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A vest or belt is integrally formed with tubular, pet receiving passageways which extend around the wearer's body and terminate in pocket-like chambers for feeding and retrieval.
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| Number | Title | Issue Date |
| 7887625 | Sealer composition A composition for sealing exposed wood before finishing the wood, which composition includes polymer solids and an acid neutralizing agent. The acid neutralizing agent may be a weak base and/or a buffering agent. The polymer solids may include acrylate monomers, ure... | 02/15/2011 |
| 7753998 | Liquid polishing composition and kit A liquid polishing composition of the invention suitable for polishing an automobile and the like comprises about 0.01 to about 3 percent by weight of at least one silicone-based wax, about 0.20 to about 10 percent by weight of poly(alpha olefin) compounds including... | 07/13/2010 |
| 7628848 | Water-based composition for renewing plastic surfaces A water-based, non-oily, scented, liquid composition, with an ultraviolet filter, to be applied manually by brush or sponge, or by using an air gun, to surfaces of a synthetic nature. When impregnated, such surfaces recover their shine to an extent according to the ... | 12/08/2009 |
| 7503963 | Cleaning and polishing wax composition A water in oil emulsion wax composition composed of natural and synthetic waxes, surfactants, suspending agents, and aluminum oxide particles of high purity of 0.20 micrometer or less containing no magnesium oxide and being agglomerate free together with a aliphatic... | 03/17/2009 |
| 7431867 | Nanosized semiconductor particles Nanosized semiconductor particles of a core/shell structure is disclosed, wherein the particles each comprise a core and a shell and exhibit an average particle size of not more than 100 nm and a coefficient of variation in core size distribution of not more than 30... | 10/07/2008 |
| 7431758 | Cerium oxide particles and production method therefor The production method for cerium oxide particles of the present invention is a method of producing a cerium oxide particle by heating a cerium compound from a normal temperature to a temperature range of 400° C. to 1200° C., and comprises at least a temperature ra... | 10/07/2008 |
| 7429367 | Method for producing improved cerium oxide abrasive particles and compositions including such particles Provided are methods for manufacturing improved cerium oxide abrasives suitable for forming slurry compositions suitable for CMP processes. The cerium oxide abrasives are produced by the heat treatment of a mixture of a cerium precursor compound under conditions tha... | 09/30/2008 |
| 7427305 | Free radical-forming activator attached to solid and used to enhance CMP formulations This invention relates to a method of making selected oxidizers or other free radical-producing compounds become more effective chemical etchants and/or oxidizers for CMP activities by promoting the formation of the free radicals in a CMP composition with one or mor... | 09/23/2008 |
| 7427587 | Polishing compound A cleaning and polishing composition contains mineral spirits, a first abrasive component of particles having a median size in a range of 1-4 microns, a second abrasive component of particles having a median size in a range of 15-30 microns and a fatty acid. The com... | 09/23/2008 |
| 7416680 | Self-cleaning colloidal slurry composition and process for finishing a surface of a substrate A self-cleaning colloidal slurry and process for finishing a surface of a glass, ceramic, glass-ceramic, metal or alloy substrate for use in a data storage device, for example. The slurry comprises a carrying fluid, colloidal particles, etchant, and a surfactant ads... | 08/26/2008 |
| 7404831 | Abrasive composite, method for making the same, and polishing apparatus using the same An abrasive composite, a method for making the abrasive composite, and a polishing apparatus using the abrasive composite are disclosed. The abrasive composite includes a matrix and a plurality of nano-particles distributed therein. The nano-particles are made of at... | 07/29/2008 |
| 7399348 | Low surface tension surfactants based on amino alcohol and their use The invention provides low surface tension surfactants based on amino alcohol and also provides for their use in aqueous coating formulations, said surfactants being preparable by reacting at least one secondary amine of formula (I): ... | 07/15/2008 |
