Famous Patents
The first commercial microwave oven was nearly 6 feet tall and weighed in at 750 pounds.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7789037 | Device for the production of thin powder layers, in particular at high temperatures, during a method involving the use of a laser on a material The invention relates to a device serving both to lay thin layers of powder and to compact them, the device being suitable for being located inside an apparatus containing a powder or powder mixture while it is subjected to the action of a laser. The device comprise... | 09/07/2010 |
| 7364771 | Method and apparatus for production of fluorine-containing polyimide film A method for producing a fluorine-containing polyimide film excelling in heat resistance, resistance to chemicals, water repellency, dielectric properties, electrical properties, and optical properties and a spin coater suitable for the method are to be provided. A ... | 04/29/2008 |
| 7361227 | Gas supply system for a powder-fluidizing apparatus A coating apparatus includes a container and a perforated plate separating a plenum from a coating chamber. A gas supply system delivers a gas to the plenum in a sufficient amount for passage of the gas through the plate and suspension of a powder in a fluidized con... | 04/22/2008 |
| 7332198 | Plating apparatus and plating method There is provided a plating apparatus and method which can control the temperature of a plating solution during plating more uniformly and easily form a uniform plated film on the to-be-plated surface of a workpiece, and which can simplify the device and decrease th... | 02/19/2008 |
| 7326437 | Method and system for coating polymer solution on a substrate in a solvent saturated chamber A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solu... | 02/05/2008 |
| 7320808 | Method and apparatus for coating confectionery centers An improved coating apparatus and an improved method of coating a mass of centers are disclosed. The improved coating apparatus comprises a temperature sensor for measuring the temperature of the surface of the coated centers and/or a moisture sensor for measuring t... | 01/22/2008 |
| 7299810 | Substrate treating apparatus with circulating and heating mechanism for removal liquid A substrate treating apparatus includes a spin chuck for supporting a substrate to be rotatable in a plane including a principal surface of the substrate, a motor for rotating the spin chuck, a circulating pump for circulating a removal liquid and transmitting the r... | 11/27/2007 |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7241340 | System configured for applying a modifying agent to a non-equidimensional substrate The present invention is related to systems and methods for modifying various non-equidimensional substrates with modifying agents. The system comprises a processing chamber configured for passing the non-equidimensional substrate therethrough, wherein the processin... | 07/10/2007 |
| 7238235 | Adhesion promoter application system and process A system and method for applying a material for improving the adhesion between the surface of thermoplastic polyolefin (TPO) elements and a coating applied thereto is disclosed. The system comprises the mixing of an adhesion promoter with de-ionized water and applyi... | 07/03/2007 |
| 7232490 | Apparatus and method for coating stents An apparatus for coating stents and a method of using the same is provided. ... | 06/19/2007 |
| 7217113 | Process and installation for the manufacturing of a coating for an impression cylinder Manufacturing a coating for an impression cylinder whereby a carrier and a cylinder shape is provided. A hollow cylinder is positioned between the carrier and the cylinder shape, and material to form the coating in the spaces is introduced between the carrier and th... | 05/15/2007 |
| 7204001 | Zipper pull tab The surfaces of a metal pull tab which is hingedly secured to a metal bracket on a zipper slider and/or the surface of the bracket which engages the pull tab is covered by a non-metallic relatively soft coating which prevents wear caused by metal-to-metal contact be... | 04/17/2007 |
| 7192996 | Manufacturing solvent-free solid paint A method and apparatus for manufacturing small batches of solid paint is disclosed, which method includes a first step of providing a component of the solid paint as a liquid in a heated mixing container that has a base and sides and includes a stirrer for stirring ... | 03/20/2007 |
| 7182813 | Production apparatus of multilayer coating film The coating construction has flexibility corresponding to the number of layers of multiple coating layers, by which a multilayer coating film can be produced with small film thickness without adherence of dust to a film surface, a drying fault such as unevenness ind... | 02/27/2007 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7114754 | Mobile construction support vehicle A vehicle for use in the construction trade to support steel building fabrication and support issues. In the preferred embodiment, the vehicle comprises a trailer, a mobile type unit containing enough equipment to handle most tasks used on a construction site, parti... | 10/03/2006 |
| 7109561 | Method of manufacturing a semiconductor device and a method for fixing the semiconductor device using substrate jig The present invention relates to a method of manufacturing a semiconductor substrate including the back grind step, the dicing step, the pick up step, and the die bonding step of the wafer; and to a semiconductor substrate jig used in such method. The object of the ... | 09/19/2006 |
| 7086408 | Multipurpose system for the automatic washing and drying of industrial containers and appliances in controlled environmental conditions The present invention relates to a multipurpose system for the automatic washing and drying of industrial containers and appliances, in controlled environmental conditions. ... | 08/08/2006 |
| 7077917 | High-pressure processing chamber for a semiconductor wafer A processing chamber having an improved sealing means is disclosed. The processing chamber comprises a lower element, an upper element, and a sealing means that tightly holds the lower element to the upper element to define a processing volume that is maintained usi... | 07/18/2006 |
