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Class 106/287.19 - Group IVA or IVB (Ti, Zr, Hf, Ge, Sn, Pb)


Subclass of Class 106 - Compositions: coating or plastic
Definition: Coating or plastic compositions which contain a compound
No. of patents: 314
Last issue date: 05/22/2012


1                
NumberTitleIssue Date
8182600Electrode for electrochemical processes and method for producing the same
An anode provided with an electrocatalytic coating comprising tin, preferably tetravalent and in form of mixed oxide, prepared by the method for the manufacturing of an electrode, comprising applying a solution of a precursor for the pyrolytic formation of a tin-con...
05/22/2012
8038786Composition for cutting off heat-ray, film formed therefrom, and method for forming the composition and the film
Disclosed are heat-ray cutoff compounds, films and method using them. The heat-ray compound is produced by dispersing conductive nanoparticles in an amphoteric solvent with acids and dispersion sol, which provides a low cost production for the heat-ray cutoff films ...
10/18/2011
7909929Dispersoid having metal-oxygen bonds, metal oxide film, and monomolecular film
The invention provides dispersoids having metal-oxygen groups which are suitable for the production of metal oxide thin-films at a low temperature of 200° C. or below and for the production of homogeneous organic-inorganic hybrid materials. The invention also provi...
03/22/2011
7892343Method for manufacturing slurry and mold for precision casting
A manufacturing method for a slurry for the production of a precision casting mold that includes a zirconia sol and a refractory powder, and a manufacturing method for a precision casting mold that uses the slurry is provided. The present invention relates to a manu...
02/22/2011
7819965Coating formulation and process for the production of titanate-based ceramic film with the coating formulation
A coating formulation contains the following components (A), (B) and (C): (A) an organic acid-titanium compound having at least one titanium atom and at least one C2-12 aliphatic organic acid residual group as essential constituents and having no constitu...
10/26/2010
7811374Colored coating and formulation
A composition for coating a surface includes a carrier and an indicator distributed throughout the carrier. The indicator is configured to modify an appearance of the coating. The indicator facilitates determining a thickness of the coating in response to the appear...
10/12/2010
7780777Dispersion containing titanium dioxide
An aqueous dispersion that can be used in the coating of glass, ceramics and metal surfaces is prepared by placing, in water, an aggregated titanium dioxide powder having a specific surface area of from 20 to 150 m2/g in such an amount that the desired di...
08/24/2010
7727322Precursor solution, method for manufacturing precursor solution, PZTN compound oxide, method for manufacturing PZTN compound oxide, piezoelectric element, ink jet printer, ferroelectric capacitor, and ferroelectric memory
A method for manufacturing a precursor solution for forming a PZTN compound oxide with Pb, Zr, Ti and Nb as constituent elements by a sol-gel method includes: a step of dissolving at least lead carboxylate with an organic solvent having an alkoxy group, to thereby f...
06/01/2010
7713348Precursor composition, method of manufacturing precursor composition, inkjet coating ink, method of manufacturing ferroelectric film, piezoelectric device, semiconductor device, piezoelectric actuator, inkjet recording head, and inkjet printer
A precursor composition including a precursor for forming a ferroelectric, the ferroelectric being shown by a general formula AB1-XCXO3, an element A including at least Pb, an element B including at least one of Zr, Ti, V, W, and Hf,...
05/11/2010
7686879Coating composition
Embodiments of the present invention provide coating materials including at least one binder and at least one photocatalytically-active substance adapted to absorb light at one or more absorption wavelengths in the range of about 380 nm to about 500 nm. Other embodi...
03/30/2010
7582156Highly active photocatalyst particles, method of production therefor, and use thereof
A coating agent which produces a film with photocatalytic properties, comprises composite photocatalyst particles of titanium dioxide and a compound inactive as a photocatalyst, and at least a binder. The photocatalyst particles achieve a ratio of decomposition of a...
09/01/2009
7540913Coating solution for forming high dielectric constant thin film and method for forming dielectric thin film using the same
Disclosed herein are a coating solution for the formation of a dielectric thin film and a method for the formation of a dielectric thin film using the coating solution. The coating solution comprises a titanium alkoxide, a β-diketone or its derivative, and a benzoi...
