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Class 427/585 - Chemical vapor deposition (e.g., electron beam or heating using IR, inductance, resistance, etc.)


Subclass of Class 427 - Coating processes
Definition: Processes wherein a vapor phase precursor decomposes either
No. of applications: 205
Last issue date: 05/03/2012


1            
Application No.Application TitleIssue Date
20120103182Slide Parts and Equipment Including Same
It is an objective of the invention to provide a slide part in which a seal member formed of an elastic body is in sliding contact with a hard member. There is provided a slide part comprising: a hard member having an amorphous carbon coating containing nitrogen formed ...
05/03/2012
20120082828LASER PATTERN MASK AND METHOD FOR FABRICATING THE SAME
The present invention relates to a laser pattern mask, and a method for fabricating the same, which can prevent a laser pattern mask from being damaged by coating a protective film on a surface of a laser pattern mask for patterning an entire layer on a mother substrate...
04/05/2012
20110311737VAPOR DEPOSITION APPARATUS FOR MINUTE-STRUCTURE AND METHOD THEREFOR
A vapor deposition apparatus for a minute-structure includes a surface acoustic wave device 10 that has at least a pair of electrodes 12 and 13 arranged at an interval on a surface of a piezoelectric body 11, a vacuum vapor deposition device ...
12/22/2011
20110311427Strongly Bound Carbon Nanotube Arrays Directly Grown On Substrates And Methods For Production Thereof
The present disclosure describes carbon nanotube arrays having carbon nanotubes grown directly on a substrate and methods for making such carbon nanotube arrays. In various embodiments, the carbon nanotubes may be covalently bonded to the substrate by nanotube carbon-su...
12/22/2011
20110287194DEVICE AND METHOD FOR COATING A SUBSTRATE USING CVD
The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conducto...
11/24/2011
20110287223METALLIC ARTICLES WITH HYDROPHOBIC SURFACES
Articles containing fine-grained and/or amorphous metallic coatings/layers on at least part of their exposed surfaces are imprinted with surface structures to raise the contact angle for water in the imprinted areas at room temperature by equal to or greater than 10°, ...
11/24/2011
20110267618PASSIVE REFLECTIVE TRACKING MEDIA COMPOSITIONS AND METHODS FOR COVERTLY TRACKING OBJECTS
A passive reflective tracking media includes a plurality of multi-layer particles including at least one layer of a high refractive index material and at least one layer of a low refractive index material. The particles are configured to reflect ambient electromagnetic ...
11/03/2011
20110256347METHOD FOR MAKING DIAMOND COMPOSITE MATERIALS
The invention relates to a method for depositing a diamond coating onto a substrate, said method resulting in the production of a coating characterised by a novel morphology of the diamond in the form of pyramids containing submicronic grains. The method is carried out ...
10/20/2011
20110223519SOLID OXIDE FUEL CELL AND METHOD OF PREPARING THE SAME
A solid oxide fuel cell includes a membrane electrode assembly including an anode, a cathode, and a solid oxide electrolyte membrane disposed between the anode and the cathode; and a porous conductive support disposed at one surface or both surfaces of the membrane elec...
09/15/2011
20110206865METHOD OF AND APPARATUS UTILIZING CARBON CORD FOR EVAPORATION OF METALS
A high temperature evaporator is made using an electrically insulating crucible and a heating element made of woven graphite fibers. The crucible is manufactured out of an electrically insulating block to the required shape, and channels are machined on the walls of the...
08/25/2011
20110192997GRID AND METHOD OF MANUFACTURING A GRID FOR SELECTIVE TRANSMISSION OF ELECTROMAGNETIC RADIATION, PARTICULARLY X-RAY RADIATION FOR MAMMOGRAPHY APPLICATIONS
A method of manufacturing a grid (1) for selective transmission of electromagnetic radiation, particularly X-ray radiation, is proposed. The method comprises: providing a support element (3) having self-supporting stability, wherein the support element (
08/11/2011
20110175487METHOD FOR PRODUCING A DIELECTRIC LAYER IN AN ELECTROACOUSTIC COMPONENT, AND ELECTROACOUSTIC COMPONENT
The invention relates to a method for producing a dielectric layer (3) in an electroacoustic component (1), in particular a component operating with acoustic surface waves or bulk acoustic waves, comprising a substrate and an associated electrode structure...
