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| Application No. | Application Title | Issue Date |
| 20120070065 | POLARIZATION IMAGING Methods of monitoring critical dimensions in a semiconductor fabrication process include capturing at least one image of a first structure that has an effect on the polarization state of light reflected therefrom. For at least some of the first structure images, a value... | 03/22/2012 |
| 20120069335 | SURFACE INSPECTING APPARATUS AND SURFACE INSPECTING METHOD A surface inspecting apparatus includes an illumination optical system irradiating linearly polarized light to a wafer surface under a plurality of inspection conditions; an imaging optical system capturing an image of the wafer formed by polarization components having ... | 03/22/2012 |
| 20120069336 | INTRA-CAVITY ELLIPSOMETER SYSTEM AND METHOD A resonant optical cavity ellipsometer system is provided. The system can be used to conduct time-dependent arid sensitive measurement of ellipsometric parameters of matter. In a particular use, the system can provide time resolution abetter than 1 microsecond. In a par... | 03/22/2012 |
| 20120050739 | SURFACE INSPECTION DEVICE AND SURFACE INSPECTION METHOD There is provided a surface inspection device configured to detect the surface state of the wafer, such as a defect in the uppermost layer and a variation of the CD value, using even diffracted light influenced by the baselayer. The surface inspection device is configur... | 03/01/2012 |
| 20120044495 | Inspection Method and Apparatus, and Associated Computer Readable Product A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of a grating on a substrate. Linearly polarized light sources are passed via a fixed phase retarder in order to change the phase of one of... | 02/23/2012 |
| 20120038921 | METHOD AND SYSTEM FOR INSPECTING BEVELED OBJECTS An inspection system and a method. The method may include: illuminating the object with impinging light of a first polarization; performing a polarization based filtering of (a) multiple-reflected light signals, each multiple-reflected light signal being reflected from ... | 02/16/2012 |
| 20120038920 | Method and Apparatus for Ellipsometry Measurement Methods and systems are provided to avoid the rotation action with the polarizer and the analyzer in complex ellipsometric measurement and repeated processes. In particular, methods and systems are provided which polarize the incident light in a fixed azimuthal angle th... | 02/16/2012 |
| 20120021539 | IN-LINE METROLOGY SYSTEM A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes.... | 01/26/2012 |
| 20120009849 | POLISHING END POINT DETECTION METHOD, POLISHING END POINT DETECTION APPARATUS, AND POLISHING APPARATUS A polishing end point detection method is to detect a polishing end point of a workpiece having a multilayer structure. The method is performed by emitting a first light and a second light to a surface of the workpiece at a first angle of incidence and a second angle of... | 01/12/2012 |
| 20120002204 | DETECTOR FOR BIREFRINGENT OBJECTS The invention relates to a detector and a method, adapted for detecting a birefringent object near a surface, and to a shaving device adapted for detecting and for cutting a hair near a skin surface of a human body part or an animal body part. The detector (26) c... | 01/05/2012 |
| 20120002203 | Sensitivity enhancement in grating coupled surface plasmon resonance by azimuthal control A method and a system for the enhancement of the sensitivity in surface plasmon resonance (SPR) sensors based metallic grating by exploiting the conical configuration is presented. We consider the propagation of surface plasmon polaritons (SPPs) excited by light from th... | 01/05/2012 |
| 20110310388 | DISCRETE POLARIZATION SCATTEROMETRY Systems and methods for discrete polarization scatterometry are provided.... | 12/22/2011 |
| 20110310387 | METHOD AND APPARATUS FOR TESTING MAGNETIC PROPERTIES OF MAGNETIC MEDIA A method and apparatus for testing a magnetic medium. The method comprises applying a magnetic field of a time-varying strength; directing a polarized optical beam towards a portion of the medium that is in the magnetic field, wherein the optical beam is reflected by a ... | 12/22/2011 |
