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| Application No. | Application Title | Issue Date |
| 20120070581 | VAPOR DEPOSITION SYSTEMS AND METHODS Vapor deposition systems and methods associated with the same are provided. The systems may be designed to include features that can promote high quality deposition; simplify manufacture, modification and use; as well as, reduce the footprint of the system, amongst othe... | 03/22/2012 |
| 20120048178 | PROCESS FOR PRODUCTION OF POLYCRYSTALLINE SILICON The invention provides a process for producing polycrystalline silicon, including introduction of a reaction gas containing a silicon-containing component and hydrogen by means of one or more nozzles into a reactor including at least one heated filament rod on which sil... | 03/01/2012 |
| 20120045588 | DEPOSITION SYSTEM WITH A ROTATING DRUM A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least on... | 02/23/2012 |
| 20120021502 | SENSOR FOR FAST DETECTION OF E-COLI A method of fabricating biochip sensor comprising providing a precursor; depositing the precursor on a substrate to form a coating; and rapid melting/quenching treatment of the coating with an energy source to form micro/nanotextured surface with enhanced reflectance fo... | 01/26/2012 |
| 20120021128 | SUBSTRATE TRANSPORT MECHANISM CONTACTING A SINGLE SIDE OF A FLEXIBLE WEB SUBSTRATE FOR ROLL-TO-ROLL THIN FILM DEPOSITION Systems and methods for depositing a thin film on a flexible substrate involve guiding the flexible substrate along a spiral transport path back and forth between spaced-apart first and second precursor zones so that the substrate transits through the first and second p... | 01/26/2012 |
| 20120015279 | DENSE THIN FILIM, FUEL CELL USING THE SAME AND FABRICATION METHODS THEREOF Disclosed is a dense thin film, a fuel cell using the same and fabrication methods thereof. A method for fabricating a dense thin film comprises (1) forming a first thin film on a porous surface, and (2) forming, on a surface of the first thin film, a second thin film m... | 01/19/2012 |
| 20120009355 | METHOD AND APPARATUS FOR STABILIZING A COATING A method and apparatus for stabilizing an incidental coating in a substrate coating apparatus is provided. The method includes defining interior surfaces of a coating zone in the substrate coating apparatus. The method may include preheating interior surfaces to a local... | 01/12/2012 |
| 20120003497 | COATING METHODS, SYSTEMS, AND RELATED ARTICLES Coated articles and methods and systems for coating the articles are described herein. The methods and systems described herein include, but are not limited to, steps for actively or passively controlling the temperature during the coating process, steps for providing i... | 01/05/2012 |
| 20110318490 | METHOD FOR DEPOSITING A COATING A coating apparatus and method for depositing a coating that contains at least one first element on a substrate by an activated vapor deposition, wherein the substrate is introduced into a gas atmosphere that contains at least the first element, and the gas atmosphere i... | 12/29/2011 |
| 20110305836 | ATOMIC LAYER DEPOSITION APPARATUS AND THIN FILM FORMING METHOD An atomic layer deposition apparatus, which forms a thin film on a substrate, includes a first container that defines a first inner space and includes a substrate carrying-in and carrying-out port and a gas introduction port in different positions, the substrate being c... | 12/15/2011 |
| 20110305837 | POLY(ETHYLENE GLYCOL) AND POLY(ETHYLENE OXIDE) BY INITIATED CHEMICAL VAPOR DEPOSITION A method for ionic polymerization of ethylene oxide. In the first step of the method, a gaseous monomer composition comprising ethylene oxide at a first flow rate is mixed with a gaseous ionic polymerization initiator at a second flow rate, thereby forming a mixture. Th... | 12/15/2011 |
| 20110296873 | MULTI-COATED METALLIC ARTICLES AND METHODS OF MAKING SAME Provided is a jewelry ring comprising a substrate, a first coating of a metallic nitride or a metallic boride, and an external metallic coating. Also provided is a metallic article comprising a substrate comprising tungsten carbide, cobalt, tungsten, titanium, titanium ... | 12/08/2011 |
| 20110293831 | LINEAR BATCH CHEMICAL VAPOR DEPOSITION SYSTEM Described is a linear batch CVD system that includes a deposition chamber, one or more substrate carriers, gas injectors and a heating system. Each substrate carrier is disposed in the deposition chamber and has at least one receptacle configured to receive a substrate.... | 12/01/2011 |
| 20110293832 | Method and apparatus for depositing thin layers of polymeric para-xylylene or substituted para-xylylene The invention relates to an apparatus and a method for depositing one or more thin layers of polymeric para-xylylene. Said apparatus comprises a heated evaporator (1) used for evaporating a solid or liquid starting material. A supply pipe (11) for a carrie... | 12/01/2011 |
