Bizarre Patents
Combination Beverage Container and Spittoon
A combination beverage container and spittoon includes a bottom portion including outer wall and a first inner wall defining a spittoon space.
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| Number | Title | Issue Date |
| 6117220 | Polishing composition and rinsing composition A polishing composition for a memory hard disc, which comprises the following components (a) to (d): (a) water, (b) at least one compound selected from the group consisting of a polystyrenesulfonic acid, and its salts, (c) a compound selected from the group co... | 09/12/2000 |
| 6117783 | Chemical mechanical polishing composition and process A composition for chemical mechanical polishing includes a slurry. A sufficient amount of a selectively oxidizing and reducing compound is provided in the composition to produce a differential removal of a metal and a dielectric material. A pH adjusting c... | 09/12/2000 |
| 6106380 | Deterministic magnetorheological finishing A method and apparatus for finishing a workpiece surface using MR fluid is provided wherein the workpiece is positioned near a carrier surface such that a converging gap is defined between a portion of the workpiece surface and the carrier surface; a magn... | 08/22/2000 |
| 6106607 | Composition for hydrophobing gypsum and methods for the preparation and use thereof A water repellent composition for gypsum containing masonry materials is disclosed. The composition contains as organohydrogensiloxane and polyvinyl alcohol, the combination of which provides unexpectedly high water repellency.... | 08/22/2000 |
| 6099604 | Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto A slurry composition enhances the removal of polish-resistant surface moieties from the surface of a semiconductor wafer during chemical-mechanical polishing. The slurry composition is a mixture including a solvent, a plurality of abrasive particles, and ... | 08/08/2000 |
| 6090767 | Automotive cleaning and protectant composition A cleaning and protectant composition for automotive painted surfaces is provided. The composition includes a low-foaming nonionic surfactant, a silicone antifoam emulsion, and a volatile silicone fluid. A method of cleaning and protecting an automotive s... | 07/18/2000 |
| 6077337 | Chemical-mechanical polishing slurry One embodiment of the present invention includes a chemical-mechanical polishing (CMP) slurry. The slurry is comprised of one or more ferrocenium salts that is or are reduced, during use, to ferrocene. The slurry also includes an abrasive and a concentrat... | 06/20/2000 |
| 6048577 | Nano-sized alpha alumina particles having a silica coating thereon Nano-sized powders of alpha alumina can be obtained from a boehmite gel doped with a barrier-forming material such as silica that is then dried, fired and comminuted to powder form.... | 04/11/2000 |
| 6045605 | Abrasive material for polishing a semiconductor wafer, and methods for manufacturing and using the abrasive material An abrasive material is prepared by dispersing silicon nitride particles acting as abrasive particles in a solvent such as a pure water or an ultra pure water, followed by adding an adsorptive stickable to the abrasive particles to the dispersion. The res... | 04/04/2000 |
| 6027554 | Polishing composition A polishing composition comprising silicon nitride fine powder, water and an acid.... | 02/22/2000 |
| 6027669 | Polishing composition A polishing composition comprising fumed silica, a basic potassium compound and water, of which the specific electric conductivity is from 100 to 5,500 μS/cm.... | 02/22/2000 |
| 6022837 | Method for rinsing a polished memory hard disk A composition for rinsing a memory hard disc, which comprises water and an additive selected from the group consisting of an oxo-acid, an oxo-acid salt and a chloride.... | 02/08/2000 |
| 6022400 | Polishing abrasive grains, polishing agent and polishing method Surfaces of substrates, typically semiconductor device substrates, are polished with a polishing agent comprising polishing abrasive grains of a metal oxide (e.g. cerium oxide, zirconium oxide or manganese oxide) having a hydrophilic surface and a surface... | 02/08/2000 |
| 6019806 | High selectivity slurry for shallow trench isolation processing This invention is for an improved slurry for shallow trench isolation processing in chemical mechanical polishing of semiconductor devices. The oxide/nitride selectivity is enhanced by increasing the pH of the slurry, increasing the solids content of the ... | 02/01/2000 |
| 6013323 | Silicone gel waxes and silicone gel protectants The present invention relates to an aqueous based, gelled silicone compositions, more particularly waxes and protectants, which are substantially free of volatile organic solvents. The silicone gel wax is useful for protecting a variety of painted surface... | 01/11/2000 |
| 6011104 | Footware dressings incorporating fluorocarbons Footware dressings containing fluorocarbons in a carrier base plus optional colorants and additives. These dressings create a relatively slick and non-stick surface with excellent "contamination" resistance.... | 01/04/2000 |
| 6007592 | Polishing composition for aluminum disk and polishing process therewith A polishing composition for an aluminum disk includes water, an alumina abrasive agent and a polishing accelerator. The polishing accelerator is preferably basic aluminum nitrate. A process for polishing an aluminum disk using the polishing composition is... | 12/28/1999 |
| 6001730 | Chemical mechanical polishing (CMP) slurry for polishing copper interconnects which use tantalum-based barrier layers A method for forming a copper interconnect on an integrated circuit (IC) begins by forming a dielectric layer (20) having an opening. A tantalum-based barrier layer (21), such as TaN or TaSiN, is formed within the opening in the layer (20). A copper layer... | 12/14/1999 |
| 5998541 | Finishing agents and method of using the same Finishing agents comprise the combination of an alkoxysilane surface active agent, a silanol condensing catalyst, and a nonaqueous liquid or solid medium, or the combination of an alkoxysilane surface active agent, an acid catalyst and a liquid or solid m... | 12/07/1999 |
| 5997620 | Polishing composition A polishing composition for polishing a memory hard disk comprising water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide... | 12/07/1999 |
