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| Application No. | Application Title | Issue Date |
| 20120128897 | Organoaminosilane Precursors and Methods for Depositing Films Comprising Same Described herein are precursors and methods of forming dielectric films. In one aspect, there is provided a silicon precursor having the following formula I: wherein R1 is independently selected fr... | 05/24/2012 |
| 20120125891 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber... | 05/24/2012 |
| 20120107524 | THIN-FILM MANUFACTURING METHOD AND APPARATUS A thin-film manufacturing method includes the steps of: generating a plasma from source gas; extracting ions from the plasma; and depositing a thin film on one side or both sides of a substrate to be deposited with the ions. The method is performed in an apparatus inclu... | 05/03/2012 |
| 20120082802 | POWER LOADING SUBSTRATES TO REDUCE PARTICLE CONTAMINATION A method for preventing particle contamination within a processing chamber is disclosed. Preheating the substrate within the processing chamber may cause a thermophoresis effect so that particles within the chamber that are not adhered to a surface may not come to rest ... | 04/05/2012 |
| 20120070741 | HIGH CAPACITY BATTERY ELECTRODE STRUCTURES Provided are battery electrode structures that maintain high mass loadings (i.e., large amounts per unit area) of high capacity active materials in the electrodes without deteriorating their cycling performance. These mass loading levels correspond to capacities per ele... | 03/22/2012 |
| 20120067844 | METHOD OF MANUFACTURING RECORDING MEDIUM According to one embodiment, in a method manufacturing a magnetic recording medium which is configured such that a ferromagnetic recording part is formed on a substrate in a desired track pattern or a desired bit pattern, a ferromagnetic film is formed on a substrate, a... | 03/22/2012 |
| 20120052215 | METHOD FOR MANUFACTURING GAS BARRIER THIN FILM-COATED PLASTIC CONTAINER Disclosed herein is a method for producing a plastic container coated with a thin film that is excellent in gas barrier properties, film coloration and film adhesiveness without using an external electrode having a special shape while suppressing deposition of foreign m... | 03/01/2012 |
| 20120048829 | METHODS FOR DISCRETIZED PROCESSING AND PROCESS SEQUENCE INTEGRATION OF REGIONS OF A SUBSTRATE The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used i... | 03/01/2012 |
| 20120052242 | Substrate Structure Grown By Plasma Deposition Substrate structure comprising a substrate (6) and a plasma grown layer (6a). The surface of the resulting substrate structure (7) is characterized by interrelated scaling components. The scaling components comprise a roughness exponent α, a... | 03/01/2012 |
| 20120043298 | METHODS FOR DISCRETIZED PROCESSING AND PROCESS SEQUENCE INTEGRATION OF REGIONS OF A SUBSTRATE The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used i... | 02/23/2012 |
| 20120045588 | DEPOSITION SYSTEM WITH A ROTATING DRUM A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least on... | 02/23/2012 |
| 20120045593 | PLASMA CVD APPARATUS In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus... | 02/23/2012 |
| 20120045590 | APPARATUS AND METHOD FOR PLASMA TREATMENT OF CONTAINERS An apparatus (9) for plasma treating multiple containers. The apparatus includes a manifold (2) comprising at least a first chamber with multiple outlet openings and multiple hollow, electrically-conductive nozzles (10) for at least one of deliverin... | 02/23/2012 |
| 20120045589 | Amidate Precursors For Depositing Metal Containing Films Volatile metal amidate metal complexes are exemplified by bis(N-(tert-butyl)ethylamidate)bis(ethylmethylamido) titanium; (N-(tert-butyl)(tert-butyl)amidate)tris(ethylmethylamido) titanium; bis(N-(tert-butyl)(tert-butyl)amidate)bis(dimethylamido) titanium and (N-(tert-bu... | 02/23/2012 |
| 20120045591 | PLASMA PROCESSING APPARATUS, DEPOSITION METHOD, METHOD OF MANUFACTURING METAL PLATE HAVING DLC FILM, METHOD OF MANUFACTURING SEPARATOR, AND METHOD OF MANUFACTURING ARTICLE A plasma processing apparatus includes a holder holding an object to be processed in a vacuum chamber while being electrically connected to the object, a first take-up portion configured to take up an electrically conductive sheet and set at a potential different from t... | 02/23/2012 |
