Bizarre Patents
Cloaking System Using Optoelectronically Controlled Camouflage
A Cloaking System designed to operate in the visible light spectrum, utilizes optoelectronics and/or photonic components to conceal an object within it.
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| Application No. | Application Title | Issue Date |
| 20120129431 | APPARATUS AND METHOD FOR TARGET THICKNESS AND SURFACE PROFILE UNIFORMITY CONTROL OF MULTI-HEAD CHEMICAL MECHANICAL POLISHING PROCESS An apparatus and method for providing target thickness and surface profile uniformity control of a multi-head chemical mechanical polishing (CMP) process is disclosed. An exemplary method includes providing at least two wafers; determining a surface profile of each of t... | 05/24/2012 |
| 20120129432 | AUTOMATED BORE FINISHING PROCESS An automated bore finishing process particularly adapted for lapping automatically corrects one or more bore parameters, such as diameter, geometry, surface finish, in an iterative manner to reach a final value, controlled by algorithms that process feedback from a meas... | 05/24/2012 |
| 20120129433 | METHOD AND DEVICE FOR PREVENTING SLIP OF WORK PIECE A master servo motor and a slave servo motor that synchronously drive for rotation a master main spindle provided with a center that supports one end of a work piece and a slave main spindle provided with a center that supports the other end of the work piece are includ... | 05/24/2012 |
| 20120108144 | PREDICTIVE CALCULATION METHOD FOR CALCULATING A SIMULATED SHAPE OF AN ENGAGEMENT RIDGE TO BE ARRANGED ON THE EDGE FACE OF AN OPHTHALMIC LENS OF A PAIR OF EYEGLASSES, AND A METHOD OF BEVELING A predictive calculation method for calculating the shape of a cross-section of an engagement ridge of an ophthalmic lens obtained by beveling the lens with a beveling grindwheel driven in accordance with an initial path setting. The method includes the following steps:... | 05/03/2012 |
| 20120083186 | EYEGLASS LENS PROCESSING APPARATUS In an eyeglass lens processing apparatus, if a material selector selects a thermoplastic material for the lens, a control unit performs a first step and then a second step. In the first step, the control unit controls a lens rotating unit to position a lens in a plurali... | 04/05/2012 |
| 20120052604 | CHEMICAL MECHANICAL POLISHING METHOD AND SYSTEM A chemical mechanical polishing method is provided. The chemical mechanical polishing method includes steps of providing a plurality of semiconductor elements to be polished, obtaining a respective dimension of the each semiconductor element to be polished, and polishin... | 03/01/2012 |
| 20120034845 | TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a be... | 02/09/2012 |
| 20120034844 | SPECTROGRAPHIC MONITORING USING INDEX TRACKING AFTER DETECTION OF LAYER CLEARING A method of controlling polishing includes storing a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value, polishing a substrate having a second layer overlying a first laye... | 02/09/2012 |
| 20120028543 | GRINDING METHOD AND GRINDING MACHINE A core grinding wheel that has a grinding layer on an outer periphery of a core is used. An ultrasonic wave is output from an ultrasonic sensor to the grinding layer via grinding fluid. An ultrasonic measuring device control unit calculates a thickness of the grinding l... | 02/02/2012 |
| 20120021670 | Chemical Mechanical Polishing Apparatus Disclosed herein is a chemical mechanical polishing apparatus. The apparatus comprises a carrier to hold a wafer and being capable of lifting, lowering and rotating, a polishing pad compressed onto the wafer through the lowering of the carrier to polish the wafer, a con... | 01/26/2012 |
| 20120009848 | METHOD FOR THE MACHINING OF GEAR TEETH, WORK PIECE WITH GEAR TEETH, AND MACHINE TOOL Method for the machining of gear teeth whose tooth flanks deviate from their specified geometry by a machining allowance, wherein the machining allowance is removed through an infeed of at least two infeed steps, each of which is followed by a machining pass with a prof... | 01/12/2012 |
| 20120009847 | CLOSED-LOOP CONTROL OF CMP SLURRY FLOW Embodiments of the present invention generally relate to methods for chemical mechanical polishing a substrate. The methods generally include measuring the thickness of a polishing pad having grooves or other slurry transport features on a polishing surface. Once the de... | 01/12/2012 |
| 20120003900 | Apparatus and Method for Refinishing a Surface In-Situ A rotary grinding system includes a support frame and a grinding assembly coupled to the support frame for longitudinal movement, with respect to a workpiece attached to the support frame. A radial arm is suspended below the grinding assembly and rotated in a plane para... | 01/05/2012 |