| 20110268880 | REACTOR CLEAN A method and apparatus for performing chemical vapor deposition (CVD) processes is provided. In one embodiment, the apparatus comprises a reactor body having a processing region, comprising a wafer carrier track having a wafer carrier disposed thereon, at least one side... | 11/03/2011 |
| 20110262740 | METAL AND ELECTRONIC DEVICE COATING PROCESS FOR MARINE USE AND OTHER ENVIRONMENTS The present disclosure relates, in part, to Parylene based conformal coating compositions having improved properties, e.g., improved heat transfer and durability characteristics, as well as a methods and apparatus to coat objects with these compositions, and objects coa... | 10/27/2011 |
| 20110262641 | INLINE CHEMICAL VAPOR DEPOSITION SYSTEM An inline CVD system includes a manifold and a continuous transport system. The manifold has a plurality of ports. The ports include a first precursor port, a pair of second precursor ports and a pair of pumping ports. The first precursor port is disposed between the se... | 10/27/2011 |
| 20110256315 | SHOWERHEAD ASSEMBLY WITH GAS INJECTION DISTRIBUTION DEVICES A method and apparatus that may be utilized for chemical vapor deposition and/or hydride vapor phase epitaxial (HVPE) deposition are provided. The apparatus includes a showerhead assembly with separate inlets and manifolds for delivering separate processing gases into a... | 10/20/2011 |
| 20110256323 | INHIBITING EXCESS PRECURSOR TRANSPORT BETWEEN SEPARATE PRECURSOR ZONES IN AN ATOMIC LAYER DEPOSITION SYSTEM Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according ... | 10/20/2011 |
| 20110229638 | SYSTEM AND METHOD FOR POLYCRYSTALLINE SILICON DEPOSITION A method for making polycrystalline silicon from a gas comprising at least one silicon precursor compound is disclosed. The method can be effected from a gas comprising a polycrystalline silicon precursor compound in a chemical vapor deposition system by establishing a ... | 09/22/2011 |
| 20110215071 | WAFER CARRIER WITH SLOPED EDGE A wafer carrier includes a body defining a central axis, a generally planar top surface perpendicular to the central axis, and pockets recessed below the top surface for receiving wafers. The body can include a lip projecting upwardly around the periphery of the top sur... | 09/08/2011 |
| 20110207283 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF DIELECTRIC OXIDES Methods are provided herein for forming metal oxide thin films by atomic layer deposition. The metal oxide thin films can be deposited at high temperatures such that the thin film is crystalline as deposited. The metal oxide thin films can be used, for example, as diele... | 08/25/2011 |
| 20110192779 | THIN LAYER CHROMATOGRAPHY PLATES AND RELATED METHODS In an embodiment, a method for manufacturing a thin layer chromatography (“TLC”) plate is disclosed. The method includes forming a layer of elongated nanostructures (e.g., carbon nanotubes), and at least partially coating the elongated nanostructures with a coating.... | 08/11/2011 |
| 20110188206 | THERMAL INTERFACE Various embodiments include apparatus and method having a heat source, a thermal management device, and an interface disposed between the thermal management device and the heat source. The interface includes nanostructures to facilitate heat transfer and adhesion betwee... | 08/04/2011 |
| 20110171384 | POLYMERIZED FILM FORMING METHOD AND POLYMERIZED FILM FORMING APPARATUS A first substrate 16 has a source material forming surface on which a plurality of source materials for forming a polymerized film is formed in a predetermined pattern, and a second substrate 15 has a film forming surface on which the polymerized film will... | 07/14/2011 |
| 20110164253 | METHOD OF MODIFYING A SUBSTRATE FOR DEPOSITION OF CHARGED PARTICLES THEREON A method of modifying a substrate for deposition of charged particles thereon, the method comprising the steps of: providing a substrate that is incapable of bonding to a polyelectrolyte coating that has a charge that is opposite to the charge of the particles that are ... | 07/07/2011 |
| 20110155355 | HEAT-DISSIPATION UNIT COATED WITH OXIDATION-RESISTANT NANO THIN FILM AND METHOD OF DEPOSITING THE OXIDATION-RESISTANT NANO THIN FILM THEREOF A heat-dissipation unit coated with oxidation-resistant nano thin film includes a metal main body having a heat-absorbing portion and a heat-dissipating portion, both of which are coated with at least a nano metal compound thin film. To form the nano metal compound thin... | 06/30/2011 |