| 20120037597 | PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD There is provided a plasma processing apparatus capable of performing a uniform plasma process on a substrate by controlling a plasma distribution within a chamber to a desired state and uniformizing a plasma density within the chamber. The plasma processing apparatus i... | 02/16/2012 |
| 20120040116 | DEVICE HOUSING AND METHOD FOR MAKING THE SAME A device housing is provided. The device housing includes a substrate, and a photochromic coating formed on the substrate. The photochromic coating includes at least one of a silver chloride-cuprous chloride mixture, a silver bromide-cuprous bromide mixture, and a silve... | 02/16/2012 |
| 20120034393 | FORMATION METHOD OF COATING A formation method of a coating that coats a coated body with the coating includes: generating cylindrical plasma in a vacuum deposition chamber as well as supplying material gas into the vacuum deposition chamber; applying pulse voltage to the coated body; and attachin... | 02/09/2012 |
| 20120027953 | Rotating Reactor Assembly for Depositing Film on Substrate A rotating reactor assembly includes an injector rotor comprising a channel extending in a direction parallel to a rotational axis of the injector rotor and at least one injection hole connected to the channel; and an intake port through which a material is introduced. ... | 02/02/2012 |
| 20120024819 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD According to one embodiment, a plasma processing apparatus includes a first electrode, a second electrode, a dielectric member, and a control unit. Plasma is generated between the first electrode and the second electrode. The dielectric member is provided between the fi... | 02/02/2012 |
| 20120027952 | TRANSPORT DEVICE HAVING A DEFLECTABLE SEALING FRAME The invention describes a device for transporting a substrate (5) into a working area (2, 3, 22) which can be temporarily separated in a vacuum-tight manner, and a corresponding method. A transport means (4) transports a substrate (5) in the ... | 02/02/2012 |
| 20120018402 | PLASMA PROCESSING APPARATUS AND LINER ASSEMBLY FOR TUNING ELECTRICAL SKEWS The invention discloses a plasma processing apparatus comprising a chamber lid, a chamber body and a support assembly. The chamber body, defining a processing volume for containing a plasma, for supporting the chamber lid. The chamber body is comprised of a chamber side... | 01/26/2012 |
| 20120019122 | DEVICE HAVING ALIGNED CARBON NANOTUBE A method comprising patterning a substrate to form exposed regions of the substrate sized to deter entangled growth of carbon nanotubes thereon and growing vertically aligned nanotubes on the exposed regions of the substrate.... | 01/26/2012 |
| 20120021139 | MANUFACTURING METHOD OF DISPLAY DEVICE AND MOLD THEREFOR A method of manufacturing a display device in which a film deposited on a substrate through openings in a covering layer is easily removed from the covering layer, is described herein, includes forming a master layer having a predetermined pattern of openings on a base ... | 01/26/2012 |
| 20120017742 | Saw Band and Method for the Production of a Saw Band A saw band of steel for a band-sawing machine has a band back and a row of teeth having a number of teeth, at least the row of teeth being provided with a hard material coating. According to the invention, this coating comprises one or more metals of subgroups IV, V or ... | 01/26/2012 |
| 20120015181 | SUBSTRATE FOR FLEXIBLE DISPLAY AND MANUFACTURING METHOD THEREOF A substrate for a flexible display and a manufacturing method thereof are disclosed. The substrate is thin and has a low oxygen and moisture transmittance. The substrate includes a plastic substrate and a barrier layer formed on the plastic substrate and having a densit... | 01/19/2012 |
| 20120006785 | Wear Resistant Vapor Deposited Coating, Method of Coating Deposition and Applications Therefor A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The... | 01/12/2012 |
| 20120009231 | APPARATUS AND METHOD FOR DEPOSITION OF FUNCTIONAL COATINGS A method for deposition of functional coatings comprises igniting a non-thermal equilibrium plasma within an ambient pressure plasma chamber having a gas supply inlet and a plasma outlet; and providing a substrate to be coated adjacent to the plasma outlet. A gas phase ... | 01/12/2012 |