| 20120003604 | OCCLUSAL ADJUSTMENT SYSTEM Occlusal-surface shape data and occlusal-surface position data of dentures are acquired on a dentist side, and the data is then transmitted to a grinding data provider side. A maxillomandibular occlusal state data is reproduced from the occlusal-surface shape data and t... | 01/05/2012 |
| 20120002295 | DISPLAY DEVICE COMPRISING MULTIFUNCTION GLASS, PRODUCTION METHOD, AND OPTICAL ELEMENT HAVING A FRESNEL STRUCTURE A display device including a holding device that can be placed on the head of a user, an image generating module fixed to the holding device and generating an image, and a multifunction glass that is fixed to the holding device and has a coupling in area and a coupling ... | 01/05/2012 |
| 20110318992 | Adaptively Tracking Spectrum Features For Endpoint Detection A method of controlling polishing includes polishing a substrate having a second layer overlying a first layer, detecting exposure of the first layer with an in-situ monitoring system, receiving an identification of a selected spectral feature and a characteristic of th... | 12/29/2011 |
| 20110312248 | SYSTEM FOR MAGNETORHEOLOGICAL FINISHING OF A SUBSTRATE A system for magnetorheological finishing of a substrate. A spherical wheel meant for carrying a magnetorheological finishing fluid houses a variable-field permanent magnet system having north and south iron pole pieces separated by primary and secondary gaps with a cyl... | 12/22/2011 |
| 20110312247 | Apparatus for Polishing Rear Surface of Substrate, System for Polishing Rear Surface of Substrate, Method for Polishing Rear Surface of Substrate and Recording Medium Having Program for Polishing Rear Surface of Substrate Provided are a rear substrate surface polishing device polishing a rear surface of a substrate, a rear substrate surface polishing system including the rear substrate surface polishing device, a rear substrate surface polishing method used in the rear substrate surface ... | 12/22/2011 |
| 20110306274 | POLISHING APPARATUS AND POLISHING METHOD A polishing apparatus has a polishing section (302) configured to polish a substrate and a measurement section (307) configured to measure a thickness of a film formed on the substrate. The polishing apparatus also has an interface (310) configured ... | 12/15/2011 |
| 20110306273 | CENTERLESS CYLINDRICAL GRINDING MACHINE AND CENTERLESS GRINDING METHOD WITH HEIGHT-ADJUSTABLE REGULATING WHEEL The present invention pertains to a centerless cylindrical grinding machine with a grinding wheel and a regulating wheel that can be laterally displaced toward a work piece that can be held between these wheels, and with a rest blade for supporting the work piece that i... | 12/15/2011 |
| 20110299031 | SYSTEM AND METHOD OF SURFACING A LENS, SUCH AS A LENS FOR USE WITH EYEGLASSES A system and method of forming surfaces on eyeglass lenses is described. In some examples, the surface is a spherical, cylindrical or spherocylindrical surface at a center of the lens and an aspherical surface at a periphery of the lens. In some examples, forming the su... | 12/08/2011 |
| 20110300775 | Control of Overpolishing of Multiple Substrates on the Same Platen in Chemical Mechanical Polishing A polishing method includes simultaneously polishing two substrates, a first substrate and a second substrate, on the same polishing pad. A default overpolishing time is stored and an in-situ monitoring system monitors the two substrates. The in-situ monitoring system f... | 12/08/2011 |
| 20110294400 | Determining Physical Property of Substrate A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a... | 12/01/2011 |
| 20110294398 | METHOD AND SYSTEM FOR PROVIDING AN ELECTRONIC LAPPING GUIDE CORRESPONDING TO A NEAR-FIELD TRANSDUCER OF AN ENERGY ASSISTED MAGNETIC RECORDING TRANSDUCER A method and system for fabricating transducer having an air-bearing surface (ABS) is described. The method and system include providing at least one near-field transducer (NFT) film and providing an electronic lapping guide (ELG) film substantially coplanar with a port... | 12/01/2011 |
| 20110294399 | Advanced finishing control Methods of using in situ finishing information for finishing workpieces and semiconductor wafers are described. Methods of using yield information at least in part related to cost of manufacture for finishing workpieces and semiconductor wafers are described. Changes or... | 12/01/2011 |
| 20110294402 | Eddy Current System for In-Situ Profile Measurement An eddy current monitoring system may include an elongated core. One or more coils may be coupled with the elongated core for producing an oscillating magnetic field that may couple with one or more conductive regions on a wafer. The core may be translated relative to t... | 12/01/2011 |
