Bizarre Patents
Decorative Jeweled Wheel Cover
An improved wheel is provided wherein decorative items such as gem stones are embedded in either the wheel surface, a special mounting section attached to the wheel surface, or to a spoke strap that wraps around each spoke and positions embedded gem stones on the outside surface of the spoke.
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| Application No. | Application Title | Issue Date |
| 20120129082 | METHOD OF ADHERING LITHOGRAPHIC PELLICLE AND ADHERING APPARATUS THEREFOR A method of adhering a lithographic pellicle includes steps of pressing the pellicle frame 6 toward the exposure stencil 5 by a pressure plate 2 via a bag 3 containing a low viscosity liquid being mounted on the surface of the pressure plate ... | 05/24/2012 |
| 20120127444 | Reflection Mask For EUV Lithography, System For EUV Lithography, And Method Of Fixing The Reflection Mask For EUV Lithography Example embodiments of the inventive concepts relate to a reflection mask including an upper surface configured to reflect extreme ultraviolet EUV light, a lower surface opposite the upper surface, where the lower surface includes at least one alignment key. The reflect... | 05/24/2012 |
| 20120129084 | PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD A photomask blank which is capable of preventing static buildup caused by electron beam pattern drawing for forming a resist pattern. The photomask blank provides a good pattern accuracy through optimization of the dry etching rate along the depth direction of the shiel... | 05/24/2012 |
| 20120129083 | METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACTURING REFLECTIVE MASK According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can includ... | 05/24/2012 |
| 20120108054 | Dual Damascene Copper Process Using a Selected Mask A method for creating a dual damascene structure while using only one lithography and masking step. Conventional dual damascene structures utilize two lithography steps: one to mask and expose the via, and a second step to mask and expose the trench interconnection. The... | 05/03/2012 |
| 20120107733 | REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY Provision of a reflective mask blank for EUV lithography having an absorber layer having optical constants suitable for reducing the film thickness. A reflective mask blank for EUV lithography comprising a substrate and a reflective layer f... | 05/03/2012 |
| 20120107730 | RECORDING MEDIUM RECORDING PROGRAM FOR GENERATING MASK DATA, METHOD FOR MANUFACTURING MASK, AND EXPOSURE METHOD A mask includes a main pattern for resolving a target pattern to be formed on a substrate and an auxiliary pattern not resolving. Values of parameters of the main pattern and the auxiliary pattern are set. An image is calculated that is formed when the main pattern and ... | 05/03/2012 |
| 20120107729 | GATE CD CONTROL USING LOCAL DESIGN ON BOTH SIDES OF NEIGHBORING DUMMY GATE LEVEL FEATURES A method of forming an IC including MOS transistors includes using a gate mask to form a first active gate feature having a line width W1 over an active area and a neighboring dummy feature having a line width 0.8W1 to 1.3W1. The neighbo... | 05/03/2012 |
| 20120107732 | CURABLE COMPOSITIONS, METHOD OF COATING A PHOTOTOOL, AND COATED PHOTOTOOL A curable composition comprises: an epoxy silane represented by formula X—Si(OR1)(OR2)(OR3) wherein R1-R3 represent C1 to C4 alkyl groups, and X represents an organic group having at least on... | 05/03/2012 |
| 20120107731 | PHOTOMASK A photomask includes a transparent substrate for passage of an exposure light, and a plurality of photomask pattern units formed on a surface of the transparent substrate. Each of the photomask pattern units includes a first light-blocking layer connected to the surface... | 05/03/2012 |
| 20120082924 | MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING A TRANSFER MASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE A mask blank for use in the manufacture of a binary mask adapted to be applied with ArF excimer laser exposure light has, on a transparent substrate, a light-shielding film for forming a transfer pattern. The light-shielding film has a laminated structure of a lower lay... | 04/05/2012 |
| 20120083124 | Method of Patterning NAND Strings Using Perpendicular SRAF A lithography mask includes a plurality of patterning features formed on a mask substrate and a first plurality of sub-resolution assist features (SRAFs) formed substantially perpendicular to the patterning features on the mask substrate.... | 04/05/2012 |
