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Class 106/1.18 - Metal-depositing composition contains elemental metal of Group IB (Cu, Ag, Au)


Subclass of Class 106 - Compositions: coating or plastic
Definition: Subject matter involving a metal-coating composition containing
No. of patents: 146
Last issue date: 05/18/2010


1        
NumberTitleIssue Date
7717987Coating material based on a copper-indium-gallium alloy, in particular for the production of sputter targets, tubular cathodes and the like
The copper-indium-gallium (CuInGa) alloy is in particular to be used for the production of sputter targets, tubular cathodes and similar coating material sources. It has a phase corresponding to a Cu5Zn8 prototype phase in which the lattice sites of the zinc atoms (...
05/18/2010
7300501Electroless gold plating liquid
The object is to provide an electroless gold plating liquid which has an adequate deposition speed for practical use without containing any thallium or other heavy metal ions, excellent stability of the plating liquid and contains a non-cyanide gold salt as a gold s...
11/27/2007
7267713Conductive paste and glass circuit structure
Provided is a conductive paste capable of adjusting resistivity and forming a conductor film having high strength of bonding with a glass substrate and high mounting strength of a metal terminal. The conductive paste contains a conductive component, a glass frit hav...
09/11/2007
7264848Non-cyanide electroless gold plating solution and process for electroless gold plating
The present invention provides a non-cyanide electroless gold plating solution free from a cyanide compound, comprising, as a completing agent of gold, a compound represented by the formula shown below or a salt thereof: X—(CH2)n—...
09/04/2007
7232513Electroplating bath containing wetting agent for defect reduction
An electroplating solution contains a wetting agent in addition to a suppressor and an accelerator. In some embodiments, the solution has a cloud point temperature greater than 35° C. to avoid precipitation of wetting agent or other solute out of the plating soluti...
06/19/2007
7189341Electrochemical sensor ink compositions, electrodes, and uses thereof
The invention is directed to conductive polymer compositions, catalytic ink compositions (e.g., for use in screen-printing), electrodes produced by deposition of an ink composition, as well as methods of making, and methods of using such compositions and electrodes....
03/13/2007
7166732Copper (I) compounds useful as deposition precursors of copper thin films
Copper (I) amidinate precursors for forming copper thin films in the manufacture of semiconductor devices, and a method of depositing the copper (I) amidinate precursors on substrates using chemical vapor deposition or atomic layer deposition processes. ...
01/23/2007
7156904Bonding layer forming solution, method of producing copper-to-resin bonding layer using the solution, and layered product obtained thereby
An aqueous copper-to-resin bonding layer solution comprising: (a) at least one acid type; (b) tin salt or tin oxide; (c) salt or oxide of at least one type of metal selected from the group consisting of: silver, zinc, aluminum, titanium, bismuth, chromium, iron, cob...
01/02/2007
7155319Closed loop control on liquid delivery system ECP slim cell
A method for controlling liquid delivery in a processing chamber. The method includes generating an analog input (AI) signal proportional to a process variable and calculating an analog output (AO) signal based on a setpoint and a deadband. The setpoint is a target ...
12/26/2006
7150781Pyrophosphoric acid bath for use in copper-tin alloy plating
The invention relates to a pyrophosphoric acid bath for use in cyanogen-free copper-tin alloy plating that contains an additive (A) composed an amine derivative, an epihalohydrin and a glycidyl ether compound with ratios of epihalohydrin to glycidyl ether compound b...
12/19/2006
7135061Conductive paste and glass circuit structure
Provided is a conductive paste capable of adjusting resistivity and forming a conductor film having high strength of bonding with a glass substrate and high mounting strength of a metal terminal. The conductive paste contains a conductive component, a glass frit hav...
11/14/2006
7087267Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallization
A method of immobilizing a catalyst on a substrate surface involves providing novel ligating copolymers comprising functional groups capable of binding to a substrate surface and functional groups capable of ligating to catalysts such as metal ions, metal complexes,...