06/02/2009
7534293Method and solution for forming anatase titanium dioxide, and titanium dioxide particles, colloidal dispersion and film
A sol solution containing poly(titanic acid) and a planar heterocyclic ligand is provided. Titanium dioxide (TiO2) particles are formed by aging the sol solution at a temperature below about 140° C. The particles have multi-coordinated Ti-complexes compr...
05/19/2009
7485182Precursor composition, method for manufacturing precursor composition, method for manufacturing ferroelectric film, piezoelectric element, semiconductor device, piezoelectric actuator, ink jet recording head, and ink jet printer
To provide precursor compositions for forming ferroelectric, methods for manufacturing precursor compositions, and methods for forming ferroelectric films using precursor compositions, which have excellent composition controllability in a liquid phase method, and in...
02/03/2009
7442247Hard films, multilayer hard films, and production methods thereof
A hard film contains [(Nb1-d,Tad)aAl1-a](C1-xNx), [(Nb1-d,Tad)a,Al1-a-b-c,Sib,Bc](C1-xNx), [(Cr,V)p(N...
10/28/2008
7399352Coating composition
A coating composition comprising a reaction product of the following components: (a) at least one cyclic ether or anhydride; and (b) an alkoxysilane-functional polyacrylate, alkyd, polyester, epoxy, or a multifunct...
07/15/2008
7371276Titanium dioxide pigment and method for producing the same and resin composition using the same
The titanium dioxide pigment of the present invention contains an anatase type crystal in an amount of 98-100% and has an average particle diameter of 0.2-0.4 μm and a whiteness of 95-97 in terms of L value of linseed oil. The titanium dioxide pigment of the presen...
05/13/2008
7371473Ferroelectric film, ferroelectric capacitor, ferroelectric memory, piezoelectric element, semiconductor element, method of manufacturing ferroelectric film, and method of manufacturing ferroelectric capacitor
A ferroelectric film is formed by an oxide that is described by a general formula AB1-xNbxO3. An A element includes at least Pb, and a B element includes at least one of Zr, Ti, V, W, Hf and Ta. The ferroelectric film includes Nb wit...
05/13/2008
7344589Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
A novel lead zirconium titanate (PZT) material having unique properties and application for PZT thin film capacitors and ferroelectric capacitor structures, e.g., FeRAMs, employing such thin film material. The PZT material is scalable, being dimensionally scalable, ...
03/18/2008
7311967Thermal interface material and electronic assembly having such a thermal interface material
A thermal interface material is described for thermal coupling of an electronic component to a thermally conductive member. The thermal interface material includes a viscoelastic polymer matrix material, fusible solder particles in the matrix material, and filler pa...
12/25/2007
7311978Primer for vulcanization bonding
A primer for vulcanization bonding, which comprises a copolymerization copolymer of amino group-containing alkoxysilane and vinyl group-containing alkoxysilane, and an organometallic compound, can give a metal-rubber composite having a water-resistant adhesiveness e...
12/25/2007
7294394Phase change material containing fusible particles as thermally conductive filler
According to one aspect of the invention, a structure and method for providing improved thermal conductivity of a thermal interface material (TIM) made of phase changed polymer matrix and a fusible filler material is disclosed. The TIM may also have a non-fusible fi...
11/13/2007
7285376Correction process of planographic printing plate
Disclosed are a process of correcting a planographic printing plate with an image, and a correction solution for correcting the planographic printing plate; the process comprising the steps of scraping stains at the non-image portions or undesired images at the imag...
10/23/2007
7282092Fire resistant glazings
Novel waterglass compositions comprise a zirconium containing anionic aggregate, preferably potassium zirconium carbonate or ammonium zirconium carbonate, in a quantity sufficient to provide at least 0.5% as zirconium metal. The compositions can be dried and/or gell...
10/16/2007
7261942Photocatalytically-active, self-cleaning aqueous coating compositions and methods
Method for producing novel photochemically-active metal oxide-containing aqueous compositions such as TiO2 compositions coated or sprayed and dried under ambient conditions to form novel photochemically-active, colorless coatings having strong wetability ...