07/21/2011
20110129621SYSTEMS AND METHODS FOR DISTRIBUTING GAS IN A CHEMICAL VAPOR DEPOSITION REACTOR
Systems and methods for the production of polysilicon or another material via chemical vapor deposition in a reactor are provided in which gas is distributed using a silicon standpipe. The silicon standpipe can be attached to the reactor system using a nozzle coupler su...
06/02/2011
20110123727MAGNETIC LAMINATED STRUCTURE AND METHOD OF MAKING
A method for making an article comprising a multilayered structure comprising a series of magnetic layers is provided. The method includes providing a substrate and depositing a series of magnetic layers on the substrate and disposing insulating layers between successiv...
05/26/2011
20110081504Method for depositing a thin-film polymer in a low-pressure gas phase
The invention relates to a method for depositing one or more thin layers. In said method, a process gas forming a polymer streams into a deposition chamber (8) along with a carrier gas by means of a gas inlet element (3) in order to deposit a thin layer, i...
04/07/2011
20110070381USE OF NITROGEN-BASED REDUCING COMPOUNDS IN BEAM-INDUCED PROCESSING
A system for beam-induced deposition or etching, in which a charged particle or laser beam can be directed to a work piece within a single vacuum chamber, either normally incident or at an angle. Simultaneously with beam illumination of the work piece, a deposition or e...
03/24/2011
20110033639APPARATUS AND PROCESS FOR CARBON NANOTUBE GROWTH
An apparatus is provided for growing high aspect ratio emitters (26) on a substrate (13). The apparatus comprises a housing (10) defining a chamber and includes a substrate holder (12) attached to the housing and positioned within the chamber...
02/10/2011
20100314353Nano-construction of complex 3-D Structures and modification of existing structures
In one preferred aspects, methods are provided to produce a three-dimensional feature, comprising: (a) providing a nano-manipulator device; (b) positioning an article with the nano-manipulator device; and (c) manipulating the article to produce the three-dimensional fea...
12/16/2010
20100307553ENGINEERING LIGHT MANIPULATION IN STRUCTURED FILMS OR COATINGS
The present disclosure concerns a means to use light manipulation in engineered or structured coatings for thermal or photothermal effects and/or refractive and reflective index management. Such metallic, nonmetallic, organic or inorganic metamaterials or nanostructures...
12/09/2010
20100304063METAL-COATED POLYMER ARTICLE OF HIGH DURABILITY AND VACUUM AND/OR PRESSURE INTEGRITY
Metal-coated polymer articles containing structural substantially porosity-free, fine-grained and/or amorphous metallic coatings/layers optionally containing solid particulates dispersed therein on polymer substrates, are disclosed. The substantially porosity-free metal...
12/02/2010
20100304011METHODS AND APPARATUSES FOR DEPOSITING NANOMETRIC FILAMENTARY STRUCTURES
The invention relates to a method for depositing nanometric filamentary structures. The method comprises passing a gaseous phase comprising the nanometric filamentary structures through a space defined between at least two electrodes generating an electric field, for de...
12/02/2010
20100297362METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES
A method for processing an object with miniaturized structures is provided. The method includes feeding a reaction gas onto a surface of the object. The method also includes processing the object by directing an energetic beam onto a processing site in a region, which i...
11/25/2010
20100285332Aluminum-scandium alloy film applied to vehicle lamps and manufacturing method thereof
An aluminum-scandium (Al—Sc) alloy film applied to vehicle lamps and a manufacturing method thereof are revealed. The Al—Sc alloy film contains a trace of scandium so that both temperature for grain refinement and temperature for recrystallization of the film are in...
11/11/2010
20100285238METHODS OF FORMING GLASS ON A SUBSTRATE
Disclosed is a deposition process for forming a glass film. An embodiment comprising the steps of disposing a substrate in a chemical vapor deposition chamber and exposing the substrate surface to a SiO2 precursor gas, a carrier gas, and optionally a dopant g...
11/11/2010
20100279513Systems and Methods for Nanowire Growth and Manufacturing
The present invention is directed to compositions of matter, systems, and methods to manufacture nanowires. In an embodiment, a buffer layer is placed on a nanowire growth substrate and catalytic nanoparticles are added to form a catalytic-coated nanowire growth substra...
11/04/2010
20100276607Method of depositing protective structures
A process of preparing a lamella from a substrate includes manufacturing a protection strip on an edge portion of the lamella to be prepared from the substrate, and preparing the lamella, wherein the manufacturing the protection strip includes a first phase of activatin...
