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| Application No. | Application Title | Issue Date |
| 20120127481 | METHOD AND APPARATUS FOR DETERMINING A DEVIATION OF AN ACTUAL SHAPE FROM A DESIRED SHAPE OF AN OPTICAL SURFACE An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting... | 05/24/2012 |
| 20120105863 | Wavefront measurement apparatus A wavefront measurement apparatus includes a light source that emits a light beam; a light splitting unit that splits the light beam emitted from the light source into an object light beam and a reference light beam; an objective lens that converges the object light bea... | 05/03/2012 |
| 20110242649 | Wavefront measurement method, wavefront measurement apparatus, and microscope A wavefront is measured with superior precision even if the density of scatterers in the vicinity of a focal plane is low. Provided is a wavefront measurement method including a contrast measuring step of measuring the contrast of an interference pattern corresponding t... | 10/06/2011 |
| 20110141484 | METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning... | 06/16/2011 |
| 20110134437 | FIZEAU INTERFEROMETER AND MEASUREMENT METHOD USING FIZEAU INTERFEROMETER A Fizeau interferometer includes: a reference spherical surface; and a measuring apparatus including an intensity obtaining section and a form calculating section, wherein: a focal point of the reference spherical surface is aligned with a center of curvature of the sph... | 06/09/2011 |
| 20110134436 | METHOD FOR DEPTH RESOLVED WAVEFRONT SENSING, DEPTH RESOLVED WAVEFRONT SENSORS AND METHOD AND APPARATUS FOR OPTICAL IMAGING Methods and devices are disclosed for acquiring depth resolved aberration information using principles of low coherence interferometry and perform coherence gated wavefront sensing (CG-WFS). The wavefront aberrations is collected using spectral domain low coherence inte... | 06/09/2011 |
| 20110080593 | SURFACE SHAPE MEASUREMENT APPARATUS An apparatus for measuring a shape of a surface, comprises a measurement head which measures at least one of a distance between a reference point and the surface and a direction of a normal from the surface to the reference point, a scanning mechanism which scans the me... | 04/07/2011 |
| 20110032536 | GRAZING INCIDENCE INTERFEROMETER A grazing incidence interferometer includes: a beam splitting section configured to split a beam from a beam source section into a measuring beam emergent to a measurement surface and a reference beam serving as a measurement reference, and configured to cause the measu... | 02/10/2011 |
| 20100259763 | SYSTEMS FOR AND METHODS OF FACILITATING FOCUSING AN OPTICAL SCANNER Systems and methods for facilitating focusing of an image scanner, such as a confocal microscope, are disclosed. Measurement of optical characteristics in certain areas of a test sample are compared to stored or baseline optical characteristic profiles to determine an a... | 10/14/2010 |
| 20100238455 | ERROR COMPENSATION IN PHASE SHIFTING INTERFEROMETRY In certain aspects, disclosed methods include combining reference light reflected from a reference surface with test light reflected from a test surface to form combined light, the test and reference light being derived from a common source, sinusoidally varying a phase... | 09/23/2010 |
| 20100208272 | METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION OF A SUBSTRATE An interferometer system and method may be used to measure substrate thickness or shape. The system may include two spaced apart reference flats having that form an optical cavity between two parallel reference surfaces. A substrate holder may be configured to place the... | 08/19/2010 |
| 20100177321 | OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the ... | 07/15/2010 |
| 20100177320 | METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning... | 07/15/2010 |
| 20100177322 | MEASUREMENT METHOD AND MEASUREMENT APPARATUS The present invention provides a measurement apparatus that illuminates a surface to be tested having an aspheric surface using light beams that form spherical waves to measure a figure of the surface to be tested, including a detection unit configured to detect interfe... | 07/15/2010 |
| 20100110446 | Scanning Interferometric Methods and Apparatus for Measuring Aspheric Surfaces and Wavefronts Interferometric scanning method(s) and apparatus for measuring test optics having aspherical surfaces including those with large departures from spherical. A reference wavefront is generated from a known origin along a scanning axis. A test optic is aligned on the scann... | 05/06/2010 |
| 20100060901 | REMOTE SENSING OF UNDERWATER ACOUSTIC FIELDS An acoustic field in a body of water is monitored using a coherent light field emitter applying a distributed light field across the surface of the water to be reflected, and a sensor is used to sense reflected components of the light field above the surface and to prov... | 03/11/2010 |
| 20100014098 | Oblique incidence interferometer An oblique incidence interferometer enlarges a measurement range without increasing a size of the apparatus. The oblique incidence interferometer includes a light source for emitting coherent light in an oblique direction to a measurement object; a light collimating uni... | 01/21/2010 |
| 20090296101 | MEASUREMENT METHOD A measurement method of the present invention is a measurement method for measuring a shape of a target T from an interference pattern generated by interference between a reflected light of the target and a reference spherical surface. The measurement method includes a ... | 12/03/2009 |
| 20090296102 | COHERENCE TOMOGRAPHY DEVICE An optical coherence tomography device includes: a light source 1; a light splitting section 2a that splits light-source light emitted from the light source 1 into reference light and measurement light; an interfering section 2a | 12/03/2009 |
| 20090284753 | SYSTEM AND METHOD OF MEASURING AND MAPPING THREE DIMENSIONAL STRUCTURES A system for mapping a three-dimensional structure includes a projecting optical system adapted to project light onto an object, a correction system adapted to compensate the light for at least one aberration in the object, an imaging system adapted to collect light sca... | 11/19/2009 |
| 20090279101 | Electrostatic Chuck With Anti-Reflective Coating, Measuring Method and Use of Said Chuck The embodiments disclosed herein relate to an electrostatic chuck, or an optically structured element or an optical mask that comprise a metal film as well as a transparent cover applied on a substrate. At least two anti-reflective films are inserted between the metal f... | 11/12/2009 |
