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| Number | Title | Issue Date |
| 8105437 | Method and system for large scale manufacture of thin film photovoltaic devices using multi-chamber configuration A method for large scale manufacture of photovoltaic devices includes loading a substrate into a load lock station and transferring the substrate in a controlled ambient to a first process station. The method includes using a first physical deposition process in the... | 01/31/2012 |
| 8021484 | Method of manufacturing epitaxial silicon wafer and apparatus therefor A method of forming an epitaxial layer to increase flatness of an epitaxial silicon wafer is provided. In particular, a method of controlling the epitaxial layer thickness in a peripheral part of the wafer is provided. An apparatus for manufacturing an epitaxial waf... | 09/20/2011 |
| 7632355 | Apparatus and method of treating fine powders The present invention relates to an apparatus and method for economic treatment of Geldhart class C or larger substrate powders of single or plural metal, ceramic, or polymeric materials. In particular, the present invention is directed to coating such powder via a ... | 12/15/2009 |
| 7332032 | Precursor mixtures for use in preparing layers on substrates Methods of forming a layer on a substrate using complexes of Formula I. The complexes and methods are particularly suitable for the preparation of semiconductor structures. The complexes are of the formula LyMYz (Formula I) wherein: M is a meta... | 02/19/2008 |
| 7323052 | Apparatus and method for the production of bulk silicon carbide single crystals An apparatus and method for growing bulk single crystals of silicon carbide is provided. The apparatus includes a sublimation chamber with a silicon vapor species phase outlet that allows the selective passage of atomic silicon vapor species while minimizing the con... | 01/29/2008 |
| 7303991 | Atomic layer deposition methods The invention includes an atomic layer deposition method of forming a layer of a deposited composition on a substrate. The method includes positioning a semiconductor substrate within an atomic layer deposition chamber. On the substrate, an intermediate composition ... | 12/04/2007 |
| 7295932 | Control system and technique for particulate collection systems Methods are provided for monitoring particulate flow distribution throughout particulate collection systems that employ collection vessels such as hoppers and feeders. The collection vessels are positioned in a grid pattern, and the amount of particulate collected f... | 11/13/2007 |
| 7279041 | Atomic layer deposition methods and atomic layer deposition tools An atomic layer deposition method includes positioning a plurality of semiconductor wafers into an atomic layer deposition chamber. Deposition precursor is emitted from individual gas inlets associated with individual of the wafers received within the chamber effect... | 10/09/2007 |
| 7271077 | Deposition methods with time spaced and time abutting precursor pulses An atomic layer deposition method includes positioning a semiconductor substrate within an atomic layer deposition chamber. A first precursor gas is flowed to the substrate within the atomic layer deposition chamber effective to form a first monolayer on the substra... | 09/18/2007 |
| 7245985 | Process and apparatus for improving and controlling the vulcanization of natural and synthetic rubber compounds A process for curing a natural or synthetic rubber compound under a plurality of curing conditions by: (1) obtaining time dependent data streams of dielectric or impedance values from a non-bridged impedance sensing circuit and a capacitor having the rubber compound... | 07/17/2007 |
| 7208065 | Structure for measuring the etching speed The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor syste... | 04/24/2007 |
| 7165340 | Feeding organic material to a heated surface Apparatus for vaporization of powdered material, includes one or more containers each containing possibly distinct powdered materials each having at least one component; a structure for fluidizing the powdered material in each container; a vaporization zone that is ... | 01/23/2007 |
| 7160809 | Process and device for the deposition of an at least partially crystalline silicium layer on a substrate In a process and device for depositing an at least partially crystalline silicon layer a plasma is generated and a substrate (24) is exposed under the influence of the plasma to a silicon-containing source fluid for deposition of silicon therefrom. A pressure... | 01/09/2007 |
| 7103443 | Directed gas injection apparatus for semiconductor processing A method and system for utilizing a gas injection plate comprising a number of shaped orifices (e.g., sonic and simple orifices, and divergent nozzles) in the gas inject system as part of a plasma processing system. By utilizing the shaped orifices, directionality o... | 09/05/2006 |
| 7086934 | Method for treating surfaces of rare earth metal-based permanent magnets A process for treating surfaces of rare earth metal-based permanent magnets, comprising removing an oxide layer formed on a surface of each of the permanent magnets using a blasting apparatus. The apparatus comprises a tubular barrel formed of a mesh net for accommo... | 08/08/2006 |
| 7083861 | EL element An EL element comprising a light transmitting substrate, a light transmitting electrode formed on the substrate, a light emitting layer containing a positive ion absorber, a dielectric layer and a back electrode. Further, an EL element of the present invention conta... | 08/01/2006 |
| 7063748 | Methods for coating particles and particles produced thereby Methods of coating core materials by providing target materials and core materials; ablating the target materials to form ablated particulate target materials; and coating the core materials with said ablated particulate target materials; wherein the method is perfo... | 06/20/2006 |
| 6997989 | Medical implant processing chamber Apparatus and method for treating medical implants are provided. The apparatus may include a vessel having a treatment chamber with an inside surface, an outside surface, an entrance, a plurality of fluid passages passing from the outside surface to the inside surfa... | 02/14/2006 |
| 6974367 | Chemical mechanical polishing process A chemical mechanical polishing process includes rotating at least one of a semiconductor substrate and polishing pad relative to the other. A chemical mechanical polishing slurry is provided intermediate the substrate and pad. The substrate is polished with the slu... | 12/13/2005 |