| 5994252 | Process for producing spherical metal-oxide powder particles There is a process for producing spherical metal-oxide powder particles. They are used as finely ground raw and filler materials in mineral, ceramic and refractory construction, technical and auxiliary materials, as well as for polishing and grinding agen... | 11/30/1999 |
| 5994246 | Low expansion feldspathic porcelain A feldspathic porcelain composition is provided which comprises a continuous glassy matrix phase and a discontinuous, substantially uniformly dispersed cubic leucite crystalline phase, said composition possessing a fusion temperature of from about 800° t... | 11/30/1999 |
| 5989301 | Optical polishing formulation An optical polishing slurry with alumina and ceria components is found to produce an improved polishing performance over either component used alone.... | 11/23/1999 |
| 5980775 | Composition and slurry useful for metal CMP A chemical mechanical polishing composition comprising an oxidizing agent at least one catalyst having multiple oxidation states, and at least one stabilizer, the composition being useful when combined with an abrasive or with an abrasive pad to remove me... | 11/09/1999 |
| 5968238 | Polishing composition including water soluble polishing agent An improved polishing composition is provided that includes an emulsion of a oil-based components and water-based components and a water soluble polishing agent. The polishing composition of the present invention is rubbed on a painted surface, hosed off ... | 10/19/1999 |
| 5968239 | Polishing slurry A polishing slurry for use in chemical mechanical polishing is disclosed. The polishing slurry contains a solvent and polishing particles dispersed in this solvent. The polishing particles are selected from silicon nitride, silicon carbide, and graphite. ... | 10/19/1999 |
| 5954864 | Furniture polish A furniture polish including a conventional active polishing ingredient is provided with a fragrance micro-encapsulated in a plurality of naturally self-adhesive microcapsules of varying wall thicknesses. The microcapsules may be produced by a wide variet... | 09/21/1999 |
| 5944994 | Coating material having refractive membrane filter fragments A coating material is provided which has fragments of a gel membrane filter in a liquid. The gel membrane filter has a plurality of electronegative particles provided in an ordered crystalline array. The gel membrane filter has been hardened with a polyme... | 08/31/1999 |
| 5934978 | Methods of making and using a chemical-mechanical polishing slurry that reduces wafer defects A method of making a chemical-mechanical polishing slurry includes mixing a ferric salt oxidizer with a solution to produce a mixture with a dissolved ferric salt oxidizer, filtering the mixture to remove most preexisting particles therein that exceed a s... | 08/10/1999 |
| 5935278 | Abrasive composition for magnetic recording disc substrate An abrasive composition for polishing a substrate for a magnetic recording disc is described, which comprises finely divided zirconium oxide particles, an abrasion promoter, an optional water-soluble oxidizing agent, and water. This abrasive composition i... | 08/10/1999 |
| 5932328 | Coating composition for hard surfaces A furniture surface having a coating consisting of a bottom layer comprising a silicone oil adjacent to the furniture surface and a top layer comprising an oil having a specific gravity less than the silicone oil in the bottom layer and a water repelling ... | 08/03/1999 |
| 5925607 | Cleaning and polishing composition A furniture cleaning and polishing composition that provides protection against water. The composition contains an admixture of A) about 0.01 to 4% by weight of a water repelling halofluoro polymer; B) up to 15% mineral oil; C) about 3 to 25% hydrocarbon ... | 07/20/1999 |
| 5916855 | Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films A polishing slurry composition and its method of making for planarization of silicon semiconductor wafers by chemical mechanical polishing of the wafer. A slurry formulation utilizing a ferric salt tungsten oxidizer, an ammonium persulfate titanium oxidiz... | 06/29/1999 |
| 5913969 | Water based paint protectant A protective composition for automotive painted surfaces is provided, comprising emulsified silicone, an evaporation modifier and an agent which increases wetting speed, dispersed in water.... | 06/22/1999 |
| 5897375 | Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture A method for chemical mechanical polishing (CMP) a copper layer (22) begins by forming the copper layer (22). The copper layer (22) is then exposed to a slurry (24). The slurry (24) contains an oxidizing agent such as H2 O2, a carbox... | 04/27/1999 |
| 5897675 | Cerium oxide-metal/metalloid oxide mixture A finely-divided cerium metal/metalloid oxide mixture, containing pyrogenically produced metal/metalloid oxide and 0.001 to 95 wt. % cerium oxide, has a specific surface area between 10 and 400 m2 /g. The mixture is produced by mixing pyrogenic... | 04/27/1999 |
| 5891205 | Chemical mechanical polishing composition A chemical mechanical polishing composition for polishing an oxide layer of a semiconductor device, the composition comprising an alkaline aqueous dispersion containing generally uniformly-shaped nanocrystalline particles of cerium oxide derived from a ph... | 04/06/1999 |
| 5885334 | Polishing fluid composition and polishing method The present invention provides a polishing fluid composition which can effectively polish a surface of a semiconductor silicon wafer or a surface of a film comprising silicon to be formed on silicon wafers with a markedly reduced amount of colloidal silic... | 03/23/1999 |
| 5882636 | Phthalate free nail polish enamel composition A phthalate-free long-lasting nail polish enamel composition consisting essentially of a film-forming agent, solvents, one or more colorants, one or more suspending agents, adhesion promoters and plasticizers selected from the group consisting essentially... | 03/16/1999 |
| 5882387 | Polish composition The present invention relates to a wipe-on polish composition which contains no wax or abrasive components. The polish requires minimal effort to wipe out to a thin, glossy, streak-free, hydrophobic film. The polish is comprised of an emulsion that contai... | 03/16/1999 |