| 20090276188 | QUANTITATIVE DIFFERENTIAL INTERFERENCE CONTRAST (DIC) MICROSCOPY AND PHOTOGRAPHY BASED ON WAVEFRONT SENSORS A wavefront microscope or camera utilizes a wavefront sensor to measure the local intensity and phase gradient of the wavefront and output image maps based on the intensity and phase gradient. A wavefront sensor provides a metal film having patterned structured two dime... | 11/05/2009 |
| 20090257068 | WAVEFRONT MEASURING METHOD AND WAVEFRONT MEASURING APPARATUS USING THE WAVEFRONT MEASURING METHOD A wavefront measuring method includes steps of:
| 10/15/2009 |
| 20090168076 | LIGHT WAVE INTERFEROMETER APPARATUS The light wave interferometer apparatus is provided and includes: a luminous flux, which is sent from the light source and divided into two portions by the luminous flux separation and composition unit, are combined with each other again under the condition that the div... | 07/02/2009 |
| 20090147269 | Interferometric nanoimaging system The invention is a means of providing focusing and the use of focal methods to improve the imaging and meteorological performance of an interferometric, non-image forming system for use in metrology and nanoscale imaging.... | 06/11/2009 |
| 20090033916 | System and Method for Measuring Interferences A system and method for measuring interferences are disclosed. The system is based on the concept of a composite interferometer. The sample is measured while a simultaneous compensation of the phase deviation due to the relative displacement of the optical delay compone... | 02/05/2009 |
| 20090012743 | Surface Measurement Instrument A surface measurement instrument (1) for obtaining surface characteristic data of a sample surface (13) is described. Relative movement between a reference surface (11) and a sample support (15) is caused to occur while a sensor (16) s... | 01/08/2009 |
| 20080259349 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD An exposure apparatus, which equipped with a projection optical system that is configured to project a pattern of an original onto a substrate, includes an interferometer configured to measure a wavefront in a first direction and a wavefront in a second direction of lig... | 10/23/2008 |
| 20080180687 | Interferometric Height Measurement The invention relates to an interferometric method for measuring a height of a first region on a first surface, the first surface having first areas having first optical properties and second areas having second optical properties, the method comprising the steps of gen... | 07/31/2008 |
| 20080151258 | SHAPE MEASURING APPARATUS, SHAPE MEASURING METHOD, AND EXPOSURE APPARATUS A shape measuring method for measuring a surface shape of a measurement target includes dividing light from a light source into measurement light and reference light, the measurement light being obliquely incident upon a surface of the measurement target, the reference ... | 06/26/2008 |
| 20080137098 | METHOD OF MULTIPLE WAVELENGTH INTERFEROMETRY A method for creating an image of an object includes setting an illumination source at an initial nominal wavelength, illuminating an object with an illumination source to create interference patterns, changing the wavelength of the illumination source to drift from the... | 06/12/2008 |
| 20080111980 | EXPOSURE APPARATUS EQUIPPED WITH INTERFEROMETER AND EXPOSURE APPARATUS USING THE SAME An exposure apparatus includes a projection optical system for projecting an exposure pattern, onto an object to be exposed, and a measuring apparatus for measuring, as an interference fringe, optical performance of the projection optical system, wherein the measuring a... | 05/15/2008 |
| 20080079950 | Diffractive null corrector employing a spatial light modulator The present invention is directed to a system and method for using a spatial light modulator (SLM) to perform a null test of an (aspheric) optical surface. In an embodiment, such a system includes an interferometer, an optical element, and an SLM. The interferometer pro... | 04/03/2008 |
| 20080062429 | LOW COHERENCE DENTAL OCT IMAGING A method for obtaining an image of a tooth obtains an area image of the tooth (20) surface and identifies a region of interest from the area image by positioning a marker (146) on the area image. The marker (146) corresponds to at least a portion of... | 03/13/2008 |
| 20080043247 | Method of Manufacturing an Optical Element A method of manufacturing an optical element includes testing the optical element by using an interferometer optics generating a beam of measuring light illuminating only a sub-aperture of the tested optical element. The interferometer optics comprises a hologram. Resul... | 02/21/2008 |
| 20080002212 | Oblique incidence interferometer An oblique incidence interferometer is provided for applying a light at a certain angle from the normal to a measurement surface of a target to be measured and measuring a light reflected from the target. A beam splitter element and beam synthesizer element splits the l... | 01/03/2008 |
| 20080002211 | SYSTEM, ARRANGEMENT AND PROCESS FOR PROVIDING SPECKLE REDUCTIONS USING A WAVE FRONT MODULATION FOR OPTICAL COHERENCE TOMOGRAPHY Exemplary systems and methods for generating information associated with at least one portion of a sample can be provided. For example, it is possible to receive from the at least one portion and/or transmit to at least one electromagnetic radiation to the portion. At l... | 01/03/2008 |
| 20070279639 | Profilometry apparatus and method of operation A profilometry apparatus is provided. The profilometry apparatus includes a fringe projection device configured to project a fringe pattern on an object and an optical unit configured to capture an image of a distorted fringe pattern modulated by the object. The profilo... | 12/06/2007 |
| 20070236702 | Geometric measurement system and method of measuring a geometric characteristic of an object A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The geometric measurement system can employ one or more of three possible metho... | 10/11/2007 |
| 20070236703 | Geometric measurement system and method of measuring a geometric characteristic of an object A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The geometric measurement system can employ one or more of three possible metho... | 10/11/2007 |
