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| Application No. | Application Title | Issue Date |
| 20110174664 | COLORED DEVICE CASING AND SURFACE-TREATING METHOD FOR FABRICATING SAME A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region. The bonding layer is positioned between the base and the color layer and bonds the base and the color layer together. The color layer includes at least o... | 07/21/2011 |
| 20110135948 | Composition for making metal matrix composites In one embodiment, a composition (10) to be mixed with a molten metal to make a metal matrix composite, the composition characterized by: a ceramic reinforcing filler (12), the ceramic reinforcing filler not being wettable by molten aluminum and/or not bei... | 06/09/2011 |
| 20110076402 | SYSTEM FOR CONTROLLING THE SUBLIMATION OF REACTANTS An apparatus and method improves heating of a solid precursor inside a sublimation vessel. In one embodiment, inert, thermally conductive elements are interspersed among units of solid precursor. For example the thermally conductive elements can comprise a powder, beads... | 03/31/2011 |
| 20100307553 | ENGINEERING LIGHT MANIPULATION IN STRUCTURED FILMS OR COATINGS The present disclosure concerns a means to use light manipulation in engineered or structured coatings for thermal or photothermal effects and/or refractive and reflective index management. Such metallic, nonmetallic, organic or inorganic metamaterials or nanostructures... | 12/09/2010 |
| 20100166815 | Method for Preparation of a Nanocomposite Material by Vapour Phase Chemical Deposition The invention relates to a method for preparing a nanocomposite material by simultaneous vapour phase chemical deposition and vacuum injection of nanoparticles and to the materials and nanoparticles obtained thus and the application thereof.... | 07/01/2010 |
| 20100080903 | FLUOROPOLYMER THIN FILM AND METHOD FOR ITS PRODUCTION To provide a method for producing a fluoropolymer excellent in adhesion to a substrate and film strength. A method for producing a fluoropolymer thin film, which comprises forming a fluoropolymer thin film on a substrate by a physical vapor... | 04/01/2010 |
| 20100080904 | SUBSTRATE PROCESSING CHAMBER WITH OFF-CENTER GAS DELIVERY FUNNEL Methods and apparatus for processing substrates are disclosed herein. The process chamber includes a chamber body, a substrate support pedestal, a pump port and a gas injection funnel. The chamber body has an inner volume and the substrate support pedestal is disposed i... | 04/01/2010 |
| 20100080902 | METHOD AND APPARATUS FOR LOW COST PRODUCTION OF POLYSILICON USING SIEMEN'S REACTORS A novel low cost polysilicon production technique for Siemens type reactors is disclosed. In one embodiment, a CVD reactor assembly includes a reactor forming a stainless steel envelope attached to a base plate. The stainless steel envelope is designed to receive a ther... | 04/01/2010 |
| 20100058954 | Novel Carbon-Modified Photocatalyst Films and Method for Producing Same A novel carbon-modified titanium dioxide film (CMF-TiO2) and a method for producing same by a CVD method at atmospheric pressure. The precursor compounds used in this context for the titanium dioxide and the carbon component are titanium-organic compounds and... | 03/11/2010 |
| 20100021727 | Method of forming continuous thin film and linear glass substrate with thin film A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through... | 01/28/2010 |
| 20100003504 | COMPOSITE MATERIAL PART WITH A SILICON-CONTAINING CERAMIC MATRIX PROTECTED AGAINST CORROSION An environmental barrier for a substrate of ceramic matrix composite material containing silicon, in particular containing SiC, is formed by an anticorrosion protection layer containing an aluminosilicate type compound of an alkali or alkaline-earth or rare earth elemen... | 01/07/2010 |
| 20090324825 | Method for Depositing an Aluminum Nitride Coating onto Solid Substrates Embodiments related to chemical vapor deposition of aluminum nitride onto surfaces are provided. In particular, methods are provided for coating AlN onto solid surfaces by heating and vaporizing an aluminum nitride precursor and exposing solid surfaces to the heated and... | 12/31/2009 |
| 20090297725 | Duplex Surface Treatment of Metal Objects The specification discloses a method and apparatus enabling the formation of a diffusion surface layer on a surface of a metal substrate, typically a ferrous based metal substrate, wherein in a first stage in a first fluidized bed furnace, a diffusion zone is formed ext... | 12/03/2009 |
| 20090194507 | APPARATUS AND METHOD FOR CLEANING, ETCHING, ACTIVATION AND SUBSEQUENT TREATMENT OF GLASS SURFACES, GLASS SURFACES COATED BY METAL OXIDES, AND SURFACES OF OTHER SI02-COATED MATERIALS The present invention relates to a device for cleaning, etching, activation and subsequent treatments of glass surfaces, glass surfaces coated with metal oxides or with organic material layers, SiO2-layer coated materials, and SiO2-layer coated mat... | 08/06/2009 |
| 20090035877 | METHODS OF FORMING A FERROELECTRIC LAYER AND METHODS OF MANUFACTURING A FERROELECTRIC CAPACITOR INCLUDING THE SAME A method of forming a ferroelectric layer is provided. A metal-organic source gas is provided into a chamber into which an oxidation gas is provided for a first time period to form ferroelectric grains on a substrate. A ferroelectric layer is formed by performing at lea... | 02/05/2009 |
| 20080226839 | Surface treatment apparatus and surface treatment method A surface treatment apparatus includes: a vaporization device vaporizing a silane coupling agent, a treatment device in which a treatment object having an inorganic oriented film is arranged, into which the silane coupling agent that has been vaporized by the vaporizati... | 09/18/2008 |
| 20080199612 | Method and Apparatus For Hydrogenation of Thin Film Silicon on Glass A method and apparatus is provided for hydrogenation of a target, such as a polycrystalline silicon film on a glass substrate, by using an atomic hydrogen source. The target is subjected to intermittent exposure of the atomic hydrogen field of the source until at least ... | 08/21/2008 |
| 20080075885 | Method of Controllable Morphology of Self-Assembled Monolayers on Substrates Method of controlling the morphology of self-assembled monolayers (SAMS) on substrates having hydrophilic surfaces. The hydrophilic surface is exposed to a fluid having a mixture of molecules which can self-assemble on the hydrophilic surface and hydrophobic molecules f... | 03/27/2008 |
