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| Application No. | Application Title | Issue Date |
| 20120040097 | ENHANCED WAFER CARRIER A wafer carrier used in wafer treatments such as chemical vapor deposition has pockets for holding the wafers and support surfaces for supporting the wafers above the floors of the pockets. The carrier is provided with locks for restraining wafers against upward movemen... | 02/16/2012 |
| 20120027936 | EXHAUST FOR CVD REACTOR A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor includes a reaction chamber having an interior, a gas inlet manifold communicating with the interior of the chamber, an exhaust system including an exhaust manifold having a p... | 02/02/2012 |
| 20110318489 | SUBSTRATE PROCESSING APPARATUS, PROCESSING TUBE, SUBSTRATE HOLDER, FIXING PART OF THE SUBSTRATE HOLDER, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD There is provided a substrate processing apparatus, including: a substrate holder that holds a plurality of substrates (wafers) in a state of being arranged in a lateral direction (approximately in a horizontal direction) approximately in a vertical posture; a processin... | 12/29/2011 |
| 20110305835 | SYSTEMS AND METHODS FOR A GAS TREATMENT OF A NUMBER OF SUBSTRATES Systems and methods for the gas treatment of one or more substrates include at least two gas injectors in a reaction chamber, one of which may be movable. The systems may also include a substrate support structure for holding one or more substrates disposed within the r... | 12/15/2011 |
| 20110300297 | MULTI-WAFER ROTATING DISC REACTOR WITH INERTIAL PLANETARY DRIVE Wafer carriers and methods for moving wafers in a reactor. The wafer carrier may include a platen with a plurality of compartments and a plurality of wafer platforms. The platen is configured to rotate about a first axis. Each of the wafer platforms is associated with o... | 12/08/2011 |
| 20110274838 | SYSTEM AND PROCESS FOR THE CONTINUOUS VACUUM COATING OF A MATERIAL IN WEB FORM The system (1) for the continuous vacuum coating of a continuously suppliable material in web form (2) provided with feed means; at least one inlet chamber (4), wherein the transition between the inlet atmospheric pressure and the vacuum pressure of... | 11/10/2011 |
| 20110268879 | APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITION Atomic layer deposition apparatus for depositing a film in a continuous fashion. The apparatus includes a downwardly sloping process tunnel, extending in a transport direction and bounded by at least two tunnel walls. Both walls are provided with a plurality of gas inje... | 11/03/2011 |
| 20110200749 | FILM DEPOSITION APPARATUS AND METHOD A chamber includes at its upper section a gas inlet from which to introduce a deposition gas. The inner walls of the chamber are covered by a cylindrical liner, and the chamber houses a susceptor assembly on which to place a semiconductor substrate. The liner includes a... | 08/18/2011 |
| 20110174664 | COLORED DEVICE CASING AND SURFACE-TREATING METHOD FOR FABRICATING SAME A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region. The bonding layer is positioned between the base and the color layer and bonds the base and the color layer together. The color layer includes at least o... | 07/21/2011 |
| 20110171399 | PROCESS AND APPARATUS FOR CONTINUOUS COATING OF FIBROUS MATERIALS A process and apparatus for continuously depositing a coating on a fibrous material. The process is a chemical vapor deposition process that includes causing multiple strands of a fibrous material to continuously travel through a coating zone within an enclosed chamber ... | 07/14/2011 |
| 20110159186 | FILM FORMING APPARATUS AND FILM FORMING METHOD The present invention provides a film forming apparatus and a film forming method realizing improvement in the degree of freedom in film formation while suppressing production cost. While conveying a base material by using a plurality of guide rolls, film formation is p... | 06/30/2011 |
| 20110159204 | OXYGEN RADICAL GENERATION FOR RADICAL-ENHANCED THIN FILM DEPOSITION A method of radical-enhanced atomic layer deposition (REALD) involves alternating exposure of a substrate to a first precursor gas and to radicals, such as monatomic oxygen radicals (O•), generated from an oxygen-containing second precursor gas, while maintaining spat... | 06/30/2011 |