| 20110159604 | ISOTOPE-DOPED NANO-MATERIAL, METHOD FOR MAKING THE SAME, AND LABELING METHOD USING THE SAME An isotope-doped nano-structure of an element is provided. The isotope-doped nano-structure includes at least one isotope-doped nano-structure segment having at least two isotopes of the element, and the at least two isotopes of the element are mixed uniformly in a cert... | 06/30/2011 |
| 20110146764 | MOLECULAR PRECURSOR METHODS AND ARTICLES FOR OPTOELECTRONICS This invention relates to compounds and compositions used to prepare semiconductor and optoelectronic materials and devices. This invention provides a range of compounds, compositions, materials and methods directed ultimately toward photovoltaic applications, as well a... | 06/23/2011 |
| 20110139209 | METHOD OF GROWING A THIN FILM, A METHOD OF FORMING A STRUCTURE AND A DEVICE A method of growing a thin film comprises growing a thin film by conformally forming at least one layer over a substrate having structures extending from a surface of the substrate, whereby the or each layer is formed over the surface of the substrate and over the struc... | 06/16/2011 |
| 20110142384 | SLIDING ELEMENT HAVING A MULTIPLE LAYER The invention relates to a sliding element that includes a carrier body and a multiple layer. The multiple layer includes a running layer and a protective layer, in which the protective layer has a hardness HUplast of greater than 5 GPa, and the hardness of t... | 06/16/2011 |
| 20110143035 | Thin Film Deposition System and Method for Depositing Thin Film A thin film deposition system and a method for deposit a thin film are disclosed. A thin film deposition system includes a source material feeder configured to feed source material, a source gas feeder comprising a vaporizer connected with the source material feeder to ... | 06/16/2011 |
| 20110135915 | Methods of Coating Substrate With Plasma Resistant Coatings and Related Coated Substrates The invention includes a method of coating a substrate with a plasma etch-resistant layer that exhibits reduced particulation comprising applying an coating layer to a substrate wherein coating layer has a thickness of about 20 microns or less and wherein the coating la... | 06/09/2011 |
| 20110130584 | INSULATING FILM MATERIAL, METHOD OF FILM FORMATION USING INSULATING FILM MATERIAL, AND INSULATING FILM An insulating film material for plasma CVD represented by a chemical formula (1) shown below, a method of film formation using the insulating film material, and an insulating film. According to the present invention, an insulating film having a low dielectric constant a... | 06/02/2011 |
| 20110129664 | ORGANIC GLASS FOR AUTOMOBILE AND PROCESS FOR PRODUCING THE SAME An organic glass for automobile is provided which has excellent weatherability, wear-resistance and abrasion-resistance, and which can be mass-produced by a simple and inexpensive process. The organic glass comprises a transparent resin base plate 12 and a hard c... | 06/02/2011 |
| 20110122552 | METHOD FOR SELECTIVE DEPOSITION AND DEVICES A chemical vapor deposition method such as an atomic-layer-deposition method for forming a patterned thin film includes applying a deposition inhibitor material to a substrate. The deposition inhibitor material is a hydrophilic polymer that is soluble in an aqueous solu... | 05/26/2011 |
| 20110121283 | METHOD FOR SELECTIVE DEPOSITION AND DEVICES A chemical vapor deposition method such as an atomic-layer-deposition method for forming a patterned thin film includes applying a deposition inhibitor material to a substrate. The deposition inhibitor material is a hydrophilic polymer that is a neutralized acid having ... | 05/26/2011 |
| 20110123409 | CHEMICAL REACTOR WITH NANOMETRIC SUPERSTRUCTURE The invention relates to a chemical reactor with a nanometric superstructure, comprising at least one member wherein at least one reaction chamber is arranged, and said reaction chamber being filled at least partially with a high specific surface area material having a ... | 05/26/2011 |
| 20110124483 | CERAMIC COMPOSITE MATERIALS CONTAINING CARBON NANOTUBE-INFUSED FIBER MATERIALS AND METHODS FOR PRODUCTION THEREOF In various embodiments, composite materials containing a ceramic matrix and a carbon nanotube-infused fiber material are described herein. Illustrative ceramic matrices include, for example, binary, ternary and quaternary metal or non-metal borides, oxides, nitrides and... | 05/26/2011 |
| 20110111227 | METHOD FOR PRODUCTION OF GERMANIUM NANOWIRES ENCAPSULATED WITHIN MULTI-WALLED CARBON NANOTUBES A method is provided for producing germanium nanowires encapsulated within multi-walled carbon nanotubes. The method includes the steps of performing chemical vapor deposition using a combined germanium and carbon source having a general formula of GeR(4-x)L<... | 05/12/2011 |