| 7399738 | Sprayable dry wash and wax composition comprising a silicone blend and acrylic-based polymer A composition for simultaneously cleaning and waxing non-porous surfaces without the need for additional rinsing of the treated surface with water, has a pH of from about 6 to about 7 and contains by weight: (a) from about 0.04 to about 0.12% of an acrylic-based pol... | 07/15/2008 |
| 7393401 | Spray wax composition A water based spray wax composition containing a microemulsion of a cationic wax nanoparticles, a quaternary silicone compound and zinc oxide nanoparticles providing long lasting protection of paint, glass, and metal, plastic, rubber, or elastomeric trim surfaces. T... | 07/01/2008 |
| 7384871 | Chemical mechanical polishing compositions and methods relating thereto The present invention provides an aqueous composition useful for polishing nonferrous metal interconnects on a semiconductor wafer comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, modified cellulose, 0.01 to 5% by wei... | 06/10/2008 |
| 7381249 | Wax composition for application to wet surfaces A wax composition for application to a wet surfaces utilizing a polymeric emulsion with a cross-linked copolymer of acrylic acid and C10-30 alkyl acrylate whereby upon application to the surface to be waxed the hydrophilic portion of the polymer instantly collapses ... | 06/03/2008 |
| 7381231 | Finishing compositions with reduced volatile organic compounds Finishing composition substantially free of non-volatile silicone materials and comprises a mixture of abrasive particles and an emulsion, which comprises water, a volatile siloxane, and a lubricant. ... | 06/03/2008 |
| 7381250 | Interior protectant/cleaner composition The present invention provides a liquid protectant composition composed of a cationic microemulsion of a natural wax (carnauba wax) nanometer sized particles and zinc oxide nanometer sized particles in combination with a quaternary siloxane compound. The protectant ... | 06/03/2008 |
| 7378381 | Floor coating composition and floor coating composition additive To provide a floor coating composition and floor coating composition additive. It is possible to improve the leveling performance, mopping performance, and other properties of a floor coating composition over those obtained with a conventional tributoxyethyl phospha... | 05/27/2008 |
| 7374592 | Cleaning and polishing composition for metallic surfaces A polish composition for metallic surfaces containing a polish and abrasive alumina nanoparticles in a water in oil emulsion composition composed of surfactants, suspending agents, and aluminum oxide particles of high purity of 200 nanometers or less having a median... | 05/20/2008 |
| 7368387 | Polishing composition and polishing method A polishing composition includes fumed alumina, alumina other than fumed alumina, colloidal silica, a first organic acid, a second organic acid, an oxidizing agent, and water. When the second organic acid is citric acid, the first organic acid is preferably malic ac... | 05/06/2008 |
| 7364667 | Slurry for CMP and CMP method A CMP slurry comprising polishing abrasives containing mixture abrasives of silica and alumina is used. In CMP using the slurry comprising mixture abrasives of silica and alumina as polishing abrasives, a down force-dependency of a polishing rate is high and an incr... | 04/29/2008 |
| 7364600 | Slurry for CMP and method of polishing substrate using same Disclosed herein is a polishing slurry and a method of producing the same. The polishing slurry has high selectivity in terms of a polishing speed of an oxide layer to that of a nitride layer used in CMP of an STI process which is essential to produce ultra highly i... | 04/29/2008 |
| 7365101 | Dispersion of pyrogenically produced cerium oxide A dispersion of pyrogenically produced cerium oxide, which does not contain any particles larger than 1 μm, is produced by dispersing a pyrogenically produced cerium oxide in water by means of a dissolver, centrifuging it, separating the supernatant from the bottom... | 04/29/2008 |
| 7320811 | Method and system for paint matching and re-touching A system is provided for touching up a chipped and scratched painted surface by applying a solvent solution to the surface, applying a selected touch-up paint, and removing a portion of the applied touch-up paint from the painted surface. The removing step includes ... | 01/22/2008 |
| 7316977 | Chemical-mechanical planarization composition having ketooxime compounds and associated method for use A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition contains a ketoxime compound and water. The composition may also contain an abrasive and/or a per compound oxidizing agent. The composition ... | 01/08/2008 |
