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Class 438/609 - Transparent conductor


Subclass of Class 438 - Semiconductor device manufacturing: process
Definition: Processes wherein the oxidic conductor is transparent to
No. of applications: 69
Last issue date: 05/03/2012


1    
Application No.Application TitleIssue Date
20120104616METHOD FOR DEPOSITING A THIN FILM ELECTRODE AND THIN FILM STACK
A method for depositing at least one thin-film electrode onto a transparent conductive oxide film is provided. At first, the transparent conductive oxide film is deposited onto a substrate to be processed. Then, the substrate and the transparent conductive oxide film ar...
05/03/2012
20120042927PHOTOVOLTAIC DEVICE FRONT CONTACT
A photovoltaic module may contain a front contact configured to transfer electrical current from the module....
02/23/2012
20120037218Electrode for photoelectric conversion device, method of preparing the same and photoelectric conversion device comprising the same
An electrode for a photoelectric conversion device, a method of preparing the same and a photoelectric conversion device including the same. In one embodiment, an electrode for a photoelectric conversion device includes a transparent conductive layer, a metal electrode ...
02/16/2012
20120012172THIN-FILM SOLAR FABRICATION PROCESS, DEPOSITION METHOD FOR TCO LAYER, AND SOLAR CELL PRECURSOR LAYER STACK
Methods of depositing a TCO layer on a substrate and precursor for solar cells are described. A method of depositing a TCO layer 102, 204, 404, 604 on a substrate 102, 8091 includes providing a glass substrate having a first alkali metal concentration, con...
01/19/2012
20110310322THIN FILM TRANSISTOR, THIN FILM TRANSISTOR SUBSTRATE, PROCESSES FOR PRODUCING THE SAME, LIQUID CRYSTAL DISPLAY USING THE SAME, AND RELATED DEVICES AND PROCESSES; AND SPUTTERING TARGET, TRANSPARENT ELECTROCONDUCTIVE FILM FORMED BY USE OF THIS, TRANSPARENT ELECTRODE, AND RELATED DEVICES AND PROCESSES
Provided are a thin film transistor substrate having a transparent electroconductive film in which residues and so on resulting etching are hardly generated; a process for producing the same; and a liquid crystal display using this thin film transistor substrate.