| 20120009355 | METHOD AND APPARATUS FOR STABILIZING A COATING A method and apparatus for stabilizing an incidental coating in a substrate coating apparatus is provided. The method includes defining interior surfaces of a coating zone in the substrate coating apparatus. The method may include preheating interior surfaces to a local... | 01/12/2012 |
| 20120003500 | PROCESS FOR PRODUCING MULTILAYERED GAS-BARRIER FILM Provided are a method for producing a film, which is satisfactory in productivity, exhibits high gas-barrier property immediately after production, and has excellent adhesive strength between constituent layers while maintaining the excellent gas-barrier property, and a... | 01/05/2012 |
| 20120003395 | METHOD OF FABRICATING AN ELECTROCHEMICAL DEVICE USING ULTRAFAST PULSED LASER DEPOSITION A method of fabricating a multi-layered thin film electrochemical device is provided. The method comprises: providing a first target material in a chamber; providing a substrate in the chamber; emitting a first intermittent laser beam directed at the first target materi... | 01/05/2012 |
| 20120003497 | COATING METHODS, SYSTEMS, AND RELATED ARTICLES Coated articles and methods and systems for coating the articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing i... | 01/05/2012 |
| 20120003396 | APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION Apparatus for atomic layer deposition on a surface of a substrate includes a precursor injector head. The precursor injector head includes a precursor supply and a deposition space that in use is bounded by the precursor injector head and the substrate surface. The prec... | 01/05/2012 |
| 20120003449 | NANO-STRUCTURED DIELECTRIC COMPOSITE A multilayer dielectric structure is formed by vacuum depositing two-dimensional matrices of nanoparticles embedded in polymer dielectric layers that are thicker than the effective diameter of the nanoparticles, so as to produce a void-free, structured, three-dimensiona... | 01/05/2012 |
| 20120003397 | METHOD FOR DEPOSITING NANOPARTICLES ON A SUPPORT A method for depositing nanoparticles on a support includes taking a colloidal solution of nanoparticles. The method also includes nebulizing the colloidal solution of nanoparticles on a surface of the support in an atmospheric plasma.... | 01/05/2012 |
| 20110318505 | METHOD FOR FORMING TANTALUM NITRIDE FILM AND FILM-FORMING APPARATUS FOR FORMING THE SAME A method for forming a tantalum nitride film, which comprises supplying a gaseous nitrogen atom-containing compound, as a reactant gas and supplying gaseous t-amylimido-tris-(dimethylamide)tantalum, as a gaseous raw material, to the surface of the substrate S to thus fo... | 12/29/2011 |
| 20110319271 | Multifilament Superconductor Having Reduced AC Losses and Method for Forming the Same A high temperature superconductor structure including: a substrate on which at least one buffer layer is deposited, a superconductor layer on the buffer layer, the superconducting layer composed of superconductor material that forms at least two substantially parallel s... | 12/29/2011 |
| 20110309050 | PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD AND METHOD OF MANUFACTURING ELEMENT INCLUDING SUBSTRATE TO BE PROCESSED The present invention provides a plasma processing device and a plasma processing method that can easily adjust plasma density distribution while making the plasma density uniform, and a method of manufacturing an element including a substrate to be processed. In an emb... | 12/22/2011 |
| 20110311736 | METHOD AND APPARATUS FOR FORMING FILM This invention adopts plasma-enhanced chemical vapor deposition using the apparatus including a chamber, a pair of rotary electrode reels including a feed-out reel and a take-up reel, a plasma source, a material gas supplier, and an exhaust unit, and includes applying a... | 12/22/2011 |
| 20110311734 | Two Layer Barrier on Polymeric Substrate fcPlasma treatment apparatus for treating a substrate (6) comprising at least two opposing electrodes (2, 3) and a treatment space (5). The at least two electrodes (2, 3) are connected to a plasma control unit (4) for generating an atm... | 12/22/2011 |
