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| Application No. | Application Title | Issue Date |
| 20110281031 | Industrial Vapour Generator For Depositing An Alloy Coating On A Metal Strip The present invention relates to a vacuum deposition facility for depositing a metal alloy coating on a substrate (7), said facility being equipped with a vapour generator/mixer comprising a vacuum chamber (6) in the form of an enclosure provided with mean... | 11/17/2011 |
| 20110206909 | COATINGS FOR SUPPRESSING METALLIC WHISKERS A coating is formed by depositing the coating on a metallic feature at a deposition temperature. Subsequently, the deposited coating and the metallic feature are cooled below the deposition temperature. The coating is chosen such that this cooling step causes the coatin... | 08/25/2011 |
| 20110143910 | INORGANIC PHOSPHATE COMPOSITIONS AND METHODS Disclosed and described are multi-component inorganic phosphate formulations of acidic phosphate components and basic oxide/hydroxide components. Also disclosed are high solids, atomizable compositions of same, suitable for spray coating.... | 06/16/2011 |
| 20110136328 | METHOD FOR DEPOSITING ULTRA FINE GRAIN POLYSILICON THIN FILM According to the present invention, a method for depositing an ultra-fine crystal particle polysilicon thin film supplies a source gas in a chamber loaded with a substrate to deposit a polysilicon thin film on the substrate, wherein the source gas contains a silicon-bas... | 06/09/2011 |
| 20110100458 | Multi-layer thin film for encapsulation and method thereof A multi-layer thin film for encapsulation and the method thereof are provided. The multi-layer thin film for encapsulation includes a protective layer composed of aluminum oxide, a single or double barrier layer composed of silicon nitride (SiNx), and a mecha... | 05/05/2011 |
| 20110052810 | FILM FORMING METHOD AND STORAGE MEDIUM An AxByOz-type oxide film can be produced by introducing a first organic metal compound source material, a second organic metal compound source material and an oxidizer into a processing chamber and forming the AxByOz-type oxide film on a substrate. In the production, a... | 03/03/2011 |
| 20100279092 | MULTIPLE-LAYER FILM AND METHOD FOR MANUFACTURNIG THE SAME The present invention provides a multiple layer film comprising a substrate layer and a multiple layer having two or more sub-layers formed by use of a single target material, provided on at least one side of the substrate layer; and a method for manufacturing the same.... | 11/04/2010 |
| 20100215842 | TANTALUM AMIDE COMPLEXES FOR DEPOSITING TANTALUM-CONTAINING FILMS, AND METHOD OF MAKING SAME Tantalum precursors useful in depositing tantalum nitride or tantalum oxides materials on substrates, by processes such as chemical vapor deposition and atomic layer deposition. The precursors are useful in forming tantalum-based diffusion barrier layers on microelectro... | 08/26/2010 |
| 20100143710 | HIGH RATE DEPOSITION OF THIN FILMS WITH IMPROVED BARRIER LAYER PROPERTIES An atomic layer deposition (ALD) method is utilized to deposit a thin film barrier layer of a metal oxide, such as titanium dioxide, onto a substrate. Excellent barrier layer properties can be achieved when the titanium oxide barrier is deposited by ALD at temperatures ... | 06/10/2010 |
| 20100080905 | SOLUTE STABILIZATION OF SHEETS FORMED FROM A MELT Embodiments of this apparatus and method introduce solutes into a sheet formed from a melt. A melt of a material is cooled and a sheet of the material is formed in the melt. A first fluid is introduced around the sheet at least partially while the sheet is formed. A sec... | 04/01/2010 |
| 20090324825 | Method for Depositing an Aluminum Nitride Coating onto Solid Substrates Embodiments related to chemical vapor deposition of aluminum nitride onto surfaces are provided. In particular, methods are provided for coating AlN onto solid surfaces by heating and vaporizing an aluminum nitride precursor and exposing solid surfaces to the heated and... | 12/31/2009 |
| 20090324830 | TIN PHOSPHATE BARRIER FILM, METHOD, AND APPARATUS A method is disclosed for inhibiting oxygen and moisture penetration of a device comprising the steps of depositing a tin phosphate low liquidus temperature (LLT) inorganic material on at least a portion of the device to create a deposited tin phosphate LLT material, an... | 12/31/2009 |
| 20090263581 | METHOD AND APPARATUS TO COAT OBJECTS WITH PARYLENE AND BORON NITRIDE The present inventions relates to an improved and novel Parylene compositions with has improved heat transfer and durability qualities, as well as a methods and apparatus to coat objects with the novel Parylene compositions, and objects coated with the novel Parylene co... | 10/22/2009 |
