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| Number | Title | Issue Date |
| 7419718 | Solution for forming ultra hydrophilic photocatalyst film, construct provided with the film and process for producing the same A coating film forming liquid containing a saccharide, and titanium oxide fine particles having peroxy groups or titanium oxide fine particles not having peroxy groups is applied onto a surface of a substrate such as glass, metal or a tile, and then heating is carri... | 09/02/2008 |
| 7384871 | Chemical mechanical polishing compositions and methods relating thereto The present invention provides an aqueous composition useful for polishing nonferrous metal interconnects on a semiconductor wafer comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, modified cellulose, 0.01 to 5% by wei... | 06/10/2008 |
| 7303993 | Chemical mechanical polishing compositions and methods relating thereto The present invention provides an aqueous composition useful for CMP of a semiconductor wafer containing a metal comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, modified cellulose, 0.001 to 10% by weight copolymer bl... | 12/04/2007 |
| 7300478 | Slurry composition and method of use The present invention provides an aqueous slurry composition that comprises cerium oxide and/or cerium oxide-containing mixed rare earth oxide abrasive particles, a polyacrylate, and an agent that retards hard settling. The agent that retards hard settling is prefer... | 11/27/2007 |
| 7211121 | Polishing composition The present invention relates to a polishing composition more suitable for use in polishing synthetic resin products or metal products. The polishing composition includes a reaction product produced by a reaction between a polyalkylene oxide and a compound having a ... | 05/01/2007 |
| 7211122 | Polishing composition and rinse composition A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide. ... | 05/01/2007 |
| 7204865 | Polishing composition The present invention relates to a polishing composition that can be preferably used to polish a silicon wafer. The polishing composition includes a block polyether represented by the chemical formula HO—(EO)a—(PO)b—(EO)c—H, ... | 04/17/2007 |
| 7074746 | Nail polish remover A nail polish remover and methods of removing nail polish are provided, where the nail polish remover includes a least one heterocyclic solvent having a carbonyl group. A thickening agent may be included. ... | 07/11/2006 |
| 7052522 | Polishing composition and polishing method using the same A polishing composition of the present invention, which is used in polishing the edge of a wafer for semiconductor devices, effectively suppresses remaining amounts of abrasives on the wafer. The polishing composition includes silicon dioxide, an alkaline compound, ... | 05/30/2006 |
| 7037379 | Anti-tarnish aqueous treatment An aqueous solution that has the capacity for removing tarnish and other soil from copper, silver, gold and other noble metals and alloys thereof comprises an acid, thiourea and a transition metal salt. The aqueous material can be used to treat the surfaces of such ... | 05/02/2006 |
| 6824578 | Abrasive material A polishing material is provided in which the dispersibility of the abrasive grains of the polishing material having, as a major component, rare earth oxides including cerium oxide is made better and the hardness of abrasive grain precipitates is reduced, and at the... | 11/30/2004 |
| 6736997 | Sol-gel derived resistive and conductive coating A composition for application to a substrate to form a an electrically conductive coating thereon. The composition includes a sol-gel solution filled with a conductive powder. The coating may be conductive or resistive depending on the application. A process is prov... | 05/18/2004 |
| 6607571 | Polishing composition and method To provide a polishing composition which enables maintenance of excellent properties and high quality of the surface of a hard disk without lowering polishing rate during polishing of the surface, and which can provide a polished surface in which the amou... | 08/19/2003 |
| 6544307 | Polishing composition and manufacturing and polishing methods A polishing compound containing cocoon-shaped silica particles and crystal silica particles, and water-soluble polymers including; at least one type selected from the groups including ammonium nitrate and ammonium acetate, and at least one type selected f... | 04/08/2003 |
| 6530968 | Chemical mechanical polishing slurry This invention provides a chemical mechanical polishing slurry for polishing a metal film formed on an insulating film with a concave on a substrate wherein the slurry contains a thickener without an ionic group with an opposite sign to a charge on a poli... | 03/11/2003 |
| 6494928 | Polishing compound for sheet metal coating There is provided a polishing compound for sheet metal coating comprising an polishing material and a surfactant in which a RB ceramics and/or CRB ceramics powder is used at least as a part of the polishing material, thereby shortening a stain removing pr... | 12/17/2002 |
| 6491745 | Water/oil repellent composition The object is to provide a water/oil repellent composition which can simultaneously perform a water/oil treatment and a polishing treatment to leather products such as leather shoes, etc., by using one water/oil repellent composition, and can also exert e... | 12/10/2002 |
| 6488729 | Polishing composition and method To provide a polishing composition which enables maintenance of excellent properties and high quality of the surface of a hard disk without lowering polishing rate during polishing of the surface, and which can provide a polished surface in which the amou... | 12/03/2002 |
| 6162268 | Polishing slurry The invention provides a mixture for polishing surfaces. The mixture includes polishing particles having an average size of less than 10 μm and water. It also includes an accelerator for chemically attacking a surface and a starch for reducing vibration ... | 12/19/2000 |