12/22/2011
20110290322SUBSTRATE WITH TRANSPARENT CONDUCTIVE FILM AND THIN FILM PHOTOELECTRIC CONVERSION DEVICE
Disclosed is a substrate with a transparent conductive film, wherein an underlying layer and a transparent conductive film are arranged in this order on a transparent insulating substrate. The transparent conductive film-side surface of the underlying layer is provided ...
12/01/2011
20110221061ANODE FOR AN ORGANIC ELECTRONIC DEVICE
There is provided an anode for an organic electronic device. The anode has (a) a first layer which is a conducting inorganic material and (b) a second ultrathin layer which is a metal oxide...
09/15/2011
20110186125PROCESS FOR PRODUCING ELECTRICALLY CONDUCTIVE ZINC OXIDE LAYERED FILMS AND PROCESS FOR PRODUCING PHOTOELECTRIC CONVERSION DEVICES
For production of an electrically conductive zinc oxide layered film, a substrate, at least a surface of the substrate being electrically non-conductive, is prepared. An underlayer is formed with a coating technique on the electrically non-conductive surface of the subs...
08/04/2011
20110165771METHOD OF FORMING VIAS IN SILICON CARBIDE AND RESULTING DEVICES AND CIRCUITS
A method of fabricating an integrated circuit on a silicon carbide substrate is disclosed that eliminates wire bonding. The method includes fabricating a semiconductor device in epitaxial layers on a surface of a silicon carbide substrate and with at least one metal con...
07/07/2011
20110151619METHOD OF FORMING METAL OXIDE FILM AND APPARATUS FOR FORMING METAL OXIDE FILM
A method of forming a metal oxide film, which can lower a temperature of a heat treatment of a substrate and also can form a metal oxide film having a low resistance value without limiting the kind of the metal oxide film to be formed. The method of forming a metal oxid...
06/23/2011
20110108099METHOD OF FORMING TRANSPARENT ZINC OXIDE LAYERS FOR HIGH EFFICIENCY PHOTOVOLTAIC CELLS
A solar cell including a high electrical resistivity transparent layer formed on a CdS buffer layer is provided. The high electrical resistivity transparent layer includes an intrinsic oxide film formed on the buffer layer and an intermediate oxide film formed on the in...
05/12/2011
20110111215TRANSPARENT CONDUCTIVE FILM HAVING FTO/ITO LAMINATE
A transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein a part or all of the crystal structure of a surface of the FTO film is orthorhombic, and a transparent conductive film for lamination on a substrate and compr...
05/12/2011
20110104885METHOD FOR TREATING A METAL OXIDE LAYER
The invention relates to a method for treating a metal oxide layer deposited on a substrate. The method comprises the step of applying a substantially atmospheric plasma process at a relatively low temperature. Preferably, the temperature during the plasma process is lo...
05/05/2011
20110097841Rear electrode structure for use in photovoltaic device such as CIGS/CIS photovoltaic device and method of making same
A photovoltaic device including a rear electrode which may also function as a rear reflector. In certain example embodiments of this invention, the rear electrode includes a metallic based reflective film that is oxidation graded, so as to be more oxided closer to a rea...
04/28/2011
20110084280THIN FILM TRANSISTOR SUBSTRATE, THIN FILM TRANSISTOR TYPE LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE
There are provided: a thin film transistor substrate provided with an amorphous transparent conductive film in which residue due to etching hardly occurs; a liquid crystal display device which utilizes the thin film transistor substrate; and a method for manufacturing a...
04/14/2011
20110049715METHOD FOR DEPOSITING METAL OXIDE FILMS
A method for depositing a metal oxide film on a surface of a supporting body for the film, comprising the steps of: —providing a deposition chamber; —providing a pulsed beam of electrons and plasma in the deposition chamber; —supplying a supporting body in the dep...
03/03/2011
20100330730Manufacturing Method of Solar Cell
The present invention discloses a method of manufacturing a solar cell by forming two electrode layers on the same side of a wafer, and avoiding sunlight incident to another side from being blocked by the electrode layers to enhance the photoelectric conversion efficien...
12/30/2010
20100311228METHOD FOR FORMING TRANSPARENT CONDUCTIVE OXIDE
Embodiments disclosed herein generally relate to a process of depositing a transparent conductive oxide layer over a substrate. The transparent oxide layer is sometimes deposited onto a substrate for later use in a solar cell device. The transparent conductive oxide lay...
12/09/2010
20100311204METHOD FOR FORMING TRANSPARENT CONDUCTIVE OXIDE
Embodiments disclosed herein generally relate to a process of depositing a transparent conductive oxide layer over a substrate. The transparent oxide layer is sometimes deposited onto a substrate for later use in a solar cell device. The transparent conductive oxide lay...
12/09/2010
20100288355SILICON NITRIDE DIFFUSION BARRIER LAYER FOR CADMIUM STANNATE TCO
A photovoltaic device can include a transparent conductive oxide layer adjacent to a substrate and a barrier layer, which can include a silicon-containing material....
11/18/2010
20100288354CADMIUM STANNATE TCO STRUCTURE WITH DIFFUSION BARRIER LAYER AND SEPARATION LAYER
A photovoltaic device can include a transparent conductive oxide layer adjacent to a substrate and one or more barrier layers, which can include a silicon oxide or a silicon nitride....
11/18/2010
20100230814NANOSCALE, SPATIALLY-CONTROLLED GA DOPING OF UNDOPED TRANSPARENT CONDUCTING OXIDE FILMS
An article of manufacture comprising a nanowire and methods of making the same. In one embodiment, the nanowire includes a Ga-doped trace formed on a surface of an indium oxide layer having a thickness in nano-scale, and wherein the Ga-doped trace is formed with a dimen...
09/16/2010
20100230679CONTACT PORTION OF WIRE AND MANUFACTURING METHOD THEREOF
A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer ...
09/16/2010
20100173489METHOD FOR MANUFACTURING LOWER SUBSTRATE OF LIQUID CRYSTAL DISPLAY DEVICE
A method for manufacturing a lower substrate of a liquid crystal display device is disclosed. The method comprises the steps of: (a) forming a patterned first metal layer, a first insulating layer, a patterned second metal layer and a second insulating layer on a substr...
07/08/2010
20100112789Method for Producing Semiconductor Chips using Thin Film Technology
For semiconductor chips using thin film technology, an active layer sequence is applied to a growth substrate, on which a reflective electrically conductive contact material layer is then formed. The active layer sequence is patterned to form active layer stacks, and re...
05/06/2010
20100101633PHOTOVOLTAIC DEVICE AND METHOD FOR MANUFACTURING THE SAME
A photovoltaic device and a manufacturing method thereof are provided. The photovoltaic device includes: a substrate; a first conductive layer formed on the substrate; P layers and N layers alternately formed along a first direction on the first conductive layer; and I ...
04/29/2010
20100090230CRYSTAL SILICON ELEMENT AND METHOD FOR FABRICATING SAME
It is an object of the present invention to provide a crystal silicon element emitting a desired visible light at high efficiency, by markedly enhancing the crystallinity of the nano Si. A p-type single crystal silicon substrate 10, a thick silicon oxide film ...
04/15/2010
20100078816DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
A display device includes a metal conductive layer formed on a substrate, a transparent electrode film formed on the substrate and joined to the metal conductive layer and an interlayer insulating film isolating the metal conductive layer and the transparent conductive ...
04/01/2010
20100038667Optoelectronic Semiconductor Chip and Method for Manufacturing a Contact Structure for Such a Chip
An optoelectronic semiconductor chip with a semiconductor body having a semiconductor layer sequence with an active region suitable for generating radiation is specified, wherein the semiconductor chip comprises a radiation-transmissive and electrically conductive conta...
02/18/2010
20100024862Substrate Provided with Transparent Conductive Film for Photoelectric Conversion Device, Method for Manufacturing the Substrate, and Photoelectric Conversion Device Using the Substrate
Provided in this invention is a low-cost substrate provided with a transparent conductive film for photoelectric conversion device, which can improve performance of the photoelectric conversion device by enhanced light confinement effect achieved with effectively increa...
02/04/2010
20100029067ROLL-TO-ROLL CONTINUOUS THIN FILM PV MANUFACTURING PROCESS AND EQUIPMENT WITH REAL TIME ONLINE IV MEASUREMENT
Apparatuses and methods are provided for the continuous, roll-to-roll formation of photovoltaic (PV) cells. Apparatuses include reel-to-reel transport chambers, one or more deposition chambers, a differential process isolation unit and a chamber for obtaining real time ...
02/04/2010
20100001359TRANSPARENT CONDUCTIVE LAYER AND METHOD OF MANUFACTURING THE SAME
A transparent conductive layer includes a substrate, a first conductive layer disposed on the substrate, and a second conductive layer disposed on the first conductive layer, wherein the second conductive layer comprises a textured surface and an opening which exposes t...
01/07/2010
20090325331METHOD FOR MANUFACTURING PIXEL STRUCTURE
A method for manufacturing a pixel structure is provided. First, a gate and a gate insulating layer are sequentially formed on the substrate. A channel layer and a second metal layer are sequentially formed on the gate insulating layer. The second metal layer is pattern...
12/31/2009
20090323168ELECTROMECHANICAL DEVICES AND METHODS OF FABRICATING SAME
In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherei...
12/31/2009
20090317934Local heterostructure contacts
Disclosed is a novel method for creating local contacts in solar cells. In the method, a surface passivation that has been applied to a semiconductor substrate is locally etched away using a plasma process with the help of a thin stretched, elastic foil. If necessary, d...
12/24/2009
20090301543Thin film solar cells with monolithic integration and backside contact
The present invention discloses novel thin film photovoltaic devices with monolithic integration and backside metal contacts and methods of making the devices.