| 20110294401 | METHOD OF COMPENSATION FOR A FLUID CUTTING APPARATUS A system and method for positioning a fluid stream for cutting a double contour workpiece includes a compensation module configured to receive information regarding a contour path in at least five degrees of freedom for cutting the double contour workpiece and a velocit... | 12/01/2011 |
| 20110287693 | NUMERICAL CONTROLLER HAVING OSCILLATING OPERATION FUNCTION CAPABLE OF CHANGING SPEED IN OPTIONAL SECTION A machine tool has an oscillating axis that reciprocates in an optional region. A numerical controller that controls the machine tool designates positions of a lower dead point and a upper dead point when the oscillating axis of the machine tool reciprocates, and a refe... | 11/24/2011 |
| 20110287692 | Automated determination of jet orientation parameters in three-dimensional fluid jet cutting Methods, systems, and techniques for automatically determining jet orientation parameters to correct for potential deviations in three dimensional part cutting are provided. Example embodiments provide an Adaptive Vector Control System (AVCS), which automatically determ... | 11/24/2011 |
| 20110287694 | PEAK-BASED ENDPOINTING FOR CHEMICAL MECHANICAL POLISHING A polishing system receives one or more target parameters for a selected peak in a spectrum of light, polishes a substrate, measures a current spectrum of light reflected from the substrate while the substrate is being polished, identifies the selected peak in the curre... | 11/24/2011 |
| 20110287219 | SYNTHETIC QUARTZ GLASS SUBSTRATE AND MAKING METHOD A synthetic quartz glass substrate has a surface of 6 inch squares including a central surface area of 132 mm squares. The central surface area of 132 mm squares has a flatness of up to 50 nm. A frame region obtained by subtracting the central surface area of 132 mm squ... | 11/24/2011 |
| 20110281503 | Apparatus for grinding hand knives An apparatus for grinding hand knives, in particular for meat processing, with at least one grinding tool is proposed, by means of which a knife ground finish, in particular during the reconditioning of hand knives after use, is made possible in a repeatable manner with... | 11/17/2011 |
| 20110281502 | SYSTEM AND METHOD PRE-BLOCKING OPHTHALMIC LENS FOR PROCESSING INCLUDING ARTICULATION EDGING A method and system for pre-blocking ophthalmic lenses for processing including articulation edging is described. Lens blanks are blocked in this method without prior knowledge of lens prescription variables or frame size and shape dimensions. This blocking can be done ... | 11/17/2011 |
| 20110281501 | FEEDBACK FOR POLISHING RATE CORRECTION IN CHEMICAL MECHANICAL POLISHING A substrate having a plurality of zones is polished and spectra are measured. For each zone, a first linear function fits a sequence of index values associated with reference spectra that best match the measured spectra. A projected time at which a reference zone will r... | 11/17/2011 |
| 20110275280 | METHOD OF AUTO SCANNING AND SCRAPING A WORK PIECE FOR A HARD RAIL A method of auto scanning and scraping a work piece for a hard rail has a preparing step, a scanning step, a detecting step, an auto-scraping step and an analyzing step. The preparing step comprises preparing an auto scanning and scraping apparatus with a multi-axis mac... | 11/10/2011 |
| 20110275281 | Dynamically Tracking Spectrum Features For Endpoint Detection A method of controlling polishing includes polishing a substrate and receiving an identification of a selected spectral feature, a wavelength range having a width, and a characteristic of the selected spectral feature to monitor during polishing. A sequence of spectra o... | 11/10/2011 |
| 20110269377 | Automatic Generation of Reference Spectra for Optical Monitoring of Substrates A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each... | 11/03/2011 |
| 20110256802 | CYCLIC SELF-LIMITING CMP REMOVAL AND ASSOCIATED PROCESSING TOOL A cyclic method of chemical mechanical polishing (CMP) a wafer having a surface includes placing the wafer on a platen in a CMP apparatus and then performing a multi-step CMP comprising process. The multi-step CMP process includes delivering a first chemical composition... | 10/20/2011 |
| 20110256804 | METHOD FOR SHAPING AN OPHTHALMIC LENS FOR EYEGLASSES The invention relates to a method of shaping an ophthalmic lens to have a desired outline (11) by means of a machining device including a blocking support for the ophthalmic lens and at least one first machining tool, the method comprising the steps of:
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| 20110256805 | Adaptively Tracking Spectrum Features For Endpoint Detection A method of controlling polishing includes polishing a substrate, monitoring a substrate during polishing with an in-situ monitoring system, generating a sequence of values from measurements from the in-situ monitoring system, fitting a non-linear function to the sequen... | 10/20/2011 |