| 20110122552 | METHOD FOR SELECTIVE DEPOSITION AND DEVICES A chemical vapor deposition method such as an atomic-layer-deposition method for forming a patterned thin film includes applying a deposition inhibitor material to a substrate. The deposition inhibitor material is a hydrophilic polymer that is soluble in an aqueous solu... | 05/26/2011 |
| 20110097494 | FLUID CONVEYANCE SYSTEM INCLUDING FLEXIBLE RETAINING MECHANISM A fluid conveyance system for thin film material deposition includes a fluid distribution manifold and a substrate transport mechanism. The fluid distribution manifold includes an output face that includes a plurality of elongated slots. The output face of the fluid dis... | 04/28/2011 |
| 20110097493 | FLUID DISTRIBUTION MANIFOLD INCLUDING NON-PARALLEL NON-PERPENDICULAR SLOTS A fluid conveyance device for thin film material deposition includes a substrate transport mechanism that causes a substrate to travels in a direction. A fluid distribution manifold includes an output face. The output face includes a plurality of elongated slots. At lea... | 04/28/2011 |
| 20110086167 | APPARATUS FOR ATOMIC LAYER DEPOSITION An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor de... | 04/14/2011 |
| 20110064878 | APPARATUS AND METHOD FOR FILM DEPOSITION A deposition apparatus 100 comprises: a heater 121 for heating a silicon wafer 101; an electrically-conductive busbar 123 for supporting the heater 121; and an electrode assembly 107 having a hollow rod electrode 108 with... | 03/17/2011 |
| 20110033612 | DISC VAPOR LUBRICATION A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below ... | 02/10/2011 |
| 20100316800 | MULTI-STATION DEPOSITION APPARATUS AND METHOD A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rotates ... | 12/16/2010 |
| 20100310766 | Roll-to-Roll Chemical Vapor Deposition System A roll-to-roll CVD system includes at least two rollers that transport a web through a deposition chamber during CVD processing. The deposition chamber defines a passage for the web to pass through while being transported by the at least two rollers. The deposition cham... | 12/09/2010 |
| 20100310768 | THIN FILM DEPOSITION APPARATUS A thin film deposition apparatus capable of forming a precise deposition pattern on a large substrate includes a deposition source; a first nozzle disposed at a side of the deposition source having a plurality of first slits; a second nozzle disposed opposite to the fir... | 12/09/2010 |
| 20100310767 | VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD A vapor deposition apparatus includes: a vacuum tank; an exhaust section that performs vacuum exhaust in the vacuum tank; a vapor deposition source disposed in the vacuum tank to vaporize a deposition material; and a traveling path for allowing an elongated substrate on... | 12/09/2010 |
| 20100272892 | FILM FORMATION REACTIVE APPARATUS AND METHOD FOR PRODUCING FILM-FORMED SUBSTRATE A plurality of partial control zones (an LL zone, an LR zone, and an R zone) that can control a gas flow rate independently in a widthwise direction of a gas flow are configured on an upstream side of the gas inlet port 20B. A control device 66 is disposed... | 10/28/2010 |
| 20100272921 | METHOD AND DEVICES FOR CONTROLLING A VAPOUR FLOW IN VACUUM EVAPORATION The invention relates to a method and a device for the coating of running substrates (25) moving along a run direction through a treatment zone (6), in which the vapour of a coating material is generated in a chamber (5), this vapour passing through... | 10/28/2010 |
| 20100272894 | METHOD FOR SIMULTANEOUSLY COATING A PLURALITY OF WORKPIECES This invention relates to a fixture for use in a physical vapor deposition coating operation which comprises a support structure 14 comprising a circular base member 10, a circular top member 11 opposite the circular base member 10, and a plurality of structural members... | 10/28/2010 |
| 20100272893 | Lift-off deposition system featuring a density optimized HULA substrate holder in a conical deposition chamber A vapor deposition device using a lift-off process includes an evaporation source, a space frame mounted for rotation about a first axis that passes through the evaporation source, a central dome-shaped wafer holder mounted to the space frame wherein a centerpoint of th... | 10/28/2010 |
| 20100266766 | GUIDING DEVICES AND METHODS FOR CONTACTLESS GUIDING OF A WEB IN A WEB COATING PROCESS According to embodiments described herein, a guiding device for contactless guiding of a web in a web coating process under vacuum conditions is provided. The guiding device includes a curved surface for facing the web and a group of gas outlets disposed in the curved s... | 10/21/2010 |