The innovative approach described in the present invention allows for devices an...

12/10/2009
20090221141METHOD FOR PATTERNING CRYSTALLINE INDIUM TIN OXIDE USING FEMTOSECOND LASER
A method for patterning crystalline indium tin oxide (ITO) using femtosecond laser is disclosed, which comprises steps of: (a) providing a substrate with an amorphous ITO layer thereon; (b) transferring the amorphous ITO layer in a predetermined area into a crystalline ...
09/03/2009
20090179239CMOS image sensors and methods of manufacturing the same
A complementary metal-oxide-semiconductor image sensor may include: a semiconductor substrate; a photodiode formed on a first portion of the semiconductor substrate; a transfer gate formed on the semiconductor substrate, near the photodiode, to transfer optical charges ...
07/16/2009
20090179220SEMICONDUCTOR LIGHT-EMITTING DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LAMP
The present invention provides a semiconductor light-emitting device capable of effectively emitting ultraviolet light and a method of manufacturing the same.

A semiconductor light-emitting device 1 includes: a p-type semiconductor l...

07/16/2009
20080258174Optical Device and Method of Fabricating the Same
Disclosed is an optical device including an optical member and a contact layer stacked on at least one of top and bottom surfaces of the optical member. The contact layer has at least one transparent conducting oxynitride (TCON) layer. The TCON consists of at least one ...
10/23/2008
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