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| Number | Title | Issue Date |
| 8122848 | Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from d... | 02/28/2012 |
| 8056501 | Film forming apparatus and method of manufacturing light emitting device The problem regarding volatileness of a solvent in an EL forming material, which occurs in adopting printing, are solved. An EL layer is formed in a pixel portion of a light emitting device by printing. Upon formation of the EL layer, a printing chamber is pressuriz... | 11/15/2011 |
| 7661386 | Film forming device A film-forming apparatus of the invention is a film-forming apparatus that includes: a processing container that defines a chamber, a pedestal arranged in the chamber, on which a substrate to be processed can be placed, a showerhead provided opposite to the pedestal... | 02/16/2010 |
| 7647886 | Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers are disclosed herein. In one embodiment, the system includes a gas phase reaction chamber, a first exhaust line coupled to the reaction ch... | 01/19/2010 |
| 7628861 | Pulsed mass flow delivery system and method A system for delivering pulses of a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber. A controller is programmed to receive the desired mass for each pulse through an input ... | 12/08/2009 |
| 7628860 | Pulsed mass flow delivery system and method A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to b... | 12/08/2009 |
| 7615120 | Pulsed mass flow delivery system and method A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to b... | 11/10/2009 |
| 7540923 | Shower head structure for processing semiconductor A shower head structure disposed in a device 2 for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a shower head 12 having a plurality of gas injection holes 20... | 06/02/2009 |
| 7520936 | Hardening processing apparatus, hardening processing method, and coating film forming apparatus The present invention is a hardening processing apparatus for heating a substrate coated with a coating solution to harden the coating film on the substrate, which includes a first processing chamber for mounting the substrate coated with the coating solution on a h... | 04/21/2009 |
| 7422636 | Plasma enhanced atomic layer deposition system having reduced contamination A plasma enhanced atomic layer deposition (PEALD) system is described, wherein the system comprises a processing space and a high vacuum, ultra-clean transfer space. During processing, the substrate to which the thin conformal film is formed is exposed to the proces... | 09/09/2008 |
| 7404860 | Thermal spraying instrument The invention relates to a device and method for controlling the operation of a thermal spray torch (12). The inventive device and method are characterized in that an on-board camera (54) and pyrometer (70) are used to measure the properties of ... | 07/29/2008 |
| 7354254 | Compact vacuum pump A compact turbomolecular vacuum pump (1) is driven by a cup-type motor (8). The cup-shaped rotor of the motor is preferably integrated into the pump rotor (14) and may define corresponding pumping stages, for instance Holweck stages, wherein the... | 04/08/2008 |
| 7332036 | Thermal projection device The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measur... | 02/19/2008 |
| 7323694 | Fluid treatment system and radiation source module for use therein A radiation source module comprising a support member, a radiation source assembly connected to the support member, the radiation source assembly comprising at least one elongate radiation source having a source longitudinal axis and a module-to-surface seal dispose... | 01/29/2008 |
| 7323061 | Thermal spraying instrument The invention relates to a device and method for controlling the operation of a thermal spray torch (12). The inventive device and method are characterised in that an on-board camera (54) and pyrometer (70) are used to measure the properties of ... | 01/29/2008 |
| 7323062 | Thermal projection device The invention relates to a device and a method for control of the operation of a thermal projection torch (12), characterized in that the characteristics of the jet (16) and the temperature of the deposit (24) on the piece (22) are measur... | 01/29/2008 |
| 7320808 | Method and apparatus for coating confectionery centers An improved coating apparatus and an improved method of coating a mass of centers are disclosed. The improved coating apparatus comprises a temperature sensor for measuring the temperature of the surface of the coated centers and/or a moisture sensor for measuring t... | 01/22/2008 |
| 7318867 | Producing cover layers in optical discs Techniques for a cover layer with uniform thickness are disclosed. The cover layer is formed with a type of material, such as glue, in hardened form. In one embodiment, a certain amount of the material in liquid form is dispensed onto a dispensing structure. After t... | 01/15/2008 |
| 7313931 | Method and device for heat treatment After carrying an LCD substrate in a reaction container of a heat treatment unit, blowing a previously heated helium gas from a gas supply part, which opposes to the surface of the LCD substrate, over the entire surface of the LCD substrate. The temperature of the L... | 01/01/2008 |