| 20090214894 | PROCESS FOR PRODUCING AN ALUMINA COATING COMPOSED MAINLY OF a-TYPE CRYSTAL STRUCTURE The present invention provides a process for producing an alumina coating comprised mainly of α crystal structure on a base material.... | 08/27/2009 |
| 20090186154 | METHOD OF FORMING A DIFFUSION BONDING ENHANCED LAYER ON AL2O3 CERAMIC TOOLS The present invention relates to ceramic cutting tools, such as, an aluminum oxide with zirconium oxide ceramic cutting tool with diffusion bonding enhanced layer and CVD coatings, particularly useful for machining modern metal materials. The method comprises a chemical... | 07/23/2009 |
| 20090136677 | Metal Complexes of Tridentate Beta-Ketoiminates Metal-containing complexes of a tridentate beta-ketoiminate, one embodiment of which is represented by the structure:
| |
| 20090121333 | Flexible substrates having a thin-film barrier Methods and apparatus provide for: applying an inorganic barrier layer to at least a portion of a flexible substrate, the barrier layer being formed from a low liquidus temperature (LLT) material; and sintering the inorganic barrier layer while maintaining the flexible ... | 05/14/2009 |
| 20090075119 | Tunable low loss material compositions and methods of manufacture and use therefore An embodiment of the present invention provides a method of making an electronically tunable dielectric material comprising mixing particles of at least one electronically tunable dielectric phase and particles of at least one compound of low loss complex perovskites, a... | 03/19/2009 |
| 20080292789 | ONE-DIMENSIONAL METAL AND METAL OXIDE NANOSTRUCTURES Metal powder (such as tin, titanium, or tungsten powder) is heated in a flowing stream of an inert gas, such as argon, containing a small abundance of oxygen at a temperature to produce metal vapor. The metal reacts with the oxygen to form and deposit one-dimensional na... | 11/27/2008 |
| 20080229891 | WEAR RESISTANT HARD COATING FOR A WORKPIECE AND METHOD FOR PRODUCING THE SAME The present invention provides an optimized hard coating and a workpiece, especially a cutting tool coated with a hard coating to increase tooling performance with difficult to machine materials such as high speed steels, titanium alloys, nickel alloys, austenitic steel... | 09/25/2008 |
| 20080220166 | Silicon Spout-Fluidized Bed Polysilicon is formed by pyrolytic decomposition of a silicon-bearing gas and deposition of silicon onto fluidized silicon particles. Multiple submerged spout fluidized bed reactors and reactors having secondary orifices are disclosed.... | 09/11/2008 |
| 20080131611 | Method for Application of a Thermal Barrier Coating and Resultant Structure Thereof Provided herein are methods and apparatuses, and resulting structures, for depositing ceramic coatings with preferred coating density, morphology and adherence for applications such as thermal protection of internally cooled components. Such components are found in, but... | 06/05/2008 |
| 20080050522 | Preparative method for protective layer of susceptor A protective layer for a susceptor is prepared. The susceptor is a graphite block; and the protective layer consists of a titanium nitride film and a titanium carbide film. The susceptor with the protective layer is used in epitaxial growth and device process with life ... | 02/28/2008 |
| 20080044574 | METHOD OF MANUFACTURING NANO-CRYSTALLINE SILICON DOT LAYER A method of manufacturing a nano-crystalline silicon dot layer is provided. A silicon layer is formed over a substrate. The silicon layer includes crystalline silicon region and amorphous silicon region. An oxidation process is performed to oxidize the amorphous silicon... | 02/21/2008 |
| 20080032063 | Plasma deposition apparatus and deposition method utilizing same A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film depos... | 02/07/2008 |
| 20080020140 | Silicon Nitride Film Forming Method A silicon nitride film forming method makes possible the high reproducibility of film quality or film thickness. The silicon nitride film forming method deposits a silicon nitride film on the substrate surface by maintaining the heating element at a predetermined temper... | 01/24/2008 |
| 20080003361 | Coating using metal organic chemical vapor deposition A method is provided for applying a coating over a substrate surface of an engine component. The method includes inserting the engine component within a deposition chamber, heating the deposition chamber to a temperature between 325° C. and 500° C., supplying one or m... | 01/03/2008 |
| 20060147755 | Coated cutting insert A cutting insert preferably for milling of extremely highly alloyed grey cast iron, of a substrate and a coating and methods of making and using the insert are disclosed. The cemented carbide substrate includes WC, of from about 3 to about 8 weight-% Co and less than ab... | 07/06/2006 |