| 20110299082 | Method of Ellipsometric Reconnaissance A method of obtaining information about a target by using an ellipsometric technique of illuminating the target with coherent light beams from moveable light sources and recording reflections from the target. By analyzing the reflections, the surface material refractive... | 12/08/2011 |
| 20110292389 | Device and Method for Determining a Piece of Polarisation Information and Polarimetric Imaging Device The invention relates to a method and to a device for determining at least one piece of polarisation information on a measurement point of a target sample, the device comprising: —a light source capable of emitting a rectilinearly polarised light beam, the light beam ... | 12/01/2011 |
| 20110292390 | Apparatus For Inspecting Defects A defect inspection apparatus includes an illumination optical system, a detection optical system which includes a reflecting objective lens, and wavelength separation optics for conducting wavelength separation, and after the wavelength separation, branching the scatte... | 12/01/2011 |
| 20110285996 | OPTICAL MEASUREMENTS OF PROPERTIES IN SUBSTANCES USING PROPAGATION MODES OF LIGHT This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.... | 11/24/2011 |
| 20110255074 | Apparatus and Method for Inspecting Defects A defect inspection apparatus and method includes utilizing an irradiation optical system that focuses a beam flux emitted from a laser light source and formed into a slit-shaped beam so as to irradiate the beam onto the surface of the substrate to be inspected, utilizi... | 10/20/2011 |
| 20110235038 | Evaluation device and evaluation method In an evaluation device (1), an analyzer (42) is rotated so that the azimuth of the transmission axis of the analyzer (42) has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer (32), an imaging... | 09/29/2011 |
| 20110216320 | MULTI-CHANNEL SURFACE PLASMON RESONANCE SENSOR USING BEAM PROFILE ELLIPSOMETRY Provided is a multi-channel surface plasmon resonance sensor using beam profile ellipsometry; and, more particularly, to a high sensitive measuring technology, which is coupled with a vertical illumination type focused-beam ellipsometer using a multi-incident angle meas... | 09/08/2011 |
| 20110205540 | METHODS AND APPARATUS FOR THE MEASUREMENT OF FILM THICKNESS Methods and apparatus for measuring thickness of a thin film include: obtaining a high-speed thickness measurement of a thin film using a laser projection system and detector array, obtaining thickness measurements of the thin film at one or more locations using a singl... | 08/25/2011 |
| 20110188020 | Overlay Measurement Apparatus, Lithographic Apparatus and Device Manufacturing Method Using Such Overlay Measurement Apparatus An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarizatio... | 08/04/2011 |
| 20110188040 | Mounting for deviation angle self compensating substantially achromatic retarder A system, method of configuring, and application a system for introducing a relative phase retardation into orthogonally polarized components of an electromagnetic beam entered thereinto, wherein the system involves a substantially achromatic multiple element retarder s... | 08/04/2011 |
| 20110176133 | METHOD AND APPARATUS FOR ELLIPSOMETRY MEASUREMENT To avoid the rotation action with the polarizer and the analyzer in ellipsometric measurement, complex measurement and repeated process, this invention proposes to polarize the incident light in a fixed azimuthal angle then illuminate the polarized light onto the target... | 07/21/2011 |
| 20110144505 | OPTICAL DEVICE AND METHOD FOR SHAPE AND GRADIENT DETECTION AND/OR MEASUREMENT AND ASSOCIATED DEVICE Provided are: an optical device for shape and gradient detection and/or measurement which has a simple structure, is robust to external disturbance, and enables accurate measurement of the gradient angle of an object surface, including a human body; a method for optical... | 06/16/2011 |
| 20110122410 | Optical Reflectometry Setup In the present invention, we present a robust technical approach of how the use of a modified detector set-up eliminates a complication in relation to the usage of prism-based optical reflectometry in contact with liquid sample suspension. Additionally we disclose how m... | 05/26/2011 |