08/08/2006
7083744Terminal electrode compositions for multilayer ceramic capacitors
The present invention relates to terminal electrode compositions for multilayer ceramic capacitors. More specifically, it relates to terminal electrode compositions for multilayer ceramic capacitors which have a metal oxide component selected from SnO2, V...
08/01/2006
7081271Cyclical deposition of refractory metal silicon nitride
Embodiments of the invention relate to an apparatus and method of cyclical layer deposition utilizing three or more precursors. In one embodiment, the method includes providing at least one cycle of precursors to form a ternary material layer. Providing at least one...
07/25/2006
7060325Simulated patina for copper
A process for imparting a simulated patina appearance to a copper substrate, and a substrate having that appearance. A colorant having the desired initial patina color tone is employed to produce a non-continuous layer of colorant on the surface of a copper substrat...
06/13/2006
7029761Bonding layer for bonding resin on copper surface
A bonding layer for bonding resin is provided that is formed on a copper surface, and contains an alloy of: (a) copper; (b) tin; and (c) at least one type of metal (third metal) selected from the group consisting of: silver, zinc, aluminum, titanium, bismuth, chromi...
04/18/2006
7018677Simulated patina for copper
A process for imparting a simulated patina appearance to a copper substrate, and a substrate having that appearance. A colorant having the desired initial patina color tone is employed to produce a non-continuous layer of colorant on the surface of a copper substrat...
03/28/2006
6986810Aqueous binder formulation for metal and ceramic feedstock for injection molding and aqueous coating composition
Additionally, a coating composition comprising gelatine, water and a metal and/or ceramic powder is used to form coating layers on selected materials. ...
01/17/2006
6979491Antimicrobial yarn having nanosilver particles and methods for manufacturing the same
The present invention provides a yarn with antimicrobial effects. The antimicrobial antifungal effect of the yarn is derived from nanosilver particles (diameter between 1 and 100 nm) which are adhered to the yarn. The yarn contains fibers which are made of cotton, l...
12/27/2005
6911405Semiconductor device and method of manufacturing the same
A process gas consisting of one of N2, N2O or a mixture thereof is converted to a plasma and then a surface of a copper wiring layer is exposed to the plasma of the process gas, whereby a surface portion of the copper wiring layer is reformed a...
06/28/2005
6908504Electroless plating bath composition and method of using
The present invention relates to a cobalt electroless plating bath composition and method of using it for microelectronic device fabrication. In one embodiment, the present invention relates to cobalt electroless plating in the fabrication of interconnect structures...
06/21/2005
6875474Electroless copper plating solutions and methods of use thereof
Electroless copper plating solutions and methods of use thereof are disclosed. A representative electroless copper plating solution includes a reducing agent that is a source of hypophosphite ions and at least one accelerator compound that accelerates the rate of co...
04/05/2005
6852210Plating method and plating bath precursor used therefor
To provide a plating method, which enables wide industrial use of the redox system electroless plating method having excellent characteristics, and a plating bath precursor which is preferable for the plating method. The plating method comprises a process oxidizing ...
02/08/2005
6811828Electroless gold plating solution and method for electroless plating
The present invention is aimed to provide an electroless gold plating solution which requires less amount of a reducing agent, retains a sufficient deposition rate for a practical use, and has an excellent stability as a plating solution; and a method for carrying o...
11/02/2004
6776826Composition and method for electroless plating of non-conductive substrates
Compositions and methods for coating and plating a non-conductive substrate, the substrate having a surface, comprising coating the surface with a binding solution composition, the binding solution composition comprising between approximately 30% by weight and appro...
08/17/2004
6770122Copper deposition using copper formate complexes
The present invention relates to novel copper formate complexes and the deposition of metallic copper on substrates or in or on porous solids using these novel copper complexes. ...
08/03/2004
6749775Conductive via composition
A conductive composition for filling a via. The composition is based on total composition and has 4.0-12.0 wt. % organic vehicle and 88.0-96.0 wt. % electrically conductive particles selected from the group consisting of silver and nickel and mixtures thereof. ...
