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Class 427/255.7 - Plural coatings applied by vapor, gas, or smoke


Subclass of Class 427 - Coating processes
Definition: Processes wherein at least two different coating materials
No. of applications: 73
Last issue date: 05/24/2012


1    
Application No.Application TitleIssue Date
20120128886NUCLEAR POWER PLANT, METHOD OF FORMING CORROSION-RESISTANT COATING THEREFOR, AND METHOD OF OPERATING NUCLEAR POWER PLANT
In a nuclear power plant, a corrosion-resistant oxide film on a surface of the metal component of a reactor structure is exposed to a high-temperature water, the corrosion-resistant oxide film containing an oxide having a property of a P-type semiconductor, and a cataly...
05/24/2012
20120107503Smoothing Agents to Enhance Nucleation Density in Thin Film Chemical Vapor Deposition
The present invention provides methods for making structures, including nanosized and microsized thin film structures that exhibit a high degree of smoothness useful for applications in microelectronics. Deposition processing of the invention utilize smoothing agents ca...
05/03/2012
20120045589Amidate Precursors For Depositing Metal Containing Films
Volatile metal amidate metal complexes are exemplified by bis(N-(tert-butyl)ethylamidate)bis(ethylmethylamido) titanium; (N-(tert-butyl)(tert-butyl)amidate)tris(ethylmethylamido) titanium; bis(N-(tert-butyl)(tert-butyl)amidate)bis(dimethylamido) titanium and (N-(tert-bu...
02/23/2012
20120040084APPARATUS AND METHODS FOR FORMING MODIFIED METAL COATINGS
Methods and systems for forming modified metal coatings on a gas turbine engine component (20). The gas turbine engine component (20) is placed inside a container (50) having a known volume, along with a source material (32) containing a seco...
02/16/2012
20120037596GAS SUPPLY MEMBER, PLASMA TREATMENT METHOD, AND METHOD OF FORMING YTTRIA-CONTAINING FILM
According to one embodiment, a gas supply member is provided with a gas supply passage including a gas flow channel with a first diameter, and an exhaust port connected to one end portion of the gas flow channel and provided to a surface of a downstream side of the gas ...
02/16/2012
20120034451SUBSTRATE FOR FLEXIBLE DISPLAY AND METHOD OF MANUFACTURING THE SUBSTRATE
A substrate for a flexible display is disclosed. The substrate has a film stress range that does not affect an electronic device such as a thin film transistor, and includes a barrier layer having excellent oxygen and moisture blocking characteristics, and a method of m...
02/09/2012
20120003497COATING METHODS, SYSTEMS, AND RELATED ARTICLES
Coated articles and methods and systems for coating the articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing i...
01/05/2012
20110305834MULTIPLE VACUUM EVAPORATION COATING DEVICE AND METHOD FOR CONTROLLING THE SAME
A multiple vacuum evaporation coating device and a method for controlling the same. The vacuum evaporation coating device includes a plurality of evaporation sources, a rotating part adapted to rotate the plurality of evaporation sources and a coating block plate adapte...
12/15/2011
20110305833APPARATUS FOR TREATING AND/OR COATING THE SURFACE OF A SUBSTRATE COMPONENT
Apparatus for treating and/or coating the surface of substrate components by deposition from the gas phase. A plurality of substrate carriers and a plurality of coating and/or treating units are arranged in a deposition or treatment chamber which can be evacuated. The s...
12/15/2011
20110299996ANTI-EROSION COATING SYSTEM FOR GAS TURBINE COMPONENTS
A gas turbine component and a method for producing an anti-erosion coating system are disclosed. The gas turbine component includes a basic material, on which an anti-erosion coating system is provided that is a multilayer system including at least one ductile metal lay...
12/08/2011
20110293830PRECURSORS AND METHODS FOR ATOMIC LAYER DEPOSITION OF TRANSITION METAL OXIDES
Methods are provided herein for forming transition metal oxide thin films, preferably Group IVB metal oxide thin films, by atomic layer deposition. The metal oxide thin films can be deposited at high temperatures using metalorganic reactants. Metalorganic reactants comp...
12/01/2011
20110290551Protective structure enclosing device on flexible substrate
A structure for protecting a device includes a first layer, one or more first microstructures on the first layer, and a second layer disposed on the first layer. The second layer is disposed on a surface of the first layer on which one or more microstructures are provid...