| 20120082923 | PHOTOMASK THROUGHPUT BY REDUCING EXPOSURE SHOT COUNT FOR NON-CRITICAL ELEMENTS A solution for improving photomask fabrication time and yield, through the reduction in the number of exposure shots used for a given photomask pattern to be written on the photomask. In one embodiment, non-critical elements can be configured into a shape that the write... | 04/05/2012 |
| 20120070768 | RETICLES WITH SUBDIVIDED BLOCKING REGIONS AND METHODS OF FABRICATION Methods for designing, fabricating, and using attenuated phase shift reticles, or photomasks are disclosed. Methods are also disclosed for subdividing the radiation blocking regions of previously fabricated reticles of previously existing designs. The methods may includ... | 03/22/2012 |
| 20120069311 | Passivation of Multi-Layer Mirror for Extreme Ultraviolet Lithography A reflector structure suitable for extreme ultraviolet lithography (EUVL) is provided. The structure comprises a substrate having a multi-layer reflector. A capping layer is formed over the multi-layer reflector to prevent oxidation. In an embodiment, the capping layer ... | 03/22/2012 |
| 20120070767 | SET OF MASKS, METHOD OF GENERATING MASK DATA AND METHOD FOR FORMING A PATTERN A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconduc... | 03/22/2012 |
| 20120052417 | Circuit Apparatus Having a Rounded Trace In various embodiments of the present invention a circuit apparatus having a rounded trace, a method to manufacture the circuit apparatus, and a design structure used in the design, testing, or manufacturing of the circuit apparatus are described. An artwork layer havin... | 03/01/2012 |
| 20120052416 | Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imagable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imagable material. Th... | 03/01/2012 |
| 20120052418 | METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNESS AND IMAGE LOG SLOPE A method for illuminating a mask with a source to project a desired image pattern through a lithographic system onto a photoactive material including: defining a representation of the mask; obtaining a fractional resist shot noise (FRSN) parameter; determining a first r... | 03/01/2012 |
| 20120052420 | HALF TONE MASK HAVING MULTI-HALF PERMEATION PART AND A METHOD OF MANUFACTURING THE SAME A half tone mask having a multi semi-transmission part and a manufacturing method thereof that can pattern a plurality of layers using one mask, by having at least two or more semi-transmission parts with light transmission that are different from each other, are provid... | 03/01/2012 |
| 20120052419 | PHOTOMASK, MANUFACTURING APPARATUS AND METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND PHOTOMASK FEATURE LAYOUT METHOD A photomask is provided which can have a large depth of focus even if four main features are annularly arranged at random. The photomask has four annularly arranged main features based on design information of a circuit feature to be formed... | 03/01/2012 |
| 20120045714 | PELLICLE FOR LITHOGRAPHY AND MANUFACTURING METHOD THEREOF A pellicle for lithography according to the present invention comprises a pellicle film (10) of single crystal silicon, and the pellicle film (10) is supported by a support member (20) including an outer frame portion (20a) and a porou... | 02/23/2012 |
| 20120045712 | EXTREME ULTRAVIOLET LIGHT (EUV) PHOTOMASKS, AND FABRICATION METHODS THEREOF Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and ov... | 02/23/2012 |
| 20120045713 | PHOTOMASK BLANK, METHOD OF MANUFACTURING THE SAME, PHOTOMASK, AND METHOD OF MANUFACTURING THE SAME A photomask blank for use in the manufacture of a photomask adapted to be applied with exposure light having a wavelength of 200 nm or less has a thin film on a transparent substrate. The thin film is made of a material containing a transition metal, silicon, and carbon... | 02/23/2012 |
| 20120040279 | METHOD, DEVICE, AND SYSTEM FOR FORMING CIRCULAR PATTERNS ON A SURFACE A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by... | 02/16/2012 |
| 20120040277 | DAMASCENE RETICLE AND METHOD OF MANUFACTURE THEREOF A reticle carrier for a polishing tool capable of accommodating a reticle includes a base plate with an obverse and reverse surfaces, a retaining ring secured to the obverse surface of the base plate forming a recess defined by the obverse surface of the rigid base plat... | 02/16/2012 |
| 20120038866 | COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE, AND EXPOSURE MASK A color filter which is able to form a liquid crystal display device that has few variation in display caused due to difference in exposure illuminance among exposure heads and/or misalignment in pattern position, and that is excellent in display quality, and an exposur... | 02/16/2012 |