| 5945474 | Composition and method for removing a substance from a finished surface A composition for removing a substance from a surface is prepared by: forming a gelatinous base material comprising water and a rheology agent; forming a solvent; forming a neutralizing agent; combining the gelatinous base material and the solvent with mi... | 08/31/1999 |
| 5882713 | Non-separable compositions of starch and water-immiscible organic materials A stable and non-separable composition comprised of starch and a water-immiscible material can be prepared in the absence of external emulsifying or dispersing agents by thoroughly solubilizing an aqueous dispersion of the starch at elevated temperatures ... | 03/16/1999 |
| 5431840 | Process for the production of cleaning and care preparations containing APG emulsifier In the new process, cleaning and care preparations for floors, shoes, leather and furniture are produced by mixing a wax emulsion containing alkyl glycoside as emulsifier with the other constituents of the preparation. The alkyl glycosides correspond to t... | 07/11/1995 |
| 5397384 | Furniture polish composition A composition which comprises approximately by weight 1 to 8 percent of a hydrocarbon solvent; 1 to 4 percent of a silicone; 1 to 5.5 percent of at least one nonionic surfactant; 0.5 to 3 percent of an alkali metal neutralized tall oil fatty acid and 0.25... | 03/14/1995 |
| 5352277 | Final polishing composition A final polishing composition for polishing a silicon wafer used as a substrate crystal in electrical integrated circuits comprises water, colloidal silica, a water-soluble polymeric compound, and a water-soluble salt.... | 10/04/1994 |
| 5085694 | Polish compositions An improved polish having improved rub-out characteristics results when a silylated polyether film former is incorporated into a conventional polish formulation. The silylated polyether contains at least one polyoxyalkylene block selected from the group c... | 02/04/1992 |
| 4801331 | Nail lacquer remover composition A nail lacquer remover of the transparent gel type, consisting essentially of: (1) 30-65% by weight of a carbonate selected from the group consisting of ethylene carbonate, propylene carbonate, butylene carbonate and glycerine carbonate; (2) 10-50% by wei... | 01/31/1989 |
| 4712571 | Nail polish compositions and means for applying same A novel nail polish composition having a low viscosity, i.e. not greater than about 200 cps comprising from about 3.0% to about 24.0% a shade paste, suitable film former and thinner and a pen-like means for applying said nail polish having a substantially... | 12/15/1987 |
| 4699807 | Finish restorer A composition containing ethanolamine, a silicate and a protective colloid is useful to restore broken, crazed, or alligatored finishes without removing the intact finish beneath.... | 10/13/1987 |
| 4260396 | Compositions for polishing silicon and germanium A composition for polishing silicon and germanium comprises a synthetic amorphous silica polishing agent and a suspending agent selected from the group consisting of water-soluble carboxypolymethylene gums and xanthum gums. The composition may be used for... | 04/07/1981 |
| 4233075 | Preservative solution for material shining cloth A food base preservative for material surfaces such as finished furniture surfaces, painted surfaces, glass surfaces, vinyl plastic surfaces, and the like. The preservative solution is made from okra, water and a food preservative agent, and it is used by... | 11/11/1980 |
| 4222747 | Polishing material for ophthalmic lenses The invention relates to a polishing material of the type containing powdered cerium oxide suspended in water. According to the invention, this polishing material also contains, in combination, a substance for use as a thickener and a substance for reduci... | 09/16/1980 |
| 4161394 | Polishing slurry of xanthan gum and a dispersing agent A solution for use in suspending 0.05 to 15 micron ceria or alumina particles to produce a slurry for polishing lenses and semiconductor wafers is disclosed. The solution consists of water containing from 0.06 to 0.75 percent by weight of xanthan gum and ... | 07/17/1979 |
| 4035163 | Conditioning cleanser for ceramic surfaces An alkaline cleaning and conditioning composition for ceramic surfaces is provided in the form of an abrasive powder mixture including a surfactant, and a silicone oil absorbed in a water soluble absorbent powder.... | 07/12/1977 |
| 3992335 | Self-shining floor care compositions A composition capable of rendering the surface of a substrate such as a wooden parquet floor shiny, without prior stripping and without subsequent polishing, by simply applying and drying the same on such surface, and which composition is a true, anhydrou... | 11/16/1976 |
| 3960832 | Polysaccharide and bacterial fermentation process for its preparation A process for producing a novel heteropolysaccharide by a bacterial fermentation in which a new bacteria is incubated in a final fermentation medium containing a suitable carbohydrate source, a source of magnesium ions, a source of phosphorus and nitrogen... | 06/01/1976 |
| 3959530 | Cleaning and protective coating composition and method A waxing and protective coating composition embodying the invention comprises a mixture of wax residue such as paraffin and microcrystalline wax, chlorinated solvent, petroleum distillate, and a nonionic surfactant such as nonylphenoxypoly-(ethyleneoxy)et... | 05/25/1976 |
| 3949104 | Starch containing concentrates The invention encompasses intermediate, starch-containing products in which the starch thickening capacity is inhibited by an aqueous dispersant system. These intermediate products can be readily converted into a starch thickened end-product by combining ... | 04/06/1976 |