08/28/2007
7235854Lanthanide doped TiOdielectric films
A dielectric film containing lanthamide doped TiOx and a method of fabricating such a dielectric film produce a reliable gate dielectric having an equivalent oxide thickness thinner than attainable using SiO2. A dielectric film is formed by ion...
06/26/2007
7208804Crystalline or amorphous medium-K gate oxides, Y0and Gd0
A gate oxide and method of fabricating a gate oxide that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Also shown is a gate oxide with a conduction band offset of 2 eV or greater. Gate oxi...
04/24/2007
7205620Highly reliable amorphous high-k gate dielectric ZrON
A gate dielectric and method of fabricating a gate dielectric that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Gate dielectrics formed from metals such as zirconium are thermodynamically...
04/17/2007
7201796Antiskinning compound and compositions containing them
The invention relates to a coating material, paint or finish which contains as anti-skinning agents a combination of at least two organic and/or inorganic oxygen scavengers and also relates to compositions containing the combination, especially oxidatively drying pa...
04/10/2007
7183186Atomic layer deposited ZrTiOfilms
After pulsing the second purging gas, a zirconium-containing precursor is pulsed into reaction chamber 220, at block 430. In an embodiment, the zirconium-containing precursor is ZTB. In other embodiments, a zirconium-containing precursor includes but i...
02/27/2007
7175825Method of producing titania solution
Titania is dissolved in a hydrogen peroxide solution to produce an amorphous titania gel, then the amorphous titania gel and a hydrogen peroxide solution are mixed together to produce an amorphous titania sol, and then an alkali solution is supplied to the solution ...
02/13/2007
7157111MOCVD selective deposition of C-axis oriented PBGEOthin films on InOoxides
A method of selectively depositing a ferroelectric thin film on an indium-containing substrate in a ferroelectric device includes preparing a silicon substrate; depositing an indium-containing thin film on the substrate; patterning the indium containing thin film; a...
01/02/2007
7157024Metal oxide particle and process for producing same
The present invention relates to a metal oxide particle comprising tin atom, zinc atom, antimony atom and oxygen atom, having a molar ratio SnO2:ZnO:Sb2O5 of 0.01–1.00:0.80–1.20:1.00 and having a primary particle diameter of 5 to...
01/02/2007
7153708Seed layer processes for MOCVD of ferroelectric thin films on high-k gate oxides
A method of forming a ferroelectric thin film on a high-k layer includes preparing a silicon substrate; forming a high-k layer on the substrate; depositing a seed layer of ferroelectric material at a relatively high temperature on the high-k layer; depositing a top ...
12/26/2006
7144840TiOmaterial and the coating methods thereof
The present invention relates to a titanium dioxide material for coating on a substrate and method of making the same. The coated material is resistant to delamination and can be used for air-purification purposes. ...
12/05/2006
7132557Amine compounds and curable compositions derived therefrom
Disclosed are compounds produced by a process comprising the step of reacting an amine reactant with an epoxide reactant to form a hydrolytically stable carbon-nitrogen bond therebetween, wherein at least one of the amine or epoxide reactants comprises a terminal al...
11/07/2006
7119218Low melting point tin salt of carboxylic acid and method for producing the same
The present invention provides a low melting point tin salt of aliphatic monocarboxylic acid obtained by a process comprising, reacting an aliphatic monocarboxylic acid having 4 to 30 carbon atoms or its salt and an inorganic tin compound so as to prepare a tin salt...
10/10/2006
7108795Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates
The invention is directed to a method and composition for providing chemically-resistant roughened copper surfaces suitable for subsequent multilayer lamination. In one embodiment, a smooth copper surface is contacted with an adhesion promoting composition under con...
09/19/2006
7098152Adhesive support method for wafer coating, thinning and backside processing
A liquid form adhesive system is provided for spin-coating on wafers and mounting to rigid carrier substrates to support thinning and backside processing. The liquid adhesive comprises about 30–35% of a rosin, between 5–10% of a thermoplastic urethane, a nonioni...
08/29/2006
7094284Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same
Chemical vapor deposition (CVD) precursor compositions for forming metal oxide high dielectric constant (κ) thin films. The precursor composition in one embodiment comprises a metal precursor having a general formula M(β-diketonate)2(OR)2, wh...
08/22/2006
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