| 20100247747 | Film Deposition Apparatus, Method for Depositing Film, and Method for Manufacturing Lighting Device A first evaporation source is disposed such that one predetermined film deposition material is deposited on one region of a substrate; a second evaporation source is disposed such that another predetermined film deposition material is deposited on another region of the ... | 09/30/2010 |
| 20100200545 | NON-CONTACT SUBSTRATE PROCESSING Embodiments of the present invention provide apparatus and methods for supporting, positioning or rotating a semiconductor substrate during processing. One embodiment of the present invention provides a method for processing a substrate comprising positioning the substr... | 08/12/2010 |
| 20100189900 | ATOMIC LAYER DEPOSITION SYSTEM AND METHOD UTILIZING MULTIPLE PRECURSOR ZONES FOR COATING FLEXIBLE SUBSTRATES Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones and through a third precursor zone interposed between the first and second precursor zones, s... | 07/29/2010 |
| 20100189559 | FIXTURE FOR USE IN A COATING OPERATION This invention relates to a fixture for use in a physical vapor deposition coating operation which comprises a support structure 14 comprising a circular base member 10, a circular top member 11 opposite the circular base member 10, and a plu... | 07/29/2010 |
| 20100075036 | DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING FILM BY USING DEPOSITION APPARATUS A vapor deposition device 100 for moving a sheet-like substrate 4 in a roll-to-roll system in a chamber 2 to continuously form a vapor deposition film on the substrate 4. The vapor deposition device 100 comprises an evaporation source ... | 03/25/2010 |
| 20100068412 | PROCESS FOR COATING A SUBSTRATE, PLANT FOR IMPLEMENTING THE PROCESS AND FEEDER FOR FEEDING SUCH A PLANT WITH METAL The invention relates to a coating process for coating at least one side of a running substrate, by vacuum evaporation, with a layer of a sublimable metal or metal alloy, in which said metal or metal alloy is positioned so as to face said side of the substrate in the fo... | 03/18/2010 |
| 20100068381 | CHEMICAL VAPOR DEPOSITION REACTOR HAVING MULTIPLE INLETS A chemical vapor deposition reactor has a wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber and a plurality of injectors configured in flow controllable zones so as to mitigate depletion.... | 03/18/2010 |
| 20100055311 | Film Conveyor Apparatus and Roll-to-Roll Vacuum Deposition Method [Object] To enable a deposition area of a base film to be protected and realize stable film traveling performance. [Solving Means] A roll-to-roll vacuum deposition apparatus according to the present invention includes a guide unit including... | 03/04/2010 |
| 20090321321 | DESULFURIZING ADSORBENT, PREPARATION METHOD AND USE THEREOF The invention provides an adsorbent for removing sulfur from cracking gasoline or diesel fuel, which adsorbent comprises: (1) a carrier consisting of a source of silica, an inorganic oxide binder, and at least one oxide of metal selected from Groups IIB, VB and VIB; (2)... | 12/31/2009 |
| 20090324823 | ROLL-TO-ROLL VACUUM DEPOSITION METHOD AND ROLL-TO-ROLL VACUUM DEPOSITION APPARATUS [Object] To carry out high-quality deposition processing while effectively maintaining a function of cleaning a can roller by a cleaning unit. [Solving Means] In the present invention, prior to deposition onto a base film, a cleaning unit i... | 12/31/2009 |
| 20090304924 | APPARATUS AND METHOD FOR LARGE AREA MULTI-LAYER ATOMIC LAYER CHEMICAL VAPOR PROCESSING OF THIN FILMS An apparatus and method for large area high speed atomic layer chemical vapor processing wherein continuous and alternating streams of reactive and inert gases are directed towards a co-axially mounted rotating cylindrical susceptor from a plurality of composite nozzles... | 12/10/2009 |
| 20090291209 | APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITION Atomic layer deposition apparatus for depositing a film in a continuous fashion. The apparatus includes a process tunnel, extending in a transport direction and bounded by at least a first and a second wall. The walls are mutually parallel and allow a flat substrate to ... | 11/26/2009 |
| 20090258141 | Method and Apparatus for Coating Surfaces An apparatus includes a workpiece support, a source for emitting a plume of coating material that flows toward the workpiece support, and plume influencing structure between the source and the workpiece support. The plume influencing structure includes a shield with plu... | 10/15/2009 |