06/15/2004
6723350Lubricious coatings for substrates
The invention provides methods and kits to form water swellable gel coatings, preferably lubricious coatings, on substrates, and coated substrates thus formed. The coatings contain one or more antimicrobial metals formed with atomic disorder, together with one or mo...
04/20/2004
6709563Copper-plating liquid, plating method and plating apparatus
There is provided a copper-plating liquid free from an alkali metal and a cyanide which, when used in plating of a substrate having an outer seed layer and fine recesses of a high aspect ratio, can reinforce the thin portion of the seed layer and can embed copper co...
03/23/2004
6656255Copper source liquid for MOCVD processes and method for the preparation thereof
Provided is a copper source liquid useful in MOCVD processes for forming copper thin films on semiconductor wafers. The source liquid comprises water and a source component wherein the source component contains at least 90 weight % Cu(hfac)TMVS and the co...
12/02/2003
6607654Copper-plating elecrolyte containing polyvinylpyrrolidone and method for forming a copper interconnect
A copper-plating electrolyte includes an aqueous copper salt solution, a water-soluble ଲ-naphtholethoxylate compound having the formula ##STR1## wherein n is an integer from 10 to 24, one selected from the group consisting of a disulfide having the ...
08/19/2003
6576114Electroplating composition bath
There is provided an electrodeposit free of cobalt, cadmium and nickel which contains 1.25 to 1.55% w/w iron, 1 to 2 ppm zirconium; and 97.7 to 98.2% gold and has a pale yellow color less than 3N on the NIHS scale. The invention also provides an electropl...
06/10/2003
6569359Transparent conductive layer forming coating liquid containing formamide
The object is to provide a transparent conductive layer forming coating liquid capable of forming a transparent conductive layer having such characteristics as high transmittance, low resistance, low reflectance and high strength and with few film defects...
05/27/2003
6533849Electroless gold plated electronic components and method of producing the same
An neutral electroless gold plating method that minimises "black band" corrosion problem in the final product. The electroless gold plating solution is provided at neutral pH in the presence of a reducing agent, a complexing agent and an accelerator to al...
03/18/2003
6475644Radioactive coating solutions methods, and substrates
Radioactive coating solutions and sol-gels, and corresponding methods for making a substrate radioactive by the application of the radioactive coating solutions and sol-gels thereto. The radioactive coating solution comprises at least one carrier metal an...
11/05/2002
6440202Pyrazolate copper complexes, and MOCVD of copper using same
Copper pyrazolate precursor compositions useful for the formation of copper in semiconductor integrated circuits, e.g., interconnect metallization in semiconductor device structures, as an adhesive seed layer for plating, for the deposition of a thin-film...
08/27/2002
6428880Paste gold and golden ornaments
A gold paste for painting glass or a ceramic, exhibits gold color by being sintered. The gold paste comprises metal components having a metal composition within the following range: gold 82.0-99.1% by weight, bismuth 5.0-0.4% by weight, silicon 3.0-0.2% b...
08/06/2002
6423202Process for making gold salt for use in electroplating
A process for producing sodium gold sulfite in solution is described. The sodium gold sulfite solution is useful in gold electroplating baths, and can be used in applications which require pure, soft gold deposits....
07/23/2002
6416571Cyanide-free pyrophosphoric acid bath for use in copper-tin alloy plating
The present invention provides a pyrophosphoric acid bath for use in Cu--Sn alloy plating without containing a cyanic ion comprising a reaction product (A) of an amine derivative and an epihalohydrin in a 1:1 mole ratio and a cationic surfactant (B) and, ...
07/09/2002
6398854Chemical solution for forming silver film and process for forming silver film using same
The present invention relates to a chemical solution for forming a silver film on a substrate. This chemical solution has (1) an ammoniac silver nitrate solution; (2) a reducing solution containing a reducing agent and a base component; and (3) an additiv...
06/04/2002
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