| 6972050 | Method for depositing in particular crystalline layers, and device for carrying out the method The invention relates to a method for depositing especially, crystalline layers onto especially, crystalline substrates, in a process chamber of a CVD reactor. At least one first and one second reaction gas are each led into a gas outlet area in an input area of the... | 12/06/2005 |
| 6960368 | Deposited-film forming apparatus With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient fo... | 11/01/2005 |
| 6955925 | Annealing A method and apparatus for annealing an integrated ferroelectric device (10) is disclosed in which the device (10) comprises a first layer of material capable of existing in a ferroelectric state and a second layer of material defining an integrated ci... | 10/18/2005 |
| 6932866 | Method for depositing in particular crystalline layers The invention relates to a method and a device for depositing especially crystalline layers on especially crystalline substrates in a process chamber of a reactor housing having a water-cooled wall. The floor of said process chamber is heated. At least one reaction ... | 08/23/2005 |
| 6918963 | Method and apparatus for coating electroluminescent phosphors A process for preparing particles of zinc sulfide-based electroluminescent phosphor having a moisture resistant coating thereon which comprises the steps of selecting a reaction vessel having a given height and a porous disc at the bottom thereof; charging the react... | 07/19/2005 |
| 6916374 | Atomic layer deposition methods and atomic layer deposition tools An atomic layer deposition method includes positioning a plurality of semiconductor wafers into an atomic layer deposition chamber. Deposition precursor is emitted from individual gas inlets associated with individual of the wafers received within the chamber effect... | 07/12/2005 |
| 6907841 | Apparatus and method for synthesizing spherical diamond powder by using chemical vapor deposition method Disclosed are an apparatus and a method to synthesize powders typed diamond with the size between several tens nm to several μm in diameter using conventional CVD processes for deposition of diamond films. Gas phase nucleation has been induced on the boundary of pl... | 06/21/2005 |
| 6872260 | Deposited-film forming apparatus With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient fo... | 03/29/2005 |
| 6827786 | Machine for production of granular silicon A fluidized bed reactor with one or more stages each stage having a heating section located below a reacting section and a mechanism that pulses granules back and forth between the heating and reacting sections, separate injectors for silicon containing gases non si... | 12/07/2004 |
| 6814837 | Controlled gas supply line apparatus and process for infilm and onfilm defect reduction According to one aspect of the disclosure, the present invention provides methods and arrangements for controlling supply process gas to a process chamber for use in the manufacturing industry. Methods include controlling the operation of a valve coupled to the supp... | 11/09/2004 |
| 6803073 | Particle forming method A submicron particle forming method includes feeding a first set of precursors to a first energy application zone. Energy is applied to the first set of precursors in the first energy application zone effective to react and form solid particles having maximum diamet... | 10/12/2004 |
| 6733826 | Method and apparatus for coating electroluminescent phosphors A process for preparing particles of zinc sulfide-based electroluminescent phosphor having a moisture resistant coating thereon which comprises the steps of selecting a reaction vessel having a given height and a porous disc at the bottom thereof; charging the react... | 05/11/2004 |
| 6726767 | Layer processing Layer processing to grow a layer structure upon a substrate surface comprises supplying a vapor mixture stream to the substrate (28) to deposit constituents, monitoring growth with an ellipsometer (12) and using its output in real-time growth control o... | 04/27/2004 |
| 6656524 | Continuous process for gas phase coating of polymerization catalyst A continuous process for gas phase coating of polymerization catalyst. The polymerization catalyst is introduced in a gas phase plug flow type reactor wherein it is submitted to polymerization conditions in the presence of at least one monomer such that a... | 12/02/2003 |
| 6596084 | Pyrolytic carbon coating apparatus having feed gas actuator A fluidized bed pyrolytic carbon coating apparatus (1) is provided for coating substrate surfaces with pyrolytic carbon. The preferred coating apparatus (1) includes a fluidized bed reactor (10) having a reactor chamber (22), a gas feed inlet (24), an exh... | 07/22/2003 |
| 6565655 | High vacuum apparatus for fabricating semiconductor device and method for forming epitaxial layer using the same A high vacuum apparatus for fabricating a semiconductor device includes a reactive chamber provided with an inlet and an outlet for a reactive gas, a suscepter installed in the reactive chamber for mounting the semiconductor thereon and a vacuum pump conn... | 05/20/2003 |
| 6528130 | Exhaust process and film depositing method using the exhaust process In a vacuum processing apparatus comprising a reactor and a vacuum pump connected to the reactor to draw up a gas held in the reactor, the vacuum pump comprising a diffusion pump and an auxiliary pump, the diffusion pump and the auxiliary pump are connect... | 03/04/2003 |
| 6486071 | Spherical shaped semiconductor integrated circuit A spherical shaped semiconductor integrated circuit ("ball") and a system and method for manufacturing same. The ball replaces the function of the flat, conventional chip. The physical dimensions of the ball allow it to adapt to many different manufacturi... | 11/26/2002 |
| 6468352 | Method and apparatus for modifying particles Particles are cooled at a particle introducing section by a cooling device. A vapor of modifying agent for modifying the particles is produced by heating the modifying agent in a vapor producing chamber by a heating device. Further, a supersaturated vapor... | 10/22/2002 |
| 6432256 | Implanatation process for improving ceramic resistance to corrosion A method for improving the corrosion resistance of ceramic parts in a substrate processing chamber by implanting the parts with rare-earth ions. The implanted ceramic parts are highly resistant to corrosive environments that can be formed in semiconductor... | 08/13/2002 |
| 6427622 | Hot wire chemical vapor deposition method and apparatus using graphite hot rods A hot wire chemical vapor deposition method and apparatus for fabricating high quality amorphous, micro-crystalline, and poly-crystalline thin film silicon, or related materials, devices and large area modules is described. A silane gas impinges upon a ho... | 08/06/2002 |
