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| Application No. | Application Title | Issue Date |
| 20120043497 | Working Component for Magnetic Heat Exchange and Method of Producing a Working Component for Magnetic Refrigeration A working component for magnetic heat exchange comprises a magnetocalorically active phase comprising La1-aRa(Fe1-x-yTyMx)13Hz, a hydrogen content, z, 90% or higher of a hydrogen saturation val... | 02/23/2012 |
| 20120045970 | OXIDIZING PARTICLES BASED SLURRY FOR NOBEL METAL INCLUDING RUTHENIUM CHEMICAL MECHANICAL PLANARIZATION A method for chemical mechanical planarization of ruthenium is provided. A semiconductor substrate comprising ruthenium is contacted with a chemical mechanical polishing system comprising an oxidizing particle, an abrasive, a polishing pad and a liquid carrier. The pH o... | 02/23/2012 |
| 20120045969 | POLISHING AMORPHOUS/CRYSTALLINE GLASS An apparatus and associated method for polishing a workpiece with a polishing slurry having ceria particulates and silica particulates.... | 02/23/2012 |
| 20120034146 | CARRIER FLUIDS FOR ABRASIVES The invention relates to improved novel carrier fluids for abrasives, in particular cutting fluids, for wafer production, the use thereof and a method of cutting wafers.... | 02/09/2012 |
| 20120028546 | METHOD AND APPARATUS FOR TRIMMING THE WORKING LAYERS OF A DOUBLE-SIDE GRINDING APPARATUS A method for trimming two working layers including bonded abrasive applied on mutually facing sides of an upper and a lower working disk of a grinding apparatus configured for simultaneous double-side processing of flat workpiece includes providing the grinding apparatu... | 02/02/2012 |
| 20120021675 | SYNTHETIC QUARTZ GLASS SUBSTRATE POLISHING SLURRY AND MANUFACTURE OF SYNTHETIC QUARTZ GLASS SUBSTRATE USING THE SAME A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector.... | 01/26/2012 |
| 20120009441 | METHOD OF MANUFACTURING PERPENDICULAR MAGNETIC RECORDING MEDIUM SUBSTRATE AND PERPENDICULAR MAGNETIC RECORDING MEDIUM SUBSTRATE MANUFACTURED BY THE SAME A method of manufacturing a perpendicular magnetic recording medium substrate is capable of reducing the waviness of all wavelength components and a recording medium is capable of reducing contact with a magnetic head to improve the flying stability of the magnetic head... | 01/12/2012 |
| 20120003901 | COMPOSITION FOR ADVANCED NODE FRONT-AND BACK-END OF LINE CHEMICAL MECHANICAL POLISHING The present disclosure is directed to a highly dilutable chemical mechanical polishing concentrate comprising an abrasive, an acid, a stabilizer, and water with a point-of-use pH ranging from 2.2-3.5 for planarizing current and next generation semiconductor integrated c... | 01/05/2012 |
| 20110312251 | Abrasive, Method of Polishing Target Member and Process for Producing Semiconductor Device To polish polishing target surfaces of SiO2 insulating films or the like at a high rate without scratching the surface, the present invention provides an abrasive comprising a slurry comprising a medium and dispersed therein at least one of i) cerium oxide pa... | 12/22/2011 |
| 20110308773 | GRANULAR ABRASIVE CLEANING OF AN EMITTER WIRE An apparatus for cleaning an emitter electrode in electrohydrodynamic fluid accelerator and precipitator devices via movement of a cleaning device including granular abrasives positioned to frictionally engage the emitter electrode. The cleaning device causes the granul... | 12/22/2011 |
| 20110302849 | PRODUCTION OF HIGH-PURITY SUSPENSIONS CONTAINING PRECIPITATED SILICAS BY ELECTRODIALYSIS The present invention relates to suspensions which have a very low salt content and contain at least one precipitated silica, a process for producing them and also their use.... | 12/15/2011 |
| 20110300778 | ABRADING AGENT AND ABRADING METHOD A polishing agent which comprises a composition containing an inorganic acid, an amino acid, a protective film-forming agent, an abrasive, an oxidizing agent, an organic acid and water, adjusted to a pH of 1.5-4, wherein the amount of potassium hydroxide required to rai... | 12/08/2011 |
| 20110257073 | METHODS OF MAKING FLUORINATED ETHERS, FLUORINATED ETHERS, AND USES THEREOF A method of making a fluorinated ether includes combining, in a polar aprotic solvent: a fluorinated alcohol represented by the formula X—Rf1CH2OH, and a fluorinated sulfonate ester represented by the formula Rf2C... | 10/20/2011 |