| 7022451 | Method of coating a cylindrical photoconductive element for an electrophotographic image forming apparatus and apparatus for the same A method of coating a photoconductive element for an electrophotographic image forming-apparatus and an apparatus therefore are disclosed. A plurality of cylindrical bodies are immersed in a bath, which stores a coating liquid, at the same time and then lifted out o... | 04/04/2006 |
| 7018476 | Device for applying a coating agent A device for applying a coating medium onto a substrate, includes at least one spray valve that has a nozzle opening that can be adjusted with regard to its effective outlet area using a closing mechanism, whereby the substrate can be moved past the spray valve, whi... | 03/28/2006 |
| 6969428 | Self-cleaning system for dry recovery of processing mists in automatic machines for spraying paints Suitable corrugated filter grids (7, 7′) are mounted on the suction intakes (6, 6′) and are positioned with a downward inclination towards the conveyor (4) of the machine, their lower ends allowing drops to fall on to this conveyor. The suct... | 11/29/2005 |
| 6962248 | Printed circuit board support A printed circuit board conveying and processing system. In accordance with the present invention, a printed circuit board conveying system is provided comprising a pair of conveyor rails and a printed circuit board support. The conveyor rails are positioned to enga... | 11/08/2005 |
| 6938629 | Rinsing lid for wet bench A rinsing lid for a wet bench cleaning chamber used in the rinsing of acids, chemicals and/or particles from semiconductor wafers. The rinsing lid includes a lid housing having an upper water reservoir for receiving a stream of deionized water or other cleaning liqu... | 09/06/2005 |
| 6913651 | Apparatus and method for electroless deposition of materials on semiconductor substrates An apparatus of the invention has a closable chamber that can be sealed and is capable of withstanding an increased pressure and high temperature. The chamber contains a substrate holder that can be rotated around a vertical axis, and an edge-grip mechanism inside t... | 07/05/2005 |
| 6913650 | Component impregnation A machine for impregnating a die cast metal part with liquid impregnant comprises an impregnation chamber having liquid impregnant in a lower portion, an opening for ingress and egress of the parts being defined in a side wall of the chamber above the liquid impregn... | 07/05/2005 |
| 6902619 | Liquid phase epitaxy The invention provides a method of growing semiconductor epitaxial layers on a substrate comprising the steps of providing a substrate, providing at least a first growth solution and optionally one or more further ... | 06/07/2005 |
| 6872254 | Method and apparatus for controlling air over a spinning microelectronic substrate A method and apparatus for forming a generally uniform liquid layer on a surface of an upper surface microelectronic substrate. The apparatus can include a support that engages less than the entire lower surface of the microelectronic substrate and rotates the micro... | 03/29/2005 |
| 6860075 | Device for surface treatment and/or coating and/or producing construction elements, in particular, flat construction elements of glass, glass alloys or metals, by a continuous process A device for surface-treating, coating or producing construction elements in a continuous process has production chambers arranged successively closely adjacent to one another in a direction of transport of the construction elements through the device. Each producti... | 03/01/2005 |
| 6858084 | Plating apparatus and method The present invention relates to an electroless plating apparatus which can reduce an amount of a plating liquid to be used, maintain a stable plating process, be downsized, reduce an apparatus cost, form a film having a uniform thickness over an entire surface, and... | 02/22/2005 |
| 6852166 | Method for coating a cylindrical photoconductive element for an electrophotographic image forming apparatus and apparatus for the same A method of coating a photoconductive element for an electrophotographic image forming apparatus and an apparatus therefore are disclosed. A plurality of cylindrical bodies are immersed in a bath, which stores a coating liquid, at the same time and then lifted out o... | 02/08/2005 |
| 6830620 | Powder coating booth containment structure A powder coating booth containment structure including first and second canopy halves, each of which is a substantially nonconductive, seamless, structural composite to substantially reduce oversprayed powder particle adhesion to the booth inner surfaces. The compos... | 12/14/2004 |
| 6790783 | Semiconductor fabrication apparatus Methods and apparatus for fabricating and cleaning in-process semi-conductor wafers are provided. An in-process wafer is placed within a closed chamber. A reactant gas is incorporated in a liquid solvent to form a “reactant mixture” that is capable of reacting w... | 09/14/2004 |
| 6752872 | Coating unit and coating method The present invention is a coating unit for applying a coating solution on a substrate, comprising: a container enclosing the substrate; a casing for accommodating the container therein; a supply device for supplying a predetermined gas into the casing; a first exha... | 06/22/2004 |
| 6719844 | Deposition method, deposition apparatus, and pressure-reduction drying apparatus Using a scan coating method, a liquid film is formed on a substrate having a temperature distribution for correcting a temperature distribution of a liquid film caused by the heat of evaporation due to the volatilization of a solvent contained in the liquid film, an... | 04/13/2004 |
| 6682598 | Apparatus for casting and drying ceramic tape A drying apparatus 10 for casting machine 80, including tunnel 20 divided into first chamber 41 and second chamber 46 by barrier 35. Each chamber 41,46 includes gas inlet 50 connected to gas source 100 for introducing inert carrier gas into chamber 41,46 ... | 01/27/2004 |
| 6673151 | Substrate processing apparatus A spin chuck for holding a wafer to the front face of which a resist solution is supplied, a cup for housing the spin chuck and forcibly exhausting an atmosphere around the wafer by exhaust from the bottom thereof, and an air flow control plate, provided ... | 01/06/2004 |