12/01/2011
20110281029METHOD FOR FORMING THIN FILM
Deterioration of the degree of vacuum in a vacuum chamber is prevented while securing adequate cooling performance by gas cooling. A substrate 21 is provided in a vacuum, and the cooling body 1 is provided close to a film non-formation surface of the subst...
11/17/2011
20110232567METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD
A method of operating a filament assisted chemical vapor deposition (FACVD) system. The method includes depositing a film on a substrate in a reactor of the FACVD system. During the depositing, a DC power is supplied to a heater assembly to thermally decompose a film fo...
09/29/2011
20110223444CRYSTALLINE SURFACE STRUCTURES AND METHODS FOR THEIR FABRICATION
A method for fabricating crystalline surface structures (4) on a template (1). The method comprises the steps of providing a template (1) into a reaction environment, wherein one or more elements (3) required for the formation of the crystall...
09/15/2011
20110217467VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD
A vacuum processing apparatus includes two process chambers and three load-lock chambers which are alternately connected in series, and a transferring device which transfers a plurality of carriers only between the process chamber and the load-lock chambers that are adj...
09/08/2011
20110206846METHOD FOR DEPOSITING TRANSPARENT CONDUCTING OXIDES
A method of preparing light transmitting conducting metal oxide (TCO) films using atomic layer deposition (ALD) of a metal precursor multiple oxidizing reactants. The multiple metal oxidizing reactants may be selected to enhance growth of the TCO film. In a particular e...
08/25/2011
20110151263MULTILAYER GROWTH BY GAS PHASE DEPOSITION
A multilayer system where intermediate well bonded and cross-linked layers provide attachment for a finishing layer with desired reactive sites....
06/23/2011
20110135898MULTILAYERED COATED CUTTING TOOL
A coated cutting tool includes a substrate and a PVD coating having an outermost zone C being a nitride, carbide, boride, or mixtures thereof, of Si and at least two additional elements selected from Al, Y, and groups 4, 5 or 6 of the periodic table and zone C is free f...
06/09/2011
20110110544METHOD OF COATING A HEARING AID COMPONENT AND A HEARING AID COMPRISING A COATED COMPONENT
A method for coating of a hearing aid said method comprising the deposition of an adhesion layer that does not develop corrosive reaction products. The method comprises applying an organometallic compound to the surface of the hearing aid component using vapour phase de...
05/12/2011
20110104322TEMPLATES USED FOR NANOIMPRINT LITHOGRAPHY AND METHODS FOR FABRICATING THE SAME
Provided are a template used for nanoimprint lithography and a method for fabricating the same. A raised first deposition layer pattern including at least one downwardly sloped side surface is formed on a substrate. A second deposition layer pattern covering the side su...
05/05/2011
20110076401Method of Making Showerhead for Semiconductor Processing Apparatus
A method of making a showerhead for a semiconductor processing apparatus is disclosed. In one embodiment, the method includes providing a substrate; forming first holes in the substrate; forming a protective film on the substrate, where the protective film covers sidewa...
03/31/2011
20110039025METHOD OF PATTERNING VAPOUR DEPOSITION BY PRINTING
A method of creating a patterned coated layer on a substrate comprises the steps of applying a pattern on the substrate by an additive process using a first material, depositing a second material by vapour deposition over the whole substrate area and mechanically removi...
02/17/2011
20110033284STRUCTURALLY DIVERSE THERMAL BARRIER COATINGS
A coated article includes an article having at least one surface and a thermal barrier coating system disposed upon the at least one surface. The thermal barrier coating system has at least two layers, with each layer having a different microstructure. The microstructur...
02/10/2011
20110027482Layered composite including cubic boron nitride
In a method of producing a layered composite, wherein at least one layer including cubic boron nitride is deposited on a substrate and, during the deposition, 3 to 15 at % oxygen is added for assuming the nitrogen locations of the cubic boron-nitride grating or intermed...
02/03/2011
20110008541METHOD AND APPARATUS FOR ORGANIC VAPOR PRINTING
In one embodiment, the disclosure relates to providing a first gas stream carrying vaporized material and depositing the vaporized material onto a substrate by directing a plurality of gas streams containing the vaporized material to a substrate, forming an gas curtain ...
01/13/2011
20100310769Continuous Feed Chemical Vapor Deposition System
A continuous feed CVD system includes a wafer transport mechanism that transport a wafer through a deposition chamber during CVD processing. The deposition chamber defines a passage for the wafer to pass through while being transported by the wafer transport mechanism. ...