11/04/2010
20100247807ELECTRON GUN EVAPORATION APPARATUS AND FILM FORMATION METHOD USING THE ELECTRON GUN EVAPORATION APPARATUS
An electron gun evaporation apparatus capable of efficiently using an evaporation source includes an electron beam position controller which determines, as an applicable range, a range within which the distribution of the film thickness growth rate is almost constant in...
09/30/2010
20100239464SUBSTRATE MANUFACTURING METHOD FOR SENSOR APPLICATIONS USING OPTICAL CHARACTERISTICS AND THE SUBSTRATE THEREFROM
A method for manufacturing a substrate of an analytical sensor and the substrate thus prepared are disclosed. The method for manufacturing the substrate of the sensor application according to the present invention is characterized in that it comprises (a) the step of pr...
09/23/2010
20100220305Optical element and exposure apparatus
An optical element is used for an exposure apparatus which is configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a sur...
09/02/2010
20100221453BIAS ENHANCED NUCLEATION OF DIAMOND FILMS IN A CHEMICAL VAPOR DEPOSITION PROCESS
Diamonds are used to nucleate diamond and diamond-like carbon films in a chemical vapor deposition process using bias enhancement. A negative bias is applied to the substrate, such that a cationic form of the diamond is accelerated toward the substrate during the nuclea...
09/02/2010
20100215872High Throughput Multi-Wafer Epitaxial Reactor
An epitaxial reactor enabling simultaneous deposition of thin films on a multiplicity of wafers is disclosed. During deposition, a number of wafers are contained within a wafer sleeve comprising a number of wafer carrier plates spaced closely apart to minimize the proce...
08/26/2010
20100209625VOLTAGE VARIABLE TYPE THINFILM DEPOSITION METHOD AND APPARATUS THEREOF
A voltage variable-type thin film deposition device and method is disclosed. The voltage variable-type thin film deposition method includes applying bias voltage while continuously varying the magnitude of the bias voltage for a period of time set by a user, —determin...
08/19/2010
20100209626METHODS FOR HEATING WITH LAMPS
Embodiments of the invention generally relate to methods for chemical vapor deposition (CVD) processes. In one embodiment, a method for heating a substrate or a substrate susceptor within a vapor deposition reactor system includes exposing a lower surface of a substrate...
08/19/2010
20100189929COATING DEVICE AND DEPOSITION APPARATUS
A coating device for use with an electron beam vapor deposition apparatus includes a crucible portion and a nozzle portion. The crucible portion includes a gas inlet port, a heating zone for presenting a source coating material to be heated, and a flow passage exposed t...
07/29/2010
20100166981SURFACE CHARGE ENHANCED ATOMIC LAYER DEPOSITION OF PURE METALLIC FILMS
A method including applying an electric charge to a substrate in a chamber; introducing an organometallic substituent into the chamber, the organometallic substituent including a metal ligand and an organic ligand; and depositing a metal film by reducing the metal ligan...
07/01/2010
20100154425STRAIN TOLERANT THERMAL BARRIER COATING SYSTEM
A method for forming a thermal barrier coating on a combustor panel or a fuel nozzle comprises the steps of: providing a component selected from the group consisting of a combustor panel, a bulkhead heat shield, and a fuel nozzle; optionally depositing a first layer of ...
06/24/2010
20100151230PROCESS FOR CONTROLLING FATIGUE DEBIT OF A COATED ARTICLE
A process for controlling fatigue debit when coating an article includes the steps of: cleaning at least one surface of an article including a structural material; depositing a bond coat material upon at least one cleaned surface of the article to form a bond coat layer...
06/17/2010
20100143609METHOD FOR FORMING LOW-CARBON CVD FILM FOR FILLING TRENCHES
A method of forming a low-carbon silicon-containing film by CVD on a substrate having trenches includes: introducing a silicon-containing compound having three or less hydrocarbon units in its molecule and having a boiling temperature of 35° C. to 220° C.; applying RF...
06/10/2010
20100129994Method for forming a film on a substrate
A method for forming a film on a substrate comprising: heating a solid organosilane source in a heating chamber to form a gaseous precursor; transferring the gaseous precursor to a deposition chamber; and reacting the gaseous precursor using an energy source to form the...
05/27/2010
20100116788Substrate temperature control by using liquid controlled multizone substrate support
A substrate support useful in a reaction chamber of a plasma processing apparatus is provided. The substrate support comprises a base member and a heat transfer member overlying the base member. The heat transfer member has multiple zones to individually heat and cool e...
05/13/2010
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