| 20110256809 | METHOD OF POLISHING BLADED DISKS FOR A TURBOMACHINE AND POLISHING DEVICE A device for polishing centrifugal impellers for a turbomachine including a vat configured to be filled with a polishing agent, and an impeller support configured to make the impeller rotate around its axis and move it along its axis such that all of points of the impel... | 10/20/2011 |
| 20110244760 | METHOD FOR POLISHING A SEMICONDUCTOR WAFER A method of polishing a semiconductor wafer includes applying a polishing pad to the semiconductor wafer so as to subject the semiconductor wafer to a polishing process and supplying an aqueous polishing agent solution between the polishing pad and the semiconductor waf... | 10/06/2011 |
| 20110230123 | POLISHER, PRESSURE PLATE OF THE POLISHER AND METHOD OF POLISHING A polisher, a pressure plate (20) of the polisher, and a method of polishing are disclosed. The pressure plate (20) includes a main body, an air bag (50) mounted to one surface of the main body to adjust a pressure applied from the main body to a po... | 09/22/2011 |
| 20110223841 | METHOD FOR POLISHING A SEMICONDUCTOR WAFER A method of polishing a semiconductor wafer includes polishing a surface of the semiconductor wafer using a polishing pad while supplying a polishing agent slurry containing abrasives during a first step. The polishing pad is free of abrasives and includes a first surfa... | 09/15/2011 |
| 20110203186 | POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and a method for manufacturing a magnetic disk substrate using the polishing ... | 08/25/2011 |
| 20110195638 | METHOD FOR PRODUCING GLASS SUBSTRATE AND METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM Disclosed is a method for producing a glass substrate, which involves a first polishing step and a second polishing step both for polishing the surface of the glass substrate with a polishing solution containing a polishing agent. The method is characterized by addition... | 08/11/2011 |
| 20110190902 | METHODS AND DEVICES FOR IMPLANTS WITH IMPROVED CEMENT ADHESION Biomedical implants (e.g., orthopedic implants) with modified surfaces that can enhance a cement bond's strength (e.g., tensile, shear, and/or fatigue) are disclosed, along with methods of manufacturing and using such implants. The implants can exhibit a variety of phys... | 08/04/2011 |
| 20110183581 | POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME There is provided a polishing composition, containing abrasive grains and an acid represented either by R2—R1—SO3H (wherein R1 is a linear alkylene or hydroxyalkylene group having 1 to 4 carbon atoms, and R2 is ... | 07/28/2011 |
| 20110162412 | METHODS FOR MANUFACTURING MOLDING DIE, GLASS GOB, AND GLASS MOLDED ARTICLE Disclosed is a lower molding die that can well prevent the occurrence of an air bubble without narrowing the range of choice for materials for the lower molding die and, at the same time, is highly durable. Also disclosed is a method for manufacturing a molding die for ... | 07/07/2011 |
| 20110159785 | PREPARATION OF SYNTHETIC QUARTZ GLASS SUBSTRATES A synthetic quartz glass substrate is prepared by (1) polishing a synthetic quartz glass substrate with a polishing slurry comprising colloidal particles, an ionic organic compound having an electric charge of the same type as the colloidal particles, and water, and (2)... | 06/30/2011 |
| 20110159786 | Polishing Pad with Porous Elements and Method of Making and Using the Same The disclosure is directed to polishing pads with porous polishing elements, and to methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pad includes a multiplicity of polishing elements, at least some of which are por... | 06/30/2011 |
| 20110136410 | METHOD FOR VIBRATION POLISHING VEHICLE WHEEL A method for polishing a vehicle wheel having a three-dimensional shape, the vehicle wheel including a disc-shaped disc portion in which a plurality of window holes are provided and a cylindrical rim portion that is located around the disc portion, the method comprising... | 06/09/2011 |
| 20110127643 | METHOD AND APPARATUS FOR CONFORMABLE POLISHING A multi-station polish system and process for polishing thin, flat (planar) and rigid workpieces. Workpieces are conveyed through multiple polishing stations that include a bulk material removal belt polishing station and finishing rotary polishing station. The bulk of ... | 06/02/2011 |
| 20110123831 | METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC DISK The present invention relates to a method for manufacturing a glass substrate for a magnetic disk, the method including: a polishing step of supplying a polishing slurry between a polishing cloth and a circular glass plate and polishing a main surface of the circular gl... | 05/26/2011 |
