherein the channel has a width to length ratio of less than about 1:3.... | 05/03/2011 |
| 7922819 | Semiconductor manufacturing device Reduction in a space of a manufacturing line, improvement of efficiency, improvement of utilization efficiency of materials, additionally, reduction in the manufacturing cost is realized by applying a means for describing a wiring pattern or a resist pattern directl... | 04/12/2011 |
| 7918939 | Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same A semiconductor manufacturing apparatus comprising: a plurality of vacuum chambers corresponding to a plurality of processing sections necessary for manufacturing a semiconductor device; an exhaust device connected to each vacuum chamber; a plate shaped guide plate ... | 04/05/2011 |
| 7918940 | Apparatus for processing substrate In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chambe... | 04/05/2011 |
| 7905960 | Apparatus for manufacturing substrate An apparatus for manufacturing a substrate includes: a transferring chamber extended along a long direction; at least one process chamber connected to the transferring chamber along the long direction; at least one load-lock chamber connected to the transferring cha... | 03/15/2011 |
| 7883582 | Vacuum processing apparatus and method A gas exhaust unit evacuates the inside of a vacuum transfer chamber at a constant exhaust rate. An gas exhaust valve is kept normally open, and a purge gas (N2 gas) is supplied from a purge gas supply source into the vacuum transfer chamber via a mass fl... | 02/08/2011 |
| 7875119 | Apparatus and method for coating an article A coating apparatus includes a mounting member for mounting a turbine airfoil in a coating chamber. The mounting member defines a chamber therein and includes a mounting port that is adapted to receive the turbine airfoil. The mounting port provides a fluid connecti... | 01/25/2011 |
| 7854805 | Plasma processing plant A plasma processing plant for plastic bottles, having a vacuum chamber arranged inside the processing chamber and when a respective bottle opening is pressed against a valve, the valve will open and establish a connection between the interior of the bottle and the v... | 12/21/2010 |
| 7833351 | Batch processing platform for ALD and CVD A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and s... | 11/16/2010 |
| 7828900 | Vacuum film-forming apparatus A vacuum film-forming apparatus comprising substrate stages; vacuum chamber-forming containers opposed to the stages; a means for moving the substrate between the stages; and gas-introduction means connected to every containers, wherein one of the stage and the cont... | 11/09/2010 |
| 7824496 | Container, container producing method, substrate processing device, and semiconductor device producing method A pressure resistant case (22) is constructed in a rectangular parallelepiped box shape by assembling a bottom plate (61) and ceiling plate (62) and first side plate (63) and second side plate (64) and third side plate (65) ... | 11/02/2010 |
| 7824497 | Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the subst... | 11/02/2010 |
| 7815739 | Vertical batch processing apparatus A semiconductor processing system includes a casing forming a handling area. The handling area includes a main-process area and a pre-process area divided from each other and connected through an openable port. The main-process area and the pre-process area are conn... | 10/19/2010 |
| 7811384 | Method and apparatus for treating substrates in a rotary installation The invention relates to a method and an apparatus for the treatment of substrates, in particular for the coating of plastic containers on a rotary installation. A plurality of treatment devices are arranged on the rotor and pass through a plurality of process phase... | 10/12/2010 |
| 7767023 | Device for containing catastrophic failure of a turbomolecular pump A device for containing the catastrophic failure of a vacuum pumping system is described. The vacuum pumping system includes a turbo-molecular pump (TMP) configured to be coupled to a vacuum processing system at an inlet end. The TMP includes a longitudinal axis sub... | 08/03/2010 |
| 7763115 | Vacuum film-forming apparatus A vacuum film-forming apparatus comprising substrate stages; vacuum chamber-forming containers opposed to the stages; a means for moving the substrate between the stages; and gas-introduction means connected to every containers, wherein one of the stage and the cont... | 07/27/2010 |
| 7699933 | Method and device for the plasma treatment of workpieces The invention relates to a method and a device which are used for the plasma treatment of work pieces. Said work piece is inserted into an at least partially evacuatable chamber of a treatment station (3) and the work piece is positioned inside the treatment ... | 04/20/2010 |
| 7682454 | Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems A seal-protected perimeter partition valve apparatus (450) defines a vacuum and pressure sealed space (401) within a larger space (540) confining a substrate processing chamber with optimized geometry, minimized footprint and 360° substrate acc... | 03/23/2010 |