| 20120040278 | INTENSITY SELECTIVE EXPOSURE PHOTOMASK An intensity selective exposure photomask, also describes as a gradated photomask, is provided. The photomask includes a first region including a first array of sub-resolution features. The first region blocks a first percentage of the incident radiation. The photomask ... | 02/16/2012 |
| 20120040276 | METHOD OF FORMING AND USING PHOTOLITHOGRAPHY MASK HAVING A SCATTERING BAR STRUCTURE A method of forming a photolithography mask including forming a first linear non-dense feature on the mask and forming a plurality of parallel linear assist features disposed substantially perpendicular to the at least one linear non-dense design feature. In an embodime... | 02/16/2012 |
| 20120034551 | BINARY PHOTOMASK BLANK AND BINARY PHOTOMASK MAKING METHOD A binary photomask blank has on a transparent substrate a light-shielding film including substrate-side and surface-side compositionally graded layers, having a thickness of 35-60 nm, and composed of a silicon base material containing a transition metal and N and/or O. ... | 02/09/2012 |
| 20120034554 | Method for Fracturing and Forming a Pattern Using Circular Characters with Charged Particle Beam Lithography In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projec... | 02/09/2012 |
| 20120034553 | Photomask Blank, Photomask, and Pattern Transfer Method Using Photomask A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank (1) having a single-layer or multilayer light-shielding film (3) arranged on a translucent substrate (2) and mainly containing a metal is ch... | 02/09/2012 |
| 20120034552 | METHOD OF MANUFACTURING A PHOTOMASK A thin film composed of a material containing a metal and silicon is formed on a transparent substrate, and a thin film pattern is formed by patterning the thin film. Then, the main surface and the side walls of the thin film pattern are previously modified so as to pre... | 02/09/2012 |
| 20120021344 | REFLECTIVE PHOTOMASK AND REFLECTIVE PHOTOMASK BLANK Provided is a reflective photomask reflecting an EUV light and used to irradiate a reflected light to a transfer sample, the reflective photomask including: a substrate; a high reflection part formed on the substrate; and a low reflection part formed on the high reflect... | 01/26/2012 |
| 20120021341 | SUBSTRATE TO BE PROCESSED HAVING LAMINATED THEREON RESIST FILM FOR ELECTRON BEAM AND ORGANIC CONDUCTIVE FILM, METHOD FOR MANUFACTURING THE SAME, AND RESIST PATTERNING PROCESS There is disclosed a substrate to be processed having laminated thereon a resist film for electron beam and an organic conductive film, in which at least a resist film for electron beam and an organic conductive film are laminated in order on a substrate to be processed... | 01/26/2012 |
| 20120021342 | PHOTOMASK HAVING TRANSCRIBING PATTERN AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME A photomask for a proximate type exposure apparatus includes: a transparent substrate; and a transcribing pattern and a peripheral region surrounding the transcribing pattern on the transparent substrate, the transcribing pattern having at least one bar including a plur... | 01/26/2012 |
| 20120021343 | Process Window Signature Patterns for Lithography Process Control A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enabl... | 01/26/2012 |
| 20120015287 | Method of fabricating a half tone mask having a shielding pattern and plural overlapping halftone patterns of different widths A halftone mask includes a shielding pattern partially formed on a transparent substrate; a first halftone transmission pattern partially formed on the transparent substrate; and a second halftone transmission pattern formed on the first halftone transmission layer.... | 01/19/2012 |
| 20120015288 | MEMBER FOR MASKING FILM, PROCESS FOR PRODUCING MASKING FILM USING THE SAME, AND PROCESS FOR PRODUCING PHOTOSENSITIVE RESIN PRINTING PLATE A member for masking films which includes a base film transparent to ultraviolet rays and, on one surface thereof, an ultraviolet-shielding resin layer capable of being removed by irradiation with laser light beams and having an average thickness of 0.1 to 30 μm, where... | 01/19/2012 |
| 20120015286 | MASK BLANK SUBSTRATE, MASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME A mask blank substrate for a photomask is chucked on a mask stage of an exposure apparatus. A main surface, on the side where a thin film for a transfer pattern is to be formed, of the mask blank substrate has a flatness of 0.3 μm or less in a 142 mm square area includ... | 01/19/2012 |