| 20110117820 | MAGNETIC FIXTURE A fixture is provided for retaining a metal workpiece for contact by finishing media during operation of a media based finishing operation. The fixture comprises a body and a magnet for retaining the workpiece in contact with the body. By use of super-magnetic materials... | 05/19/2011 |
| 20110117821 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING METHOD USING THE SAME, AND METHOD OF RECYCLING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION A chemical mechanical polishing aqueous dispersion includes (A) abrasive grains, (B) an organic acid, and (C1) copper ions or (C2) at least one kind of metal atoms selected from Ta, Ti, and Rb, the chemical mechanical polishing aqueous dispersion including the copper io... | 05/19/2011 |
| 20110111676 | MULTIPLE-PHASE SURFACES, AND METHOD THEREFOR A workpiece having a multiple-phase working surface, and a lapping process for producing the surface, the process including: (a) providing a system including: (i) a workpiece having a multiple-phase working surface having a first continuous solid phase, and a second sol... | 05/12/2011 |
| 20110104991 | NOZZLE CONFIGURATIONS FOR ABRASIVE BLASTING Disclosed herein are nozzle configurations for an abrasive blasting system. The system can comprise multiple hoppers for feeding separate powders streams to a fluid jet. The separate powder streams can be mixed in a frustoconical or conical mixer prior to delivery to th... | 05/05/2011 |
| 20110104992 | POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME A polishing solution for metal films that comprises an oxidizing agent, a metal oxide solubilizer, a metal corrosion preventing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a copolymer of acrylic acid and methacrylic acid, the copolymer... | 05/05/2011 |
| 20110100347 | Wire and Methodology for Cutting Materials With Wire Wire for cutting feedstock and a method for cutting feedstock with the wire. The wire may include an iron based alloy comprising at least 35 at % iron, nickel and/or cobalt in the range of about 7 to 50 at %, at least one non-metal or metalloid selected from the group c... | 05/05/2011 |
| 20110070745 | POLISHING METHOD, POLISHING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE A polishing method includes performing conditioning process of injecting a conditioning agent onto a surface of a non-foam polishing pad arranged on a polishing table at a predetermined pressure, and polishing a surface of a polishing target while supplying a polishing ... | 03/24/2011 |
| 20110070809 | APPARATUS AND METHOD FOR SPIRAL POLISHING WITH ELECTROMAGNETIC ABRASIVE An apparatus and method for spiral polishing with electromagnetic abrasive has adopted the principle of electromagnetic and magnetic abrasive along with a lead screw to polish the inner or outer surface of a precise screw or a complicated part. The apparatus includes a ... | 03/24/2011 |
| 20110059680 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD A chemical mechanical polishing aqueous dispersion includes (A) a graft polymer that includes an anionic functional group in a trunk polymer, and (B) abrasive grains.... | 03/10/2011 |
| 20110053462 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD A chemical mechanical polishing aqueous dispersion including (A) silica particles, and (B1) an organic acid, the sodium content, the potassium content, and the ammonium ion content of the silica particles (A) determined by ICP atomic emission spectrometry, ICP mass spec... | 03/03/2011 |
| 20110041334 | PROCESS FOR MANUFACTURING A SINGLE-PIECE BLISK WITH A TEMPORARY BLADE SUPPORT RING REMOVED AFTER A MILLING FINISHING STEP A process for manufacturing a single-piece blisk, including: using an abrasive water jet to cut a block of material, so as to create blade preforms extending radially outwards from a disk, while keeping material forming a connecting mechanism between at least two direct... | 02/24/2011 |
| 20110045671 | COMPOSITION FOR POLISHING SURFACES OF SILICON DIOXIDE A composition for polishing surfaces comprises the following components:
| 02/24/2011 |
| 20110045743 | SCRATCH REMOVAL AND DEVICE AND METHOD A scratch removal tool that includes a motor, a housing, a rotatable shaft operably coupled to the motor and movable in an axial direction along a length of the shaft, and a head assembly. The head assembly includes a shroud member having an open end, a pad member, a sl... | 02/24/2011 |
