Pillow with retractable umbrella
A pillow assembly having a supporting assembly and a retractable umbrella assembly that is easily transportable and allows a user to support his/her head while covering their face from sunlight.
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7258706 | Abrasive particles for surface polishing Polishing compositions are described that are appropriate for fine polishing to very low tolerances. The polishing compositions include particles with small diameters with very narrow distributions in size and effectively no particles with diameters several times la... | 08/21/2007 |
| 7232529 | Polishing compound for chemimechanical polishing and polishing method This invention provides a polishing medium for CMP, comprising an oxidizing agent, a metal-oxide-dissolving agent, a protective-film-forming agent, a water-soluble polymer, and water, and a polishing method making use of this polishing medium. Also, it is preferable... | 06/19/2007 |
| 7211122 | Polishing composition and rinse composition A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide. ... | 05/01/2007 |
| 7204865 | Polishing composition The present invention relates to a polishing composition that can be preferably used to polish a silicon wafer. The polishing composition includes a block polyether represented by the chemical formula HO—(EO)a—(PO)b—(EO)c—H, ... | 04/17/2007 |
| 7196010 | Slurry for chemical mechanical polishing process and method of manufacturing semiconductor device using the same A slurry composition useful for chemical mechanical polishing of the surface of a material layer, e.g., a silicon oxide layer, is disclosed. A first material surface which is exposed to the slurry exhibits hydrophilicity, while a second material layer, e.g., a polys... | 03/27/2007 |
| 7156717 | situ finishing aid control A method of using finishing aids for advanced finishing control is described. A finishing surface is used generally to induce frictional wear. The finishing aids with preferred in situ control can improve control of the coefficient of friction, the tangential force ... | 01/02/2007 |
| 7131890 | In situ finishing control An apparatus and method of using a in situ finishing information for finishing semiconductor wafers is described. The method uses operative sensors such as friction sensors for detecting and improving control during finishing. The method can aid control of finishing... | 11/07/2006 |
| 7052522 | Polishing composition and polishing method using the same A polishing composition of the present invention, which is used in polishing the edge of a wafer for semiconductor devices, effectively suppresses remaining amounts of abrasives on the wafer. The polishing composition includes silicon dioxide, an alkaline compound, ... | 05/30/2006 |
| 6964923 | Selective polishing with slurries containing polyelectrolytes Polishing rate selectivity is increased by providing a polyelectrolyte in the polishing slurry. The polishing selectivity of silicon oxide to silicon nitride is enhanced by using an anionic polyelectrolyte. The polishing selectivity of metals to silicon oxide, silic... | 11/15/2005 |
| 6863717 | Plate handling system and a method of removing plates from rail ties A rail plate handling device is provided for removing plates located on rail ties on a railroad track having a pair of rails, and includes a frame configured for movement relative to the track, at least one tie plate gripping assembly mounted to the frame, the assem... | 03/08/2005 |
| 6491745 | Water/oil repellent composition The object is to provide a water/oil repellent composition which can simultaneously perform a water/oil treatment and a polishing treatment to leather products such as leather shoes, etc., by using one water/oil repellent composition, and can also exert e... | 12/10/2002 |
| 6391226 | Coating or sealing composition A coating or sealing composition comprising: (a) at least one agent adapted to form a coat or seal when applied onto a substrate; (b) at least one sensor adapted to reveal the presence of the coat or seal under determined conditions; and (c) a volatile excipie... | 05/21/2002 |
| 6117220 | Polishing composition and rinsing composition A polishing composition for a memory hard disc, which comprises the following components (a) to (d): (a) water, (b) at least one compound selected from the group consisting of a polystyrenesulfonic acid, and its salts, (c) a compound selected from the group co... | 09/12/2000 |
| 6011104 | Footware dressings incorporating fluorocarbons Footware dressings containing fluorocarbons in a carrier base plus optional colorants and additives. These dressings create a relatively slick and non-stick surface with excellent "contamination" resistance.... | 01/04/2000 |
| 5645736 | Method for polishing a wafer A method is shown for polishing a workpiece such as a semiconductor wafer. A polishing composition is first formed which includes (1) a polishing media particle; and (2) a film forming binder for suspending the particle and forming a temporary film on an ... | 07/08/1997 |
| 5614005 | Water resistant shoe polish A water resistant shoe polish including in addition to a tradition base mixture of wax and turpentine oil, petroleum benzin, high vacuum silicone grease, glycerin, glycerol stearate and stearic acid. The composition greatly enhances the retention period o... | 03/25/1997 |
| 5378271 | Tire polishing and protective composition The invention provides a tire polishing and protective composition including, as dissolved or dispersed in an organic solvent, 2 to 25% by weight of a silicone varnish, 0.1 to 4% by weight of a rubber type polymer and 0.1 to 10% by weight of a tackifier.... | 01/03/1995 |