| 7309269 | Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device In this embodiment, an interval distance between a desposition source holder 17 and an object on which deposition is performed (substrate 13) is reduced to 30 cm or less, preferably 20 cm or less, more preferably 5 to 15 cm, and a deposition source hol... | 12/18/2007 |
| 7304715 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern i... | 12/04/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7284917 | Coating and developing system and coating and developing method A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The c... | 10/23/2007 |
| 7283226 | Measurement system cluster Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for tr... | 10/16/2007 |
| 7279398 | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces The present disclosure provides methods and apparatus useful in depositing materials on batches of microfeature workpieces. One implementation provides a method in which a quantity of a first precursor gas is introduced to an enclosure at a first enclosure pressure.... | 10/09/2007 |
| 7270137 | Apparatus and method of securing a workpiece during high-pressure processing An apparatus is disclosed for performing high-pressure processing of a workpiece having a top face and a bottom face. The apparatus comprises a processing chamber and a holder for securing the workpiece within the processing chamber so that a substantial portion of ... | 09/18/2007 |
| 7267723 | Treating solution supply nozzle, a substrate treating apparatus having this nozzle, and a method of manufacturing a treating solution supply nozzle A resin block has a treating solution channel extending between and opening at front and back surfaces thereof. Heat conductive members are face-bonded to the front and back surfaces of the resin block, respectively, for closing the channel. Consequently, no air is ... | 09/11/2007 |
| 7262390 | Apparatus and adjusting technology for uniform thermal processing An adjusting technology of thermal processing is provided. A heating lamp and a reflector are disposed over a wafer and the heat flux distribution on the wafer generated by the individual heating lamp is measured and adjusted. A set of heating lamps formed by heatin... | 08/28/2007 |
| 7262116 | Low temperature epitaxial growth of silicon-containing films using close proximity UV radiation A method of preparing a clean substrate surface for blanket or selective epitaxial deposition of silicon-containing and/or germanium-containing films. In addition, a method of growing the silicon-containing and/or germanium-containing films, where both the substrate... | 08/28/2007 |
| 7258892 | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition The present disclosure provides methods and systems for controlling temperature. The method has particular utility in connection with controlling temperature in a deposition process, e.g., in depositing a heat-reflective material via CVD. One exemplary embodiment pr... | 08/21/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7255747 | Coat/develop module with independent stations An apparatus for dispensing fluid during semiconductor substrate processing operations. The apparatus includes a first processing chamber, a second processing chamber, and a dispense arm assembly. The apparatus further includes a dispense arm access shutter position... | 08/14/2007 |
| 7254458 | Systems and methods for metrology recipe and model generation Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generat... | 08/07/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7241633 | Heat treatment apparatus and heat treatment method A reference value, which defines electric power to be supplied to a heating element, is generated. Deviation ΔT of temperature T1 measured by a radiation thermometer from target temperature T0 defined by a target temperature rising curve is determined... | 07/10/2007 |
| 7241672 | Method and apparatus for rapid cooldown of annealed wafer A method for annealing a semiconductor substrate. The method includes turning on at least one heat source, heating a semiconductor substrate in a chamber, turning off the at least one heat source, and cooling the semiconductor substrate in the chamber. The heating a... | 07/10/2007 |
| 7235130 | Apparatus and method for diamond production An apparatus for producing diamond in a deposition chamber including a heat-sinking holder for holding a diamond and for making thermal contact with a side surface of the diamond adjacent to an edge of a growth surface of the diamond, a noncontact temperature measur... | 06/26/2007 |
| 7234862 | Apparatus for measuring temperatures of a wafer using specular reflection spectroscopy An apparatus (295) using specular reflection spectroscopy to measure a temperature of a substrate (135). By reflecting light (100) from a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the su... | 06/26/2007 |
| 7211144 | Pulsed nucleation deposition of tungsten layers A method of forming a tungsten nucleation layer using a sequential deposition process. The tungsten nucleation layer is formed by reacting pulses of a tungsten-containing precursor and a reducing gas in a process chamber to deposit tungsten on the substrate. Thereaf... | 05/01/2007 |
| 7211769 | Heating chamber and method of heating a wafer A heating chamber which can be used during a reflow process to form a metal wiring having a multi-layered writing structure and a method of heating a wafer using the same, are provided. The heating chamber is movable upward and downward between the upper process pos... | 05/01/2007 |