| 20110102793 | Inspection Apparatus for Lithography Four separately polarized beams are simultaneously measured upon diffraction from a substrate (W) to determine properties of the substrate. Linearly, circularly or elliptically polarized radiation is transmitted through a first beam splitter (N-PBS) and split into two p... | 05/05/2011 |
| 20110085167 | SURFACE PLASMON RESONANCE SPECTROMETER WITH AN ACTUATOR DRIVEN ANGLE SCANNING MECHANISM Instruments and methods relating to surface plasmon imaging are described. An instrument comprises a semi-circular rail and a driving mechanism. The driving mechanism is attached to a light source mount and a detector mount, and both the light source mount and the detec... | 04/14/2011 |
| 20110080586 | OPTICAL DEVICE HAVING POLARIZER AND RETARDERS FOR SPECTROSCOPIC POLARIMETRY In the channeled spectroscopic polarimetry, a measurement error of a parameter showing a spectropolarization characteristic of a sample is effectively removed, the error being generated by various variations in retardation of a retarder depending upon the state of the s... | 04/07/2011 |
| 20110080585 | Scatterometry Measurement of Asymmetric Structures Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer that may include a rot... | 04/07/2011 |
| 20110075151 | INTERFEROMETRIC DEFECT DETECTION AND CLASSIFICATION Systems and methods for using common-path interferometric imaging for defect detection and classification are described. An illumination source generates and directs coherent light toward the sample. An optical imaging system collects light reflected or transmitted from... | 03/31/2011 |
| 20110069312 | METROLOGY SYSTEMS AND METHODS Various metrology systems and methods are provided.... | 03/24/2011 |
| 20110069313 | METHOD FOR INSPECTING DEFECTS AND DEFECT INSPECTING APPARATUS Light from a light source device (4) is polarized through a polarizer (5) and is caused to impinge obliquely on an object (W) to be inspected. The resulting scattered light (SB) is received by a CCD imaging device (7) having an element (9) fo... | 03/24/2011 |
| 20110071784 | Goos-Hanchen compensation in autofocus systems A new and useful method is provided for Goos-Hanchen compensation in an optical autofocus (AF) system that uses light reflected from a substrate to determine changes in the z position of a substrate. According to the method of the invention reflected light from the subs... | 03/24/2011 |
| 20110063616 | OPTICAL MEASUREMENTS OF PROPERTIES IN SUBSTANCES USING PROPAGATION MODES OF LIGHT This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.... | 03/17/2011 |
| 20110063603 | APPARATUS AND METHOD FOR INSPECTING DEFECTS A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate... | 03/17/2011 |
| 20110037981 | WAVE-GUIDE COUPLING SPR SENSOR CHIP AND SENSOR CHIP ARRAY THEREOF A sensor chip based on the WCSPR effect and an array thereof are disclosed. The sensor chip is a multilayer structure comprising a substrate, a dielectric waveguide layer (26) disposed on the substrate and a first metal layer (27) disposed on the dielectri... | 02/17/2011 |
| 20110038526 | Method and Device for Testing Cigarette Packages Wound with Film A method for testing moving products having at least two layers, such as cigarette packages wrapped with film, wherein at least one layer of the product, namely an inner layer which is arranged further inwards, is covered at least regionally by at least one, at least pa... | 02/17/2011 |
| 20110032500 | INSPECTION APPARATUS FOR LITHOGRAPHY The measurement of two separately polarized beams (Ix, Iy) upon diffraction from a substrate (W) in order to determine properties of the substrate is disclosed. Circularly or elliptically polarized radiation is passed via a variable phase retarder in order to change the... | 02/10/2011 |
| 20110019190 | RESISTIVITY TESTING METHOD AND DEVICE THEREFOR An object is to efficiently measure the resistivity of a transparent conductive film with high accuracy in a non-destructive and non-contact manner. Provided is a resistivity testing device that includes a light emitting device that emits p-polarized emission light havi... | 01/27/2011 |