| 7316993 | Combination cleaning and waxing composition and method A single step rub-on, rub-off combination cleaning and waxing composition particularly suited for automobiles, glass, plastics, fiberglass, tile, and floor coverings. ... | 01/08/2008 |
| 7316976 | Polishing method to reduce dishing of tungsten on a dielectric The present invention relates generally to compositions and associated methods for chemical-mechanical polishing of substrate surfaces having at least one feature thereon comprising tungsten and at least one feature thereon comprising a dielectric material. The comp... | 01/08/2008 |
| 7306638 | Chemical mechanical polishing process for 2.45T CoFeNi structures of thin film magnetic heads The present invention is directed to methods for polishing and cleaning a wafer having CoFeNi structures within alumina fill to achieve corrosion-free, smooth, and planar surface. A preferred chemical mechanical polishing (CMP) method includes a CMP polishing compou... | 12/11/2007 |
| 7306637 | Anionic abrasive particles treated with positively charged polyelectrolytes for CMP The invention provides chemical-mechanical polishing systems, and methods of polishing a substrate using the polishing systems, comprising (a) an abrasive, (b) a liquid carrier, and (c) a positively charged polyelectrolyte with a molecular weight of about 15,000 or ... | 12/11/2007 |
| 7303601 | Polishing composition A polishing composition for memory hard disk containing water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumu... | 12/04/2007 |
| 7303993 | Chemical mechanical polishing compositions and methods relating thereto The present invention provides an aqueous composition useful for CMP of a semiconductor wafer containing a metal comprising oxidizer, inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, modified cellulose, 0.001 to 10% by weight copolymer bl... | 12/04/2007 |
| 7300480 | High-rate barrier polishing composition The solution is useful for removing a barrier material from a semiconductor substrate. The solution comprises, by weight percent, 0.01 to 25 oxidizer, 0 to 15 inhibitor for a nonferrous metal, 0 to 15 abrasive, 0 to 20 complexing agent for the nonferrous metal, 0.01... | 11/27/2007 |
| 7300976 | Fluorochemical oligomeric polish composition A method of treating hard substrates by contacting the substrate with a fluorochemical composition comprising: a fluorochemical urethane component and a base component is described. The compositions provide desirable repellency, antisoiling and anti-staining propert... | 11/27/2007 |
| 7300478 | Slurry composition and method of use The present invention provides an aqueous slurry composition that comprises cerium oxide and/or cerium oxide-containing mixed rare earth oxide abrasive particles, a polyacrylate, and an agent that retards hard settling. The agent that retards hard settling is prefer... | 11/27/2007 |
| 7288509 | Compatibilization of esters with latices There is provided a composition comprising (a) at least one aqueous polymer dispersion, (b) at least one ester in the amount of 0.005 to 50 parts by weight of said ester, based on 100 weight parts of solids of all polymers in said aqueous c... | 10/30/2007 |
| 7279036 | Process for preparation of inorganic colorants from mixed rare earth compounds The present invention provides a novel process for preparation of inorganic colourants from mixed rare earth compounds, which are directly obtained from the ore industry, without undergoing any separation, thereby enabling a cost reduction to the extend of 10-100 ti... | 10/09/2007 |
| 7275311 | Apparatus and system for precise lapping of recessed and protruding elements in a workpiece An apparatus and system for precise lapping of recessed and protruding elements in a workpiece is disclosed. According to one embodiment, a system is provided having an air bearing surface with electrical components embedded therein to provide a desired surface dime... | 10/02/2007 |
| 7270762 | Polishing compositions for noble metals The polishing composition of this invention is useful for chemical-mechanical polishing of substrates containing noble metals such as platinum and comprises up to about 50% by weight of a adjuvant wherein said adjuvant is s elected from a group consisting of a metal... | 09/18/2007 |
| 7267702 | Polishing composition A polishing composition is provided containing an abrasive having an average particle size of from 1 to 30 nm and water, wherein the abrasive has a packing ratio of from 79 to 90% by weight; a method for manufacturing a substrate, including the steps of introducing ... | 09/11/2007 |