| 5352277 | Final polishing composition A final polishing composition for polishing a silicon wafer used as a substrate crystal in electrical integrated circuits comprises water, colloidal silica, a water-soluble polymeric compound, and a water-soluble salt.... | 10/04/1994 |
| 5300130 | Polishing material A novel polishing slurry for particularly hard materials such a silicon carbide has been found. The slurry comprises diamond particles with a median particle size of around a micron and alpha alumina particles with a median size of from about 20 to about ... | 04/05/1994 |
| 5264010 | Compositions and methods for polishing and planarizing surfaces An abrasive composition for use in polishing or planarizing the surface of a work piece is provided comprising about 30 to 50 percent of cerium oxide; about 8 to about 20 percent of fumed silica and about 15 to about 45 percent of precipitated silica. Met... | 11/23/1993 |
| 5149338 | Superpolishing agent, process for polishing hard ceramic materials, and polished hard ceramics A process for superpolishing hard ceramic substrates, and super polished substrates having surface finishes below about 20 angstroms RMS. The process comprises applying a pitch to a lap tool and forming channels in the pitch. The pitch is wetted with a po... | 09/22/1992 |
| 5055132 | Floor polish composition with improved gloss The addition of 2-pyrrolidone in combination with a surfactant having an HLB range of 13 to 15 and a formula C9 H19 C6 H4 (OCH2 OCH2)n OH in which n has an average value of 15 im... | 10/08/1991 |
| 5041235 | Liquid hard surface cleaner for porous surfaces A process and liquid composition for cleaning, restoring and polishing a hard, porous surface wherein the composition contains from 0.1 to 4 weight percent of a surfactant, from 5 to 20 weight percent of a synthetic hydrocarbon oil, and from 76 to 94.9 we... | 08/20/1991 |
| 5028458 | Antiseptic polish There is disclosed an antiseptic polish for covering highly touched surfaces which contain a solution comprising Povidone-Iodine of approximately 7.5 to 10 percent by volume dispersed in a liquid polish.... | 07/02/1991 |
| 4950467 | Ultraviolet radiation absorbing compositions Sunscreen compositions are described which contain certain 5-phenylpentadienoate esters which act as UV filters when incorporated in a carrier in amounts ranging from 0.1-50% by weight.... | 08/21/1990 |
| 4898598 | Compound and method for polishing stone The present invention relates to a compound and method for polishing stone wherein the compound is a mixture of metallic oxides, a resin and a pre-prepared gel which compound is utilized in conjunction with sandpaper of varying grits to provide a smooth h... | 02/06/1990 |
| 4828885 | Ski wax composition and process of application A wax composition for waxing skis comprising a wax matrix having incorporated therein a silicone polymer of relatively low volatility.... | 05/09/1989 |
| 4729533 | Support apparatus A support for an object of appreciable weight (e.g., for a CRT display) comprises a mount 10 which, in use is located at a reference height. A crank 20 extends from this mount. A boom 12 is pivotally mounted on the mount and extends therefrom to and carri... | 03/08/1988 |
| 4240939 | Wood finishing composition A wood finishing composition comprising about three parts by volume of an alcoholic solution of white shellac, about two parts by volume of a solution of an oil modified polyurethane resin and about one part by volume of a drying oil. The wood finishing c... | 12/23/1980 |
| 4186250 | Method of desensitizing image-bearing lithographic plates Aqueous solutions are provided for treating imagebearing lithographic plates. These solutions include as an active polmyer component: (a) a polyacrylamide-based polymer wherein from about 3 to about 70 percent of the carbonyl sites are carboxyl groups, and the... | 01/29/1980 |
| 4131585 | Leveling agent for floor polishes A novel leveling agent for self polishing dry-bright floor polishes having the following general structure is described: ##STR1## where R is either a non-linear aliphatic hydrocarbon or mixture of hydrocarbons containing 8 to 15 carbon atoms or an al... | 12/26/1978 |
| 4071645 | Aqueous coating composition The aqueous coating composition, which is particularly adaptable for use as a household floor polish or a temporary protective coating for various articles, contains a non-volatile, solid film former, such as an acrylic copolymer, dispersed in the aqueous... | 01/31/1978 |
| 4070510 | Aqueous polish composition The aqueous base polish composition, which is particularly adaptable for use as a household floor polish, contains a non-volatile, solid film former, such as an acrylic copolymer, dispersed in the aqueous phase or base, a water-soluble, acid-base indicato... | 01/24/1978 |
| 3992335 | Self-shining floor care compositions A composition capable of rendering the surface of a substrate such as a wooden parquet floor shiny, without prior stripping and without subsequent polishing, by simply applying and drying the same on such surface, and which composition is a true, anhydrou... | 11/16/1976 |
| 3959530 | Cleaning and protective coating composition and method A waxing and protective coating composition embodying the invention comprises a mixture of wax residue such as paraffin and microcrystalline wax, chlorinated solvent, petroleum distillate, and a nonionic surfactant such as nonylphenoxypoly-(ethyleneoxy)et... | 05/25/1976 |