12/09/2010
20100304026Method and Apparatus for Manufacturing a Nanowire
A method and an apparatus for manufacturing a nanowire are provided. The method for manufacturing a nanowire includes i) providing a source gas into a chamber, ii) controlling the temperature of a substrate received in the chamber separately from the temperature of the ...
12/02/2010
20100304027SUBSTRATE PROCESSING SYSTEM AND METHODS THEREOF
Embodiments of the invention provide methods for processing substrates within a substrate processing system. In one embodiment, the method provides depositing a material on a substrate within a vapor deposition chamber coupled to a buffer chamber contained within a main...
12/02/2010
20100304025DEPOSITION APPARATUS AND METHOD OF CONTROLLING THE SAME
A deposition apparatus including a plurality of reaction chambers, and a method of controlling the deposition apparatus. The deposition apparatus includes a first chamber to deposit a first deposition material onto a deposition body, a second chamber to deposit a second...
12/02/2010
20100266466REACTOR WITH SILICIDE-COATED METAL SURFACES
In an embodiment, a reactor includes a section, wherein at least a portion of the section includes a base layer, wherein the base layer has a first composition that contains a silicide-forming metal element; and a silicide coating layer, wherein the silicide coating lay...
10/21/2010
20100266409Method for Coating a Blade and Blade of a Gas Turbine
A method is provided for coating a hollow, internally cooled blade (1) of a gas turbine, in which method an outer coating (5) comprising an MCrAlY-based bonding layer (6) and a ceramic thermal barrier layer (9) of zirconium oxide is applied t...
10/21/2010
20100261017METHOD OF PRODUCING GAS BARRIER LAMINATE AND GAS BARRIER LAMINATE OBTAINED
A method of producing a gas barrier laminate comprises: the steps of forming an inorganic compound layer on a substrate by vapor-phase film deposition, applying surface roughening treatment to a surface of the inorganic compound layer, and subsequently forming an organi...
10/14/2010
20100233633ENGINEERING BORON-RICH FILMS FOR LITHOGRAPHIC MASK APPLICATIONS
Methods for processing a substrate with a boron rich film are provided. A patterned layer of boron rich material is deposited on a substrate and can be used as an etch stop. By varying the chemical composition, the selectivity and etch rate of the boron rich material ca...
09/16/2010
20100215891RECORDING MEDIUM AND MANUFACTURING METHOD OF RECORDING MEDIUM
A recording medium and a method for manufacturing the same are disclosed. More particularly, a recording medium having a high density and high energy transfer efficiency and a method for manufacturing the same are disclosed. The recording medium includes a substrate, a ...
08/26/2010
20100159135PROCESS FOR IN SITU GENERATION OF HYDROGEN SULFIDE OR HYDROGEN SELENIDE GAS USING A SOLID PRECURSOR
The present disclosure relates to novel methods and apparatuses for generating hydrogen sulfide or hydrogen selenide gas from decomposition of a solid precursor. In some embodiments, the generated gas is cooled so as to condense a by-product of the decomposition and the...
06/24/2010
20100151261METHODS AND APPARATUS FOR THE VAPORIZATION AND DELIVERY OF SOLUTION PRECURSORS FOR ATOMIC LAYER DEPOSITION
Improved apparatus and methods for atomic layer deposition (ALD) are described—In particular, improved methods and apparatus for the vaporization and delivery of solution ALD precursors are provided. The present invention is particularly useful for processing lower vo...
06/17/2010
20100151128MASKING MECHANISM FOR FILM FORMING APPARATUS
It comprises a mask (11) having a first, a second and a third action edge (11a, 11b, 11c), and a drive means for moving the mask (11) relative to a substrate (12) in a uniaxial direction (A) whereby moving t...
06/17/2010
20100098971COATING FOR GAS TURBINE COMPONENTS, AND METHOD AND DEVICE FOR PROVIDING A COATING
A coating, in particular for gas turbine components produced of a superalloy, is disclosed. The coating has an outer layer and an inner layer. The outer layer constitutes 10% to 60% of the overall coating and is substantially made of a β-NiAl phase having an Al proport...
04/22/2010
20100098854PRESSURE CONTROLLED DROPLET SPRAYING (PCDS) METHOD FOR FORMING PARTICLES OF COMPOUND MATERIALS FROM MELTS
A method and apparatus of forming compositionally homogeneous particles is provided. The method includes forming a homogenous melt from a plurality of constituent materials under a first pressure sufficient to prevent substantial vaporization of the constituent material...
04/22/2010
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